JPH05249694A - Immersion treating device - Google Patents

Immersion treating device

Info

Publication number
JPH05249694A
JPH05249694A JP5135792A JP5135792A JPH05249694A JP H05249694 A JPH05249694 A JP H05249694A JP 5135792 A JP5135792 A JP 5135792A JP 5135792 A JP5135792 A JP 5135792A JP H05249694 A JPH05249694 A JP H05249694A
Authority
JP
Japan
Prior art keywords
dry plate
rotation
liquid
processing
stirring means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5135792A
Other languages
Japanese (ja)
Inventor
Masayuki Kato
雅之 加藤
Naritake Iwata
成健 岩田
Takeshi Matsumoto
松本  剛
Fumihiro Tawa
文博 田和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5135792A priority Critical patent/JPH05249694A/en
Publication of JPH05249694A publication Critical patent/JPH05249694A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide an immersion treating device having a simple structure and high uniformity in the treatment of a medium surface. CONSTITUTION:The immersion treatment device is constituted of a dry plate 5 having a medium surface 6 to carry out an immersion treatment at one surface, a motor 1 holding the dry plate 5 and rotating the dry plate in a treating liquid 7 in a treating tank 2 in the desired rotational direction and at the inside of the surface of the dry plate 5, and an agitation means 4 which is arranged in the vicinity of a bottom of the treating tank 2 with the same shaft as the motor and generates a convection in the treating liquid 7 by rotating it in the direction opposite to a desired rotational direction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は媒体面を処理液と化学反
応させ所定の処理を行う液浸処理装置に関する。本発明
による液浸処理装置は、特に、ホログラムディスク等の
現像処理等に有効である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an immersion treatment apparatus for chemically reacting a surface of a medium with a treatment liquid to perform a predetermined treatment. The liquid immersion processing apparatus according to the present invention is particularly effective for the development processing of hologram disks and the like.

【0002】[0002]

【従来の技術】図5は従来の液浸処理装置の一例要部構
成図である。長方形の乾板5はその下面に媒体面6を備
え共に処理液7内に浸漬されている。乾板5は図示しな
い適切な方法で支持されている。ところで、媒体面6の
処理(化学反応)を均一に行うために処理液7を対流さ
せる必要がある。そのために処理槽2の底に複数の回転
子4を配置し、これらを回転させることにより処理液7
に対流を起こさせる。回転子4はスターラー3と磁気的
に結合しており、スターラー3内の図示しないマグネッ
トの回転により回転子4が回転するようになっている。
2. Description of the Related Art FIG. 5 is a block diagram of an example of a conventional liquid immersion processing apparatus. The rectangular dry plate 5 has a medium surface 6 on its lower surface and is immersed in the processing liquid 7 together. The dry plate 5 is supported by a suitable method (not shown). By the way, it is necessary to convect the treatment liquid 7 in order to uniformly perform the treatment (chemical reaction) on the medium surface 6. For that purpose, a plurality of rotors 4 are arranged at the bottom of the processing tank 2, and these are rotated so that the processing liquid 7
Cause convection to. The rotor 4 is magnetically coupled to the stirrer 3, and the rotor 4 is rotated by rotation of a magnet (not shown) in the stirrer 3.

【0003】図6は従来の液浸処理装置の他の例要部構
成図である。この構造は処理液7をサーキュラーにより
循環させる方法である。処理液7は矢印で示すように流
入治具9から流入し乾板5及び媒体面6の上下を通流し
て流出し再び流入され、循環している。この場合、流入
治具9の幅を乾板5の幅に略等しいか、大きく設定して
媒体面6での通流をよくしている。
FIG. 6 is a schematic view of the essential part of another example of a conventional liquid immersion processing apparatus. This structure is a method of circulating the treatment liquid 7 by a circular. The treatment liquid 7 flows in from the inflow jig 9 as shown by the arrow, flows through the upper and lower sides of the dry plate 5 and the medium surface 6, flows out, is flowed in again, and is circulated. In this case, the width of the inflow jig 9 is set to be substantially equal to or larger than the width of the dry plate 5 to improve the flow on the medium surface 6.

【0004】[0004]

【発明が解決しようとする課題】しかし、これらの従来
構造による処理液の対流を行っても、まだ、対流にむら
があり媒体面の処理の均一性において改善が必要であ
り、また、図6の方法では装置が大掛かりになる等の改
善点がある。本発明の目的は、簡素化された構造で、か
つ媒体面の処理に高い均一性が得られる液浸処理装置を
提供することにある。
However, even if the convection of the processing liquid by these conventional structures is carried out, the convection is still uneven and the uniformity of the processing on the medium surface needs to be improved. The method of (1) has an improvement such as a large scale of the device. An object of the present invention is to provide a liquid immersion processing apparatus having a simplified structure and capable of obtaining high uniformity in processing the medium surface.

【0005】[0005]

【課題を解決するための手段】本発明の液浸処理装置
は、浸漬処理を行うべき媒体面6を片面に有する乾板5
と、該乾板を保持し、かつ該乾板を処理槽2内の処理液
7中にて該乾板の面内で所定の回転方向に回転させるモ
ータ1と、該モータと同軸上で該処理槽の底近傍に配置
され、該所定の回転方向とは逆方向に回転し該処理液に
対流を発生させる攪拌手段4とを具備する。
DISCLOSURE OF THE INVENTION A liquid immersion treatment apparatus according to the present invention has a dry plate 5 having a medium surface 6 to be subjected to immersion treatment on one surface.
A motor 1 for holding the dry plate and rotating the dry plate in the processing liquid 7 in the processing tank 2 in a predetermined rotation direction in the plane of the dry plate; and a motor 1 coaxially with the motor. The stirring means 4 is disposed near the bottom and rotates in a direction opposite to the predetermined rotation direction to generate convection in the treatment liquid.

【0006】本発明では、該乾板の該所定の回転方向へ
の回転により生じる該処理液に対する相対速度と、該攪
拌手段の回転により生じる該処理液の対流速度の合計
が、該媒体面の面内で一定となるように、該モータの回
転速度及び該攪拌手段の回転速度を調整する。また、本
発明では、該攪拌手段により発生する対流が、該処理液
中に浸漬状態の該乾板の媒体面との境界面において、回
転軸からの距離とともに線型に減少するように該攪拌手
段の回転速度を調整してもよい。
In the present invention, the sum of the relative velocity with respect to the treatment liquid generated by the rotation of the dry plate in the predetermined rotation direction and the convection velocity of the treatment liquid generated by the rotation of the stirring means is the surface of the medium surface. The rotation speed of the motor and the rotation speed of the agitating means are adjusted so as to be constant inside. Further, in the present invention, the convection generated by the stirring means is linearly reduced with the distance from the rotation axis at the boundary surface between the dry plate immersed in the treatment liquid and the medium surface. The rotation speed may be adjusted.

【0007】さらに、該処理槽の構造として、処理槽の
内面形状を、該乾板の外周と、該攪拌手段の周囲とを開
口部とする円錐状8とすることもできる。
Further, as the structure of the processing tank, the shape of the inner surface of the processing tank may be a conical shape 8 having openings at the outer periphery of the dry plate and the periphery of the stirring means.

【0008】[0008]

【作用】本発明では、図2及び図3に矢印で示すよう
に、乾板の所定の回転方向への回転により生じる処理液
に対する相対速度と、攪拌手段の回転により生じる処理
液の対流速度の合計が、媒体面の面内で一定となるよう
に、該モータの回転速度及び攪拌手段の回転速度を調整
し、その結果、処理液は媒体面に対して一定となるの
で、媒体面の処理を均一にすることができる。
In the present invention, as shown by the arrows in FIGS. 2 and 3, the sum of the relative speed to the processing liquid generated by the rotation of the dry plate in the predetermined rotation direction and the convection speed of the processing liquid generated by the rotation of the stirring means. However, the rotation speed of the motor and the rotation speed of the stirring means are adjusted so as to be constant within the surface of the medium, and as a result, the treatment liquid becomes constant with respect to the medium surface. Can be uniform.

【0009】[0009]

【実施例】図1は本発明による液浸処理装置の要部構成
図である。処理槽2には処理液7が満たされており、モ
ータ1を回転させると処理液7内で乾板5と共に媒体面
6も回転するようになっている。媒体面6を回転させる
のは処理液7との化学反応を均一にするためである。処
理槽2の底には処理液7を攪拌する回転子4があり、回
転子4はスターラー3と磁気的に結合されており、スタ
ーラー3内の図示しないマグネットが回転すると回転子
4も回転するようになっている。処理液7を攪拌するの
は媒体面6付近の処理液を対流させるためである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic view of the essential parts of a liquid immersion processing apparatus according to the present invention. The processing bath 2 is filled with the processing liquid 7, and when the motor 1 is rotated, the medium surface 6 is rotated together with the dry plate 5 in the processing liquid 7. The reason why the medium surface 6 is rotated is to make the chemical reaction with the processing liquid 7 uniform. At the bottom of the processing tank 2, there is a rotor 4 for stirring the processing liquid 7. The rotor 4 is magnetically coupled to the stirrer 3, and when a magnet (not shown) in the stirrer 3 rotates, the rotor 4 also rotates. It is like this. The treatment liquid 7 is agitated in order to convect the treatment liquid near the medium surface 6.

【0010】乾板5はモータ1のシャフト9の先端に固
定されており、シャフト9の回転と共にその面内で回転
する。モータ1はアーム10を介して支柱に取り付けら
れ、点線で示すように、支点Fの周囲の回転で乾板5及
び媒体面6を処理槽2の外で着脱したり、処理槽2内に
浸漬ができるようになっている。モータ1の回転方向は
モータ1の側から乾板5を見て反時計回りとする。乾板
5は処理槽2内で水平に保持されている。処理液6に対
流を発生させるための攪拌手段として磁気的に回転子4
を回すスターラー3を使用する。回転子4の回転方向は
乾板5から処理槽2の底に向かって時計回り、即ち、乾
板5の回転方向と逆方向に設定する。そして回転子4の
回転中心はモータ1の回転軸と一致させる。乾板5の面
内回転と、回転子4により生じる対流によって、媒体面
6と処理液7の相対速度を一定に保つ。
The dry plate 5 is fixed to the tip of the shaft 9 of the motor 1 and rotates in its plane as the shaft 9 rotates. The motor 1 is attached to the support via the arm 10, and as shown by the dotted line, the dry plate 5 and the medium surface 6 can be attached / detached outside the processing tank 2 or immersed in the processing tank 2 by rotation around the fulcrum F. You can do it. The rotation direction of the motor 1 is counterclockwise when the dry plate 5 is viewed from the motor 1 side. The dry plate 5 is held horizontally in the processing tank 2. The rotor 4 is magnetically used as stirring means for generating convection in the treatment liquid 6.
Use the stirrer 3 which turns. The rotation direction of the rotor 4 is set clockwise from the dry plate 5 to the bottom of the processing tank 2, that is, the reverse direction of the dry plate 5 is set. The rotation center of the rotor 4 is made to coincide with the rotation axis of the motor 1. The relative speed between the medium surface 6 and the processing liquid 7 is kept constant by the in-plane rotation of the dry plate 5 and the convection generated by the rotor 4.

【0011】図2は乾板5の面内回転による乾板5との
境界面における処理液の流速の説明図である。説明の便
宜上、乾板5の形状を円形で示したが、形状はこれに限
定されるものではない。図示のように、矢印の長さをそ
れぞれの始点における流速の大きさと方向を示すとする
と、流速uは乾板5の回転中心Oからの距離rに比例し
て大きくなる。なお、乾板5の回転方向は矢印方向であ
り、乾板5の回転速度は一定であるとする。明らかなよ
うに、流速は乾板の外周ほど大きくなる。
FIG. 2 is an explanatory view of the flow velocity of the processing liquid at the interface with the dry plate 5 due to the in-plane rotation of the dry plate 5. For convenience of explanation, the shape of the dry plate 5 is shown as a circle, but the shape is not limited to this. As shown in the figure, when the length of the arrow indicates the magnitude and direction of the flow velocity at each starting point, the flow velocity u increases in proportion to the distance r from the rotation center O of the dry plate 5. The rotation direction of the dry plate 5 is the arrow direction, and the rotation speed of the dry plate 5 is constant. As is apparent, the flow velocity becomes larger at the outer periphery of the dry plate.

【0012】図3は回転子4による攪拌で発生する処理
液6の対流状態の説明図である。座標系は図2と同様で
ある。図示のように、流速vは回転子の回転中心Oほど
大きく、距離rに沿って小さくなる。即ち、回転子4に
よる攪拌では回転軸付近が最も流速が大きく周囲ほど小
さくなる。回転中心から距離に比例して減少するように
するためには、回転子の大きさや速度を適切に選択す
る。
FIG. 3 is an explanatory view of a convection state of the processing liquid 6 generated by stirring by the rotor 4. The coordinate system is the same as in FIG. As shown in the figure, the flow velocity v increases as the rotation center O of the rotor increases and decreases along the distance r. That is, in the agitation by the rotor 4, the flow velocity is highest near the rotation axis and becomes smaller toward the periphery. The size and speed of the rotor should be selected appropriately in order to decrease in proportion to the distance from the center of rotation.

【0013】ところで、図2及び図3に示す流速u,v
の矢印を中心からの同じ距離rについて足し合わせる
と、全て大きさが等しくなる。即ち、相対的な流速が場
所によらず一定となる。本発明はこの点に着目してい
る。図4は本発明による液浸処理装置の他の例要部構成
図である。図示のように、処理槽2内に渦制御治具8を
設けおり、これにより上述の対流状態を実現することが
できる。即ち、処理槽2内に攪拌の軸(即ち、乾板の回
転軸)に対して回転対称な円錐面を渦制御治具8により
形成する。固定壁の界面では流速が0であるため、円錐
の上部開口を乾板5の外径に合わせる。また、円錐の下
部開口は回転子4の回転を妨げない範囲の大きさとす
る。これにより処理液の対流状態が得やすくなる。
By the way, the flow velocities u and v shown in FIGS.
When the arrows of are added for the same distance r from the center, they all have the same size. That is, the relative flow velocity is constant regardless of the place. The present invention focuses on this point. FIG. 4 is a block diagram of the essential parts of another example of the liquid immersion processing apparatus according to the present invention. As shown in the drawing, the vortex control jig 8 is provided in the processing tank 2, and thereby the above-mentioned convection state can be realized. That is, a conical surface that is rotationally symmetrical with respect to the axis of stirring (that is, the rotation axis of the dry plate) is formed in the processing tank 2 by the vortex control jig 8. Since the flow velocity at the interface of the fixed wall is 0, the upper opening of the cone is adjusted to the outer diameter of the dry plate 5. The lower opening of the cone has a size that does not hinder the rotation of the rotor 4. This makes it easier to obtain the convection state of the processing liquid.

【0014】上述した液浸処理装置において、乾板の回
転中心は渦の中心となり、攪拌の均一性が保てない場合
がある。従って、本発明では乾板の中央付近の処理が重
要でない場合、例えば、媒体面をドーナツ状に幅のある
輪帯状に処理するホログラムディスク等の場合に、特に
適した方法である。上述の例ではモータ1の回転方向を
反時計回り、回転子4の回転方向を時計回りとしたが、
それぞれ逆であっても同様の効果を得ることは明らかで
ある。
In the liquid immersion treatment apparatus described above, the center of rotation of the dry plate may be the center of the vortex, and the uniformity of stirring may not be maintained in some cases. Therefore, in the present invention, it is a method particularly suitable for the case where the treatment in the vicinity of the center of the dry plate is not important, for example, for the case of a hologram disk or the like in which the medium surface is processed into a donut-shaped wide annular shape. In the above example, the rotation direction of the motor 1 is counterclockwise and the rotation direction of the rotor 4 is clockwise.
It is clear that the same effect can be obtained even if they are reversed.

【0015】[0015]

【発明の効果】以上説明したように、本発明によれば、
液浸処理装置を簡素化することができ、かつこの液浸処
理装置によれば大面積の媒体面の処理、特にドーナツ状
の媒体面の処理を均一に行う場合に非常に効果がある。
As described above, according to the present invention,
The liquid immersion treatment device can be simplified, and the liquid immersion treatment device is very effective in uniformly treating a medium surface having a large area, particularly a donut-shaped medium surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による液浸処理装置の要部構成図であ
る。
FIG. 1 is a configuration diagram of essential parts of a liquid immersion processing apparatus according to the present invention.

【図2】本発明の乾板との境界面における処理液の流速
の説明図である。
FIG. 2 is an explanatory diagram of the flow velocity of the processing liquid at the interface with the dry plate of the present invention.

【図3】本発明の回転子による攪拌で発生する処理液の
対流状態の説明図である。
FIG. 3 is an explanatory diagram of a convection state of a processing liquid generated by stirring by the rotor of the present invention.

【図4】本発明による液浸処理装置の他の例要部構成図
である。
FIG. 4 is a configuration diagram of main parts of another example of the liquid immersion processing apparatus according to the present invention.

【図5】従来の処理装置の一例要部構成図である。FIG. 5 is a configuration diagram of main parts of an example of a conventional processing apparatus.

【図6】従来の処理装置の他の例要部構成図である。FIG. 6 is a configuration diagram of a main part of another example of a conventional processing device.

【符号の説明】[Explanation of symbols]

1…モータ 2…処理槽 3…スターラー 4…回転子 5…乾板 6…媒体面 7…処理液 8…渦制御治具 9…モータシャフト 10…アーム DESCRIPTION OF SYMBOLS 1 ... Motor 2 ... Processing tank 3 ... Stirrer 4 ... Rotor 5 ... Dry plate 6 ... Medium surface 7 ... Processing liquid 8 ... Vortex control jig 9 ... Motor shaft 10 ... Arm

フロントページの続き (72)発明者 田和 文博 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内Front page continued (72) Inventor Fumihiro Tawa 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Fujitsu Limited

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 浸漬処理を行うべき媒体面(6)を片面
に有する乾板(5)と、該乾板を保持し、かつ該乾板を
処理槽(2)内の処理液(7)中にて該乾板の面内で所
定の回転方向に回転させるモータ(1)と、該モータと
同軸上で該処理槽の底近傍に配置され、該所定の回転方
向とは逆方向に回転し該処理液に対流を発生させる攪拌
手段(4)とを具備することを特徴とする液浸処理装
置。
1. A dry plate (5) having on one side a medium surface (6) to be immersed, and a dry plate held in the processing liquid (7) in a processing tank (2). A motor (1) that rotates in a predetermined rotation direction in the plane of the dry plate, and a processing liquid that is arranged coaxially with the motor near the bottom of the processing tank and that rotates in a direction opposite to the predetermined rotation direction. And a stirring means (4) for generating convection.
【請求項2】 該乾板の該所定の回転方向への回転によ
り生じる該処理液に対する相対速度と、該攪拌手段の回
転により生じる該処理液の対流速度の合計が、該媒体面
の面内で一定となるように、該モータの回転速度及び該
攪拌手段の回転速度を調整した請求項1に記載の液浸処
理装置。
2. The total of the relative velocity with respect to the treatment liquid generated by the rotation of the dry plate in the predetermined rotation direction and the convection velocity of the treatment liquid generated by the rotation of the stirring means is within the plane of the medium surface. The liquid immersion processing apparatus according to claim 1, wherein the rotation speed of the motor and the rotation speed of the stirring means are adjusted so as to be constant.
【請求項3】 該攪拌手段により発生する対流が、該処
理液中に浸漬状態の該乾板の媒体面との境界面におい
て、回転軸からの距離とともに線型に減少するように該
攪拌手段の回転速度を調整した請求項1に記載の液浸処
理装置。
3. The rotation of the stirring means such that the convection generated by the stirring means decreases linearly with the distance from the rotation axis at the boundary surface with the medium surface of the dry plate immersed in the treatment liquid. The liquid immersion processing apparatus according to claim 1, wherein the speed is adjusted.
【請求項4】 該処理槽の内面形状を、該乾板の外周
と、該攪拌手段の周囲とを開口部とする円錐状(8)と
した請求項1〜3に記載の液浸処理装置。
4. The immersion treatment apparatus according to claim 1, wherein an inner surface of the treatment tank has a conical shape (8) having an opening formed around the outer periphery of the dry plate and the periphery of the stirring means.
JP5135792A 1992-03-10 1992-03-10 Immersion treating device Withdrawn JPH05249694A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5135792A JPH05249694A (en) 1992-03-10 1992-03-10 Immersion treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5135792A JPH05249694A (en) 1992-03-10 1992-03-10 Immersion treating device

Publications (1)

Publication Number Publication Date
JPH05249694A true JPH05249694A (en) 1993-09-28

Family

ID=12884689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5135792A Withdrawn JPH05249694A (en) 1992-03-10 1992-03-10 Immersion treating device

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Country Link
JP (1) JPH05249694A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5701544A (en) * 1993-07-07 1997-12-23 Canon Kabushiki Kaisha Process for producing color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5701544A (en) * 1993-07-07 1997-12-23 Canon Kabushiki Kaisha Process for producing color filter

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