JPH0225197Y2 - - Google Patents
Info
- Publication number
- JPH0225197Y2 JPH0225197Y2 JP1983151649U JP15164983U JPH0225197Y2 JP H0225197 Y2 JPH0225197 Y2 JP H0225197Y2 JP 1983151649 U JP1983151649 U JP 1983151649U JP 15164983 U JP15164983 U JP 15164983U JP H0225197 Y2 JPH0225197 Y2 JP H0225197Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- plate
- ion implantation
- electrode plate
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983151649U JPS6059998U (ja) | 1983-09-30 | 1983-09-30 | 放射性ガスの固定化処分装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983151649U JPS6059998U (ja) | 1983-09-30 | 1983-09-30 | 放射性ガスの固定化処分装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6059998U JPS6059998U (ja) | 1985-04-25 |
| JPH0225197Y2 true JPH0225197Y2 (enExample) | 1990-07-11 |
Family
ID=30335995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983151649U Granted JPS6059998U (ja) | 1983-09-30 | 1983-09-30 | 放射性ガスの固定化処分装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6059998U (enExample) |
-
1983
- 1983-09-30 JP JP1983151649U patent/JPS6059998U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6059998U (ja) | 1985-04-25 |
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