JPS63112430A - Production of glass - Google Patents

Production of glass

Info

Publication number
JPS63112430A
JPS63112430A JP25630986A JP25630986A JPS63112430A JP S63112430 A JPS63112430 A JP S63112430A JP 25630986 A JP25630986 A JP 25630986A JP 25630986 A JP25630986 A JP 25630986A JP S63112430 A JPS63112430 A JP S63112430A
Authority
JP
Japan
Prior art keywords
sol
gel
glass
ultrafine silica
alkyl silicate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25630986A
Other languages
Japanese (ja)
Inventor
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP25630986A priority Critical patent/JPS63112430A/en
Publication of JPS63112430A publication Critical patent/JPS63112430A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To obtain a high-quality glass is high yield, by producing a liquid sol mainly from alkyl silicate and ultrafine silica particles, gelatinizing the sol in a closed vessel allowing the shrinkage and drying and sintering the produced gel. CONSTITUTION:Alkyl silicate mixed with ultrafine silica particles and HCl is stirred for 2-3hr to effect the hydrolysis of the alkyl silicate and obtain a liquid sol produced by the decomposition of the ultrafine silica particles and having the composition of the objective glass component. The sol if put into a closed vessel and gelatinized by heating. After maintaining the closed state until the wet gel is shrunk to a linear shrinkage of >=1%, the gel is dried and sintered.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ゾル−ゲル法によるガラスの製造方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing glass by a sol-gel method.

〔従来の技術〕[Conventional technology]

従来のアルキルシリケートおよび超微粒子シリカを主原
料とし、アルキルシリケートの酸性触媒加水分解溶液中
に、超微粒子シリカを混合し調製したゾルをゲル化させ
た後、これを乾燥、焼結するゾル−ゲル法によるガラス
の製造においては、調製したゾルのPH値を塩基の滴下
により3〜6程度に調整していた。
A sol-gel that uses conventional alkyl silicate and ultrafine silica as main raw materials and prepares a sol by mixing ultrafine silica into an acid-catalyzed hydrolysis solution of alkyl silicate to gel, then drying and sintering the sol. In the production of glass by this method, the pH value of the prepared sol was adjusted to about 3 to 6 by dropping a base.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、前述の従来技術では、ゾルのPHgt1i1M
整時の中和反応生成物を取シ込んだ状態でゲル化し乾燥
ゲル中に残存する、これを焼結時に完全に分解、除去す
ることは、非常に困難であり、ガラス中の気泡などの欠
陥の生成刃となる。したがりて高品質なガラスを作製す
るための焼結における負荷がきわめて大きなものになる
という問題点を有する。また、ゾルのPH値を調整しな
い場合には、ゲル強度が小さく、乾燥、焼結において割
れてしまい大型ガラスの作製が困難であるという問題点
を有する。
However, in the above-mentioned conventional technology, the sol PHgt1i1M
It is extremely difficult to completely decompose and remove the neutralization reaction products that remain in the dry gel during sintering, as the neutralization reaction products that are mixed in during sintering are gelled and remain in the dried gel. It becomes a blade that generates defects. Therefore, there is a problem in that the load required during sintering to produce high-quality glass becomes extremely large. Furthermore, if the pH value of the sol is not adjusted, the gel strength is low and it breaks during drying and sintering, making it difficult to produce large glasses.

そこで、本発明はこのような問題点を解決するもので、
線収縮率が1%以上になれば安定した品位が確得できそ
の目的とするところは、高品質なガラスを容易に高歩留
シで作製するゾル−ゲル法によるガラスの製造方法を提
供するところにある。
Therefore, the present invention aims to solve these problems.
Stable quality can be achieved if the linear shrinkage rate is 1% or more, and the purpose is to provide a method for manufacturing glass using the sol-gel method that easily produces high-quality glass at a high yield. There it is.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の方法は、アルキルシリケートおよび超微粒子シ
リカを主原料として、目的ガラス成分組成の液状ゾルを
調製し、該ゾルをゲル化させた後乾燥、焼結するゾル−
ゲル法によるガラスの製造方法において以下の条件を有
することを特徴゛とする。(α〕調製したゾルを密閉容
器中にて加熱しゲル化する。(h)前記ゲル化後、反応
が進行しウェットゲルが線収縮率で1%以上収縮するま
で前記密閉状態な保持するものである。
The method of the present invention involves preparing a liquid sol with a desired glass composition using alkyl silicate and ultrafine silica as main raw materials, gelling the sol, drying and sintering the sol.
A method for manufacturing glass using a gel method is characterized by having the following conditions. (α) The prepared sol is heated in a sealed container to form a gel. (h) After the gelation, the device maintains the airtight state until the reaction progresses and the wet gel shrinks by 1% or more in terms of linear shrinkage rate. It is.

〔作用〕[Effect]

本発明によれば、ゾルPH値を調整しないためガラス中
の欠陥の原因となる両生成物がなく、焼結条件の設定が
容易になる。また、密閉状態にて加熱しゲル化させある
程度この状態で保持するため、PH値を調整しなくとも
、適度の速度で又応が進行し、ゲル強度も大きくなるこ
とにより、乾燥および焼結時の割れを防ぐものである。
According to the present invention, since the sol PH value is not adjusted, there are no products that cause defects in the glass, and the sintering conditions can be easily set. In addition, since the gel is heated in a sealed state and maintained in this state to some extent, the reaction progresses at an appropriate speed without adjusting the pH value, and the gel strength increases, resulting in drying and sintering. This prevents cracking.

〔実施例〕〔Example〕

(1)市販のエチルシリケート(5i(oEt)4)1
52t、α01N  HC3t  108tおよび超微
粒子シリカ(商品名アエロジル0X50(デグサ社) 
”) 45Kj’を同時に混合し、ディシルバー(攪拌
分散装置)にて攪拌を2〜3時間行ない、エチルシリケ
ートの加水分解反応を行なうと共に超微粒子シリカのあ
る程度分数したゾルを調製した。この後、更に分散性を
向上させるため該ゾルに、超音波照射(攪拌併用)を5
〜7時間行なった、な1お、この際、超音波照射による
該シフ!+/温度の上昇を防ぐため、冷却装置により該
ゾル温度を一定に保持した。
(1) Commercially available ethyl silicate (5i(oEt)4) 1
52t, α01N HC3t 108t and ultrafine silica (trade name Aerosil 0X50 (Degussa))
") 45Kj' were mixed at the same time and stirred for 2 to 3 hours using a disilver (stirring and dispersion device) to carry out a hydrolysis reaction of ethyl silicate and prepare a sol containing a certain fraction of ultrafine silica. After this, In order to further improve the dispersibility, the sol was irradiated with ultrasonic waves (combined with stirring) for 55 minutes.
It was carried out for ~7 hours. At this time, the shift was performed using ultrasonic irradiation! +/To prevent a rise in temperature, the sol temperature was kept constant by a cooling device.

次工程として、該ゾル中の半ゲル化ゼリー状物や不純物
を含有する粗大粒子およびゴミなどを除去するため、該
ゾルに対し遠心分離処理(5000r p m 、 5
0 m )を加えた。
As a next step, the sol is subjected to centrifugation treatment (5000 rpm,
0 m) was added.

この後、該ゾルを濾過し、大きさ30X50X15(c
rn)のポリプロピレン製の容器に各1000?、25
0個に注入し、7タとして密閉状態にした。これらを、
各50個、それぞれ20℃。
After this, the sol was filtered and the size 30X50X15 (c
rn) polypropylene containers each with 1000? , 25
It was injected into 0 pieces and sealed in 7 bottles. these,
50 pieces each, 20℃ each.

30℃、40℃、50℃、60℃の恒温槽に入れゲル化
させた。ゲル化後、5口口にフタを乾燥速度がl!!節
可能なものに変え、60℃にて乾燥を行なった。多少バ
ラツキがあったものの、10日間程で乾燥を終了し21
. OX 2 t 0口口(の)。
The mixture was placed in a constant temperature bath at 30°C, 40°C, 50°C, and 60°C to form a gel. After gelling, put a lid on the 5-mouth opening and the drying speed is l! ! The material was changed to one that could be knotted and dried at 60°C. Although there was some variation, the drying was completed in about 10 days and 21
.. OX 2t 0口口(of).

350 flW度の乾燥ゲルを得た0表1に歩留シを示
す。
A dry gel of 350 flW was obtained.Table 1 shows the yield.

表1. 乾燥歩留シ また、乾燥工程に移す際の各温度での収縮率を表2に示
す。
Table 1. Drying yield Table 2 also shows the shrinkage rate at each temperature when transferring to the drying step.

次に、ここで得られた乾燥ゲルを焼結炉に投入し、加熱
焼結し1280℃にて透明なガラス体を得た。このガラ
スの大きさは%15..OX1!LOXO,45[:α
〕で、重量は280 Pli度であった。
Next, the dried gel obtained here was put into a sintering furnace, and heated and sintered to obtain a transparent glass body at 1280°C. The size of this glass is %15. .. OX1! LOXO,45[:α
], and the weight was 280 Pli degrees.

以上のようにして得たガラスを、光学顕微鋺、集光ラン
プを当てるなどして観察したところ、ガラス中には、何
ら欠陥は観察されず非常に良好なものであった。また、
これらのガラスに関する諸物性分析の結果はビッカース
硬度、比重、熱膨張係数、赤外吸収スペクトル、近赤外
吸収スペクトル、屈折率など全て溶融石英ガラスに一致
した。
When the glass obtained as described above was observed using an optical microscope or a condensing lamp, no defects were observed in the glass and it was found to be in very good condition. Also,
The physical property analysis results for these glasses, including Vickers hardness, specific gravity, coefficient of thermal expansion, infrared absorption spectrum, near-infrared absorption spectrum, and refractive index, all matched those of fused silica glass.

〔発明の効果〕〔Effect of the invention〕

以上、実施例で示したように、本発明の方法によれば、
ゾルのPH値を調整しなくとも、高歩留シで乾燥ゲルの
作製が可能である。また品質的にも中和生成物の影響が
な≠ため、簡易な焼結方法で高品質なガラスが作製でき
る。したがって、高品質なガラスの大量生産が容易とな
る。
As shown in the examples above, according to the method of the present invention,
It is possible to produce a dry gel at a high yield without adjusting the pH value of the sol. Furthermore, since there is no influence on quality from neutralization products, high-quality glass can be produced using a simple sintering method. Therefore, mass production of high quality glass becomes easy.

更に、本発明により製造される石英ガラスは、他の製造
方法(溶融法、OVD法など)に比べ低コストであり、
高品質なガラスが容易に製造可能であるため、これまで
石英ガラスを使用していた分野においてはもちろんのこ
と、工C用フォトマスク基板、光ファイバー用母材など
種々の分野に応用されるものと考える。さらにゾル状態
において異種の元素を混合することにより、多成分系の
種々の特性をもつガラスの製造も容易である。
Furthermore, the quartz glass produced by the present invention is less expensive than other production methods (melting method, OVD method, etc.),
Because high-quality glass can be manufactured easily, it is being applied not only in fields where quartz glass has been used up until now, but also in various fields such as photomask substrates for industrial C and base materials for optical fibers. think. Furthermore, by mixing different types of elements in a sol state, it is easy to produce multi-component glasses with various properties.

Claims (1)

【特許請求の範囲】[Claims] (1)アルキルシリケートおよび超微粒子シリカを主原
料として、目的ガラス成分組成の液状ゾルを調製し、該
ゾルをゲル化させた後、乾燥、焼結するゾル−ゲル法に
よるガラスの製造方法において、以下の条件を有するこ
とを特徴とするガラスの製造方法。 a)調製したゾルを密閉容器中にて、加熱しゲル化させ
る b)前記ゲル化後、反応が進行し、ウェットゲルが、線
収縮率で1%以上収縮するまで前記密閉状態を保持する
(1) A method for producing glass by a sol-gel method in which a liquid sol with a desired glass component composition is prepared using alkyl silicate and ultrafine silica as main raw materials, the sol is gelled, and then dried and sintered. A method for producing glass, characterized by having the following conditions. a) Heat the prepared sol in a sealed container to gel it. b) After the gelation, the sealed state is maintained until the reaction proceeds and the wet gel shrinks by 1% or more in terms of linear shrinkage rate.
JP25630986A 1986-10-28 1986-10-28 Production of glass Pending JPS63112430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25630986A JPS63112430A (en) 1986-10-28 1986-10-28 Production of glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25630986A JPS63112430A (en) 1986-10-28 1986-10-28 Production of glass

Publications (1)

Publication Number Publication Date
JPS63112430A true JPS63112430A (en) 1988-05-17

Family

ID=17290871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25630986A Pending JPS63112430A (en) 1986-10-28 1986-10-28 Production of glass

Country Status (1)

Country Link
JP (1) JPS63112430A (en)

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