JPS6067901A - 水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子 - Google Patents

水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子

Info

Publication number
JPS6067901A
JPS6067901A JP58176612A JP17661283A JPS6067901A JP S6067901 A JPS6067901 A JP S6067901A JP 58176612 A JP58176612 A JP 58176612A JP 17661283 A JP17661283 A JP 17661283A JP S6067901 A JPS6067901 A JP S6067901A
Authority
JP
Japan
Prior art keywords
refractive index
substrate
amorphous silicon
silicon carbide
thin films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58176612A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0477281B2 (enExample
Inventor
Yutaka Hayashi
豊 林
Mitsuyuki Yamanaka
光之 山中
Atsuo Ito
厚雄 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58176612A priority Critical patent/JPS6067901A/ja
Publication of JPS6067901A publication Critical patent/JPS6067901A/ja
Publication of JPH0477281B2 publication Critical patent/JPH0477281B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Chemical Vapour Deposition (AREA)
JP58176612A 1983-09-24 1983-09-24 水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子 Granted JPS6067901A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58176612A JPS6067901A (ja) 1983-09-24 1983-09-24 水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58176612A JPS6067901A (ja) 1983-09-24 1983-09-24 水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子

Publications (2)

Publication Number Publication Date
JPS6067901A true JPS6067901A (ja) 1985-04-18
JPH0477281B2 JPH0477281B2 (enExample) 1992-12-08

Family

ID=16016608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58176612A Granted JPS6067901A (ja) 1983-09-24 1983-09-24 水素化及び弗素化した非晶質炭化ケイ素薄膜を用いた光学素子

Country Status (1)

Country Link
JP (1) JPS6067901A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0391701A (ja) * 1989-09-05 1991-04-17 Hitachi Ltd 反射防止膜及びその形成方法
EP0714041A3 (de) * 1994-11-25 1996-09-25 Tuhh Tech Gmbh Lichtwellenleitende Struktur auf einem Substrat
EP0897898A3 (de) * 1997-08-16 1999-03-10 MERCK PATENT GmbH Verfahren zur Abscheidung optischer Schichten
WO2002077320A1 (en) * 2001-03-23 2002-10-03 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films
JP2009525397A (ja) * 2006-01-30 2009-07-09 ユーロピアン エアロノティック ディフェンス アンド スペース カンパニー イーエーディーエス フランス 薄膜多層構造体、該構造体を含む構成要素、および該構造体の堆積方法
EP2048699A3 (en) * 2007-10-12 2010-11-03 Air Products and Chemicals, Inc. Antireflective coatings for photovoltaic applications

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57115559A (en) * 1981-01-09 1982-07-19 Canon Inc Photoconductive material
JPS57119357A (en) * 1981-01-16 1982-07-24 Canon Inc Photoconductive member
JPS57177148A (en) * 1981-04-23 1982-10-30 Canon Inc Image forming member for electrophotography

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57115559A (en) * 1981-01-09 1982-07-19 Canon Inc Photoconductive material
JPS57119357A (en) * 1981-01-16 1982-07-24 Canon Inc Photoconductive member
JPS57177148A (en) * 1981-04-23 1982-10-30 Canon Inc Image forming member for electrophotography

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0391701A (ja) * 1989-09-05 1991-04-17 Hitachi Ltd 反射防止膜及びその形成方法
EP0714041A3 (de) * 1994-11-25 1996-09-25 Tuhh Tech Gmbh Lichtwellenleitende Struktur auf einem Substrat
EP0897898A3 (de) * 1997-08-16 1999-03-10 MERCK PATENT GmbH Verfahren zur Abscheidung optischer Schichten
WO2002077320A1 (en) * 2001-03-23 2002-10-03 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films
JP2009525397A (ja) * 2006-01-30 2009-07-09 ユーロピアン エアロノティック ディフェンス アンド スペース カンパニー イーエーディーエス フランス 薄膜多層構造体、該構造体を含む構成要素、および該構造体の堆積方法
EP2048699A3 (en) * 2007-10-12 2010-11-03 Air Products and Chemicals, Inc. Antireflective coatings for photovoltaic applications
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications

Also Published As

Publication number Publication date
JPH0477281B2 (enExample) 1992-12-08

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