JPS61108930A - 粒子線等の入射位置を検出するための半導体入射位置検出装置 - Google Patents
粒子線等の入射位置を検出するための半導体入射位置検出装置Info
- Publication number
- JPS61108930A JPS61108930A JP59230778A JP23077884A JPS61108930A JP S61108930 A JPS61108930 A JP S61108930A JP 59230778 A JP59230778 A JP 59230778A JP 23077884 A JP23077884 A JP 23077884A JP S61108930 A JPS61108930 A JP S61108930A
- Authority
- JP
- Japan
- Prior art keywords
- incident position
- semiconductor
- resistance
- detection device
- incident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/29—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Measurement Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59230778A JPS61108930A (ja) | 1984-11-01 | 1984-11-01 | 粒子線等の入射位置を検出するための半導体入射位置検出装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59230778A JPS61108930A (ja) | 1984-11-01 | 1984-11-01 | 粒子線等の入射位置を検出するための半導体入射位置検出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61108930A true JPS61108930A (ja) | 1986-05-27 |
JPH0476055B2 JPH0476055B2 (enrdf_load_stackoverflow) | 1992-12-02 |
Family
ID=16913112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59230778A Granted JPS61108930A (ja) | 1984-11-01 | 1984-11-01 | 粒子線等の入射位置を検出するための半導体入射位置検出装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61108930A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4912974A (en) * | 1987-12-08 | 1990-04-03 | Mitsubishi Denki Kabushiki Kaisha | Thermal flow sensor |
US5351537A (en) * | 1992-08-28 | 1994-10-04 | Mitsubishi Denki Kabushiki Kaisha | Heat-sensitive flow rate sensor having a longitudinal wiring pattern for uniform temperature distribution |
US5361634A (en) * | 1992-08-28 | 1994-11-08 | Mitsubishi Denki Kabushiki Kaisha | Heat-sensitive flow rate sensor |
JP2006234661A (ja) * | 2005-02-25 | 2006-09-07 | Toshiba Corp | 放射線入射位置検出装置および放射線入射位置検出方法 |
JP2008116260A (ja) * | 2006-11-01 | 2008-05-22 | Tohoku Univ | 半導体検出器ブロック及びこれを用いた陽電子断層撮影装置 |
US7381940B2 (en) | 2005-09-09 | 2008-06-03 | Sharp Kabushiki Kaisha | Light receiving element for position detection having a plurality of resistance units and sensor and electronic apparatus having the same |
WO2009130782A1 (ja) * | 2008-04-24 | 2009-10-29 | 住友重機械工業株式会社 | 半導体検出器ブロック及びこれを用いた陽電子断層撮影装置 |
WO2010064693A1 (ja) * | 2008-12-03 | 2010-06-10 | 国立大学法人東北大学 | 放射線の位置を2次元で検出する半導体検出器及びそれを用いた放射線の2次元位置検出方法 |
-
1984
- 1984-11-01 JP JP59230778A patent/JPS61108930A/ja active Granted
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4912974A (en) * | 1987-12-08 | 1990-04-03 | Mitsubishi Denki Kabushiki Kaisha | Thermal flow sensor |
US5351537A (en) * | 1992-08-28 | 1994-10-04 | Mitsubishi Denki Kabushiki Kaisha | Heat-sensitive flow rate sensor having a longitudinal wiring pattern for uniform temperature distribution |
US5361634A (en) * | 1992-08-28 | 1994-11-08 | Mitsubishi Denki Kabushiki Kaisha | Heat-sensitive flow rate sensor |
JP2006234661A (ja) * | 2005-02-25 | 2006-09-07 | Toshiba Corp | 放射線入射位置検出装置および放射線入射位置検出方法 |
US7381940B2 (en) | 2005-09-09 | 2008-06-03 | Sharp Kabushiki Kaisha | Light receiving element for position detection having a plurality of resistance units and sensor and electronic apparatus having the same |
JP2008116260A (ja) * | 2006-11-01 | 2008-05-22 | Tohoku Univ | 半導体検出器ブロック及びこれを用いた陽電子断層撮影装置 |
WO2009130782A1 (ja) * | 2008-04-24 | 2009-10-29 | 住友重機械工業株式会社 | 半導体検出器ブロック及びこれを用いた陽電子断層撮影装置 |
WO2010064693A1 (ja) * | 2008-12-03 | 2010-06-10 | 国立大学法人東北大学 | 放射線の位置を2次元で検出する半導体検出器及びそれを用いた放射線の2次元位置検出方法 |
US8785865B2 (en) | 2008-12-03 | 2014-07-22 | Tohoku University | Semiconductor detector for two-dimensionally detecting radiation positions and method for two-dimensionally detecting radiation positions using the same |
JP5622339B2 (ja) * | 2008-12-03 | 2014-11-12 | 国立大学法人東北大学 | 放射線の位置を2次元で検出する半導体2次元位置検出器及びそれを用いた陽電子断層撮影装置並びに放射線の2次元位置検出方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0476055B2 (enrdf_load_stackoverflow) | 1992-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |