JPS6231023A - Plating device for magnetic disk substrate - Google Patents

Plating device for magnetic disk substrate

Info

Publication number
JPS6231023A
JPS6231023A JP17017285A JP17017285A JPS6231023A JP S6231023 A JPS6231023 A JP S6231023A JP 17017285 A JP17017285 A JP 17017285A JP 17017285 A JP17017285 A JP 17017285A JP S6231023 A JPS6231023 A JP S6231023A
Authority
JP
Japan
Prior art keywords
magnetic disk
substrate holding
gear
shaft
holding shafts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17017285A
Other languages
Japanese (ja)
Inventor
Hidehiro Ohashi
大橋 秀弘
Toshihisa Miyazaki
稔久 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chuo Seisakusho KK
Original Assignee
Chuo Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chuo Seisakusho KK filed Critical Chuo Seisakusho KK
Priority to JP17017285A priority Critical patent/JPS6231023A/en
Publication of JPS6231023A publication Critical patent/JPS6231023A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To enable electroless plating which has no bit defect over the entire external surfaces of numbers of magnetic disk substrates by providing gears successively at end parts of respective substrate holding shafts and engaging the gears with a sun gear provided coaxially with the center shaft of a rotary disk. CONSTITUTION:Magnetic disk substrates 50 are supported in many grooves 17 recessed in substrate holding shafts 13 and a grip part 14 is gripped to fit the substrate holding shafts 13 between rotary disks 6 and 7; and a carrier body 3 is dipped in treating liquid and a motor 8 is driven to rotate the rotary disks 6 and 7 in vertical planes respectively. Consequently, the substrate holding shafts 13 revolve around a center shaft 5 and each substrate holding shaft 13 rotates on its axis at a relatively high speed while a gear 21 engages the sun gear 22 provided coaxially with the center shaft 5. Hydrogen gas produced on the surface of each magnetic disk substrate 50 is removed by a liquid flow and a straightening plate 15 prevents the treating liquid from being disordered, so none of the magnetic disk substrates 50 vibrates to right and left and electroless plated layers which have no bit defect are formed over the entire surfaces.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ディスク基板の全外表面に欠陥のない無電
解めっきを施すために用いられる磁気ディスク基板のめ
っき装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic disk substrate plating apparatus used for applying defect-free electroless plating to the entire outer surface of a magnetic disk substrate.

(従来の技術) 情報処理システムの記包装置に使用される磁気ディスク
は、アルミニウム合金製の磁気ディスク基板の上面に下
地層として厚さ約10μmのニッケルめっき層を形成し
た上に磁気記録層を形成し更にその上面を保護層でカバ
ーしたものであり、このニッケルめっき層の形成には無
電解ニッケルめっきが広く行われている。ところがこの
無電解ニッケルめっき工程中においては化学反応によっ
て磁気ディスク基板の表面に水素ガスの気泡が発生しこ
れを放置するとめっきむらを生ずるので、従来は磁気デ
ィスク基板を支持している冶具に上下方向の振動を与え
て気泡の除去を図るようにしためっき装置が用いられて
いた。
(Prior Art) A magnetic disk used in a storage device for an information processing system is made by forming a nickel plating layer with a thickness of about 10 μm as an underlayer on the upper surface of a magnetic disk substrate made of an aluminum alloy, and then a magnetic recording layer. The nickel plating layer is formed by covering the upper surface with a protective layer, and electroless nickel plating is widely used to form this nickel plating layer. However, during this electroless nickel plating process, hydrogen gas bubbles are generated on the surface of the magnetic disk substrate due to a chemical reaction, and if left untreated, uneven plating will occur. A plating device was used that applied vibrations to remove air bubbles.

しかし上記のような従来の磁気ディスク基板のめっき装
置においては磁気ディスク基板を確実に動かすことがで
きず微細な気泡を完全に除去することができないために
磁気ディスク基板の表面にピットと呼ばれる微細な凹欠
陥が発生する問題があり、また磁気ディスク基板とその
支持治具との接触部にめっきを行うことができない問題
があった。更にまた、従来の磁気ディスク基板のめっき
装置は小型のものが多く、多量のめっき処理を行うこと
かできない問題があった。
However, in the conventional magnetic disk substrate plating equipment as described above, the magnetic disk substrate cannot be moved reliably and minute air bubbles cannot be completely removed. There is a problem that concave defects occur, and there is also a problem that plating cannot be performed on the contact portion between the magnetic disk substrate and its support jig. Furthermore, many of the conventional plating apparatuses for magnetic disk substrates are small, and there is a problem in that they cannot perform a large amount of plating.

(発明が解決しようとする問題点) 本発明はこのような従来の問題点を解決して、多数の磁
気ディスク基板の全外表面にビット等の欠陥のない無電
解めっきを施すことができる磁気ディスク基板のめっき
Viaを目的として完成されたものである。
(Problems to be Solved by the Invention) The present invention solves these conventional problems and provides a magnetic plate that can perform electroless plating without defects such as bits on the entire outer surface of a large number of magnetic disk substrates. It was completed for the purpose of plating vias on disk substrates.

(問題点を解決するための手段) 本発明は処理槽の内部に浸漬されて垂直面内を回転する
一対の回転円板間に中央部に把手部と整流板とを備えそ
の両側に延びる軸部に磁気ディスク基板を支持するため
の多数の溝を凹設した複数本の基板保持軸を着脱自在に
取付けるとともに、各基板保持軸の端部に歯車を連設し
て該歯車を回転円板の中心軸と同軸に設けられた太陽歯
車に噛合させたことを特徴とするものである。
(Means for Solving the Problems) The present invention has a handle portion and a rectifying plate in the center between a pair of rotating disks that are immersed inside a processing tank and rotates in a vertical plane, and a shaft that extends on both sides. A plurality of board holding shafts each having a number of grooves for supporting a magnetic disk board are removably attached to the part, and a gear is connected to the end of each board holding shaft to connect the gear to a rotating disk. It is characterized by meshing with a sun gear provided coaxially with the center axis of.

(実施例) 次に本発明を図示の実施例について詳細に説明すると、
(1)は内面にポリフッ化エチレンのライニング層(2
)を有するステンレス鋼のような耐食性材料からなる処
理槽、(3)は該処理槽(1)の上部にセットされ得る
キャリア本体、(4)、(4)は該キャリア本体(3)
の両端部下面に垂設された左右一対の垂直な支持板であ
る。これらの支持板(4)、(4)間には水平な中心軸
(5)が架設されており、該中心軸(5)上の支持板(
4)、(4)の内側部分には一対の回転円板(6)、(
7)が取付けられている。一方の回転円板(63は外周
面にギアが刻設されており、キャリア本体(3)に内蔵
されたモータ(8)によって駆動される垂直軸(9)の
下端のベヘルギア(10)が支持板(4)に支持された
駆動ギア(11)を回転させ、この駆動ギア(11)が
回転円板(6)の外周面のギアと噛合しているので、モ
ータ(8)が回転すると回転円板(6)は中心軸(5)
のまわりを回転し、支軸(12)によってこれと連結さ
れている他方の回転円板(7)も同様に回転することと
なる。
(Example) Next, the present invention will be explained in detail with reference to the illustrated example.
(1) has a polyfluoroethylene lining layer (2) on the inner surface.
), (3) is a carrier body that can be set on the top of the treatment tank (1), and (4) is the carrier body (3).
A pair of vertical support plates on the left and right are installed vertically on the lower surface of both ends. A horizontal central axis (5) is installed between these support plates (4), (4), and the support plate (
A pair of rotating disks (6), (
7) is installed. One rotating disk (63) has gears carved on its outer circumferential surface, and is supported by a beher gear (10) at the lower end of a vertical shaft (9) driven by a motor (8) built into the carrier body (3). The drive gear (11) supported by the plate (4) is rotated, and this drive gear (11) meshes with the gear on the outer circumferential surface of the rotating disk (6), so when the motor (8) rotates, it rotates. The disk (6) is the central axis (5)
The other rotary disk (7), which rotates around the rotor and is connected to it by the support shaft (12), also rotates in the same manner.

(13)はこれらの一対の回転円板(6)、(7)間に
着脱自在に取付けられた複数本の基板保持軸である。各
基板保持軸(13)は中央部に把手部(14)と円板状
の整流板(15)とを備えるとともにその両側に延びる
軸部(16)に第3図に明示するような磁気ディスク基
板(50)を支持するためのa(17)を一定ピツチで
多数凹設したものである。軸部(16)の外径を磁気デ
ィスク基板(50)の中心孔の内径よりも細くしておく
ことは当然である。これらの各基板保持軸(13)はそ
の一端を回転円板(6)に回転自在に枢着された短軸(
18)の角穴(19)に嵌入させたうえでその他端を回
転円板(7)に着脱ナラl−(20)により枢着させる
ことによって回転円板(6)、(7)に対して回転自在
に取付けられている。そしてこの短軸(18)の先端に
はそれぞれ歯車(21)が設けられており、各歯車(2
1)は回転円板(6)、(7)の中心軸(5)と同軸と
なるよう支持板(4)に固設された太陽歯車(22)と
噛合されている。従って各歯車(2I)が中心軸(51
の周りを公転するとき各歯車(21)は太陽歯車(22
)との噛合によって回転することとなり、これに角穴(
19)付きの短軸(18)を介して連設された基板保持
軸(13)も同時に回転することとなる。
(13) is a plurality of substrate holding shafts detachably attached between the pair of rotating disks (6) and (7). Each board holding shaft (13) has a handle part (14) and a disk-shaped rectifying plate (15) in the center, and a magnetic disk as shown in FIG. 3 in the shaft part (16) extending on both sides thereof. A large number of recesses a (17) for supporting the substrate (50) are provided at a constant pitch. Naturally, the outer diameter of the shaft portion (16) is made smaller than the inner diameter of the center hole of the magnetic disk substrate (50). Each of these substrate holding shafts (13) has one end connected to a short shaft (13) rotatably pivoted to the rotating disk (6).
18) into the square hole (19), and the other end is pivotally connected to the rotating disk (7) with a removable lug l-(20), so that it can be attached to the rotating disks (6) and (7). It is rotatably mounted. A gear (21) is provided at the tip of each short shaft (18).
1) is meshed with a sun gear (22) fixed to the support plate (4) so as to be coaxial with the central axis (5) of the rotating disks (6) and (7). Therefore, each gear (2I) is connected to the center shaft (51
Each gear (21) rotates around the sun gear (22
), it rotates due to engagement with the square hole (
The substrate holding shaft (13), which is connected via the short shaft (18) with 19), also rotates at the same time.

(作用) このように構成されたものは、基板保持軸(13)の軸
部(16)に凹設された多数の溝(17)に磁気ディス
ク基板(50)をそれぞれ支持させ、その中央部の把手
部(14)を握って基板保持軸(13)を回転円板(6
)、(7)間に取付けたうえでキャリア本体(3)を処
理槽(1)の上部にセットして回転円板(6)、(7)
を含む部分全体を処理液中に浸漬させ、モータ(8)を
回転させて前述のとおり回転円板(6)、(7)を垂直
面内で回転させる。この結果、基板保持軸(13)は中
心軸(5)のまわりを公転するとともに各基板保持軸(
13)はその端部に連設された歯車(21)が中心軸(
5)と同軸に設けられた太陽歯車(22)と噛合して公
転方向と同一方向に比較的高速度で自転し、また各磁気
ディスク基板(50)もその中心孔の内径がa(17)
の外径よりも大きいために基板保持軸(13)に対して
回転してその接触点を常に移動させることとなる。この
ようにして各磁気ディスク基板(50)は処理液中を移
動しつつ無電解ニッケルめっき等を施されることとなり
、この際に磁気ディスク基板(50)の表面に生ずる水
素ガスは各磁気ディスク基板(50)間に生ずる液流に
よって除去されるとともに、整流板(15)が処理液の
乱れを防止するので磁気ディスク基板(50)が左右に
振動することなく磁気ディスク基板(50)の全表面に
ピット等の欠陥のない無電解めっき層が形成されること
となる。なお、処理槽〔1ンの外側面に超音波振動子を
設けて処理液に超音波振動を与えれば、ピントの発生を
更に確実に防止することができる。
(Function) In this structure, the magnetic disk substrate (50) is supported by a large number of grooves (17) recessed in the shaft portion (16) of the substrate holding shaft (13), and the central portion of the magnetic disk substrate (50) is Grip the handle (14) of the board holding shaft (13) to rotate the rotating disk (6).
), (7), and then set the carrier body (3) on the top of the processing tank (1) and rotate the rotating disks (6), (7).
The entire part including the parts is immersed in the processing liquid and the motor (8) is rotated to rotate the rotating disks (6), (7) in a vertical plane as described above. As a result, the substrate holding shaft (13) revolves around the central axis (5) and each substrate holding shaft (
13) has a gear (21) connected to its end that is connected to the central shaft (
5) and rotates at a relatively high speed in the same direction as the revolution direction, and each magnetic disk substrate (50) also has an inner diameter of the center hole a (17).
Since it is larger than the outer diameter of the substrate holding shaft (13), it rotates with respect to the substrate holding shaft (13) and constantly moves its contact point. In this way, each magnetic disk substrate (50) is subjected to electroless nickel plating, etc. while moving through the processing solution, and at this time, the hydrogen gas generated on the surface of the magnetic disk substrate (50) coats each magnetic disk. The processing liquid is removed by the liquid flow generated between the substrates (50), and the rectifying plate (15) prevents the processing liquid from being disturbed, so that the entire magnetic disk substrate (50) is removed without the magnetic disk substrate (50) vibrating from side to side. An electroless plating layer without defects such as pits is formed on the surface. Incidentally, if an ultrasonic vibrator is provided on the outer surface of the processing tank [1] to apply ultrasonic vibration to the processing liquid, the occurrence of focusing can be more reliably prevented.

(発明の効果) 本発明は以上の説明からも明らかなように、磁気ディス
ク基板の全外表面にビット等の欠陥のない均一な無電解
めっきを施すことができるものであり、また両端を回転
円板に支持された基板保持軸に多数の溝を設けて磁気デ
ィスク基板を保持させるようにしたので、数百枚の磁気
ディスク基板を同時に処理することができるものである
。更に、基板保持軸はその中央部に把手部を設けたので
取扱いが容易で作業性にも優れたものであり、従来の磁
気ディスク基板のめっき装置の問題点を解決したものと
して産業の発展に寄与するところは極めて大である。
(Effects of the Invention) As is clear from the above description, the present invention enables uniform electroless plating without defects such as bits to be applied to the entire outer surface of a magnetic disk substrate. Since the substrate holding shaft supported by the disk is provided with a large number of grooves to hold the magnetic disk substrates, several hundred magnetic disk substrates can be processed at the same time. Furthermore, the board holding shaft has a handle in the center, making it easy to handle and has excellent workability.This system has helped the industry develop by solving the problems of conventional magnetic disk board plating equipment. The contribution made is extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例を示す一部切欠正面図、第2図
はその一部切欠側面図、第3図は基板保持軸の拡大断面
図である。 (1):処理槽、(5):中心軸、(6)、(7)二回
転円板、(13) :基板保持軸、(14) :把手部
、(15) :整流板、(16):軸部、(17): 
*、(21):歯車、(22):太陽歯車、(50):
磁気ディスク基板。 特許出願人 株式会社中央製作所 代  理  人  名   嶋   明   即問  
       綿   貫   達   誰岡    
     山   零   文   夫第 3 図 fq  22
FIG. 1 is a partially cutaway front view showing an embodiment of the present invention, FIG. 2 is a partially cutaway side view thereof, and FIG. 3 is an enlarged sectional view of a substrate holding shaft. (1): Processing tank, (5): Center shaft, (6), (7) Bi-rotating disk, (13): Substrate holding shaft, (14): Handle, (15): Current plate, (16) ): Shaft, (17):
*, (21): Gear, (22): Sun gear, (50):
magnetic disk board. Patent applicant: Chuo Seisakusho Co., Ltd. Representative: Akira Shima Immediate question
Tatsu Watanuki
Yama Rei Bunfu No. 3 Figure fq 22

Claims (1)

【特許請求の範囲】[Claims] 処理槽(1)の内部に浸漬されて垂直面内を回転する一
対の回転円板(6)、(7)間に中央部に把手部(14
)と整流板(15)とを備えその両側に延びる軸部(1
6)に磁気ディスク基板(50)を支持するための多数
の溝(17)を凹設した複数本の基板保持軸(13)を
着脱自在に取付けるとともに、各基板保持軸(13)の
端部に歯車(21)を連設して該歯車(21)を回転円
板(6)、(7)の中心軸(5)と同軸に設けられた太
陽歯車(22)に噛合させたことを特徴とする磁気ディ
スク基板のめっき装置。
A handle part (14) is located in the center between a pair of rotating discs (6) and (7) that are immersed in the processing tank (1) and rotate in a vertical plane.
) and a rectifier plate (15), and extends on both sides thereof.
A plurality of board holding shafts (13) each having a number of grooves (17) for supporting the magnetic disk board (50) are removably attached to 6), and the ends of each board holding shaft (13) are A gear (21) is connected to the rotary disk (6), (7), and the gear (21) meshes with a sun gear (22) coaxially provided with the central axis (5) of the rotating disks (6), (7). Plating equipment for magnetic disk substrates.
JP17017285A 1985-08-01 1985-08-01 Plating device for magnetic disk substrate Pending JPS6231023A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17017285A JPS6231023A (en) 1985-08-01 1985-08-01 Plating device for magnetic disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17017285A JPS6231023A (en) 1985-08-01 1985-08-01 Plating device for magnetic disk substrate

Publications (1)

Publication Number Publication Date
JPS6231023A true JPS6231023A (en) 1987-02-10

Family

ID=15900023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17017285A Pending JPS6231023A (en) 1985-08-01 1985-08-01 Plating device for magnetic disk substrate

Country Status (1)

Country Link
JP (1) JPS6231023A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020092642A (en) * 2001-06-05 2002-12-12 주식회사 정우이지텍 The method and an+ apparatus plating a shaft

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020092642A (en) * 2001-06-05 2002-12-12 주식회사 정우이지텍 The method and an+ apparatus plating a shaft

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