JPS6071657A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS6071657A
JPS6071657A JP17900683A JP17900683A JPS6071657A JP S6071657 A JPS6071657 A JP S6071657A JP 17900683 A JP17900683 A JP 17900683A JP 17900683 A JP17900683 A JP 17900683A JP S6071657 A JPS6071657 A JP S6071657A
Authority
JP
Japan
Prior art keywords
polymer
composition
salt
aromatic
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17900683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6260418B2 (fr
Inventor
Shoji Watanabe
渡辺　庄司
Shohei Kosakai
正平 小堺
Masao Kato
加藤　政雄
Kunihiro Ichimura
市村　国宏
Masao Suda
須田　昌男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP17900683A priority Critical patent/JPS6071657A/ja
Publication of JPS6071657A publication Critical patent/JPS6071657A/ja
Publication of JPS6260418B2 publication Critical patent/JPS6260418B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP17900683A 1983-09-27 1983-09-27 感光性樹脂組成物 Granted JPS6071657A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17900683A JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17900683A JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6071657A true JPS6071657A (ja) 1985-04-23
JPS6260418B2 JPS6260418B2 (fr) 1987-12-16

Family

ID=16058463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17900683A Granted JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6071657A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175046A (ja) * 1983-12-20 1985-09-09 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニ− 輻射線感光性組成物及びそれを用いた輻射線感光要素
EP0302019A2 (fr) * 1987-07-28 1989-02-01 Ciba-Geigy Ag Photoréserves négatives à base de polyphénols et un choix d'époxydes ou de vinyléthers
US5079129A (en) * 1986-08-06 1992-01-07 Ciba-Geigy Corporation Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
US5719008A (en) * 1994-09-12 1998-02-17 Sumitomo Chemical Company, Limited Photoresist composition comprising a polyfunctional vinyl ether compound

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175046A (ja) * 1983-12-20 1985-09-09 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニ− 輻射線感光性組成物及びそれを用いた輻射線感光要素
US5079129A (en) * 1986-08-06 1992-01-07 Ciba-Geigy Corporation Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0302019A2 (fr) * 1987-07-28 1989-02-01 Ciba-Geigy Ag Photoréserves négatives à base de polyphénols et un choix d'époxydes ou de vinyléthers
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
US5719008A (en) * 1994-09-12 1998-02-17 Sumitomo Chemical Company, Limited Photoresist composition comprising a polyfunctional vinyl ether compound

Also Published As

Publication number Publication date
JPS6260418B2 (fr) 1987-12-16

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