JPS61114757U - - Google Patents

Info

Publication number
JPS61114757U
JPS61114757U JP19935084U JP19935084U JPS61114757U JP S61114757 U JPS61114757 U JP S61114757U JP 19935084 U JP19935084 U JP 19935084U JP 19935084 U JP19935084 U JP 19935084U JP S61114757 U JPS61114757 U JP S61114757U
Authority
JP
Japan
Prior art keywords
sample
hole
electron beam
beam path
backscattered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19935084U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02843Y2 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19935084U priority Critical patent/JPH02843Y2/ja
Publication of JPS61114757U publication Critical patent/JPS61114757U/ja
Application granted granted Critical
Publication of JPH02843Y2 publication Critical patent/JPH02843Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Microscoopes, Condenser (AREA)
JP19935084U 1984-12-28 1984-12-28 Expired JPH02843Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19935084U JPH02843Y2 (enExample) 1984-12-28 1984-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19935084U JPH02843Y2 (enExample) 1984-12-28 1984-12-28

Publications (2)

Publication Number Publication Date
JPS61114757U true JPS61114757U (enExample) 1986-07-19
JPH02843Y2 JPH02843Y2 (enExample) 1990-01-10

Family

ID=30759190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19935084U Expired JPH02843Y2 (enExample) 1984-12-28 1984-12-28

Country Status (1)

Country Link
JP (1) JPH02843Y2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11264900A (ja) * 1998-01-09 1999-09-28 Internatl Business Mach Corp <Ibm> 汚染防止手段を有する荷電粒子ビ―ム装置
WO2007119873A1 (ja) * 2006-04-12 2007-10-25 Hitachi High-Technologies Corporation 走査型電子顕微鏡
JP2023128230A (ja) * 2022-03-03 2023-09-14 国立研究開発法人産業技術総合研究所 Ｘ線分光装置及びｘ線分光システム

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11264900A (ja) * 1998-01-09 1999-09-28 Internatl Business Mach Corp <Ibm> 汚染防止手段を有する荷電粒子ビ―ム装置
WO2007119873A1 (ja) * 2006-04-12 2007-10-25 Hitachi High-Technologies Corporation 走査型電子顕微鏡
JPWO2007119873A1 (ja) * 2006-04-12 2009-08-27 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡
JP2023128230A (ja) * 2022-03-03 2023-09-14 国立研究開発法人産業技術総合研究所 Ｘ線分光装置及びｘ線分光システム

Also Published As

Publication number Publication date
JPH02843Y2 (enExample) 1990-01-10

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