JPS6111222Y2 - - Google Patents

Info

Publication number
JPS6111222Y2
JPS6111222Y2 JP18165980U JP18165980U JPS6111222Y2 JP S6111222 Y2 JPS6111222 Y2 JP S6111222Y2 JP 18165980 U JP18165980 U JP 18165980U JP 18165980 U JP18165980 U JP 18165980U JP S6111222 Y2 JPS6111222 Y2 JP S6111222Y2
Authority
JP
Japan
Prior art keywords
substrate
base plate
mask
center
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18165980U
Other languages
English (en)
Japanese (ja)
Other versions
JPS57106758U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18165980U priority Critical patent/JPS6111222Y2/ja
Publication of JPS57106758U publication Critical patent/JPS57106758U/ja
Application granted granted Critical
Publication of JPS6111222Y2 publication Critical patent/JPS6111222Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP18165980U 1980-12-19 1980-12-19 Expired JPS6111222Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18165980U JPS6111222Y2 (enrdf_load_stackoverflow) 1980-12-19 1980-12-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18165980U JPS6111222Y2 (enrdf_load_stackoverflow) 1980-12-19 1980-12-19

Publications (2)

Publication Number Publication Date
JPS57106758U JPS57106758U (enrdf_load_stackoverflow) 1982-07-01
JPS6111222Y2 true JPS6111222Y2 (enrdf_load_stackoverflow) 1986-04-09

Family

ID=29979331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18165980U Expired JPS6111222Y2 (enrdf_load_stackoverflow) 1980-12-19 1980-12-19

Country Status (1)

Country Link
JP (1) JPS6111222Y2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602007006772D1 (de) * 2007-04-27 2010-07-08 Applied Materials Inc Substratverarbeitungsvorrichtung und Verfahren zum Platzieren eines Substrats
JP2010196126A (ja) 2009-02-26 2010-09-09 Canon Inc 真空蒸着装置の重石板およびそれを用いた真空蒸着装置
JP5950164B2 (ja) * 2012-10-03 2016-07-13 日新イオン機器株式会社 基板ホルダ
US20210010128A1 (en) * 2018-03-29 2021-01-14 Oerlikon Surface Solutions Ag, Pfäffikon Device and method for selective vapor coating of a substrate

Also Published As

Publication number Publication date
JPS57106758U (enrdf_load_stackoverflow) 1982-07-01

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