JPS6059998U - 放射性ガスの固定化処分装置 - Google Patents

放射性ガスの固定化処分装置

Info

Publication number
JPS6059998U
JPS6059998U JP15164983U JP15164983U JPS6059998U JP S6059998 U JPS6059998 U JP S6059998U JP 15164983 U JP15164983 U JP 15164983U JP 15164983 U JP15164983 U JP 15164983U JP S6059998 U JPS6059998 U JP S6059998U
Authority
JP
Japan
Prior art keywords
radioactive gas
ion implantation
accelerating electrode
electrode plate
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15164983U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225197Y2 (enExample
Inventor
寺澤　倫孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15164983U priority Critical patent/JPS6059998U/ja
Publication of JPS6059998U publication Critical patent/JPS6059998U/ja
Application granted granted Critical
Publication of JPH0225197Y2 publication Critical patent/JPH0225197Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP15164983U 1983-09-30 1983-09-30 放射性ガスの固定化処分装置 Granted JPS6059998U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15164983U JPS6059998U (ja) 1983-09-30 1983-09-30 放射性ガスの固定化処分装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15164983U JPS6059998U (ja) 1983-09-30 1983-09-30 放射性ガスの固定化処分装置

Publications (2)

Publication Number Publication Date
JPS6059998U true JPS6059998U (ja) 1985-04-25
JPH0225197Y2 JPH0225197Y2 (enExample) 1990-07-11

Family

ID=30335995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15164983U Granted JPS6059998U (ja) 1983-09-30 1983-09-30 放射性ガスの固定化処分装置

Country Status (1)

Country Link
JP (1) JPS6059998U (enExample)

Also Published As

Publication number Publication date
JPH0225197Y2 (enExample) 1990-07-11

Similar Documents

Publication Publication Date Title
JPS6059998U (ja) 放射性ガスの固定化処分装置
JPS5877043U (ja) プラズマ処理装置
JPS62175559U (enExample)
JPS58172434U (ja) イオン化成膜装置
JPS6180497U (enExample)
JPS58103045U (ja) ドライ現像装置
JPS60843U (ja) イオン源
JPS5861461U (ja) スパツタリング装置
JPS59152555U (ja) イオン源装置
JPS6418568U (enExample)
JPS6119799U (ja) 放射性ガスの固定化処理装置用容器
JPS6220227A (ja) イオン源
JPS61199860U (enExample)
JPS58182140U (ja) 蒸着装置
JPS58121622U (ja) 回転被加工物の電気加工装置
JPS58110059U (ja) 海水電解装置
JPS58172433U (ja) イオン化成膜装置
JPS6130069U (ja) 被膜形成装置
JPS5972655U (ja) エネルギ−分析器
JPS58165899U (ja) 中性粒子入射装置
JPS59187070U (ja) 衝突活性化室
JPS58151666U (ja) プラズマ・エツチング装置
JPS58144750U (ja) イオン打込機のイオン源部
JPS5818966U (ja) スパツタリング装置
JPS6214724U (enExample)