JPS6070172A - 皮膜形成装置 - Google Patents
皮膜形成装置Info
- Publication number
- JPS6070172A JPS6070172A JP58178717A JP17871783A JPS6070172A JP S6070172 A JPS6070172 A JP S6070172A JP 58178717 A JP58178717 A JP 58178717A JP 17871783 A JP17871783 A JP 17871783A JP S6070172 A JPS6070172 A JP S6070172A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cathode
- conduit
- centerline
- vacuum container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005540 biological transmission Effects 0.000 claims description 11
- 239000003566 sealing material Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 230000008021 deposition Effects 0.000 abstract 2
- 238000007796 conventional method Methods 0.000 abstract 1
- 239000013528 metallic particle Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 26
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000011521 glass Substances 0.000 description 10
- 239000011261 inert gas Substances 0.000 description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- 229920001875 Ebonite Polymers 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58178717A JPS6070172A (ja) | 1983-09-27 | 1983-09-27 | 皮膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58178717A JPS6070172A (ja) | 1983-09-27 | 1983-09-27 | 皮膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6070172A true JPS6070172A (ja) | 1985-04-20 |
| JPS639585B2 JPS639585B2 (enrdf_load_stackoverflow) | 1988-02-29 |
Family
ID=16053327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58178717A Granted JPS6070172A (ja) | 1983-09-27 | 1983-09-27 | 皮膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6070172A (enrdf_load_stackoverflow) |
-
1983
- 1983-09-27 JP JP58178717A patent/JPS6070172A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS639585B2 (enrdf_load_stackoverflow) | 1988-02-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4355036B2 (ja) | イオン化スパッタリング装置 | |
| JP2898635B2 (ja) | 第２の電極のスパッタリングを減少させる方法および装置 | |
| JPS5933191B2 (ja) | 皮膜形成装置 | |
| JP4233702B2 (ja) | カーボンスパッタ装置 | |
| JPS6070172A (ja) | 皮膜形成装置 | |
| JPH0297671A (ja) | 膜形成装置および侵食装置 | |
| JP4526139B2 (ja) | 基板処理装置及びスパッタリング装置 | |
| JPH02236277A (ja) | スパッタリング方法 | |
| JPH077324Y2 (ja) | 皮膜形成装置 | |
| JP3099153B2 (ja) | 皮膜加工装置 | |
| JPH02156066A (ja) | 基材のクリーニング方法 | |
| JPH0867981A (ja) | スパッタ装置 | |
| JPS61223178A (ja) | 皮膜形成装置 | |
| JPS6318071A (ja) | 枚葉式バイアススパツタ装置 | |
| JPS61174725A (ja) | 薄膜形成装置 | |
| JPS63458A (ja) | 真空ア−ク蒸着装置 | |
| JPH02290246A (ja) | 硬脆材料の加工方法 | |
| JPH02197567A (ja) | プラズマスパッタ装置 | |
| JPS619570A (ja) | 薄膜製造方法 | |
| JPH0674509B2 (ja) | 侵食装置 | |
| JPH0573288B2 (enrdf_load_stackoverflow) | ||
| JPH02290243A (ja) | 硬質薄膜材料の平坦加工方法 | |
| JPS62224935A (ja) | プラズマ処理装置 | |
| JPS6250461A (ja) | スパツタリングによる薄膜の堆積法 | |
| JPH0791639B2 (ja) | スパツタ方法 |