JPS6074249A - イオンビ−ム装置 - Google Patents

イオンビ−ム装置

Info

Publication number
JPS6074249A
JPS6074249A JP58181535A JP18153583A JPS6074249A JP S6074249 A JPS6074249 A JP S6074249A JP 58181535 A JP58181535 A JP 58181535A JP 18153583 A JP18153583 A JP 18153583A JP S6074249 A JPS6074249 A JP S6074249A
Authority
JP
Japan
Prior art keywords
ion
filter
ion beam
wien
filters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58181535A
Other languages
English (en)
Japanese (ja)
Other versions
JPH027503B2 (enrdf_load_stackoverflow
Inventor
Ryuzo Aihara
相原　竜三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58181535A priority Critical patent/JPS6074249A/ja
Publication of JPS6074249A publication Critical patent/JPS6074249A/ja
Publication of JPH027503B2 publication Critical patent/JPH027503B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
JP58181535A 1983-09-29 1983-09-29 イオンビ−ム装置 Granted JPS6074249A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58181535A JPS6074249A (ja) 1983-09-29 1983-09-29 イオンビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58181535A JPS6074249A (ja) 1983-09-29 1983-09-29 イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS6074249A true JPS6074249A (ja) 1985-04-26
JPH027503B2 JPH027503B2 (enrdf_load_stackoverflow) 1990-02-19

Family

ID=16102471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58181535A Granted JPS6074249A (ja) 1983-09-29 1983-09-29 イオンビ−ム装置

Country Status (1)

Country Link
JP (1) JPS6074249A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172650A (ja) * 1986-01-23 1987-07-29 Jeol Ltd 集束イオンビ−ム装置
JPS6441885U (enrdf_load_stackoverflow) * 1987-09-07 1989-03-13
AT391771B (de) * 1987-03-05 1990-11-26 Ims Ionen Mikrofab Syst Einrichtung zur verkleinernden oder 1 : 1 ionenprojektionslithographie
WO2006115090A1 (ja) * 2005-04-22 2006-11-02 Sii Nanotechnology Inc. 集束イオンビームによる加工方法及び集束イオンビーム加工装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172650A (ja) * 1986-01-23 1987-07-29 Jeol Ltd 集束イオンビ−ム装置
AT391771B (de) * 1987-03-05 1990-11-26 Ims Ionen Mikrofab Syst Einrichtung zur verkleinernden oder 1 : 1 ionenprojektionslithographie
JPS6441885U (enrdf_load_stackoverflow) * 1987-09-07 1989-03-13
WO2006115090A1 (ja) * 2005-04-22 2006-11-02 Sii Nanotechnology Inc. 集束イオンビームによる加工方法及び集束イオンビーム加工装置
JP2006301406A (ja) * 2005-04-22 2006-11-02 Sii Nanotechnology Inc 集束イオンビームによる加工方法及び集束イオンビーム加工装置
US7750318B2 (en) 2005-04-22 2010-07-06 Sii Nanotechnology Inc. Working method by focused ion beam and focused ion beam working apparatus

Also Published As

Publication number Publication date
JPH027503B2 (enrdf_load_stackoverflow) 1990-02-19

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