JPS6070725A - マ−ク検出方式 - Google Patents

マ−ク検出方式

Info

Publication number
JPS6070725A
JPS6070725A JP58178014A JP17801483A JPS6070725A JP S6070725 A JPS6070725 A JP S6070725A JP 58178014 A JP58178014 A JP 58178014A JP 17801483 A JP17801483 A JP 17801483A JP S6070725 A JPS6070725 A JP S6070725A
Authority
JP
Japan
Prior art keywords
switch
signal
electron beam
detector
mark detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58178014A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055164B2 (enExample
Inventor
Susumu Ozasa
小笹 進
Masahide Okumura
正秀 奥村
Hisatake Yokouchi
久猛 横内
Kiichi Takamoto
喜一 高本
Korehito Matsuda
松田 維人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP58178014A priority Critical patent/JPS6070725A/ja
Publication of JPS6070725A publication Critical patent/JPS6070725A/ja
Publication of JPH055164B2 publication Critical patent/JPH055164B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58178014A 1983-09-28 1983-09-28 マ−ク検出方式 Granted JPS6070725A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58178014A JPS6070725A (ja) 1983-09-28 1983-09-28 マ−ク検出方式

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58178014A JPS6070725A (ja) 1983-09-28 1983-09-28 マ−ク検出方式

Publications (2)

Publication Number Publication Date
JPS6070725A true JPS6070725A (ja) 1985-04-22
JPH055164B2 JPH055164B2 (enExample) 1993-01-21

Family

ID=16041051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58178014A Granted JPS6070725A (ja) 1983-09-28 1983-09-28 マ−ク検出方式

Country Status (1)

Country Link
JP (1) JPS6070725A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722767U (ja) * 1993-10-01 1995-04-25 株式会社セラジパング フード内クラブプロテクション装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59207624A (ja) * 1983-05-11 1984-11-24 Hitachi Ltd マ−ク検出回路

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59207624A (ja) * 1983-05-11 1984-11-24 Hitachi Ltd マ−ク検出回路

Also Published As

Publication number Publication date
JPH055164B2 (enExample) 1993-01-21

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