JPS608801A - ブレ−ズド格子の形成方法 - Google Patents

ブレ−ズド格子の形成方法

Info

Publication number
JPS608801A
JPS608801A JP11613983A JP11613983A JPS608801A JP S608801 A JPS608801 A JP S608801A JP 11613983 A JP11613983 A JP 11613983A JP 11613983 A JP11613983 A JP 11613983A JP S608801 A JPS608801 A JP S608801A
Authority
JP
Japan
Prior art keywords
substrate
grating
mask
ion
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11613983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0318681B2 (enrdf_load_stackoverflow
Inventor
Kazuhiro Kosuge
小菅 和弘
Nobuo Nishida
西田 信夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP11613983A priority Critical patent/JPS608801A/ja
Publication of JPS608801A publication Critical patent/JPS608801A/ja
Publication of JPH0318681B2 publication Critical patent/JPH0318681B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP11613983A 1983-06-29 1983-06-29 ブレ−ズド格子の形成方法 Granted JPS608801A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11613983A JPS608801A (ja) 1983-06-29 1983-06-29 ブレ−ズド格子の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11613983A JPS608801A (ja) 1983-06-29 1983-06-29 ブレ−ズド格子の形成方法

Publications (2)

Publication Number Publication Date
JPS608801A true JPS608801A (ja) 1985-01-17
JPH0318681B2 JPH0318681B2 (enrdf_load_stackoverflow) 1991-03-13

Family

ID=14679697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11613983A Granted JPS608801A (ja) 1983-06-29 1983-06-29 ブレ−ズド格子の形成方法

Country Status (1)

Country Link
JP (1) JPS608801A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0318681B2 (enrdf_load_stackoverflow) 1991-03-13

Similar Documents

Publication Publication Date Title
US5340637A (en) Optical device diffraction gratings and a photomask for use in the same
CN101726779A (zh) 一种制作全息双闪耀光栅的方法
JP2005157118A (ja) ブレーズド・ホログラフィック・グレーティング、その製造方法、及びレプリカグレーティング
US20110268145A1 (en) Optical component
US4241109A (en) Technique for altering the profile of grating relief patterns
JPS5557807A (en) Production of diffraction grating
JP2005018061A (ja) 反射防止コーティングを施された回折光学素子
JP3434907B2 (ja) 凹面エシェレットグレーティングの製造方法
US11371134B2 (en) Nanowire grid polarizer on a curved surface and methods of making and using
CN102565905A (zh) 凸面双闪耀光栅的制备方法
JPS608801A (ja) ブレ−ズド格子の形成方法
Veldkamp et al. High efficiency binary lenses
JP2001042253A (ja) レーザー照射光学系
CA1267712A (en) Mask flow method of forming a variable width channel
JPS6252506A (ja) グレ−テイング作製方法
JPS59116602A (ja) チヤ−プトグレ−テイングの製造方法
JPS60186806A (ja) ブレ−ズド格子の製作方法
JPS5947282B2 (ja) エシエレツト格子の製造方法
JP2982832B2 (ja) ブレーズ反射回折格子製作方法
CN1422388A (zh) 依照干涉图案对衬底上材料的选择性沉积
JPH0456284B2 (enrdf_load_stackoverflow)
JPH0374362B2 (enrdf_load_stackoverflow)
JPS63187202A (ja) ブレ−ズドホログラフイツク回折格子
JPS6321128B2 (enrdf_load_stackoverflow)
US5337169A (en) Method for patterning an optical device for optical IC, and an optical device for optical IC fabricated by this method