JPS61121734U - - Google Patents
Info
- Publication number
- JPS61121734U JPS61121734U JP412585U JP412585U JPS61121734U JP S61121734 U JPS61121734 U JP S61121734U JP 412585 U JP412585 U JP 412585U JP 412585 U JP412585 U JP 412585U JP S61121734 U JPS61121734 U JP S61121734U
- Authority
- JP
- Japan
- Prior art keywords
- boat
- gas
- quartz tube
- tube
- end side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000001947 vapour-phase growth Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims 8
- 239000012495 reaction gas Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985004125U JPH0539624Y2 (US06168655-20010102-C00055.png) | 1985-01-18 | 1985-01-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985004125U JPH0539624Y2 (US06168655-20010102-C00055.png) | 1985-01-18 | 1985-01-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61121734U true JPS61121734U (US06168655-20010102-C00055.png) | 1986-07-31 |
JPH0539624Y2 JPH0539624Y2 (US06168655-20010102-C00055.png) | 1993-10-07 |
Family
ID=30479395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985004125U Expired - Lifetime JPH0539624Y2 (US06168655-20010102-C00055.png) | 1985-01-18 | 1985-01-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0539624Y2 (US06168655-20010102-C00055.png) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0888193A (ja) * | 1995-08-11 | 1996-04-02 | Furendotetsuku Kenkyusho:Kk | 半導体デバイスの製造装置 |
JPH09186096A (ja) * | 1997-02-06 | 1997-07-15 | Hitachi Ltd | 処理方法 |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49387A (US06168655-20010102-C00055.png) * | 1972-04-17 | 1974-01-05 | ||
JPS4915366A (US06168655-20010102-C00055.png) * | 1972-05-17 | 1974-02-09 | ||
JPS508782A (US06168655-20010102-C00055.png) * | 1973-05-28 | 1975-01-29 | ||
JPS51124353U (US06168655-20010102-C00055.png) * | 1975-03-31 | 1976-10-07 | ||
JPS52149969A (en) * | 1976-06-09 | 1977-12-13 | Hitachi Ltd | Method of putting wafers into and out from reaction tube in heat-treatment furnace |
JPS5691417A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Heating treatment device for wafer |
JPS57159015A (en) * | 1981-03-26 | 1982-10-01 | Nec Corp | Film growing device |
JPS5821025A (ja) * | 1981-07-31 | 1983-02-07 | Ogura Clutch Co Ltd | 逆作動連結装置 |
JPS58118119A (ja) * | 1982-01-07 | 1983-07-14 | Nec Corp | 反応性イオンプレ−テイング装置 |
JPS58138334U (ja) * | 1982-03-12 | 1983-09-17 | 富士通株式会社 | ウエハ自動給材機構 |
JPS5938377A (ja) * | 1982-08-26 | 1984-03-02 | Canon Inc | プラズマcvd装置 |
JPS60193323A (ja) * | 1984-03-15 | 1985-10-01 | Nec Corp | 半導体気相成長装置 |
JPS61114522A (ja) * | 1984-11-09 | 1986-06-02 | Hitachi Ltd | 半導体ウエハ加熱装置 |
JPS6250970A (ja) * | 1985-08-28 | 1987-03-05 | 林 器良 | 多相カ−ド読み取り方法及びその装置 |
-
1985
- 1985-01-18 JP JP1985004125U patent/JPH0539624Y2/ja not_active Expired - Lifetime
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49387A (US06168655-20010102-C00055.png) * | 1972-04-17 | 1974-01-05 | ||
JPS4915366A (US06168655-20010102-C00055.png) * | 1972-05-17 | 1974-02-09 | ||
JPS508782A (US06168655-20010102-C00055.png) * | 1973-05-28 | 1975-01-29 | ||
JPS51124353U (US06168655-20010102-C00055.png) * | 1975-03-31 | 1976-10-07 | ||
JPS52149969A (en) * | 1976-06-09 | 1977-12-13 | Hitachi Ltd | Method of putting wafers into and out from reaction tube in heat-treatment furnace |
JPS5691417A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Heating treatment device for wafer |
JPS57159015A (en) * | 1981-03-26 | 1982-10-01 | Nec Corp | Film growing device |
JPS5821025A (ja) * | 1981-07-31 | 1983-02-07 | Ogura Clutch Co Ltd | 逆作動連結装置 |
JPS58118119A (ja) * | 1982-01-07 | 1983-07-14 | Nec Corp | 反応性イオンプレ−テイング装置 |
JPS58138334U (ja) * | 1982-03-12 | 1983-09-17 | 富士通株式会社 | ウエハ自動給材機構 |
JPS5938377A (ja) * | 1982-08-26 | 1984-03-02 | Canon Inc | プラズマcvd装置 |
JPS60193323A (ja) * | 1984-03-15 | 1985-10-01 | Nec Corp | 半導体気相成長装置 |
JPS61114522A (ja) * | 1984-11-09 | 1986-06-02 | Hitachi Ltd | 半導体ウエハ加熱装置 |
JPS6250970A (ja) * | 1985-08-28 | 1987-03-05 | 林 器良 | 多相カ−ド読み取り方法及びその装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0888193A (ja) * | 1995-08-11 | 1996-04-02 | Furendotetsuku Kenkyusho:Kk | 半導体デバイスの製造装置 |
JPH09186096A (ja) * | 1997-02-06 | 1997-07-15 | Hitachi Ltd | 処理方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0539624Y2 (US06168655-20010102-C00055.png) | 1993-10-07 |