JPS60131834A - Manufacture of quartz glass - Google Patents

Manufacture of quartz glass

Info

Publication number
JPS60131834A
JPS60131834A JP14169984A JP14169984A JPS60131834A JP S60131834 A JPS60131834 A JP S60131834A JP 14169984 A JP14169984 A JP 14169984A JP 14169984 A JP14169984 A JP 14169984A JP S60131834 A JPS60131834 A JP S60131834A
Authority
JP
Japan
Prior art keywords
quartz glass
gel
sol
dry gel
dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14169984A
Other languages
Japanese (ja)
Other versions
JPH0114177B2 (en
Inventor
Motoyuki Toki
元幸 土岐
Sadao Kanbe
貞男 神戸
Satoru Miyashita
悟 宮下
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP14169984A priority Critical patent/JPS60131834A/en
Publication of JPS60131834A publication Critical patent/JPS60131834A/en
Publication of JPH0114177B2 publication Critical patent/JPH0114177B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Abstract

PURPOSE:To manufacture large quartz glass by a sol-gel method by using a hydrophobic material as the material of a sol holding container in gelling and dry gel forming stages so that gel slips easily. CONSTITUTION:Hyperfine silica powder is added to sol prepd. by hydrolyzing a metallic alkoxide such as silicon ethoxide by 0.2-5mol per 1mol alkoxide. The sol contg. the silica powder is made to gel and dried to form dry gel, and quartz glass is manufactured by sintering the dry gel. At this time, a hydrophobic material such as PP or PVC is used as the material of a sol holding container in the gelling and dry gel forming stages. The affinity between the resulting gel and the container is weak, and the gel slips easily, so quartz glass plates of a large area or quartz glass blocks of a large volume can be manufactured in a high yield.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は、金属アルコキシ、ドを原料とするゾル−ゲル
法において、ゾル溶液に超微粉末71ツカを添加するこ
とにより、大きに石英ガラスを製造する方法に関する。
[Detailed Description of the Invention] [Technical Field] The present invention is a method for producing quartz glass on a large scale by adding 71 particles of ultrafine powder to a sol solution in a sol-gel method using a metal alkoxy compound as a raw material. Regarding the method.

〔従来技術〕[Prior art]

石英ガラスは、高純度のものが製造できるようになった
ため、最近では半導体の製造に使用するルツボ、ボード
おるいは拡散炉の炉芯管に用いられるようになり、その
有用性が認められている〇また、理化学用のビーカー醇
のガラス器具や光学測定用のセルなどにも用いられ、さ
らには水酸基の少ないものや光学的に均一のものが開発
されたことによって、各種の光学的用途にも使用され、
特に光通信用の石英ガラスファイバーやTPT(薄膜ト
ランジスタ)の基板への応用が最近注目されるようにな
り、今後ますます需要が拡大するものと期待されている
〇 現在、石英ガラスは主に次の三種類の方法で製造されて
いる。
Since quartz glass can now be manufactured in high purity, it has recently been used for crucibles, boards, and furnace core tubes in diffusion furnaces used in the manufacture of semiconductors, and its usefulness has been recognized. Yes, it is also used in beaker glassware for physics and chemistry and cells for optical measurement, and with the development of products with fewer hydroxyl groups and optically uniform products, it has become suitable for various optical applications. is also used,
In particular, the application of silica glass fibers for optical communications and TPT (thin film transistor) substrates has recently attracted attention, and demand is expected to increase further in the future.Currently, silica glass is mainly used for the following It is manufactured in three ways.

1)天然水晶を洗浄し、これを溶融する方法02)高純
度のS i CJ4あるいは5IR4を原料として51
02を作る方法。
1) Method of cleaning natural crystal and melting it 02) Using high purity Si CJ4 or 5IR4 as raw material 51
How to make 02.

3)天然珪砂を溶融する方法。3) Method of melting natural silica sand.

これらの方法は、いずれも高温での処理が必要であるこ
とに加えて、石英ガラス特有の製造工程の難しさから、
得られる石英ガラスが非常に高価なものとなってしまう
という欠点を有している。
All of these methods require processing at high temperatures, and the manufacturing process is difficult, which is unique to quartz glass.
The drawback is that the resulting quartz glass is very expensive.

このようなことから、石英ガラスを安価に製造する方法
の実現が望まれており、その方法として金属アルコキシ
ドを原料とするゾル−ゲル法により石英ガラスを合成す
る方法と、超微粉末シリカを原料とするゾル−ゲル法に
より石英ガラスを合成する方法の二つの方法が、これま
でに試みられている。
For this reason, it is desired to realize a method for producing quartz glass at low cost, and two methods are available: a method of synthesizing quartz glass by a sol-gel method using metal alkoxide as a raw material, and a method of synthesizing quartz glass using ultrafine powdered silica as a raw material. Two methods have been tried so far: a method of synthesizing quartz glass by a sol-gel method.

金属アルコキシドを原料とするゾル−ゲル法により、石
英ガラスを安価に製造しようという試みは、封止、守谷
らによってなされている(ジャーナル・オプ・ノンクリ
スタリン・リリツズ(Journalof Non−C
rystalline 5olids ) 。
Attempts to manufacture quartz glass at low cost by the sol-gel method using metal alkoxides as raw materials have been made by Moriya et al. (Journal of Non-Crystalline Litties)
rystalline 5olids).

P191〜201.37.1980参照)0この方法の
概略は、シリコンアルコキシド、水。
(Refer to P191-201.37.1980) 0 The outline of this method is: silicon alkoxide, water.

アルコールおよび塩酸やアンモニア等の適当な触媒を混
合踵加水分解後ゲル化し、さらに収縮乾燥させてドライ
ゲルとした後、このドライゲルを加熱処理して無孔化し
、石英ガラスとするものである。
After hydrolyzing alcohol and a suitable catalyst such as hydrochloric acid or ammonia, the gel is formed into a gel, and then shrink-dried to form a dry gel.The dry gel is then heat-treated to make it non-porous to form quartz glass.

この方法は、原料のアルコキシドの精製が容易なことか
ら、純度の高い石英ガラスが得られるということと、熱
処理温度が低いために製造コストが安価であるbいう特
徴を有している反面、ゲル化後収縮乾燥させてドライゲ
ルとする工程中に割れが発生しやすいということと、さ
らに、ドライゲルを加熱処理して石英ガラスとする工程
においても割れやすいということから、結局実用上充分
な大きさの石英ガラスを作成できないという欠点を有し
ている。文献でみるかぎり、現状では桁上、9谷らの研
究によって得られた28龍φの円板状石英ガラスが最大
のようである。
This method has the characteristics that high purity quartz glass can be obtained because the raw material alkoxide is easy to purify, and the manufacturing cost is low because the heat treatment temperature is low. Because cracks tend to occur during the process of shrink-drying and drying to form a dry gel, and also during the process of heat-treating the dry gel to form quartz glass, we ended up finding a size that was large enough for practical use. It has the disadvantage that quartz glass cannot be made. As far as I can see in the literature, it seems that at present the largest disc-shaped quartz glass with a diameter of 28 dragons obtained by the research of Kutani et al.

次に、超微粉末シリカを原料とするゾル−ゲル法により
、石英ガラスを製造しようという試みはイー・エム・ラ
ビノビッヒ(E、M、Ravinovich )らによ
って試みられている(ジャーナル・オプ・ノンクリスタ
リン・ソリツズ、P455〜459゜47.1982参
照)0 この方法の概略は、超微粉末シリカ(キャポシル(Ca
b−o−8it ) 、キャポット社の商品名)を水に
加、えてヒドロシルとした後ゲル化し、さらに収縮乾燥
させてドライゲルとした後、このドライゲルを焼結して
石英ガラスとするものである。
Next, E.M. Ravinovich et al. attempted to manufacture quartz glass by the sol-gel method using ultrafine powdered silica as a raw material (Journal of Noncrystalline Materials).・Solidz, P455-459゜47.1982) 0 The outline of this method is to use ultrafine powdered silica
b-o-8it), Capot Co.'s trade name) is added to water to form hydrosil, which is then gelled, further shrink-dried to form a dry gel, and this dry gel is sintered to form quartz glass. .

この方法は、前述の金属アルコキシドを原料とする方法
に比べて、ドライゲル作成工程および焼結工程中に割れ
やクラックが発生しに<<、前述の方法よりは大きな石
英ガラスを製造しやすいという特徴を有している。しか
し、前述の文献によれば、実際に得られた石英ガラスは
、95X15x5mm(4%のB2O3を含む)程度で
、まだ充分な大きさと言えず、またこの程度が大きさの
限界のように思われる。さらにこの方法は、気泡がゾル
中に取り込まれやすいため、結果として石英ガラス中に
無数の気泡が存在することになり、光学的な均質性が得
られないと−う欠点を有しており、光学的特性を要求さ
れる分野への応用は期待できない〇 以上述べたように、これまでに試みられたゾル−ゲル法
による石英ガラスの製造方法では、いずれも充分な大き
さ、充分な品質を有する石英ガラスが得られておらず、
各種の分腎で実用化される状況にはなっていない。
Compared to the method using metal alkoxide as a raw material, this method is less likely to cause cracks during the dry gel creation process and sintering process, and it is easier to manufacture larger quartz glass than the method described above. have. However, according to the above-mentioned literature, the size of the quartz glass actually obtained is about 95 x 15 x 5 mm (including 4% B2O3), which is still not large enough, and this seems to be the limit of the size. It will be done. Furthermore, this method has the disadvantage that air bubbles are easily incorporated into the sol, resulting in the presence of countless air bubbles in the quartz glass, making it impossible to obtain optical homogeneity. Cannot be expected to be applied to fields that require optical properties. As mentioned above, all of the sol-gel methods that have been tried to produce quartz glass so far have failed to produce quartz glass of sufficient size and quality. quartz glass with
It has not yet been put into practical use in various kidney divisions.

〔目 的〕〔the purpose〕

本発明の目的は大面積の石英ガラス板あるいは大きな体
積の石英ガラス塊を製造できる方法の提供および、製造
上の歩留りを向上させることにある。
An object of the present invention is to provide a method for producing a large-area quartz glass plate or a large-volume quartz glass block, and to improve the production yield.

〔概 要〕〔overview〕

本発明の石英ガラスの製造方法は、金属アルコキシドを
加水分解してなるゾル溶液に超微粉末シリカを前記金属
アルコキシド1モルに対して0.2〜5モルの割合で添
加する工程、前記超微粉末シリカを添加してなるゾル溶
液をゲル化した後、乾燥させてドライゲルを作成する工
程および前記ドライゲルを焼結して石英ガラスとする工
程からなる石英ガラスの製造□方法において、前記ゲル
化およびドライゲル作成工程における前記ゾル溶液を収
容する容器か疎水性の材質であることを特徴とする。
The method for producing quartz glass of the present invention includes a step of adding ultrafine powdered silica to a sol solution obtained by hydrolyzing a metal alkoxide at a ratio of 0.2 to 5 moles per mole of the metal alkoxide; A method for producing quartz glass comprising the steps of gelling a sol solution containing powdered silica and then drying it to create a dry gel, and sintering the dry gel to obtain quartz glass. The container for accommodating the sol solution in the dry gel production process is characterized by being made of a hydrophobic material.

疎水性の材質としては、ポリプロピレン、ポリフッ化エ
チレン、ポリ環化ビニル、ポリエチlzン、ポリスチレ
ン咎の有機ポリマーが吸過である。
Examples of hydrophobic materials include organic polymers such as polypropylene, polyfluoroethylene, polycyclized vinyl, polyethylene, and polystyrene.

また、金属、ガラス等の無機材料の表面に前記有機ポリ
マーを付着さぜたものでも良い◇〔実施例〕 以下、本発明について実施例に基づき詳細に説明する。
Alternatively, the organic polymer may be attached to the surface of an inorganic material such as metal or glass. [Examples] The present invention will be described in detail below based on Examples.

実施例1゜ 精製した市販のシリコンエトキシド208?(1モル)
に0.01規定の塩酸を280 m/加え、激しく攪拌
し加水分解する。この溶液に超微粉末シリカ(Cab−
o−s i 1 :Cabot社の表面f、fi 20
.0nr/fの超微粉末シリカの商品名)を72 f 
(1,22モル)攪拌下加えた。このゾルに0.1規定
のアンモニア水を滴下し、P Rを4.5に調整した。
Example 1゜Purified commercially available silicon ethoxide 208? (1 mole)
Add 280 m/m of 0.01 N hydrochloric acid to the mixture and stir vigorously to hydrolyze. Add ultrafine powder silica (Cab-
o-s i 1: Cabot surface f, fi 20
.. 72 f
(1.22 mol) was added under stirring. 0.1N aqueous ammonia was added dropwise to this sol to adjust PR to 4.5.

このゾルをポリプロピレン製の箱型容器(幅30 cm
 X30α×高さ10σ)に高さが1mになるように仕
込んだ。密閉して20℃で放置すると30分後ゲル化し
、更に一夜放置した。
This sol was poured into a polypropylene box-shaped container (width 30 cm).
x 30α x height 10σ) so that the height was 1 m. When the mixture was sealed and left at 20°C, it gelled after 30 minutes, and was further left overnight.

次に、穴の面積がフタの面積に対して2%(開口率)の
7タに替え、20℃から昇温スピード2℃/hrで60
℃に加熱した。7日間この温度で乾燥させると、室温に
放置しても割れない安定なドライゲル(19αX 19
 cm X 0.6 cm )が得られた。同様の乾燥
をすると、2個が割れ、歩留り90チで18個のドライ
グルが得られた。
Next, change the hole area to 7T, where the area of the lid is 2% (opening ratio), and heat up from 20℃ to 60℃ at a heating rate of 2℃/hr.
heated to ℃. When dried at this temperature for 7 days, a stable dry gel (19αX 19
cm x 0.6 cm) was obtained. When drying was carried out in the same manner, two pieces were broken and 18 pieces of dry glue were obtained with a yield of 90 pieces.

18個のドライゲルを焼結炉に入れ、室温から昇温スピ
ード60℃/ h rで200℃まで加熱し、200℃
で1時間保持して脱吸着水処理の工程を行なった。つづ
いて昇温スピード180C/hrで950℃まで加熱し
、950Cで18時間保持して脱炭素・脱塩化アンモニ
ウムの工程を行なった。〕さらに昇温スピード180℃
/hrで1200℃まで加熱し、この温度で1゜5時間
保持すると無孔化し、透明な石英ガラス(15cmX 
15cmX0.5cIn)となった。この焼結過程では
、どのドライゲルも割れなくて、歩留り100%で18
個の石英ガラスが得られた。得られた石英ガラスの近赤
外吸収スペクトルを測定すると、市販の石英ガラスと同
様のピークがあられれ、多少ピークの高さには差はあら
れれたが、はt!一致していると甘える。また、比重は
2.2、ビッカース硬度は792にり/−熱膨張係数5
.4X10 であり、これも市販品と#1ぼ一致した。
18 dry gels were placed in a sintering furnace and heated from room temperature to 200°C at a heating rate of 60°C/hr.
The sample was held for 1 hour to perform a desorption water treatment process. Subsequently, the mixture was heated to 950° C. at a temperature increase rate of 180 C/hr, and held at 950 C for 18 hours to carry out decarbonization and dechlorination of ammonium. ] Furthermore, the temperature increase speed is 180℃
/hr to 1200℃ and held at this temperature for 1.5 hours, it becomes non-porous and becomes transparent quartz glass (15cm
15 cm x 0.5 cIn). In this sintering process, none of the dry gels cracked and the yield was 100%.
pieces of quartz glass were obtained. When the near-infrared absorption spectrum of the obtained quartz glass was measured, there were peaks similar to those of commercially available quartz glass, and although there was a slight difference in peak height, it was t! It's sweet when they match. Also, the specific gravity is 2.2 and the Vickers hardness is 792/-coefficient of thermal expansion 5
.. 4X10, which also matched #1 with the commercially available product.

したがって本発明の製造方法による石英ガラスは、市販
の石英ガラスと同τ物性であると言える。
Therefore, it can be said that the quartz glass manufactured by the manufacturing method of the present invention has the same τ physical properties as commercially available quartz glass.

実施例Z 実施例1と同様に調整したゾルをポリフッ化エチレン製
の箱型容器(幅30 ctnX S 0 CrnX高さ
10譚)に高さが13になるように仕込んだ。密閉して
20℃で放置すると50分後ゲル化し、更に一夜放置し
た。
Example Z A sol prepared in the same manner as in Example 1 was placed in a box-shaped container made of polyfluoroethylene (width: 30 ctn x S 0 Crn x height: 10 ct) so that its height was 13 ct. When the mixture was sealed and left at 20°C, it gelled after 50 minutes, and was further left overnight.

次に穴の面iが7タの面積に対して2チ(開口率)のフ
タに替え、20℃から昇温スピード2℃/hrで60℃
に加熱した。7日間この温度で乾燥させると、室温に放
置しても割れない安定なドライゲル(19crnx 1
9crnx O,6cm )が得られた、同様の処理を
同様の容器20個に仕込み、同様の乾燥をすると、1個
が割れ、歩留り?5係で19個のドライゲルが得られた
Next, change to a lid with a hole surface i of 2mm (opening ratio) for an area of 7mm, and heat up from 20°C to 60°C at a heating rate of 2°C/hr.
heated to. When dried at this temperature for 7 days, a stable dry gel (19crnx 1
When 20 similar containers were filled with the same treatment and dried in the same manner, one cracked and the yield decreased. Nineteen dry gels were obtained in 5 batches.

19個のドライゲルを焼結炉に入れ、実施例1と同条の
焼結プログジムで加熱すると透明な石英ガラス(15c
mX15tynX 0.5rn1)と、fつだ。この焼
結過程では割れなくて、歩留91QQ(bで19・個の
石英ガラスが得られた。
When 19 pieces of dry gel were placed in a sintering furnace and heated using the same sintering program as in Example 1, transparent quartz glass (15c
mX15tynX 0.5rn1) and f. There was no cracking in this sintering process, and a yield of 91QQ (19 pieces of quartz glass was obtained at b).

実施例3゜ 実施例1と同様に調整したゾルをポリ塩化ビニル製の箱
型容器(幅50zX30+zx高さ10m)に高さが1
crnになるように仕込んだ。密閉し°C20℃で放置
すると50分後ゲル化し、更に一夜放置した。
Example 3 A sol prepared in the same manner as in Example 1 was placed in a polyvinyl chloride box-shaped container (width: 50 z x 30 m x height: 10 m) with a height of 1 m.
I prepared it to become crn. When the mixture was sealed and left at 20°C, it turned into a gel after 50 minutes, and was further left overnight.

次に穴の面積がフタの面積に対して2裂(開口率)の7
タに替え、2Q℃から昇温スピード2℃/hr で60
℃に加熱した。7日間この温度で乾燥させると、室温に
放置しCも割れない安定なドライゲル(19cmX 1
9cmX 0.6on )が得られた。
Next, the area of the hole is 2 times the area of the lid (opening ratio), which is 7.
60 at a temperature increase rate of 2°C/hr from 2Q°C.
heated to ℃. If dried at this temperature for 7 days, a stable dry gel (19 cm x 1
9 cm x 0.6 on) was obtained.

同様の処理を同様の容器2D個に仕込み、同様の乾燥を
すると5袖が割れ、歩留り75チで1Saのドライゲル
が得られた。
When 2D similar containers were subjected to the same treatment and dried in the same manner, 5 sleeves were cracked and a dry gel of 1Sa was obtained with a yield of 75cm.

15個のドライゲルを焼結炉に入れ、実施例1と同様の
焼結プログラムで加熱すると透明な石英ガラス(15t
YnX 15crnX 0..5an )となった0こ
の焼結過程では割れなくて、歩留り100%で15個の
石英ガラスが得られた。
When 15 pieces of dry gel were placed in a sintering furnace and heated with the same sintering program as in Example 1, transparent quartz glass (15t
YnX 15crnX 0. .. During this sintering process, no cracking occurred, and 15 pieces of quartz glass were obtained with a yield of 100%.

実施例4゜ 実施例1と同様に調整したゾルをポリエチレン製の箱型
容器(幅30 cm X 50cn1X高さ10crn
)に高さが1mになるように仕込んだ。密閉して20℃
で放置すると30分後ゲル化し、史に一夜放置した。
Example 4 A sol prepared in the same manner as in Example 1 was placed in a polyethylene box-shaped container (width 30 cm x 50 cm 1 x height 10 cm).
) to a height of 1 m. Seal tightly at 20℃
When left to stand for 30 minutes, it turned into a gel, and was left to stand overnight.

次に穴の面積がフタの面積に対して2チ(開口率)のフ
タに替え、20℃から昇温スピード2℃/hrで60℃
に加熱した。7日間この温度で乾燥させると、室温に放
置しても割れない安定なドライゲル(196nX 19
crnXO,6cm)が得られた。
Next, change to a lid whose hole area is 2 inches (opening ratio) to the area of the lid, and raise the temperature from 20°C to 60°C at a heating rate of 2°C/hr.
heated to. If dried at this temperature for 7 days, a stable dry gel (196nX 19
crnXO, 6 cm) was obtained.

同様の処理を同様の容器20個に仕込み、同様の乾燥を
すると3個が割れ、歩留985%で17個のドライゲル
が得られた。
When 20 similar containers were subjected to the same treatment and dried in the same manner, 3 containers were cracked and 17 dry gels were obtained with a yield of 985%.

17個のドライゲルを焼結炉に入れ、実施例1と同様の
焼結プログラムで加熱すると透明な石英ガラス(15c
rnX’15crnX D、 5m )となったOこの
焼結過程では割れなくて、歩留り100%÷17個の石
英ガラスが得られた0 実施例5゜ 実施例1と同様に調整したゾルをポリスチレン製の箱型
容器(幅30crnX 30 cm X高さ10crn
)に高さが1crnになるように仕込んだ。密閉して2
0℃で放置すると30分後ゲル化し、更に一夜放置した
When 17 pieces of dry gel were placed in a sintering furnace and heated with the same sintering program as in Example 1, transparent quartz glass (15c
rnX' 15 crn Box-shaped container (width 30 crn x 30 cm x height 10 crn
) so that the height was 1 crn. Close it tightly 2
When left at 0°C, it gelled after 30 minutes, and was further left overnight.

次に穴の面積がフタの面積に対して2%(開口率)のフ
タに替え、20℃から昇温スピード2℃/hr で60
℃に加熱した。7日間この温度で乾燥させると、室温に
放置しても割れない安定なドライゲル(19mx19α
X0.6α)が得られた。
Next, change to a lid whose hole area is 2% of the lid area (opening ratio), and increase the temperature from 20°C to 60°C at a heating rate of 2°C/hr.
heated to ℃. Drying at this temperature for 7 days will result in a stable dry gel (19m x 19α) that will not crack even if left at room temperature.
X0.6α) was obtained.

同様の処理を同様の容器20個に仕込み、同様の乾燥を
すると8個が割れ、歩留り60チで12個のドライゲル
が得られたO 12個のドライゲルを焼結炉に入れ、実施例1と同様の
焼結プログラムで加熱すると透明な石英ガラス(15z
X 15rrnX o、 5m)となった。この焼結過
程では割れなくて、歩留り100チで12個の石英ガラ
スが得られた。
When 20 similar containers were subjected to the same treatment and dried in the same manner, 8 of them cracked and 12 dry gels were obtained with a yield of 60 cm. When heated with a similar sintering program, transparent quartz glass (15z
X 15rrnXo, 5m). There were no cracks in this sintering process, and 12 pieces of quartz glass were obtained with a yield of 100 pieces.

実施例6゜ 実施例1と同様に調整したゾルをアルミニウムにポリフ
ッ化エチレンをコーティングした箱型容器(幅30 c
m X !l Ocm x高さ10m)にAさfis 
j−になるように仕込んだ。密閉して20℃で放置する
と30分後ゲル化し更に一夜放置した0次に穴の面積が
フタの面積に対して2%(IA口目串のフタに替え、2
0℃から昇温スピード2℃/hrで60℃に加熱した。
Example 6 The sol prepared in the same manner as in Example 1 was placed in a box-shaped container (width 30cm) made of aluminum coated with polyfluoroethylene.
mX! lOcm x height 10m)
I prepared it so that it would be j-. When it is sealed and left at 20℃, it becomes a gel after 30 minutes, and when left overnight, the area of the hole is 2% of the area of the lid (replace with the lid of the IA opening skewer,
It was heated from 0°C to 60°C at a heating rate of 2°C/hr.

7日間この温度で乾燥させると、室温に放置しても割れ
kい安定な卜゛ライゲル(19crnX 19crnX
 0.6cIn)が得られた0同様の処理を同様の容器
20個に仕込み、同様の乾燥をすると3個が割れ、歩留
り85チで17(+fflのドライゲルが得られた。
If you dry it at this temperature for 7 days, it will become stable and will not crack even if left at room temperature.
0.6 cIn) was obtained. Twenty similar containers were charged with the same treatment and dried in the same manner. Three of the containers cracked, and a dry gel of 17 (+ffl) was obtained at a yield of 85 cm.

17個のドライゲルを焼結炉に入れ、実施例1と同様の
焼結プログラムで加熱すると透明な石英ガラス(15c
mx 15cmX O,5c1n)となった。この焼結
過程□では割れなくて、歩留り100チで17個の石英
ガラスが得られた。
When 17 pieces of dry gel were placed in a sintering furnace and heated with the same sintering program as in Example 1, transparent quartz glass (15c
mx 15cmX O, 5c1n). In this sintering process □, there were no cracks, and 17 pieces of quartz glass were obtained with a yield of 100 pieces.

実施例7゜ 実施例1と同様に調整したゾルをポリプロピレン製の箱
型容器(幅3’0 twr X 30 cm X高さ1
5an)に高さが6cmになるように仕込んだ。密閉し
て20℃で放置すると30分後ゲル化し、更に一夜次に
穴の面積がフタの面積に対して2チ(開口率)のフタに
替え 20℃から昇温スピード2℃/hrで60℃に加
熱した。30日間この温度で乾燥させると、室温に放置
しても割れない安定なドライゲル(19crnX 19
ctnX 4cm )が得られた。
Example 7゜The sol prepared in the same manner as in Example 1 was placed in a polypropylene box-shaped container (width 3'0 twr x 30 cm x height 1
5an) to a height of 6 cm. When sealed and left at 20°C, it gels after 30 minutes, and then overnight, replace it with a lid whose hole area is 2 inches (opening ratio) relative to the area of the lid. From 20°C, heat up at a rate of 2°C/hr to 60°C. heated to ℃. When dried at this temperature for 30 days, a stable dry gel (19crnX 19
ctnX 4 cm) was obtained.

同様の処理を同様の容器20個に仕込み、同様の乾燥を
すると5個が割れ、歩留Q75%で15 (161のド
ライゲルが得られた。
When 20 similar containers were subjected to the same treatment and dried in the same manner, 5 of them cracked and 15 (161) dry gels were obtained with a yield Q of 75%.

15個のドライゲルを焼結炉に入れ、実施例1と同様の
焼結プログラムで加熱すると透明な石英ガラス(15m
X 15zX3Crn)となった。との焼結過程では割
れなくて、歩留り100係で15個の石英ガラス塊が得
られた。
When 15 pieces of dry gel were placed in a sintering furnace and heated with the same sintering program as in Example 1, transparent quartz glass (15 m
X 15zX3Crn). There were no cracks during the sintering process, and 15 silica glass ingots were obtained with a yield of 100.

以上数種類の材質の容器忙ついて実施例を示したが、ゲ
ルと容器の間の親和力が弱く、なるべくゲルがすべり易
い疎水性の材質ならば、大型、の石英ガラスを製造する
ことができる。
Although several examples have been given of containers made of several kinds of materials, large-sized quartz glass can be manufactured if the material is hydrophobic, which has a weak affinity between the gel and the container and allows the gel to slide easily.

また、ゾルに超音波をかけたり、遠心分離によってダマ
状物を取り除き均一度の高いゾルt−調整すると歩留り
は更に向上する。開口率、乾燥温度。
Further, the yield can be further improved by applying ultrasonic waves to the sol or by centrifuging to remove lumps and adjust the sol to have a high degree of uniformity. Opening ratio, drying temperature.

容器の形状等を変えることによって、歩留りが向上する
可能性もある。ここに挙げた実施例はろくまでも一実施
例にすぎないものである。
There is also a possibility that the yield can be improved by changing the shape of the container. The embodiments listed here are merely examples.

〔効 果〕〔effect〕

以上述べたように本発明によれば、ゾル−ゲル法による
石英ガラスの製造方法において、ゲル化およびドライゲ
ル作成工程におけるゾル溶液を収容する容器に疎水性の
材質を用いる仁とにより、ゲルと容器の間の親和力が弱
くゲルがすべり易い為、大面積の石英ガラス板あるいは
大きな体積の石英ガラス塊を製造子ることか可能になり
、高い歩留りを有した。
As described above, according to the present invention, in the method for manufacturing quartz glass by the sol-gel method, by using a hydrophobic material for the container containing the sol solution in the gelation and dry gel production steps, the gel and the container are Because the gel has a weak affinity and is easily slippery, it has become possible to manufacture large-area quartz glass plates or large-volume quartz glass lumps, resulting in a high yield.

以 上 出願人 株式会社 諏訪精工台 代理人弁理士最上 務that's all Applicant: Suwa Seikodai Co., Ltd. Agent Patent Attorney Mogami

Claims (1)

【特許請求の範囲】[Claims] (1)金属アルコキシドを加水分解してなるゾル溶液に
超微粉末シリカを前記金属アルコキシド°1モルに対し
て0.2〜5モルの割合で添加する工程、前記超微粉末
シリカを添加してなるゾル溶液をゲル化した後乾燥させ
てドライゲルを作成する工程および前記ドライゲルを焼
結して石英ガラスとする工程からなる石英ガラスの製造
方法において、前記ゲル化およびドライゲル作成工程に
おける前記ゾル溶液を収容する容器が疎水・性の材質で
あることを特徴とする石英ガラスの製造方法O
(1) A step of adding ultrafine powdered silica to a sol solution obtained by hydrolyzing a metal alkoxide at a ratio of 0.2 to 5 moles per 1 mole of the metal alkoxide, adding the ultrafine powdered silica. A method for producing quartz glass comprising a step of gelling a sol solution and then drying it to create a dry gel, and a step of sintering the dry gel to form quartz glass. Method O for producing quartz glass, characterized in that the container to contain it is made of a hydrophobic material
JP14169984A 1984-07-09 1984-07-09 Manufacture of quartz glass Granted JPS60131834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14169984A JPS60131834A (en) 1984-07-09 1984-07-09 Manufacture of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14169984A JPS60131834A (en) 1984-07-09 1984-07-09 Manufacture of quartz glass

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP23757783A Division JPS60131833A (en) 1982-12-23 1983-12-16 Manufacture of quartz glass

Publications (2)

Publication Number Publication Date
JPS60131834A true JPS60131834A (en) 1985-07-13
JPH0114177B2 JPH0114177B2 (en) 1989-03-09

Family

ID=15298147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14169984A Granted JPS60131834A (en) 1984-07-09 1984-07-09 Manufacture of quartz glass

Country Status (1)

Country Link
JP (1) JPS60131834A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63166730A (en) * 1986-12-27 1988-07-09 Shinetsu Sekiei Kk Production of quartz glass
KR100549422B1 (en) * 1999-03-16 2006-02-06 삼성전자주식회사 silica glass composition and manufacturing method of silica glass using the same
US9322596B2 (en) 2009-02-19 2016-04-26 Tokyo Metropolitan University Drying device and method of aqueous moisture gel
CN110790489A (en) * 2019-11-28 2020-02-14 福建工程学院 Preparation method of low-dimensional material doped non-hydrolytic gel glass

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63166730A (en) * 1986-12-27 1988-07-09 Shinetsu Sekiei Kk Production of quartz glass
JPH0517172B2 (en) * 1986-12-27 1993-03-08 Shinetsu Sekiei Kk
KR100549422B1 (en) * 1999-03-16 2006-02-06 삼성전자주식회사 silica glass composition and manufacturing method of silica glass using the same
US9322596B2 (en) 2009-02-19 2016-04-26 Tokyo Metropolitan University Drying device and method of aqueous moisture gel
CN110790489A (en) * 2019-11-28 2020-02-14 福建工程学院 Preparation method of low-dimensional material doped non-hydrolytic gel glass

Also Published As

Publication number Publication date
JPH0114177B2 (en) 1989-03-09

Similar Documents

Publication Publication Date Title
JPS60131834A (en) Manufacture of quartz glass
JP2635313B2 (en) Method for producing silica glass
JPS59131538A (en) Production of quartz glass
JPH0755835B2 (en) Method for producing silica glass
JPH0123420B2 (en)
JPS6065735A (en) Production of quartz glass
JPH0114178B2 (en)
JPS60239329A (en) Manufacture of quartz glass
JPS643810B2 (en)
JPS63117917A (en) Production of glass
JPS63182222A (en) Production of silica glass
JPS5983956A (en) Preparation of quartz glass
JPS6046937A (en) Manufacture of quartz glass
JPS6086035A (en) Production of quartz glass
JPS6191021A (en) Production of quartz glass
JPS6428243A (en) Cerium-doped quartz glass and production thereof
JPS59137340A (en) Manufacture of quartz glass
JPS58208144A (en) Method for synthesizing lump silica glass at low temperature
JPS62100424A (en) Production of glass
JPS643814B2 (en)
JPS63112430A (en) Production of glass
JPS6054931A (en) Mass-production of quartz glass plate
JPS6144720A (en) Production of quartz glass
JPS6086036A (en) Production of quartz glass
EP1258457A1 (en) Silica glass formation process