JPS6057959A - 薄膜コンデンサ - Google Patents
薄膜コンデンサInfo
- Publication number
- JPS6057959A JPS6057959A JP16527083A JP16527083A JPS6057959A JP S6057959 A JPS6057959 A JP S6057959A JP 16527083 A JP16527083 A JP 16527083A JP 16527083 A JP16527083 A JP 16527083A JP S6057959 A JPS6057959 A JP S6057959A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- ta2o5
- film capacitor
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003990 capacitor Substances 0.000 title claims abstract description 37
- 239000010409 thin film Substances 0.000 title claims abstract description 35
- 238000004544 sputter deposition Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011261 inert gas Substances 0.000 claims description 4
- 230000008685 targeting Effects 0.000 claims description 2
- 229910001362 Ta alloys Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 36
- 238000000034 method Methods 0.000 abstract description 22
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract description 19
- 230000003647 oxidation Effects 0.000 abstract description 11
- 238000007254 oxidation reaction Methods 0.000 abstract description 11
- 239000007789 gas Substances 0.000 abstract description 10
- 238000000151 deposition Methods 0.000 abstract description 3
- -1 oxygen ions Chemical class 0.000 abstract description 2
- 239000002356 single layer Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 10
- 229910052681 coesite Inorganic materials 0.000 abstract 5
- 229910052906 cristobalite Inorganic materials 0.000 abstract 5
- 239000000377 silicon dioxide Substances 0.000 abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 abstract 5
- 229910052682 stishovite Inorganic materials 0.000 abstract 5
- 229910052905 tridymite Inorganic materials 0.000 abstract 5
- 230000008021 deposition Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 230000005684 electric field Effects 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 241000270722 Crocodylidae Species 0.000 description 1
- 229910008649 Tl2O3 Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- LNNWVNGFPYWNQE-GMIGKAJZSA-N desomorphine Chemical compound C1C2=CC=C(O)C3=C2[C@]24CCN(C)[C@H]1[C@@H]2CCC[C@@H]4O3 LNNWVNGFPYWNQE-GMIGKAJZSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- QTQRFJQXXUPYDI-UHFFFAOYSA-N oxo(oxothallanyloxy)thallane Chemical compound O=[Tl]O[Tl]=O QTQRFJQXXUPYDI-UHFFFAOYSA-N 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16527083A JPS6057959A (ja) | 1983-09-09 | 1983-09-09 | 薄膜コンデンサ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16527083A JPS6057959A (ja) | 1983-09-09 | 1983-09-09 | 薄膜コンデンサ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6057959A true JPS6057959A (ja) | 1985-04-03 |
JPS6349385B2 JPS6349385B2 (enrdf_load_stackoverflow) | 1988-10-04 |
Family
ID=15809139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16527083A Granted JPS6057959A (ja) | 1983-09-09 | 1983-09-09 | 薄膜コンデンサ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6057959A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5225286A (en) * | 1991-06-13 | 1993-07-06 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Dielectric film |
-
1983
- 1983-09-09 JP JP16527083A patent/JPS6057959A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5225286A (en) * | 1991-06-13 | 1993-07-06 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Dielectric film |
Also Published As
Publication number | Publication date |
---|---|
JPS6349385B2 (enrdf_load_stackoverflow) | 1988-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4020222A (en) | Thin film circuit | |
US2993266A (en) | Method of making a capacitor employing film-forming metal electrode | |
US5977582A (en) | Capacitor comprising improved TaOx -based dielectric | |
US3878079A (en) | Method of producing thin tantalum films | |
US3258413A (en) | Method for the fabrication of tantalum film resistors | |
KR100815021B1 (ko) | 투명 도전막 부착 기판의 제조방법, 이 제조방법에 의해제조된 투명 도전막 부착 기판, 및 이 기판을 사용한 터치패널 | |
JPS5815933B2 (ja) | アルミニウム−タンタル合金から成る容量性又は抵抗性薄膜受動素子 | |
KR970077672A (ko) | 증대된 유전 특성을 갖는 산화 탄탈 박막 층의 제조 방법 및 그 층을 사용하는 커패시터 | |
JPS6057959A (ja) | 薄膜コンデンサ | |
US3149398A (en) | Silicon dioxide solid capacitor | |
US3808109A (en) | Method of producing pure alpha tantalum films by cathode sputtering | |
KR950004840B1 (ko) | 반도체 장치의 제조 방법 | |
JPS63166236A (ja) | 電子装置 | |
JPH0687490B2 (ja) | 薄膜コンデンサおよびその製造方法 | |
JPH0773738A (ja) | 透明導電膜およびその製造方法 | |
JPS6130018A (ja) | 薄膜コンデンサおよびその製造方法 | |
US6919283B2 (en) | Fabrication of pure and modified Ta2O5 thin film with enhanced properties for microwave communication, dynamic random access memory and integrated electronic applications | |
US3738919A (en) | Technique for adjusting temperature coefficient of resistance of tantalum aluminum alloy films | |
JPS63164A (ja) | 薄膜トランジスタの製造方法 | |
JPH059710A (ja) | 電解コンデンサ用アルミニウム電極の製造方法 | |
US3575833A (en) | Hafnium nitride film resistor | |
JPH03212976A (ja) | 透明導電酸化膜を含むcis構造の処理方法 | |
JP2005181670A (ja) | 極薄ito膜の製造方法 | |
JP2571416Y2 (ja) | タンタルコンデンサ | |
JPH0265111A (ja) | 薄膜キャパシタおよびその製造方法 |