JPS61102092A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPS61102092A
JPS61102092A JP22504084A JP22504084A JPS61102092A JP S61102092 A JPS61102092 A JP S61102092A JP 22504084 A JP22504084 A JP 22504084A JP 22504084 A JP22504084 A JP 22504084A JP S61102092 A JPS61102092 A JP S61102092A
Authority
JP
Japan
Prior art keywords
plating
thermosetting resin
holes
insulating substrate
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22504084A
Other languages
Japanese (ja)
Inventor
魚津 信夫
横山 博義
洋一 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lincstech Circuit Co Ltd
Original Assignee
Hitachi Condenser Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Condenser Co Ltd filed Critical Hitachi Condenser Co Ltd
Priority to JP22504084A priority Critical patent/JPS61102092A/en
Publication of JPS61102092A publication Critical patent/JPS61102092A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、アディティブ法による印刷配線板の製造方法
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for manufacturing a printed wiring board by an additive method.

(従来の技術) 従来、CG−4法等のようなアディティブ法により無電
解めっきして回路を形成し印刷配線板を製造する場合、
絶縁基板の表面に予め、めっき触媒入り接着剤層を設け
ている。また、絶縁基板には、通常、パラジウム系など
の無電解めっき用の触媒が含有されているが、スルーホ
ール用の孔を設けた場合には、孔にめっきが析出し難く
なるために、孔を形成後、無電解めっき処理をする前に
、めっき触媒を孔に付着する処理を行なっている。
(Prior art) Conventionally, when manufacturing a printed wiring board by forming a circuit by electroless plating using an additive method such as the CG-4 method,
An adhesive layer containing a plating catalyst is previously provided on the surface of the insulating substrate. Additionally, insulating substrates usually contain catalysts for electroless plating, such as palladium-based catalysts, but when holes are provided for through-holes, it becomes difficult for plating to deposit in the holes. After forming the pores and before electroless plating, a plating catalyst is attached to the pores.

(発明が解決しようとする問題点) ところで、通常、孔にめっき触媒を付着した後に、接着
剤層と無電解めっき処理により形成されためつきの回路
との接着力を向上するために、接着剤層を粗化している
。接着剤層の粗化は、絶縁基板を硼弗化水素酸溶液や無
水クロム酸ra酸系溶液等の粗化液に浸漬することによ
り行なっているが、この浸漬処理により孔に付着しため
っき触媒の大部分が洗い流されてしまう。従って、後に
無電解めっき処理を行なっても、孔の箇所にめらきが析
出するのに時間が掛かり、析出しためつき膜は薄く剥離
強度が小さいという欠点があった。そのため、半田ディ
ツプ等により孔に半田めっきをしたりさらに電子部品を
接続する場合等に、孔内周面に設けられためつき膜が部
分的に薄く、絶縁基板内のガスが孔壁のめつき膜を剥離
して孔内に放出され、孔内に充填される半田に欠陥(以
下ブローホールという)を生じる欠点があった。このよ
うな状態になると、電子部品の接続不良が発生し易くな
り、また、接着力も低下し易くなる欠点があった。
(Problems to be Solved by the Invention) By the way, usually, after the plating catalyst is attached to the holes, an adhesive layer is added to improve the adhesion between the adhesive layer and the plating circuit formed by electroless plating. is becoming coarser. The adhesive layer is roughened by immersing the insulating substrate in a roughening solution such as a borofluoric acid solution or an chromic anhydride RA acid solution. Most of it is washed away. Therefore, even if electroless plating is performed later, it takes time for the glitter to precipitate at the holes, and the precipitated plating film is thin and has a low peel strength. Therefore, when applying solder plating to the hole using solder dip, etc., or when connecting electronic components, the dipping film provided on the inner circumferential surface of the hole is partially thin, and the gas in the insulating substrate may cause the plating on the hole wall. There is a drawback that the film is peeled off and released into the holes, causing defects (hereinafter referred to as blowholes) in the solder that fills the holes. In such a state, there are disadvantages in that connection failures of electronic components are likely to occur and adhesive strength is also likely to decrease.

本発明は上記の欠点を改良し、スルーホール用の孔壁面
のめつき析出を容易にし、製造時間を短縮しうると共に
ブローホールを防止して信頼性の高い印刷配線板の製造
方法の提供を目的とするものである。
The present invention improves the above-mentioned drawbacks, and provides a method for manufacturing printed wiring boards that facilitates plating deposition on the hole wall surface for through holes, shortens manufacturing time, prevents blowholes, and has high reliability. This is the purpose.

(問題点を解決するための手段) 本発明は、上記の目的を達成するために、スルーホール
用の孔を有しめっき触媒入り接着剤が塗布された絶縁板
に無電解めっき法により所定の回路を形成する印刷配線
板の製造方法において、絶縁板をめっき触媒を含んだ熱
硬化性樹脂液中に浸漬し、該熱硬化性樹脂液に超音波振
動を与えて孔に前記めっき触媒入りの熱硬化性樹脂を付
着する工程と、該工程後に孔に付着した前記めっき触媒
入りの熱硬化性樹脂を乾燥する工程とを施すことを特徴
とする印刷配線板の製造方法を提供するものである。
(Means for Solving the Problems) In order to achieve the above-mentioned object, the present invention provides a method of forming a predetermined shape by electroless plating on an insulating plate having holes for through holes and coated with an adhesive containing a plating catalyst. In a method for manufacturing a printed wiring board that forms a circuit, an insulating plate is immersed in a thermosetting resin solution containing a plating catalyst, and ultrasonic vibrations are applied to the thermosetting resin solution to form holes containing the plating catalyst. Provided is a method for manufacturing a printed wiring board, which comprises a step of applying a thermosetting resin, and a step of drying the thermosetting resin containing the plating catalyst adhering to the holes after the step. .

(作用) すなわち、孔形成後の絶縁基板をめっき触媒入りの熱硬
化性樹脂液中にただ単に浸漬した場合には、孔壁面に熱
硬化性樹脂が付着し難く、中にはほとんど樹脂の付着し
ない孔もある。が、本発明によれば、熱硬化性樹脂液に
超音波振動を与えるため、どんなに狭い孔にも熱硬化性
樹脂が入り壁面に付着する。従って、その後に絶縁基板
を粗化液に浸漬しても、孔壁にはめっき触媒を含む熱硬
化性樹脂が十分に付着した状態を保持できるため、無電
解めっき処理により、孔壁に十分な厚さのめっきが短時
間に析出し、めっき層が形成される。
(Function) In other words, if the insulating substrate after hole formation is simply immersed in a thermosetting resin solution containing a plating catalyst, it is difficult for the thermosetting resin to adhere to the hole wall surface, and almost no resin adheres to the inside. Some holes do not. However, according to the present invention, since ultrasonic vibrations are applied to the thermosetting resin liquid, the thermosetting resin can enter even the narrowest holes and adhere to the wall surface. Therefore, even if the insulating substrate is subsequently immersed in a roughening solution, the thermosetting resin containing the plating catalyst can remain sufficiently attached to the pore walls. A thick plating is deposited in a short time to form a plating layer.

しかも、絶縁基板内のガスが孔壁を通して放出されるの
を樹脂層により防止できるため、半田めっき処理等をし
た場合のブローホールも防止できる。
Moreover, since the resin layer can prevent gas in the insulating substrate from being released through the hole walls, blowholes can be prevented when solder plating or the like is performed.

(実施例) 以下、本発明を実施例に基づいて説明する。(Example) Hereinafter, the present invention will be explained based on examples.

先ず、第1図に示す通り、紙=フェノール樹脂基材や紙
−エポキシ樹脂基材からなる絶縁基板1にパラジウム等
のめつき触媒入りの接着剤を塗布して接着剤ff12を
形成する。次に、第2図に示す通り、この接着剤JII
2が形成された絶縁基板1をパンチして所定のスルーホ
ール用の孔3を形成する。孔3形成後、絶縁基板1の表
面を整面し、高圧水洗をしてパンチによる基板カスを除
去する。
First, as shown in FIG. 1, an adhesive containing a plating catalyst such as palladium is applied to an insulating substrate 1 made of a paper-phenol resin base material or a paper-epoxy resin base material to form an adhesive ff12. Next, as shown in Figure 2, this adhesive JII
A hole 3 for a predetermined through hole is formed by punching the insulating substrate 1 on which the hole 2 is formed. After forming the holes 3, the surface of the insulating substrate 1 is leveled and washed with high-pressure water to remove substrate debris caused by punching.

水洗後、絶縁基板1を特にめっき触媒入り熱硬化性樹脂
のエマルジョン中に浸漬し、このエマルジョンに50K
Hz〜1MH2の超音波振動を加えて、孔3壁面に2〜
10μ程度の熱硬化性の樹脂を付着する。熱硬化性樹脂
としては、エポキシ樹脂やウレタン樹脂、ポリエステル
樹脂等を用いるが、絶縁基板1がフェノール樹脂系ある
いはエポキシ樹脂系のものの場合には、エポキシ樹脂が
基板との密着性がよく好ましい。また、硬化剤としては
、アミン系のものが安定したエマルジョンが得られるの
で好ましい。そしてエマルジョン中の固形分濃度として
は0.3〜10wt%の範囲のものが特に好ましい。す
なわち、0.3wt%未満の濃度では硬化剤としての効
果が低くなって樹脂が硬化し難くなり、また10wt%
より多いと孔を塞ぐように樹脂が被覆されることがあり
、除去作業が必要となり作業上好ましくない。めっき触
媒は、パラジウム化合物あるいは錫化合物との併用系の
パラジウム系触媒を用い、樹脂分100東fit部に対
して0.005〜0.5ffi 1部添加分散したもの
が好ましく、o、oos重」部未満では触媒効果が低く
、0.51fi部より多いと価格が高(なり製造コスト
が高くなり、効果も飽和状態に近くなる。さらに、熱硬
化性樹脂溶液としては、通常の溶剤溶液でもよいが、エ
マルジョンや水溶液の方が、その後の乾燥処理の際に皮
張り等がなく好ましい。絶縁基板1をエマルジョン中に
浸漬した後、絞りローラやパフにより表面のエマルジョ
ンを除去する。表面のエマルジョンを除去した後、加熱
された空気が自然対流している状態の熱風や扇I!l1
等により強制的に加熱された空気を循環している状態の
熱風により孔壁に付着した熱硬化性樹脂を加熱乾燥して
半硬化状態にし、第3図に示す通り、熱硬化性樹脂層4
を形成する。熱硬化性樹脂w14を半硬化した後、絶縁
基板1をパラジウム系めっき触媒の溶液中に浸漬して第
4図に示す通り、熱硬化性樹脂層4表面にめっき触媒5
を付着し、取り出して熱硬化性樹脂114を加熱硬化す
る。熱硬化性樹脂H4を硬化後、絶縁基板1を硼弗化水
素酸溶液や無水クロム酸硫酸系溶液からなる粗化液に浸
漬し、第5図に示す通り、接着剤Fm2を粗化する。
After washing with water, the insulating substrate 1 is immersed in an emulsion of a thermosetting resin containing a plating catalyst, and immersed in this emulsion at 50K.
By applying ultrasonic vibration of Hz to 1 MH2, 2 to
Attach a thermosetting resin of about 10 μm. As the thermosetting resin, epoxy resin, urethane resin, polyester resin, etc. are used, but when the insulating substrate 1 is made of phenol resin or epoxy resin, epoxy resin is preferred because of its good adhesion to the substrate. Furthermore, as the curing agent, amine-based curing agents are preferable because they provide stable emulsions. The solid content concentration in the emulsion is particularly preferably in the range of 0.3 to 10 wt%. That is, if the concentration is less than 0.3 wt%, the effect as a curing agent becomes low and the resin becomes difficult to cure;
If the amount is more than that, the resin may be coated so as to close the holes, which requires removal work, which is not preferable in terms of work. The plating catalyst is preferably a palladium-based catalyst used in combination with a palladium compound or a tin compound, and is preferably added and dispersed in an amount of 0.005 to 0.5 ffi (1 part) per 100 parts of the resin (o, oos weight). If the thermosetting resin solution is less than 0.51 parts, the catalytic effect will be low, and if it is more than 0.51 parts, the price will be high (the manufacturing cost will be high, and the effect will be close to saturation).Furthermore, as the thermosetting resin solution, a normal solvent solution may be used. However, emulsions and aqueous solutions are preferable because they do not cause skin formation during the subsequent drying process.After the insulating substrate 1 is immersed in the emulsion, the emulsion on the surface is removed using a squeezing roller or a puff. After removal, use hot air or a fan with natural convection of heated air!l1
The thermosetting resin adhered to the hole wall is heated and dried by hot air in a state where air is forcibly heated by, for example, being circulated to a semi-cured state, and as shown in FIG. 3, the thermosetting resin layer 4
form. After semi-curing the thermosetting resin w14, the insulating substrate 1 is immersed in a solution of a palladium-based plating catalyst, and as shown in FIG. 4, a plating catalyst 5 is applied to the surface of the thermosetting resin layer 4.
The thermosetting resin 114 is attached and taken out, and the thermosetting resin 114 is heated and cured. After curing the thermosetting resin H4, the insulating substrate 1 is immersed in a roughening solution consisting of a borofluoric acid solution or an anhydrous chromic acid/sulfuric acid solution to roughen the adhesive Fm2 as shown in FIG.

接着剤層2を粗化後、めっきレジストインクを所定のパ
ターンに塗布・乾燥し、第6図に示す通り、めっきレジ
スト116を形成する。めっきレジスト1116を形成
後、絶縁基板1を無電解銅めっき溶液中に浸漬し所定の
パターンにめっきを析出して、第7図に示す通り、回路
7を形成する。回路7を形成後、通常の方法で絶縁基板
1を処理し、印刷配線板を製造する。
After roughening the adhesive layer 2, a plating resist ink is applied in a predetermined pattern and dried to form a plating resist 116 as shown in FIG. After forming the plating resist 1116, the insulating substrate 1 is immersed in an electroless copper plating solution to deposit plating in a predetermined pattern to form the circuit 7 as shown in FIG. After forming the circuit 7, the insulating substrate 1 is processed in a conventional manner to produce a printed wiring board.

次に、本発明と比較例及び従来例とについて、スルーホ
ール用の孔内のめつき付着性、スルーホール信頼性及び
ブローホール発生率を測定したところ表の通りの結果が
得られた。
Next, the plating adhesion inside the through-hole, the through-hole reliability, and the blowhole occurrence rate were measured for the present invention, comparative example, and conventional example, and the results shown in the table were obtained.

■スルーホール用の孔内のめつき付着性は孔内壁全面に
めっきが析出し銅色になるまでの時間1、■めっきの付
着しない孔の比率はめつき処理開始から30分後の測定
値、■スルーホール信頼性はMIL−107D (−6
5℃、30分〜125℃、30分のサイクルによる熱衝
撃テスト)により抵抗値が10%増加するサイクル数、
■プローホール発生率は半田あげ条件を240℃、5秒
とし、温度40℃、相対湿度95%の雰囲気中に2日間
fi直後の基板を用い測定する。
■The adhesion of plating inside the hole for through-holes is the time it takes for the plating to deposit on the entire inner wall of the hole and become copper-colored.■The ratio of holes where no plating adheres is the value measured 30 minutes after the start of the plating process. ■Through hole reliability is MIL-107D (-6
Thermal shock test by cycles of 5°C, 30 minutes to 125°C, 30 minutes) The number of cycles at which the resistance value increases by 10%,
(2) The blowhole generation rate is measured using a board immediately after 2 days of soldering in an atmosphere of 40°C and 95% relative humidity under soldering conditions of 240°C for 5 seconds.

製造条件は、実施例1)が、 a)M縁基板:エポキシ樹脂aWj板にめっき触媒入り
接着剤を塗布硬化したもの(日立化成工業社製ACL−
E−144K)。
The manufacturing conditions were as follows in Example 1): a) M edge substrate: An adhesive containing a plating catalyst was applied and cured on an epoxy resin aWj board (ACL-manufactured by Hitachi Chemical Co., Ltd.).
E-144K).

b)熱硬化性樹脂層形成工!!:エポキシ樹脂エマルジ
ョン(カネボウNSC社製エポルジョンEA−1の固形
分100重1部に対し硬化剤EB−1を80重1部添加
したもの)に、パラジウム液PEC−8 (日立化成工業社製めっき触*、 >をパラジウム濃度
が樹脂分100重量部に対し0.03重開部となるよう
に添加した濃度5%の液中に浸漬し、液に500KHz
の超音波振動を加えて処理した後、パフにより接着剤表
面のエマルジョンを取り除き、さらに、100″C程度
に加熱された空気の自然対流で加熱する。
b) Thermosetting resin layer forming process! ! : Palladium liquid PEC-8 (Plating manufactured by Hitachi Chemical Co., Ltd.) was added to an epoxy resin emulsion (1 part by weight of curing agent EB-1 was added to 1 part by weight of 80 parts by weight of solid content of Epolsion EA-1 manufactured by Kanebo NSC). *,> was immersed in a solution with a concentration of 5% palladium added so that the palladium concentration was 0.03 folds per 100 parts by weight of resin, and the solution was heated at 500 KHz.
After treatment by applying ultrasonic vibrations, the emulsion on the surface of the adhesive is removed using a puff, and the adhesive is further heated by natural convection of air heated to about 100''C.

C)めっき触媒付着工程:めつき触媒(日立化成工業社
製H8−101B)を孔内に塗布し乾燥する。
C) Plating catalyst adhesion step: A plating catalyst (H8-101B manufactured by Hitachi Chemical Co., Ltd.) is applied into the holes and dried.

d〉めっきレジスト工程:めつきレジストインク(日立
化成工業社製HGM−028に−1)をスクリーン印刷
し、温度160℃で30分間加熱して硬化する。
d> Plating resist step: Plating resist ink (HGM-028-1 manufactured by Hitachi Chemical Co., Ltd.) is screen printed and cured by heating at a temperature of 160° C. for 30 minutes.

e)粗化工程:硼弗化水素酸系粗化液により接着剤層表
面を粗化し、洗浄する。
e) Roughening step: The surface of the adhesive layer is roughened using a borofluoric acid-based roughening liquid and then washed.

f)無電解めつき工8:無電解銅めっき処理により厚さ
25μの銅層を形成する。
f) Electroless plating process 8: Form a copper layer with a thickness of 25 μm by electroless copper plating process.

実施例2)は、実施例1)において、超音波振動の強さ
を100KHzとし、比較例は、実施例1)において、
超音波撮動を省略し、従来例は、実施例1)において、
b)の熱硬化性樹脂層形成工程を省略したものである。
In Example 2), the intensity of the ultrasonic vibration was 100 KHz in Example 1), and in the comparative example, in Example 1),
In the conventional example, in Example 1), ultrasonic imaging is omitted.
The thermosetting resin layer forming step b) is omitted.

表 表から明らかな通り、本発明によれば、めっき付着性は
従来例に比べて約86%以下であり、まためつきの付着
しない孔の比率は本発明が0%であるのに対し、比較例
は10%、従来例は100%となり、本発明により孔内
壁面へのめっき掛出が容易になっていることがわかる。
As is clear from the table, according to the present invention, the plating adhesion is about 86% or less compared to the conventional example, and the ratio of pores to which no glare adheres is 0% in the present invention, compared to the comparative example. The ratio was 10% for the example and 100% for the conventional example, indicating that the present invention facilitates plating on the inner wall surface of the hole.

さらに、本発明により、信頼性は比較例よりも25%、
従来例よりも約108%各々向上している。またブロー
ホール発生率も、比較例と比べて1/17に、従来例に
比べて1/35に各々減少している。
Furthermore, according to the present invention, the reliability is 25% higher than that of the comparative example.
This is an improvement of approximately 108% over the conventional example. The blowhole occurrence rate was also reduced to 1/17 compared to the comparative example and to 1/35 compared to the conventional example.

(効果) 以上の通り、本発明によれば、孔形成後の絶縁基板をめ
っき触媒入りの熱硬化性樹脂液中に浸漬するとともに、
この°液に超音波振動を加えているために、孔内壁面に
効果的に樹脂が付着し、無電解めっき処理の際にめっき
析出が早くなり製造時間を短縮できるとともにブローホ
ールの発生率が低く信頼性の高い印刷配線板の製造方法
が得られる。
(Effects) As described above, according to the present invention, an insulating substrate after hole formation is immersed in a thermosetting resin liquid containing a plating catalyst, and
Because ultrasonic vibration is applied to this solution, the resin adheres effectively to the inner wall surface of the hole, which accelerates plating deposition during electroless plating, shortens manufacturing time, and reduces the incidence of blowholes. A method for manufacturing a printed wiring board with low cost and high reliability can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第7図は本発明実施例の製造工程を示し、第1
図は接着剤層を設けた絶縁基板の断面図、第2図は孔を
形成した絶縁基板の断面図、第3図は孔壁にめっき触媒
入り熱硬化性樹脂層を設けた絶縁基板の断面図、第4図
は熱硬化性樹脂層にめっき触媒を付着した絶縁基板の断
面図、第5図は接着剤層を粗化した絶縁基板の断面図、
第6図はめつきレジスト層を設けた絶縁基板の断面図、
第7図は回路を設けた絶縁基板の断面図を示す。 1・・・絶縁基板、 2・・・接着剤層、 3・・・孔
、4・・・熱硬化性樹脂層、 5・・・めっき触媒、6
・・・めっきレジスト層、 7・・・回路。
Figures 1 to 7 show the manufacturing process of the embodiment of the present invention.
The figure is a cross-sectional view of an insulating substrate provided with an adhesive layer, Figure 2 is a cross-sectional view of an insulating substrate with holes formed, and Figure 3 is a cross-sectional view of an insulating substrate with a thermosetting resin layer containing a plating catalyst provided on the hole wall. 4 is a cross-sectional view of an insulating substrate with a plating catalyst attached to a thermosetting resin layer, and FIG. 5 is a cross-sectional view of an insulating substrate with a roughened adhesive layer.
FIG. 6 is a cross-sectional view of an insulating substrate provided with a plating resist layer,
FIG. 7 shows a cross-sectional view of an insulating substrate provided with a circuit. DESCRIPTION OF SYMBOLS 1... Insulating substrate, 2... Adhesive layer, 3... Hole, 4... Thermosetting resin layer, 5... Plating catalyst, 6
...Plating resist layer, 7...Circuit.

Claims (1)

【特許請求の範囲】[Claims] (1)スルーホール用の孔を有しめつき触媒入り接着剤
が塗布された絶縁板に無電解めつき法により所定の回路
を形成する印刷配線板の製造方法において、絶縁板をめ
つき触媒を含んだ熱硬化性樹脂液中に浸漬し、該熱硬化
性樹脂液に超音波振動を与えて孔に前記めつき触媒入り
の熱硬化性樹脂を付着する工程と、該工程後に孔に付着
した前記めっき触媒入りの熱硬化性樹脂を乾燥する工程
とを施すことを特徴とする印刷配線板の製造方法。
(1) In a method for manufacturing a printed wiring board in which a predetermined circuit is formed by electroless plating on an insulating plate having holes for through holes and coated with a plating catalyst-containing adhesive, the insulating plate is plated and a catalyst-containing adhesive is applied. A step of attaching the thermosetting resin containing the plating catalyst to the hole by immersing it in a thermosetting resin solution containing the plating catalyst and applying ultrasonic vibration to the thermosetting resin solution, and a step of attaching the thermosetting resin containing the plating catalyst to the hole after this step. A method for manufacturing a printed wiring board, comprising the step of drying the thermosetting resin containing the plating catalyst.
JP22504084A 1984-10-25 1984-10-25 Manufacture of printed wiring board Pending JPS61102092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22504084A JPS61102092A (en) 1984-10-25 1984-10-25 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22504084A JPS61102092A (en) 1984-10-25 1984-10-25 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPS61102092A true JPS61102092A (en) 1986-05-20

Family

ID=16823103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22504084A Pending JPS61102092A (en) 1984-10-25 1984-10-25 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPS61102092A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013067856A (en) * 2011-09-09 2013-04-18 Kansai Univ Catalyst adsorption method and adsorption device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013067856A (en) * 2011-09-09 2013-04-18 Kansai Univ Catalyst adsorption method and adsorption device

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