JPS6054931A - Mass-production of quartz glass plate - Google Patents

Mass-production of quartz glass plate

Info

Publication number
JPS6054931A
JPS6054931A JP16074683A JP16074683A JPS6054931A JP S6054931 A JPS6054931 A JP S6054931A JP 16074683 A JP16074683 A JP 16074683A JP 16074683 A JP16074683 A JP 16074683A JP S6054931 A JPS6054931 A JP S6054931A
Authority
JP
Japan
Prior art keywords
quartz glass
dry gel
gel
flat
thick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16074683A
Other languages
Japanese (ja)
Inventor
Motoyuki Toki
元幸 土岐
Sadao Kanbe
貞男 神戸
Satoru Miyashita
悟 宮下
Tetsuhiko Takeuchi
哲彦 竹内
Haruo Nagafune
長船 晴夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP16074683A priority Critical patent/JPS6054931A/en
Publication of JPS6054931A publication Critical patent/JPS6054931A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To enable the mass-production of quartz glass plate having high flatness, by manufacturing a thick dry gel by the sol-gel process from a metal alkoxide, and slicing the dry gel. CONSTITUTION:Ethyl silicate is hydrolyzed with an aqueous solution of hydrochloric acid, mixed with fine silica powder, dispersed uniformly, and adjusted to 4-6pH. The obtained sol is poured into a deep vessel having flat bottom, and gelatinized and dried under shrinkage to obtain a thick dry gel. The thick dry gel is sliced to a plurality of flat dry gel plates having the required thickness, and the sliced plates are sintered to obtain a plurality of flat quartz glass plates at the same time. Since the dry gel prepared by this process has large thickness, an easily sliceable thick gel having high flatness and resistant to warpage in drying can be produced.

Description

【発明の詳細な説明】 本発明は、すくなくとも金属アルコキシドを原料とする
ゾル−ゲル法による石英ガラスの製造法に係わす、wに
詳しくは平面性の良い平板状の石英ガラスのt1#力法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing quartz glass by a sol-gel method using at least a metal alkoxide as a raw material. Regarding.

石英ガ2ヌは、l0tJ造工程中でるつぼやポート°、
拡散炉等圧使用されるようKなり、その有用性が認めら
れ yrに水酸基の少ないものや、光学的均一性の良い
ものが開発さJlりことによって、各種の光学的用途に
使用さiするようKなった。測知げ、光通信用の石英ガ
ラスファイバーや、T。
Quartz glass is used in crucibles and ports during the l0tJ manufacturing process.
Diffusion furnaces have come to be used at equal pressure, and their usefulness has been recognized.Those with less hydroxyl groups in yr and those with good optical uniformity have been developed.Thus, they are used for various optical purposes. It's like K. Detection, quartz glass fiber for optical communication, and T.

用の石英ガラスマスク力どけ注目されている。また、薄
膜トランジスタ(TPT)の基板と1.ても注目されて
おり1石英ガラスマスクやTPTの基板などのように平
板状石英ガラスの用途も広がってきている。
The power of quartz glass masks for use is attracting attention. In addition, a thin film transistor (TPT) substrate and 1. The use of flat quartz glass is also expanding, such as in silica glass masks and TPT substrates.

平板状石英ガラスは一般に2神類の方法で製造されてい
る。その一つけ、天然石英を溶融り、ま痩は合成石英を
溶融し1口・・ドを作成する方法でこれはそのロッドを
輪切りする方法である。また他方は、ロッド状ではなく
、中空の円筒管を作成し、これを切り開いて平板状にす
る方法である。
Flat quartz glass is generally manufactured by two methods. One method is to melt natural quartz and, more commonly, synthetic quartz to create a single rod.This method involves cutting the rod into rounds. The other method is to create a hollow cylindrical tube instead of a rod shape, and cut it open to make it into a flat plate.

いずれの方法においても作成温度が高く、原料が高価で
あるということから一般に市販さhている平板状石英ガ
ラスは高価である。こういう石英ガラスの欠点から、最
近、金属アルコキシドを用いゾル−ゲル法の手法を用い
て石英ガラスを安価に製造しようといら試入がなされて
いる。一般に、ゾル−ゲル法により石英ガラスを作成す
る方法は次の3種類に分けられる。
In either method, the production temperature is high and the raw materials are expensive, so commercially available flat quartz glass is expensive. Due to these drawbacks of quartz glass, attempts have recently been made to manufacture quartz glass at low cost using a sol-gel method using metal alkoxides. Generally, methods for producing quartz glass using the sol-gel method can be divided into the following three types.

一つけ、金属アルコキシドを酸ll′fCはアルカリ触
媒下で加水分解し、ゾルと12で、ゲル化さぜ乾燥しド
ライゲルと17、焼結12て石英ガラスとするものであ
る。もう一つけ、金属アルコキシドは原料としないで、
微粉末シリカを原料とするものである。これは、微粉末
シリカを水に力pえ、ヒドロシルとした稜装置しゲル化
させ、ドライゲルとI2ドライゲルを焼結して石英ガラ
スとするものである。また、もう一つは金属アルコキシ
ドと微粉末シリカを原料とするものである。これは、金
属アルコキシドを加水分解したゾル溶液に微粉末シリカ
を添加し、更にFT(全中性近(になるよう調整し放置
しゲル化させ、乾燥してドライゲルとし、続いて焼結し
石英ガラスとするく、のである。こ〕1らの方法で、塊
状の石英ガラスの製造法として最も優れているのけ、最
後に記した金属アルコキシド及び微粉末シリカを原料と
する方法である。従って、本発明の5φ明及び実施例は
特にこの方法に基づ(/−Iだ内容で杏〈が、他の2法
においてイ、同様の効果が有ることは明らかである。
First, a metal alkoxide is hydrolyzed with an acid ll'fC under an alkali catalyst, gelled with a sol (12), dried, dried to form a dry gel (17), and sintered (12) to form quartz glass. One more thing, don't use metal alkoxide as a raw material.
The raw material is finely powdered silica. This is a process in which finely powdered silica is poured into water, turned into a hydrosil, gelled, and the dry gel and I2 dry gel are sintered to form quartz glass. The other type uses metal alkoxide and finely powdered silica as raw materials. This is done by adding finely powdered silica to a sol solution obtained by hydrolyzing metal alkoxide, adjusting it to FT (near total neutrality), leaving it to gel, drying it to form a dry gel, and then sintering it to form a quartz crystal. Among these methods, the most excellent method for producing bulk quartz glass is the method mentioned last, which uses metal alkoxide and finely powdered silica as raw materials. Although the 5φ light and the embodiments of the present invention are particularly based on this method (/-I), it is clear that the other two methods have similar effects.

以上配したように、一般に平板状石英ガラスの甲途は多
いのであるが、高価であるという欠点がある。
As mentioned above, flat quartz glass generally has many uses, but it has the drawback of being expensive.

そこで、本発明の目的は、平板状石英ガラスを安価に製
造する!産声法を提供することである。
Therefore, an object of the present invention is to manufacture flat quartz glass at low cost! It is to provide a method for giving birth.

その方法として次のような方法をt案1.た。すなわち
、ケイ酸エチルに塩酸水を抽気加水分解しherost
l (Deggrtssa社)やCab−n−si l
 (Ca)ro−を社)等のホワイトカーボンである微
粉末シリカを加えよく均一に分散し7た移PHf4〜乙
に調整する。
As a method, the following method is used as plan t. Ta. That is, by hydrolyzing hydrochloric acid water into ethyl silicate,
(Deggrtssa) and Cab-n-si
Add finely powdered silica, which is a white carbon such as (Ca) Ro-O Co., Ltd., and disperse it well and uniformly, and adjust the pH to 4 to 7.

このようにして得られるゾルを、底が平坦で深さの深い
容器に加憂、ゲル化させ収縮乾燥させて、厚板状のドラ
イゲルを得ることができる。この厚板状ドライゲルをス
ライスして、複数枚の必要な厚みの平板状ドライゲルと
し、これらを焼結し、平板状の石英ガラスを同時に複数
枚得ることができる。従って、この方法は量産的に平坦
な石英ガラス板を製造する場合には非常に有効な手段と
なる、 また、一枚の必要な厚みの石英板を一枚の魁状石英ガラ
スからスライスなしで作製する場合、目的の石英板の厚
みは薄い場合が多いので、ドライゲルの厚みも薄くなる
。簿いドライゲA−け乾燥時の不均一さや、種々の理由
からそる場合が多いので、そったままのドライゲルを焼
結すると、そった石英ガラスになり乎用な平板状石英ガ
ラスとしにくい。これに対17て、本発明の方法のドラ
イゲルは厚さが厚いので、乾燥時に非常にそりに〈〈平
坦性の良い厚板状ドライゲルになり、スライスをするの
が容易である。
The sol thus obtained is placed in a deep container with a flat bottom, gelled, and dried by shrinkage to obtain a thick plate-like dry gel. This thick plate-like dry gel is sliced into a plurality of flat dry gels having a required thickness, and these are sintered to simultaneously obtain a plurality of flat quartz glasses. Therefore, this method is a very effective means for manufacturing flat quartz glass plates in mass production, and it is also possible to produce a single quartz plate of the required thickness from a single piece of quartz glass without slicing. When manufacturing, the thickness of the target quartz plate is often thin, so the thickness of the dry gel is also thin. Curved dry gel tends to warp due to non-uniformity during drying or for various reasons, so if dry gel is sintered as it is, it becomes warped quartz glass, which is difficult to produce into a usable flat quartz glass. On the other hand, since the dry gel obtained by the method of the present invention is thick, it becomes a plate-like dry gel with good flatness and is very warped during drying, making it easy to slice.

以下実施例に従(A本発明の詳細な説明する。The present invention will be described in detail below according to Examples.

実施例1 精製した市販のケイ酸エチル624σ(3モル)に00
2規定の塩酸水溶液を540rnl加え、檄しく攪拌し
加水分解する。この溶液に水を300mt加え更に微粉
末シリカ(A、erosil o x s O:アエロ
ジル社の表面積50 m”7gの微粉末シリカの商品名
)を 5− 225σ攪拌下加え、超音波振動等の分散を良くする操
作を行い均一性の良(ハゾルと1.た。これを、ゴミ等
を除くためろ過した。このゾルK O,1規定のアンモ
ニア水を滴下1. P Hを5. OK調整した。
Example 1 00 to purified commercially available ethyl silicate 624σ (3 mol)
Add 540 rnl of 2N hydrochloric acid aqueous solution and stir gently for hydrolysis. To this solution, 300 mt of water was added, and finely powdered silica (A, erosil ox s O: trade name of finely powdered silica with a surface area of 50 m" and 7 g manufactured by Aerosil Co., Ltd.) was added under stirring of 5-225σ, followed by dispersion using ultrasonic vibration, etc. This sol was filtered to remove dust, etc. 1. PH was adjusted to 5. OK by adding 1N ammonia water dropwise to this sol KO. .

このゾルをポリプロピレン製の底の平坦で深い箱型の容
器(30m×20G×20口)に、深さが6Gになるよ
う仕込んだ。密閉して室温に放置させると30分後ゲル
化L7、更に一昼夜放置しt0フタを溶媒が留出できる
ように穴をあけたものに替え、50〜70℃に放置して
乾燥させ、7日後に室温に放置しても割れない安定な厚
板状ドライゲル(21cm×14crn×46In)が
得られた。この厚板状ドライゲルをスライスして、21
crn×14cm×04確の板状ドライゲルが6枚得ら
れを。ただし、スライスした外周刃の切りしろは0.2
crnであったので、その切りしろの分だ叶損失してい
る。このように1゜得られた6枚の板状ドライゲルを焼
結炉中で1200℃までゆっくり昇温し、1200℃で
1.5時間放置し焼結すると、透明で平坦な板状石英ガ
ラス(15crnX 10cmX 0.5cm 1が6
枚得られた。
This sol was placed in a deep box-shaped container (30 m x 20 G x 20 ports) made of polypropylene with a flat bottom to a depth of 6 G. Seal the lid and let it stand at room temperature for 30 minutes and gelation L7. Leave it for another day and night. Replace the t0 lid with one that has a hole in it so that the solvent can distill out. Leave it at 50-70°C to dry, and leave it for 7 days. A stable thick plate-like dry gel (21 cm x 14 crn x 46 In) was obtained which did not crack even after being left at room temperature. Slice this thick plate-like dry gel and
Six dry gel plates measuring crn x 14 cm x 04 cm were obtained. However, the cutting margin of the peripheral blade for slicing is 0.2
Because it was crn, we lost the amount of margin. The six plate-shaped dry gels obtained in this manner were heated slowly to 1,200°C in a sintering furnace, and left at 1,200°C for 1.5 hours to sinter, resulting in transparent and flat plate-shaped quartz glass ( 15crnX 10cmX 0.5cm 1 is 6
I got one.

 6− 本発明の方法は、この実施例のように原料を金属アルコ
キシド及び微粉末シリカを用いるゾル−ゲル法に限られ
るものではないことは明らかである。
6- It is clear that the method of the present invention is not limited to the sol-gel method using metal alkoxide and finely powdered silica as raw materials as in this example.

本発明の平jf3性の肉い平板状石英ガラスのII量産
法、従来法によるものより7.価に製造で入るのでTP
Tの基板やTCマスク等の種々の分野に太きく貢献する
と思われる。
II mass production method of thick flat quartz glass with flat jf3 properties of the present invention, 7. TP because it is included in the price due to manufacturing.
It is believed that this will greatly contribute to various fields such as T substrates and TC masks.

以 十 出願人 株式会社 *i8精工舎 伏理人 弁理士 最 1・ 務  7− 173−Less than ten Applicant: *i8 Seikosha Co., Ltd. Fushirito Patent attorney 1st office 7- 173-

Claims (1)

【特許請求の範囲】[Claims] すくなくとも金属アルコ゛A′シトな原料とするゾル−
ゲル法により、板状石英ガラスを低温で合成する方法に
おいて、JIfい平板状ドライゲルを作成し、#ドライ
ゲルをスライスして、−塵に多数枚の平板状ドライゲル
を製造することを特徴とする板状石英ガラスの′l!産
方法。
A sol containing at least metal alcohol A' as a raw material.
A method for synthesizing plate-shaped quartz glass at a low temperature by a gel method, which is characterized in that a large plate-shaped dry gel is created, and the dry gel is sliced to produce a large number of flat-shaped dry gels. ’l of shaped quartz glass! Method of birth.
JP16074683A 1983-09-01 1983-09-01 Mass-production of quartz glass plate Pending JPS6054931A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16074683A JPS6054931A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16074683A JPS6054931A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Publications (1)

Publication Number Publication Date
JPS6054931A true JPS6054931A (en) 1985-03-29

Family

ID=15721557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16074683A Pending JPS6054931A (en) 1983-09-01 1983-09-01 Mass-production of quartz glass plate

Country Status (1)

Country Link
JP (1) JPS6054931A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10811610B2 (en) 2017-01-27 2020-10-20 Sumitomo Chemical Company, Limited Composition and light emitting device obtained by using the composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10811610B2 (en) 2017-01-27 2020-10-20 Sumitomo Chemical Company, Limited Composition and light emitting device obtained by using the composition

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