JPS6056068A - スパッタ装置 - Google Patents

スパッタ装置

Info

Publication number
JPS6056068A
JPS6056068A JP16320283A JP16320283A JPS6056068A JP S6056068 A JPS6056068 A JP S6056068A JP 16320283 A JP16320283 A JP 16320283A JP 16320283 A JP16320283 A JP 16320283A JP S6056068 A JPS6056068 A JP S6056068A
Authority
JP
Japan
Prior art keywords
shutter
sputtering
present
opened
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16320283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH041068B2 (OSRAM
Inventor
Yoshihisa Ishida
義久 石田
Munetoshi Kira
吉良　宗利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16320283A priority Critical patent/JPS6056068A/ja
Publication of JPS6056068A publication Critical patent/JPS6056068A/ja
Publication of JPH041068B2 publication Critical patent/JPH041068B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP16320283A 1983-09-07 1983-09-07 スパッタ装置 Granted JPS6056068A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16320283A JPS6056068A (ja) 1983-09-07 1983-09-07 スパッタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16320283A JPS6056068A (ja) 1983-09-07 1983-09-07 スパッタ装置

Publications (2)

Publication Number Publication Date
JPS6056068A true JPS6056068A (ja) 1985-04-01
JPH041068B2 JPH041068B2 (OSRAM) 1992-01-09

Family

ID=15769217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16320283A Granted JPS6056068A (ja) 1983-09-07 1983-09-07 スパッタ装置

Country Status (1)

Country Link
JP (1) JPS6056068A (OSRAM)

Also Published As

Publication number Publication date
JPH041068B2 (OSRAM) 1992-01-09

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