JPS6076740A - 可視光感光性樹脂組成物 - Google Patents

可視光感光性樹脂組成物

Info

Publication number
JPS6076740A
JPS6076740A JP18559683A JP18559683A JPS6076740A JP S6076740 A JPS6076740 A JP S6076740A JP 18559683 A JP18559683 A JP 18559683A JP 18559683 A JP18559683 A JP 18559683A JP S6076740 A JPS6076740 A JP S6076740A
Authority
JP
Japan
Prior art keywords
compound
resin composition
group
visible light
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18559683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH039453B2 (enrdf_load_stackoverflow
Inventor
Kunihiro Ichimura
市村 国宏
Yoshihiro Nishio
吉弘 西尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP18559683A priority Critical patent/JPS6076740A/ja
Publication of JPS6076740A publication Critical patent/JPS6076740A/ja
Publication of JPH039453B2 publication Critical patent/JPH039453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
JP18559683A 1983-10-04 1983-10-04 可視光感光性樹脂組成物 Granted JPS6076740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18559683A JPS6076740A (ja) 1983-10-04 1983-10-04 可視光感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18559683A JPS6076740A (ja) 1983-10-04 1983-10-04 可視光感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6076740A true JPS6076740A (ja) 1985-05-01
JPH039453B2 JPH039453B2 (enrdf_load_stackoverflow) 1991-02-08

Family

ID=16173563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18559683A Granted JPS6076740A (ja) 1983-10-04 1983-10-04 可視光感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6076740A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096604A (ja) * 1983-11-01 1985-05-30 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPH0254268A (ja) * 1988-08-19 1990-02-23 Fuji Photo Film Co Ltd 光重合性組成物
WO1992013008A1 (en) * 1991-01-22 1992-08-06 Nippon Paint Co., Ltd. Photopolymerizable composition
JPH0527436A (ja) * 1990-01-12 1993-02-05 E I Du Pont De Nemours & Co 長波長可視活性線に対して感受性を有する光重合性組成物
JP2007119731A (ja) * 2005-09-30 2007-05-17 Fujifilm Corp 光記録用組成物、光記録媒体及びその製造方法、並びに光記録方法及び光記録装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096604A (ja) * 1983-11-01 1985-05-30 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPH0254268A (ja) * 1988-08-19 1990-02-23 Fuji Photo Film Co Ltd 光重合性組成物
JPH0527436A (ja) * 1990-01-12 1993-02-05 E I Du Pont De Nemours & Co 長波長可視活性線に対して感受性を有する光重合性組成物
WO1992013008A1 (en) * 1991-01-22 1992-08-06 Nippon Paint Co., Ltd. Photopolymerizable composition
US5368990A (en) * 1991-01-22 1994-11-29 Nippon Paint Co., Ltd. Photopolymerizable composition
JP2007119731A (ja) * 2005-09-30 2007-05-17 Fujifilm Corp 光記録用組成物、光記録媒体及びその製造方法、並びに光記録方法及び光記録装置

Also Published As

Publication number Publication date
JPH039453B2 (enrdf_load_stackoverflow) 1991-02-08

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