JPS6058238A - 紫外線洗浄方法 - Google Patents

紫外線洗浄方法

Info

Publication number
JPS6058238A
JPS6058238A JP58165149A JP16514983A JPS6058238A JP S6058238 A JPS6058238 A JP S6058238A JP 58165149 A JP58165149 A JP 58165149A JP 16514983 A JP16514983 A JP 16514983A JP S6058238 A JPS6058238 A JP S6058238A
Authority
JP
Japan
Prior art keywords
cleaned
ultraviolet
ultraviolet rays
chamber
vibrators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58165149A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6235811B2 (enrdf_load_stackoverflow
Inventor
Kazuya Tanaka
一也 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP58165149A priority Critical patent/JPS6058238A/ja
Publication of JPS6058238A publication Critical patent/JPS6058238A/ja
Publication of JPS6235811B2 publication Critical patent/JPS6235811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP58165149A 1983-09-09 1983-09-09 紫外線洗浄方法 Granted JPS6058238A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58165149A JPS6058238A (ja) 1983-09-09 1983-09-09 紫外線洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58165149A JPS6058238A (ja) 1983-09-09 1983-09-09 紫外線洗浄方法

Publications (2)

Publication Number Publication Date
JPS6058238A true JPS6058238A (ja) 1985-04-04
JPS6235811B2 JPS6235811B2 (enrdf_load_stackoverflow) 1987-08-04

Family

ID=15806808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58165149A Granted JPS6058238A (ja) 1983-09-09 1983-09-09 紫外線洗浄方法

Country Status (1)

Country Link
JP (1) JPS6058238A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121A (ja) * 1987-06-17 1988-01-05 Wakomu:Kk 蒸気乾燥洗浄装置
JPS63202921A (ja) * 1987-02-18 1988-08-22 Nec Kyushu Ltd 半導体基板洗浄装置
EP0661110A1 (en) * 1993-11-26 1995-07-05 Ushiodenki Kabushiki Kaisha Process for oxidation of an article surface
WO1999044760A1 (en) * 1998-03-03 1999-09-10 Applied Materials, Inc. In situ cleaning of the surface inside a vacuum processing chamber
SG96163A1 (en) * 1995-10-30 2003-05-23 Towa Corp Resin sealing/molding apparatus sealing electronic parts
WO2003076086A1 (de) * 2002-03-12 2003-09-18 Carl Zeiss Smt Ag Verfahren und vorrichtung zur dekontamination optischer oberflächen
CN104259128A (zh) * 2014-08-01 2015-01-07 苏州普京真空技术有限公司 一种晶振片清洗方法
CN112718692A (zh) * 2020-12-09 2021-04-30 四川富乐德科技发展有限公司 一种OLED坩埚部品LiF结晶物的清洗方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109482577A (zh) * 2018-12-19 2019-03-19 烟台和锦电子有限公司 一种石英晶体谐振器管壳除油清洗装置及其使用方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63202921A (ja) * 1987-02-18 1988-08-22 Nec Kyushu Ltd 半導体基板洗浄装置
JPS63121A (ja) * 1987-06-17 1988-01-05 Wakomu:Kk 蒸気乾燥洗浄装置
EP0661110A1 (en) * 1993-11-26 1995-07-05 Ushiodenki Kabushiki Kaisha Process for oxidation of an article surface
SG96163A1 (en) * 1995-10-30 2003-05-23 Towa Corp Resin sealing/molding apparatus sealing electronic parts
WO1999044760A1 (en) * 1998-03-03 1999-09-10 Applied Materials, Inc. In situ cleaning of the surface inside a vacuum processing chamber
US6098637A (en) * 1998-03-03 2000-08-08 Applied Materials, Inc. In situ cleaning of the surface inside a vacuum processing chamber
WO2003076086A1 (de) * 2002-03-12 2003-09-18 Carl Zeiss Smt Ag Verfahren und vorrichtung zur dekontamination optischer oberflächen
CN104259128A (zh) * 2014-08-01 2015-01-07 苏州普京真空技术有限公司 一种晶振片清洗方法
CN112718692A (zh) * 2020-12-09 2021-04-30 四川富乐德科技发展有限公司 一种OLED坩埚部品LiF结晶物的清洗方法

Also Published As

Publication number Publication date
JPS6235811B2 (enrdf_load_stackoverflow) 1987-08-04

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees