JPS60925B2 - Method for manufacturing oxide semiconductor material for thermistor - Google Patents
Method for manufacturing oxide semiconductor material for thermistorInfo
- Publication number
- JPS60925B2 JPS60925B2 JP490580A JP490580A JPS60925B2 JP S60925 B2 JPS60925 B2 JP S60925B2 JP 490580 A JP490580 A JP 490580A JP 490580 A JP490580 A JP 490580A JP S60925 B2 JPS60925 B2 JP S60925B2
- Authority
- JP
- Japan
- Prior art keywords
- thermistor
- oxide semiconductor
- semiconductor material
- manufacturing
- manufacturing oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Thermistors And Varistors (AREA)
Description
【発明の詳細な説明】
本発明は、酸化マンガンを主成分とし、特に酸化ジルコ
ニウムを含有することを特徴とした負の抵抗温度係数を
有するサーミスタ用酸化物半導体材料の製造方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an oxide semiconductor material for a thermistor, which has a negative temperature coefficient of resistance and is characterized by containing manganese oxide as a main component and, in particular, containing zirconium oxide.
従来、負の抵抗温度係数を有する市販の汎用サーミスタ
材料の製造方法は、他のセラミックスの製造工程と同様
、湿式混合・仮焼・湿式粉砕が−般的である。Conventionally, the manufacturing method of commercially available general-purpose thermistor materials having a negative temperature coefficient of resistance generally involves wet mixing, calcination, and wet pulverization, similar to the manufacturing process of other ceramics.
また、不純物の混入を極度に嫌う場合には、溶液法が導
入されている。上記湿式混合および湿式粉砕に使用され
る玉石はメノウ玉石が一般的である。また、酸化ジルコ
ニウムを含有し、酸化マンガンを主成分とするサーミス
タ用酸化物組成としては「Mn−Z「系、Co−Zr系
、Ni−Zr系、Cu−Zr系の2成分系がよく知られ
ている〔■日立製作所、中央研究所創立二十周年記念論
文集、P30〜40昭和37年〕。In addition, when contamination with impurities is extremely objectionable, a solution method has been introduced. Agate cobbles are generally used as the cobblestones for the above-mentioned wet mixing and wet grinding. Furthermore, as oxide compositions for thermistors containing zirconium oxide and manganese oxide as the main component, two-component systems such as "Mn-Z" system, Co-Zr system, Ni-Zr system, and Cu-Zr system are well known. [■Hitachi, Ltd., Collected Papers Commemorating the 20th Anniversary of the Central Research Institute, P30-40, 1960].
本発明は、Nm−Niスピネルに鉄もしくはクロムおよ
び鉄とクロムを含有させることにより比抵抗をコントロ
ールし、しかも酸化ジルコニウム含有効果として常温比
抵抗のわりにB定数が大きく、安定しているMn−Ni
−Fe−Zr系もしくはMn−Ni−Cr−Zr系ある
いはMn−Ni−Fe−Cr−Zr系酸化物材料の製造
方法で、ジルコニアボールを玉石として湿式混合・湿式
粉砕を行い、Mn−Ni−Fe系もしくはMn−Nj−
Cr系あるいはMn−Ni−Fe−Cr系材料にZrを
ジルコニアボールからの摩耗により添加することを特徴
とする。The present invention controls the resistivity by containing iron or chromium or iron and chromium in Nm-Ni spinel, and furthermore, as an effect of containing zirconium oxide, the B constant is large compared to the resistivity at room temperature, making the Mn-Ni spinel stable.
- A method for producing Fe-Zr-based, Mn-Ni-Cr-Zr-based, or Mn-Ni-Fe-Cr-Zr-based oxide materials, in which wet mixing and wet pulverization are performed using zirconia balls as cobblestones, and Mn-Ni- Fe-based or Mn-Nj-
It is characterized in that Zr is added to the Cr-based or Mn-Ni-Fe-Cr-based material by abrasion from the zirconia balls.
以下、実施例を挙げて説明する。Examples will be described below.
市販の原料MhC03,NOおよびCr203をMn三
Ni:Cr=81.5:17.5:1.0原子%になる
ように配合し、これをl iMhendmdbnsty
pe(アメリカ、ノートン社製)のジルコニアボールを
玉石としてボールミルで湿式混合し、これらのスラリー
を乾燥後、800qoの温度で仮擁し「 これらの仮焼
物を上記のボールミルで湿式粉砕混合を行った。Commercially available raw materials MhC03, NO and Cr203 were blended so that Mn3Ni:Cr=81.5:17.5:1.0 at%, and this was mixed with l iMhendmdbnsty.
PE (manufactured by Norton, Inc., USA) were used as cobblestones for wet mixing in a ball mill, and after drying these slurries, they were temporarily held at a temperature of 800 qo and wet-pulverized and mixed these calcined products in the above ball mill.
こうして得られたスラリーを乾燥し「半導体材料を得る
。ここで、粉砕条件を変えることにより添加するZd量
をコントロールできる。下表にボールミルの回転数およ
び粉砕時間を変えた場合の嫌絹体としての最終組成比を
示す。この最終組成比は、鱗結体を蛍光X線解析を行い
求めた。*は配合組成比Mn:Ni:Cr:Zr〒76
.5:17.5:1.0:5.0(原子%)上記表に示
すように、Zrを含有させる系で、しかも徴量添加が必
要な場合に最も適している。The slurry thus obtained is dried to obtain a "semiconductor material." Here, the amount of Zd added can be controlled by changing the grinding conditions. This final composition ratio was determined by fluorescent X-ray analysis of the scale bodies. * indicates the compound composition ratio Mn:Ni:Cr:Zr〒76
.. 5:17.5:1.0:5.0 (atomic %) As shown in the table above, it is most suitable for systems that contain Zr and require addition of features.
従来のようにメノウ玉石を用いた場合には、玉石からS
P2,Ca○が混入し「特性上に大きな影響を与えt製
造上の再現性にも乏しい。また、溶液法に転換するには
設備面等の投資が必要である。以上のように本発明の製
造方法を用いれば、従来通りの設備を使用でき、且つ特
性の再現性が得られる点で産業上の効果は大きい。また
「請求の範囲の中で限定したサーミスタ組成の限定理由
は、既に市販されている汎用サーミスタの特性値(比抵
抗10Q伽〜lh40伽「 B定数は100びK〜60
0びKの範囲)からなるものである。When using agate boulders as in the past, S
The contamination of P2 and Ca○ has a large effect on the properties and poor reproducibility in manufacturing.In addition, investment in equipment is required to convert to a solution method.As described above, the present invention If the manufacturing method is used, conventional equipment can be used and the characteristics can be reproducible, which has a great industrial effect. Characteristic values of commercially available general-purpose thermistors (resistivity: 10Q ~ 1h40; B constant: 100 and K ~ 60
0 to K).
Claims (1)
マンガン94.6〜55原子%、ニツケル5〜25原子
%、鉄およびクロムからなる群から選択した少なくとも
1種以上の元素を0.3〜5原子%、およびジルコニウ
ム0.3〜10原子%を含有し、合計少なくとも4種以
上の金属元素を総合計100原子%含有するサーミスタ
用酸化物半導体を得るために、粉末製造工程でジルコニ
アボールを玉石とした湿式混合・湿式粉砕工程を行なう
ことを特徴とするサーミスタ用酸化物半導体材料の製造
方法。1. In a sintered mixture of metal oxides, the metal element is 94.6 to 55 atom% of manganese, 5 to 25 atom% of nickel, at least one element selected from the group consisting of iron and chromium. In order to obtain an oxide semiconductor for a thermistor containing 100 at% of at least four or more metal elements, including 0.3 to 10 at% of zirconium and 0.3 to 10 at% of zirconium, zirconia balls are produced in the powder manufacturing process. A method for producing an oxide semiconductor material for a thermistor, the method comprising performing a wet mixing/wet grinding process using cobblestones.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP490580A JPS60925B2 (en) | 1980-01-18 | 1980-01-18 | Method for manufacturing oxide semiconductor material for thermistor |
US06/201,441 US4324702A (en) | 1979-11-02 | 1980-10-28 | Oxide thermistor compositions |
CA000363406A CA1147945A (en) | 1979-11-02 | 1980-10-28 | Oxide thermistor compositions |
DE8080303866T DE3069423D1 (en) | 1979-11-02 | 1980-10-30 | Oxide thermistor compositions and thermistors containing them |
EP80303866A EP0028510B1 (en) | 1979-11-02 | 1980-10-30 | Oxide thermistor compositions and thermistors containing them |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP490580A JPS60925B2 (en) | 1980-01-18 | 1980-01-18 | Method for manufacturing oxide semiconductor material for thermistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56101706A JPS56101706A (en) | 1981-08-14 |
JPS60925B2 true JPS60925B2 (en) | 1985-01-11 |
Family
ID=11596659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP490580A Expired JPS60925B2 (en) | 1979-11-02 | 1980-01-18 | Method for manufacturing oxide semiconductor material for thermistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60925B2 (en) |
-
1980
- 1980-01-18 JP JP490580A patent/JPS60925B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS56101706A (en) | 1981-08-14 |
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