JPS61104082A - Device for plating magnetic disk substrate - Google Patents

Device for plating magnetic disk substrate

Info

Publication number
JPS61104082A
JPS61104082A JP22492884A JP22492884A JPS61104082A JP S61104082 A JPS61104082 A JP S61104082A JP 22492884 A JP22492884 A JP 22492884A JP 22492884 A JP22492884 A JP 22492884A JP S61104082 A JPS61104082 A JP S61104082A
Authority
JP
Japan
Prior art keywords
magnetic disk
substrate
oscillating shaft
disk substrate
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22492884A
Other languages
Japanese (ja)
Inventor
Hidehiro Ohashi
大橋 秀弘
Shiro Suzuki
鈴木 嗣郎
Toshihisa Miyazaki
稔久 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chuo Seisakusho KK
Original Assignee
Chuo Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chuo Seisakusho KK filed Critical Chuo Seisakusho KK
Priority to JP22492884A priority Critical patent/JPS61104082A/en
Publication of JPS61104082A publication Critical patent/JPS61104082A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1619Apparatus for electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1619Apparatus for electroless plating
    • C23C18/1628Specific elements or parts of the apparatus
    • C23C18/163Supporting devices for articles to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To obtain the titled device capable of electroless-plating a substrate without any defects by rotating circumferentially an oscillating shaft having a recessed groove for supporting plural magnetic disk substrates in a treating vessel with an ultrasonic vibrator on the outside surface. CONSTITUTION:An oscillating shaft 3 consisting of two circular surface 8 and 9 each having a different radius of curvature is protruded from the lower end of a T-shaped frame 4 in an electroless nickel plating liq. 30 in a treating vessel 1 lined with a polyfluoroethylene layer 2, and plural recessed grooves 10 are furnished to the shaft to support plural magnetic disk substrates 20 in parallel, and out of contact with each other. The frame 4 is rotated by a revolving plate 6 through a bearing 5 and a crank pin 7, the oscillating shaft 3 is rotated and allowed to follow a cricumferential course, and the substrate 20 is rotated around the oscillating shaft 3 having a non-circular cross section. An auxiliary vessel 11 is further provided, and ultrasonic vibration is produced by a vibrating plate 12 attached to the outer side surface of the treating vessel 1 and an ultrasonic vibrator 13. Consequently, the whole outer surface of the substrate 20 is plated without any defects such as pits.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ディスク基板の全外表面に欠陥のない無電
解めっきを施すために用いられる磁・気ディスク基板の
めっき装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a plating apparatus for magnetic disk substrates, which is used to perform defect-free electroless plating on the entire outer surface of a magnetic disk substrate.

(従来の技術) 情報処理システムの記憶装置に使用される磁気ディスク
は、アルミニウム合金製の磁気ディスク基板の上面に下
地層として厚さ約10μmのニッケルめっき層を形成し
た上に磁気記録層を形成し更にその上面を保護層でカバ
ーしたものであり、このニッケルめっき層の形成には無
電解ニッケルめっきが広く行われている。ところがこの
無電解ニッケルめっき工程中においては化学反応によっ
て磁気ディスク基板の表面に水素ガスの気泡が発生しこ
れを放置するとめっきむらを生ずるので、従来は磁気デ
ィスク基板を支持している冶具に上下方向の振動を与え
て気泡の除去を図るようにしためっき装置が用いられて
いた。
(Prior Art) A magnetic disk used in a storage device of an information processing system is formed by forming a nickel plating layer with a thickness of about 10 μm as an underlayer on the upper surface of a magnetic disk substrate made of an aluminum alloy, and then forming a magnetic recording layer on top of it. Furthermore, the top surface is covered with a protective layer, and electroless nickel plating is widely used to form this nickel plating layer. However, during this electroless nickel plating process, hydrogen gas bubbles are generated on the surface of the magnetic disk substrate due to a chemical reaction, and if left untreated, uneven plating will occur. A plating device was used that applied vibrations to remove air bubbles.

(発明が解決しようとする問題点) しかし上記のような従来の磁気ディスク基板のめっき装
置においては微細な気泡を完全に除去することができな
いために磁気ディスク基板の表面にピントと呼ばれる微
細な凹欠陥が発生する問題。
(Problem to be Solved by the Invention) However, in the conventional magnetic disk substrate plating apparatus as described above, fine air bubbles cannot be completely removed, so microscopic concavities called spots are formed on the surface of the magnetic disk substrate. Problems that result in defects.

があり、また磁気ディスク基板とその支持冶具との接触
部にめっきを行うことができない問題があった。
There was also the problem that plating could not be performed on the contact area between the magnetic disk substrate and its support jig.

(問題点を解決するための手段) 本発明はこのような従来の問題点を解決するために完成
されたものであり、処理槽の内部に円周状の軌跡を描い
て公転する断面非円形の揺動軸を設け、該揺動軸の周面
に複数の磁気ディスク基板を支持する複数の凹溝を形成
するとともに、処理槽の該揺動軸に平行な外側面には超
音波振動子を取付けたことを特徴とするものである。
(Means for Solving the Problems) The present invention has been completed in order to solve the problems of the conventional technology, and includes a non-circular cross-section that revolves in a circumferential trajectory inside the processing tank. A swing shaft is provided, and a plurality of grooves for supporting a plurality of magnetic disk substrates are formed on the circumferential surface of the swing shaft, and an ultrasonic vibrator is installed on the outer surface of the processing tank parallel to the swing shaft. It is characterized by having a.

(実施例) 次に本発明を図示の実施例について詳細に説明すると、
’+1)は内面にポリフッ化エチレンのライニング層(
2)を有するステンレス鋼のような耐食性材料からなる
処理槽、(3)は該処理槽(1)の内部に水平又はやや
傾斜状態で設けられた揺動軸、(20)は該揺動軸(3
)に支持された複数枚の磁気ディスク基板である。揺動
軸(3)は丁字形の支持フレーム(4)の下端に突設さ
れたものであり、支持フレーム(4)の上部の両端に設
けらし光軸受(5)、(5)に回転盤(6)、(6)の
クランクピン(7)、(7)が嵌入されているので、回
転盤(6)、(6)を7ORPM程度の速度で回転させ
れば揺動軸(3)は円周状の軌跡を描いて公転すること
となる。揺動軸(3)は図示のように曲率半径が異なる
二つの円弧面(8)、(9)により形成された断面非円
形のもので、その最大径を磁気ディスク基板(20)の
中心孔(21)の約2/3程度のものとし、またその周
面には複数枚の磁気ディスク基板(20)を互いに接触
することのないよう平行に支持するための複数の凹溝α
ωが磁気ディスク基板(20)の厚さよりもやや広い幅
で形成されている。処理槽(11の内部には液温80〜
90℃の無電解ニッケルめっき液(30)が満たされて
いる。(11)は処理槽(1)の揺動軸(3)に平行な
外側面に必要に応じて設けられた補助槽であり、その外
側面には振動板(12)と複数の超音波振動子(13)
とが取付けられている。補助槽(11)の内部には給水
管(14)と排水管(15)とによって冷却水(31)
が循環できるように供給されており、処理槽(1)の熱
が超音波振動子(13)に伝わらないようにされている
が、補助槽(11)を省略して処理槽(1)の外側面に
直接超音波振動子(13)を取付けても=1″0゛・ 
                         
1゜(作用) このように構成されたものは、揺動軸(3)の周面の複
数の凹溝(10)に複数の磁気ディスク基板(20)の
中心孔(21)を嵌込んで支持させ、回転盤(6)、(
6)を回転させることにより揺動軸(3)を円周状の軌
跡を描いて公転させれば、回転数が55PPM程度の低
速回転時には第3図に示すように揺動軸(3)と磁気デ
ィスク基板(20)の中心孔(21)とはその接゛触点
をRで示す範囲内でわずかに変えるのみでほぼ一定の関
係を保ちつつ回転するのみであるが、回転数を7ORP
M程度とすると第4図に示すようにB位置からC位置へ
揺動軸(3)が移動する間に磁気ディスク基板(20)
が追従できずにその接触点が下方へ移動し、更に揺動軸
(3)がD位置へ移動したとき中心孔(21)の左内側
面に上向きに衝突して磁気ディスク基板を15PPM程
度の速度で時計方向へ回転させることになる。この結果
磁気ディスク基板(20)は処理槽(1)の内部で揺動
軸(3)との接触点を図中Rで示すように大きく移動さ
せながら自転し、その全外表面に無電解ニッケルめっき
を施されることとなる。またこの際に磁気ディスク基板
(20)の表面には水素ガスの気泡が生ずるが、処理槽
(11の揺動軸(3)に平行な外側面に取付けられた超
音波振動子(13)が処理槽(1)内の無電解ニッケル
めっき液(30)に超音波振動を与えるので、磁気ディ
スク基板(20)の間を伝わる超音波振動によってその
表面の水素ガスの気泡は完全に除去され、ピント等の欠
陥のない無電解ニッケルめっきが施されることとなる。
(Example) Next, the present invention will be explained in detail with reference to the illustrated example.
'+1) has a polyfluoroethylene lining layer (
2) is a processing tank made of a corrosion-resistant material such as stainless steel, (3) is a swinging shaft installed horizontally or slightly inclined inside the processing tank (1), and (20) is the swinging shaft. (3
) is a plurality of magnetic disk substrates supported by. The swing shaft (3) is provided protruding from the lower end of the T-shaped support frame (4), and the rotating disc is attached to the optical bearings (5), (5) provided at both ends of the upper part of the support frame (4). Since the crank pins (7) and (7) of (6) and (6) are fitted, if the rotary disks (6) and (6) are rotated at a speed of about 7ORPM, the swing shaft (3) will move. It will revolve in a circumferential trajectory. As shown in the figure, the swing shaft (3) has a non-circular cross section formed by two arcuate surfaces (8) and (9) with different radii of curvature, and its maximum diameter is the center hole of the magnetic disk substrate (20). (21), and has a plurality of concave grooves α on its circumferential surface for supporting a plurality of magnetic disk substrates (20) in parallel so that they do not come into contact with each other.
ω is formed with a width slightly wider than the thickness of the magnetic disk substrate (20). The inside of the processing tank (11 has a liquid temperature of 80~
It is filled with an electroless nickel plating solution (30) at 90°C. (11) is an auxiliary tank provided as necessary on the outer surface parallel to the swing axis (3) of the processing tank (1), and the outer surface has a diaphragm (12) and a plurality of ultrasonic vibrations. Child (13)
is installed. Cooling water (31) is provided inside the auxiliary tank (11) by a water supply pipe (14) and a drain pipe (15).
is supplied so that it can be circulated, and the heat of the processing tank (1) is prevented from being transmitted to the ultrasonic transducer (13), but the auxiliary tank (11) is omitted and the processing tank (1) is Even if the ultrasonic transducer (13) is attached directly to the outer surface = 1″0゛・

1゜(Function) In this structure, the center holes (21) of the plurality of magnetic disk substrates (20) are fitted into the plurality of grooves (10) on the circumferential surface of the swing shaft (3). Support the turntable (6), (
If the swing shaft (3) is made to revolve in a circumferential trajectory by rotating 6), the swing shaft (3) will rotate as shown in Fig. The center hole (21) of the magnetic disk substrate (20) rotates while maintaining an almost constant relationship by only slightly changing the contact point within the range shown by R, but the rotation speed is set to 7ORP.
If it is about M, as shown in Fig. 4, the magnetic disk substrate (20)
could not follow the contact point and moved downward, and when the swing shaft (3) further moved to the D position, it collided upward with the left inner surface of the center hole (21), causing the magnetic disk board to drop to about 15 PPM. It will rotate clockwise at the same speed. As a result, the magnetic disk substrate (20) rotates inside the processing tank (1) while largely moving the point of contact with the swing shaft (3) as shown by R in the figure, and its entire outer surface is coated with electroless nickel. It will be plated. At this time, hydrogen gas bubbles are generated on the surface of the magnetic disk substrate (20), but the ultrasonic vibrator (13) attached to the outer surface parallel to the swing axis (3) of the processing tank (11) Since ultrasonic vibrations are applied to the electroless nickel plating solution (30) in the processing tank (1), hydrogen gas bubbles on the surface of the magnetic disk substrates (20) are completely removed by the ultrasonic vibrations transmitted between the magnetic disk substrates (20). Electroless nickel plating without defects such as focus will be applied.

なお、処理槽(1)の内部には超音波による定在波が生
じてキャビテーション効果の強弱を生じ易いが、前述の
ように磁気ディスク基板(20)が回転しているので水
素ガスの気泡は全表面にわたり完全に除去されるもので
ある。
Note that standing waves caused by ultrasonic waves are generated inside the processing tank (1), which tends to cause cavitation effects to vary in strength, but since the magnetic disk substrate (20) is rotating as described above, hydrogen gas bubbles are The entire surface is completely removed.

(発明の効果) 本発明は以上の説明からも明らかなように、磁気ディス
ク基板の全外表面にピット等の欠陥のない均一な無電解
めっきを施すことができるものであり、従来の磁気ディ
スク基板のめっき装置の問題点を解決したものとして産
業の発展に寄与するところは極めて大である。
(Effects of the Invention) As is clear from the above description, the present invention enables uniform electroless plating without defects such as pits to be applied to the entire outer surface of a magnetic disk substrate, and it is possible to apply uniform electroless plating to the entire outer surface of a magnetic disk substrate. It will greatly contribute to the development of industry by solving the problems of substrate plating equipment.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例を示す一部切欠正面図、第2図
はその一部切欠側面図、第3図と第4図は揺動軸の作動
説明図である。 (1):処理槽、(3):揺動軸、(10) :凹溝、
(13) :超音波振動子、(20) :磁気ディスク
基板。 t:eaヰ會
FIG. 1 is a partially cutaway front view showing an embodiment of the present invention, FIG. 2 is a partially cutaway side view thereof, and FIGS. 3 and 4 are explanatory views of the operation of the swing shaft. (1): Processing tank, (3): Swing shaft, (10): Concave groove,
(13): Ultrasonic transducer, (20): Magnetic disk substrate. t:ea meeting

Claims (1)

【特許請求の範囲】[Claims] 処理槽(1)の内部に円周状の軌跡を描いて公転する断
面非円形の揺動軸(3)を設け、該揺動軸(3)の周面
に複数の磁気ディスク基板(20)を支持する複数の凹
溝(10)を形成するとともに、処理槽(1)の該揺動
軸(3)に平行な外側面には超音波振動子(13)を取
付けたことを特徴とする磁気ディスク基板のめっき装置
A swing shaft (3) with a non-circular cross section that revolves in a circumferential trajectory is provided inside the processing tank (1), and a plurality of magnetic disk substrates (20) are mounted on the circumferential surface of the swing shaft (3). A plurality of grooves (10) are formed to support the processing tank (1), and an ultrasonic vibrator (13) is attached to the outer surface of the processing tank (1) parallel to the swing axis (3). Magnetic disk substrate plating equipment.
JP22492884A 1984-10-25 1984-10-25 Device for plating magnetic disk substrate Pending JPS61104082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22492884A JPS61104082A (en) 1984-10-25 1984-10-25 Device for plating magnetic disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22492884A JPS61104082A (en) 1984-10-25 1984-10-25 Device for plating magnetic disk substrate

Publications (1)

Publication Number Publication Date
JPS61104082A true JPS61104082A (en) 1986-05-22

Family

ID=16821365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22492884A Pending JPS61104082A (en) 1984-10-25 1984-10-25 Device for plating magnetic disk substrate

Country Status (1)

Country Link
JP (1) JPS61104082A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105002478A (en) * 2015-07-07 2015-10-28 苏州华日金菱机械有限公司 Non-electrolysis electroplating equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311262A (en) * 1976-07-16 1978-02-01 Mitsubishi Electric Corp Tilting pad thrust bearing

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311262A (en) * 1976-07-16 1978-02-01 Mitsubishi Electric Corp Tilting pad thrust bearing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105002478A (en) * 2015-07-07 2015-10-28 苏州华日金菱机械有限公司 Non-electrolysis electroplating equipment

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