JPS6110974B2 - - Google Patents
Info
- Publication number
- JPS6110974B2 JPS6110974B2 JP16162578A JP16162578A JPS6110974B2 JP S6110974 B2 JPS6110974 B2 JP S6110974B2 JP 16162578 A JP16162578 A JP 16162578A JP 16162578 A JP16162578 A JP 16162578A JP S6110974 B2 JPS6110974 B2 JP S6110974B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- electron beam
- alignment marks
- forming
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16162578A JPS5586118A (en) | 1978-12-23 | 1978-12-23 | Alignment mark formation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16162578A JPS5586118A (en) | 1978-12-23 | 1978-12-23 | Alignment mark formation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5586118A JPS5586118A (en) | 1980-06-28 |
| JPS6110974B2 true JPS6110974B2 (OSRAM) | 1986-04-01 |
Family
ID=15738730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16162578A Granted JPS5586118A (en) | 1978-12-23 | 1978-12-23 | Alignment mark formation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5586118A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100540644B1 (ko) * | 1998-02-19 | 2006-02-28 | 삼성전자주식회사 | 마이크로 엑츄에이터 제조방법 |
-
1978
- 1978-12-23 JP JP16162578A patent/JPS5586118A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5586118A (en) | 1980-06-28 |
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