JPS6054932A - Mass-production of quartz glass plate - Google Patents

Mass-production of quartz glass plate

Info

Publication number
JPS6054932A
JPS6054932A JP16074783A JP16074783A JPS6054932A JP S6054932 A JPS6054932 A JP S6054932A JP 16074783 A JP16074783 A JP 16074783A JP 16074783 A JP16074783 A JP 16074783A JP S6054932 A JPS6054932 A JP S6054932A
Authority
JP
Japan
Prior art keywords
quartz glass
thick
dry gel
flat
glass plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16074783A
Other languages
Japanese (ja)
Inventor
Motoyuki Toki
元幸 土岐
Sadao Kanbe
貞男 神戸
Satoru Miyashita
悟 宮下
Tetsuhiko Takeuchi
哲彦 竹内
Haruo Nagafune
長船 晴夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP16074783A priority Critical patent/JPS6054932A/en
Publication of JPS6054932A publication Critical patent/JPS6054932A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To enable the mass-production of quartz glass plate having high flatness, by manufacutring a thick dry gel by the sol-gel process from a metal alkoxide, sintering the dry gel, and slicing the obtained thick quartz glass. CONSTITUTION:Ethyl silicate is hydrolyzed with an aqueous solution of hydrochloric acid, mixed with fine silica powder, dispersed uniformly, and adjusted to 4-6pH. The obtained sol is poured into a deep vessel having flat bottom to a sufficient depth, and gelatinized and dried under free shrinkage to obtain a thick dry gel. The thick dry gel is sintered to obtain a thick quartz glass plate, which is sliced to a plurality of flat quartz glass plates having the required thickness to obtain a plurality of flat quartz glass plates at the same time. Since the dry gel prepared by this process has large thickness, it is resistant to warpage in drying, and gives the thick quartz glass plate having high flatness by drying. Accordingly, the process has high yield and is suitable for mass-production, and the flatness of the plate can be improved further by slicing.

Description

【発明の詳細な説明】 本発明は、すくなくとも金属アルコキシドを原料とする
ゾル−ゲル法による石英ガラスの製造法に係わり、更に
詳しくは、平面性の良い平板状の石英ガラスの量産方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing quartz glass by a sol-gel method using at least a metal alkoxide as a raw material, and more particularly to a method for mass-producing flat quartz glass with good flatness.

石英ガラスは、IC製造工程中でるつぼやボード、拡散
炉等に使用されるようになり、その有用性が認めらり、
Fに水酸基の少ないものや、光学的均一性の作いものが
開発さfまたことに1って、各種の光学的用途に使用さ
れるよ’l (Cなった。例えば、光通信用の石英ガラ
スファイバー−宅・、TO用の石英ガラスマスクなどけ
注目さねて(ハる。ナに1薄膜トランジスタ(TPT)
の基板としても注目されておね、石英ガラスマスクやT
PTの法板などのように平板状石英ガラスの用途も広が
って^でいる。
Quartz glass began to be used in crucibles, boards, diffusion furnaces, etc. during the IC manufacturing process, and its usefulness was recognized.
Products with fewer hydroxyl groups in F and those with optical uniformity have been developed and are used in various optical applications. Quartz glass fiber - Don't pay attention to quartz glass masks for home use, TO use (Haru.Ni 1 Thin Film Transistor (TPT)
It is also attracting attention as a substrate for quartz glass masks and T
Applications of flat quartz glass, such as PT law plates, are also expanding.

平板状石英ガラスは一般に2種類の方法で製造されてい
る。その一つけ、天然石英を溶融[7、または合成石英
を溶融11、ロッドを作成する方法でこれは、そのロッ
ドを輪切りする方法である。また仲方け、口・・ド状で
はなく、中空の円筒管を作成し7、これを切ね開いて平
版状にする方法である。
Flat fused silica glass is generally manufactured in two ways. One method is to create a rod by melting natural quartz [7] or by melting synthetic quartz [11], and this method involves cutting the rod into rounds. Also, instead of having a do-shaped shape, a hollow cylindrical tube is created7, which is then cut open to make it into a planar shape.

いずれの方法においても作成温度が高(、原料が高価で
あるということから一般に市販さねでいる平板状石英ガ
ラスは高価である。こういう石英ガラスの欠点から、形
近、金属アルコキシドを用いゾル−ゲル法の手法を用い
て石英ガラスを安価に製造しよりという試みがなされて
いる。一般に、ゾル−ゲル法により石英ガラスを作成す
る方法は次の3種類に分けられる。
In either method, the production temperature is high (and the raw materials are expensive, so the flat quartz glass that is commercially available is expensive. Attempts have been made to produce quartz glass at a lower cost using the gel method.In general, methods for producing quartz glass using the sol-gel method can be divided into the following three types.

一つけ金属アルコキシドを酸士たけアルカリ触媒下で加
水分解し、ゾルとしてゲル化させ乾燥しドライゲルとし
、焼結して石英ガラスとするものである。もつ一つけ、
金属アルコキシドは原料としないで、微粉末シリカを原
料とするものである。
A metal alkoxide is hydrolyzed under an alkaline acidic acid catalyst, gelled as a sol, dried to form a dry gel, and sintered to form quartz glass. One offal,
Metal alkoxide is not used as a raw material, but fine powder silica is used as a raw material.

これは、微粉末シリカを水に肺気、ヒドロシルとした後
放置しゲル化させ、ドライゲルとし、ドライゲルを焼結
1.て石英ガラスとするものである。
This is done by adding fine powder silica to water, making it hydrosil, leaving it to gel, making it a dry gel, and sintering the dry gel.1. It is made of quartz glass.

また、もつ一つけ、金属アルコキシドと微粉末シリカを
原料とするものである。これは、金属アルコキシドを加
水分解したゾル溶液に微粉末シリカを添加L、更にPH
を中性近くになるよう調整し2放置しゲル化させ、乾燥
してドライゲルとし、続いて焼結し石英ガラスとするも
のである。これらの方法で、塊状の石英ガラスの製造法
として最も優しテいるのけ、最後に記した金属アルコキ
シド及び微粉末シリカを原料とする方法である。従うて
、本発明の費明及γY実施例は特にこの方法に基いた内
容で書くが、仲の2法においても同様の効果が有ること
は明らかである。
Moreover, it is made from metal alkoxide and finely powdered silica. This involves adding finely powdered silica to a sol solution obtained by hydrolyzing a metal alkoxide, and then adjusting the pH.
The mixture is adjusted to near neutrality, left to gel, dried to form a dry gel, and then sintered to form quartz glass. Of these methods, the most gentle method for producing bulk quartz glass is the method mentioned last, which uses metal alkoxide and finely powdered silica as raw materials. Therefore, although the cost and γY embodiments of the present invention will be written based on this method, it is clear that the two middle methods have similar effects.

以上紀り、たように1一般に平板状石英ガラスの用途は
多いのであるが、高価であるという欠点がある。
As mentioned above, flat quartz glass generally has many uses, but it has the drawback of being expensive.

そこで、本発明の目的は、平板状石英ガラスを安価に製
造す石量産方法を提供することである。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a stone mass production method for manufacturing flat quartz glass at low cost.

その方法として次のような方法を考案17た。すなわち
、ケイ酸エチル塩酸水を加え加水分解し、Aerosi
l (Deggwssa社)やaa h−o−sir 
(0aly−o−を社)等のホワイトカーボンである微
粉末シリカを加えよく均一に分散1また稜P Hを4〜
乙に調整する。
As a method for doing so, we devised the following method17. That is, ethyl silicate is hydrolyzed by adding hydrochloric acid water, and Aerosi
l (Deggwssa) and aa ho-sir
Add finely powdered silica, which is a white carbon such as 0aly-o-wo Co., Ltd., and disperse it well and uniformly.
Adjust to Party B.

このようにして得られるゾルを、底が平坦で深さの深い
容器に厚みが厚くなるよう肺気、ゲル化させ、収縮乾燥
させて厚みの厚い板状ドライゲルを得ることができる。
The sol obtained in this way is placed in a deep container with a flat bottom to form a thick gel, and is then shrunk and dried to obtain a thick plate-like dry gel.

この厚いドライゲルを焼結し厚い板状の石英ガラスとl
、て、必要な属人の平枦状石英ガラスにスライスするこ
とで、一つの塊状石英ガラスから複数枚の平板状の石英
ガラス板が得られる。従って、量産的に平坦な石英ガラ
ス板を製造する場合には非常に有効な手段となる。
This thick dry gel is sintered to form a thick plate of quartz glass.
A plurality of flat quartz glass plates can be obtained from one block of quartz glass by slicing it into flat quartz glass of the required size. Therefore, it is a very effective means for manufacturing flat quartz glass plates in mass production.

また、一枚の必要な厚みの石英板を一枚の斜状石英ガラ
スからスライスなしで作製する場合、目的の石英板の厚
みは薄い場合が多いので、ドライゲルの厚みも薄くなる
。薄いドライゲル(d乾燥時の不均一さや、種々の理由
からそる場合が多いので、そったttのドライゲルを焼
結すると、そった石英ガラスになり平坦な平板状石英ガ
ラスとしにくい。これに対して、本発明の方法のドライ
ゲルは厚さが厚いので、乾燥時に非常にそりに〈〈また
、焼結して得られる厚い石英ガラスもそっていなくて平
坦である。従って、平板状の石英ガラスを作成する場合
は厚さの厚いドライゲルを作成した方が歩留り良く、ス
ライスすることで更に平面性も良くなり量産にむいてい
る。
Further, when a single quartz plate of the required thickness is produced from a single sheet of oblique quartz glass without slicing, the thickness of the target quartz plate is often thin, so the thickness of the dry gel is also thin. Thin dry gel (d) is often warped due to unevenness during drying or for various reasons, so if tt dry gel that has been warped is sintered, it becomes warped quartz glass, which is difficult to make into a flat plate-shaped quartz glass. Since the dry gel obtained by the method of the present invention is thick, it does not warp very much during drying.In addition, the thick quartz glass obtained by sintering is flat without warping. When manufacturing, it is better to create a thicker dry gel for better yields, and slicing it further improves flatness, making it suitable for mass production.

以下実施例に従い本発明の詳細な説明する。The present invention will be described in detail below with reference to Examples.

実施例1 精製した市販のケイ酸エチル624 Q (3モル)に
0.02規定の塩酸水溶液を540 mt加え、激しく
攪 5− 拌し加水分解する。この溶液に水を30 O???!加
え、更に微粉末シリカ(Aernsil 0X50 :
アエロジル社の表面積50 m2//(7の微粉末シリ
カの商品名)を、225g攪拌下加え、超音波振動等の
分散を良くする操作を行い均一性の良いゾルとl〜た。
Example 1 540 mt of a 0.02N hydrochloric acid aqueous solution was added to purified commercially available ethyl silicate 624Q (3 mol), and the mixture was vigorously stirred for hydrolysis. Add water to this solution at 30 O? ? ? ! In addition, fine powder silica (Aernsil 0X50:
225 g of Aerosil Co., Ltd.'s surface area 50 m2// (trade name of fine powder silica No. 7) was added under stirring, and operations such as ultrasonic vibration to improve dispersion were performed to obtain a sol with good uniformity.

これを。this.

コミ等を除(ためろ過11.た。このゾルに01規定の
アンモニア水を滴下しPMを50にH周整した。
The sol was filtered to remove dust etc. 01N ammonia water was added dropwise to this sol to adjust the PM to 50H.

このゾルをポリプロピレン製の底の平坦で、深い箱型の
容器(3oαx 2 affix 2 acm )に、
深さが6cmになるよう仕込んだ、密閉して室温に放置
させると30分後ゲル化し、1!に一昼夜放置し7た。
This sol was placed in a flat, deep box-shaped container made of polypropylene (3oαx 2 affix 2 acm ).
I filled it to a depth of 6cm, sealed it, and left it at room temperature, and it gelled after 30 minutes, 1! I left it for a day and night.

フタを溶媒が留出できるように穴をあけたものに替え5
0〜70℃に放置して乾燥させ、70後に室温に放置し
ても割れない安定な厚板状ドライゲル(21cInx 
14cy+X 4cm )が得られ友。この厚板状ドラ
イゲルを焼結炉中で、1200℃までゆっくり昇温し1
200℃で1.5時間放置し焼結すると透明な厚板状石
英ガラス(15湿X 10crnx 2.4cm )と
なった。
Replace the lid with one that has holes in it so that the solvent can distill out.5
A stable thick dry gel that does not crack even if left at room temperature after 70 days (21cInx
14cy+X 4cm) was obtained. This thick dry gel was heated slowly to 1200℃ in a sintering furnace.
After being left at 200° C. for 1.5 hours and sintered, a transparent plate-like quartz glass (15 cm x 10 crn x 2.4 cm) was obtained.

この厚板状石英ガラスをスライスして、15crn×1
0硼X0.1菌の板状石英ガラスが8枚とれた。た 6
− だし、スライスした外周刃の切りしろけ0.2 crn
であったので、その切りl、ろの分だけ掃失している。
This thick plate-shaped quartz glass was sliced into 15crn×1
Eight sheets of plate-shaped quartz glass containing 0 cells and 0.1 bacteria were obtained. 6
- Cutting allowance of the peripheral blade for slicing dashi stock 0.2 crn
Therefore, only the amount of the cut l and ro was wiped out.

本発明の方法は、この実施例のよらに原料を金属アルコ
キシド及び微粉末シリカを用いるゾル−ゲル法に限られ
るものではないことは明らかである。
It is clear that the method of the present invention is not limited to the sol-gel method using metal alkoxide and finely powdered silica as raw materials as in this example.

本発明の平坦性の良い平板状石英ガラスの隈産法け、従
来法によるものより安価に製造できるので、TPTの基
板や工0マスク等の種々の分野に大きく貢献すると思わ
れる。
Since the flat quartz glass of the present invention can be produced at a lower cost than the conventional method, it is expected to greatly contribute to various fields such as TPT substrates and zero-process masks.

以 上 出願人 株伏会社 諏訪精工舎 代理人 弁理士 最上 務  7− 177−that's all Applicant: Suwa Seikosha Co., Ltd. Agent Patent Attorney Mogami 7- 177-

Claims (1)

【特許請求の範囲】[Claims] すくなくとも金属アルコキシドを原料とするゾル−ゲル
法により、板状石英ガラスを低温で合成する方法におい
て、厚1八平板状ドライゲルを作成し、これを焼結して
厚い石英ガラスとし、スライスして−9に多数枚の平板
状石英ガラスを製造することを特徴とする板状石英ガラ
スの量産方法。
In a method of synthesizing plate-shaped quartz glass at low temperatures by a sol-gel method using at least a metal alkoxide as a raw material, a plate-shaped dry gel of 18 mm in thickness is prepared, this is sintered to form thick quartz glass, and sliced. 9. A method for mass production of plate-shaped quartz glass, characterized by manufacturing a large number of plates of quartz glass.
JP16074783A 1983-09-01 1983-09-01 Mass-production of quartz glass plate Pending JPS6054932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16074783A JPS6054932A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16074783A JPS6054932A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Publications (1)

Publication Number Publication Date
JPS6054932A true JPS6054932A (en) 1985-03-29

Family

ID=15721579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16074783A Pending JPS6054932A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Country Status (1)

Country Link
JP (1) JPS6054932A (en)

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