JPS6065588A - 半導体レ−ザの製造方法 - Google Patents
半導体レ−ザの製造方法Info
- Publication number
- JPS6065588A JPS6065588A JP58172897A JP17289783A JPS6065588A JP S6065588 A JPS6065588 A JP S6065588A JP 58172897 A JP58172897 A JP 58172897A JP 17289783 A JP17289783 A JP 17289783A JP S6065588 A JPS6065588 A JP S6065588A
- Authority
- JP
- Japan
- Prior art keywords
- laser
- diffraction grating
- grating
- periodic
- crystal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000013078 crystal Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 9
- 230000000737 periodic effect Effects 0.000 abstract description 8
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 230000007246 mechanism Effects 0.000 abstract description 4
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000004907 flux Effects 0.000 abstract 1
- 230000002452 interceptive effect Effects 0.000 abstract 1
- 238000005530 etching Methods 0.000 description 5
- 238000005253 cladding Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Weting (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58172897A JPS6065588A (ja) | 1983-09-21 | 1983-09-21 | 半導体レ−ザの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58172897A JPS6065588A (ja) | 1983-09-21 | 1983-09-21 | 半導体レ−ザの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6065588A true JPS6065588A (ja) | 1985-04-15 |
JPS6355232B2 JPS6355232B2 (enrdf_load_stackoverflow) | 1988-11-01 |
Family
ID=15950360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58172897A Granted JPS6065588A (ja) | 1983-09-21 | 1983-09-21 | 半導体レ−ザの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6065588A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS614223A (ja) * | 1984-06-19 | 1986-01-10 | Ricoh Co Ltd | 薄膜デバイスのビツトパタ−ン形成方法 |
JPS6273690A (ja) * | 1985-09-26 | 1987-04-04 | Sharp Corp | 半導体レ−ザ−素子 |
US5020072A (en) * | 1989-05-22 | 1991-05-28 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser device |
US5023198A (en) * | 1990-02-28 | 1991-06-11 | At&T Bell Laboratories | Method for fabricating self-stabilized semiconductor gratings |
US6862394B2 (en) * | 2002-01-07 | 2005-03-01 | Triquint Technology Holding Co. | Wavelength tunable laser and method of formation |
-
1983
- 1983-09-21 JP JP58172897A patent/JPS6065588A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS614223A (ja) * | 1984-06-19 | 1986-01-10 | Ricoh Co Ltd | 薄膜デバイスのビツトパタ−ン形成方法 |
JPS6273690A (ja) * | 1985-09-26 | 1987-04-04 | Sharp Corp | 半導体レ−ザ−素子 |
US5020072A (en) * | 1989-05-22 | 1991-05-28 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser device |
US5023198A (en) * | 1990-02-28 | 1991-06-11 | At&T Bell Laboratories | Method for fabricating self-stabilized semiconductor gratings |
US6862394B2 (en) * | 2002-01-07 | 2005-03-01 | Triquint Technology Holding Co. | Wavelength tunable laser and method of formation |
Also Published As
Publication number | Publication date |
---|---|
JPS6355232B2 (enrdf_load_stackoverflow) | 1988-11-01 |
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