JPS62265130A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPS62265130A JPS62265130A JP11014386A JP11014386A JPS62265130A JP S62265130 A JPS62265130 A JP S62265130A JP 11014386 A JP11014386 A JP 11014386A JP 11014386 A JP11014386 A JP 11014386A JP S62265130 A JPS62265130 A JP S62265130A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- silica glass
- alcohol
- cracks
- silicon alkoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000011230 binding agent Substances 0.000 claims abstract description 13
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 239000010703 silicon Substances 0.000 claims abstract description 13
- -1 silicon alkoxide Chemical class 0.000 claims abstract description 13
- 238000001035 drying Methods 0.000 claims abstract description 10
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000007062 hydrolysis Effects 0.000 claims abstract description 7
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 238000005245 sintering Methods 0.000 claims abstract description 5
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 238000006068 polycondensation reaction Methods 0.000 abstract description 4
- 238000005336 cracking Methods 0.000 abstract description 3
- 239000000499 gel Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は光学用、半導体工業用、電子工業用。[Detailed description of the invention] (Industrial application field) The present invention is applicable to optics, semiconductor industry, and electronic industry.
理化学用等に使用されるクラックや割れのないシリカガ
ラスの製造法に関する。This article relates to a method for manufacturing silica glass that is free from cracks and breaks and is used for physical and chemical purposes.
(従来の技術)
シリカガラスは耐熱性、耐食性および光学的性質に便れ
ていることから最近、半導体製造に欠かせない重要な材
料であシ、さらには光ファイバやICm造用フォトマス
ク基板、TF’T基板などに使用されその用途はますま
す拡大されている。(Prior art) Silica glass has good heat resistance, corrosion resistance, and optical properties, so it has recently become an important material indispensable for semiconductor manufacturing, and is also used as a photomask substrate for optical fiber and IC manufacturing. It is used for TF'T substrates and its applications are expanding more and more.
従来のシリカガラスの製造法には天然石英を電気炉また
は酸水素炎により溶解する方法、あるいは四塩化ケイ素
を酸水素炎又はプラズマ炎中で高温酸化し溶解する方法
があるがいずれの方法も製造工程に2,000’Cある
いはそれ以上の高温を必要とするため大量のエネルギー
を消費し、また製造時にそのような高温に耐える材料が
必要であり。Conventional methods for manufacturing silica glass include melting natural quartz in an electric furnace or oxyhydrogen flame, or oxidizing and melting silicon tetrachloride at high temperature in an oxyhydrogen flame or plasma flame, but neither method can produce it. The process requires high temperatures of 2,000'C or more, consuming a large amount of energy, and materials that can withstand such high temperatures are required during manufacturing.
また高純度のものが得にくいなど経済的2品質的にいく
つかの問題点をもっている。In addition, it has several problems in terms of economy and quality, such as the difficulty in obtaining high-purity products.
これに対し、近年ゾル−ゲル法と呼ばれるシリカガラス
を低温で合成する方法が注目されている。On the other hand, in recent years, a method of synthesizing silica glass at low temperature called the sol-gel method has been attracting attention.
その概要を簡単に述べる。The outline will be briefly described below.
一般式Si(OR)4(但しRはアルキル基を示す)で
示されるシリコンアルコキシド及び/又はその重縮合物
(例えば(ROhSi・(O8i(ORh) ・03
i(OR)3.n=o〜8. 几はアルキル基)に水
(アルカリ、酸などの触媒を添加してもよい)を加え、
加水分解し、シリカヒドロシル(以下シリカゾル)とす
る。この時、シリコンアルコキシドと水が均一な系とな
る様に適当な溶媒(例えばアルコール等)を加えてもよ
い。このシリカゾルを静置、昇温ゲル化剤添加等により
ゲル化させる。Silicon alkoxides and/or polycondensates thereof represented by the general formula Si(OR)4 (where R represents an alkyl group) (for example, (ROhSi.(O8i(ORh).03)
i(OR)3. n=o~8.几 is an alkyl group), add water (a catalyst such as alkali or acid may be added),
It is hydrolyzed to produce silica hydrosil (hereinafter referred to as silica sol). At this time, an appropriate solvent (for example, alcohol) may be added so that the silicon alkoxide and water form a uniform system. This silica sol is allowed to stand still and is gelled by heating and adding a gelling agent.
さらにゲルを蒸発乾燥することにより乾燥ゲルとする。Further, the gel is evaporated to dryness to obtain a dry gel.
この乾燥ゲルを適当な雰囲気中で焼結することによりシ
リカガラスを得るものである。Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
(発明が解決しようとする問題点)
しかしゾル−ゲル法によるシリカガラスの製造にはまだ
未解決の問題が残されている。特にゲルを乾燥していく
過程でゲルにクラックや割れが発生し易く、クラックや
割れのないモノリシックな大形の乾燥ゲルを歩留り良く
製造することが困難となることである。(Problems to be Solved by the Invention) However, there are still unresolved problems in the production of silica glass by the sol-gel method. In particular, during the process of drying the gel, cracks and fractures are likely to occur in the gel, making it difficult to produce a monolithic large-sized dry gel without cracks and fractures with a good yield.
ゲル化、乾燥収縮過程でのクラックや割れはゲルの内部
構造と乾燥条件に負うところが大きい。Cracks and splits during the gelation and drying shrinkage processes are largely due to the internal structure of the gel and the drying conditions.
シリコンアルコキシドを加水分解してゲル化させるには
アンモニアのような塩基を触媒に用いる方法と、塩酸の
ような酸を触媒に用いる方法とがある。There are two methods for hydrolyzing and gelling silicon alkoxide: one method uses a base such as ammonia as a catalyst, and the other method uses an acid such as hydrochloric acid as a catalyst.
アンモニアを触媒に用いると加水分解速度に比較して重
縮合速度が著しく速いだめ、得られた乾燥ゲルは粒子の
大きい粗な構造をとり2粒子間の結合力が弱いために直
径2Cm以上の乾燥ゲルを得ることは困難である。When ammonia is used as a catalyst, the polycondensation rate is significantly faster than the hydrolysis rate, and the resulting dry gel has a coarse structure with large particles, and the bonding force between the two particles is weak, resulting in dry gels with a diameter of 2 cm or more. It is difficult to obtain gel.
一方酸を触媒に用いると加水分解速度が速く。On the other hand, when an acid is used as a catalyst, the rate of hydrolysis is faster.
重縮合速度が非常に遅いため粒成長は起きにくい。Grain growth is difficult to occur because the polycondensation rate is very slow.
したがって結合力が強いゲルが得られるが、酸触媒を用
いた場合の割れは乾燥条件に起因すると考えられる。ま
た酸触媒の場合は室温ではゲル化するのにかな)の時間
を要する。したがってゲル化時間を短縮するためにゲル
化温度を高くする必要がある。しかしながら50〜70
℃でゲル化させたものは気泡を含み易い欠点がある。Therefore, a gel with strong binding strength can be obtained, but cracking when an acid catalyst is used is thought to be caused by the drying conditions. In addition, in the case of an acid catalyst, it takes about 30 minutes to gel at room temperature. Therefore, it is necessary to increase the gelling temperature in order to shorten the gelling time. However, 50-70
One that is gelled at ℃ has the disadvantage that it tends to contain air bubbles.
本発明は上記した欠点を解消するシリカガラスの製造法
を提供することを目的とする。An object of the present invention is to provide a method for producing silica glass that eliminates the above-mentioned drawbacks.
(問題点を解決するための手段)
本発明は、一般式Si (OR)4 (但しRdアルキ
ル基を示す)で示されるシリコンアルコキシド及び/又
はその重縮合物を加水分解してシリカゾルとし2次いで
ゲル化し乾燥及び焼結するシリカガラスの製造法におい
て、#記加水分解時にアルコール溶性の有機質バインダ
ーを添加するシリカガラスの製造法て関する。(Means for Solving the Problems) The present invention involves hydrolyzing a silicon alkoxide and/or its polycondensate represented by the general formula Si (OR) 4 (where Rd represents an alkyl group) to form a silica sol. In the method for producing silica glass which involves gelling, drying and sintering, item # relates to a method for producing silica glass in which an alcohol-soluble organic binder is added during hydrolysis.
本発明において、シリコンアルコキシド及び/又はその
重縮合物のアルキル基については特に制限はない。シリ
コンアルコキシド及び/又はその重縮合物に水及びアル
コールを加えて加水分解してシリカゾルを生成させる際
に、接水又はアルコールにあらかじめアルコール溶性の
有機質バインダーを加える。有機質バインダーとしては
、アクリル酸ポリマー、イソシアナート、エチレンオキ
シドポリマー、ヒドロキシルエチルセルロース。In the present invention, there are no particular limitations on the alkyl group of the silicon alkoxide and/or its polycondensate. When water and alcohol are added to silicon alkoxide and/or its polycondensate and hydrolyzed to produce silica sol, an alcohol-soluble organic binder is added in advance to the water or alcohol. Examples of organic binders include acrylic acid polymer, isocyanate, ethylene oxide polymer, and hydroxyl ethyl cellulose.
ポリエチレンクリコール、ポリビニルアルコール。Polyethylene glycol, polyvinyl alcohol.
メチルセルロース、ワックス等をあげることができ、こ
れらの有機質バインダーの使用は単独でも複数でもよい
。該有機質バインダーのシリコンアルコキシド及び/又
はその重縮合物に対する濃度は、用いるシリコンアルコ
キシド及び/又けその重縮合物の種類、加水分解の速度
等により適宜調整する。用いるアルコールはシリコンア
ルコキシド及び/又はその重縮合物と有機質バインダー
との双方を溶解するものであればよく制限はない。Examples include methylcellulose and wax, and these organic binders may be used alone or in combination. The concentration of the organic binder relative to the silicon alkoxide and/or its polycondensate is appropriately adjusted depending on the type of silicon alkoxide and/or its polycondensate used, the rate of hydrolysis, etc. The alcohol used is not limited as long as it can dissolve both the silicon alkoxide and/or its polycondensate and the organic binder.
アルコールの使用は一種類でも複数でもよい。One or more types of alcohol may be used.
、@媒は塩基、酸等特に制限しないが、ゲル化時間の関
係から塩基の方が好ましい。The medium is not particularly limited, such as bases and acids, but bases are preferred from the viewpoint of gelation time.
シリカガラスは、上記のようにして生成したシリカゾル
をシャーレ等の容器に移し、室温〜70℃に保ってゲル
化し9次いで室温以上の温度で乾燥して乾燥ゲルとし、
更に公知の方法で焼結して得られる。Silica glass is obtained by transferring the silica sol produced as described above to a container such as a petri dish, keeping it at room temperature to 70°C to gel it, and then drying it at a temperature above room temperature to form a dry gel.
Further, it can be obtained by sintering using a known method.
(作用)
有機質バインダーは、シリコンアルコキシド及び/又は
その重縮合物の加水分解速度を適度に制御する一方、生
成するゲルの均一性を向上させ。(Function) The organic binder moderately controls the rate of hydrolysis of silicon alkoxide and/or its polycondensate, while improving the uniformity of the gel produced.
ゲルの強度を向上させて、ゲルのクラックや割れを防止
する。又有機質バインダーの添加によりゲルの乾燥条件
の制御がより容易となる。Improves the strength of the gel and prevents it from cracking and splitting. Furthermore, the addition of an organic binder makes it easier to control the drying conditions of the gel.
(実施例) 本発明を実施例に二り説明する。(Example) The present invention will be explained with reference to two examples.
実施例1
1モルのシリコンテトラメトキシド(S i (0CR
3)4)に対し、3モルのメチルアルコールを加えよく
混合した。この溶液に0.01mol/lのアンモニア
水えて、さらに充分混合し、シリカゾルを得た。これを
直径90mのテフロンでコーティングしたガラス製シャ
ーレに入れ、密封し室温でゲル化した。Example 1 1 mol of silicon tetramethoxide (S i (0CR
3) To 4), 3 moles of methyl alcohol was added and mixed well. 0.01 mol/l of ammonia water was added to this solution and thoroughly mixed to obtain a silica sol. This was placed in a Teflon-coated glass petri dish with a diameter of 90 m, sealed, and gelatinized at room temperature.
その後蓋に穴を開け、50℃の恒温槽中で7日間乾燥し
、その後120℃の恒温槽に移して1日乾燥して直径6
70の乾燥ゲルを得た。こうして得られた乾燥ゲルのか
さ密度は0.74 g/cm”であり。After that, a hole was made in the lid, and it was dried for 7 days in a constant temperature bath at 50℃, and then transferred to a constant temperature bath at 120℃ and dried for 1 day.
70 dry gels were obtained. The bulk density of the dry gel thus obtained was 0.74 g/cm''.
クラックや割れなどは全くなかった。There were no cracks or breaks at all.
この乾燥ゲルを1,250°Cまで加熱焼結したところ
直径45皿×厚さ511Inのクラックや割れのない透
明なシリカガラスが得られた。このシリカガラスは分析
の結果、その特性は市販のシリカガラスと一致した。When this dried gel was heated and sintered to 1,250°C, a transparent silica glass having a diameter of 45 plates and a thickness of 511 inches without any cracks or breaks was obtained. Analysis of this silica glass revealed that its properties matched those of commercially available silica glass.
実施例2
実施例1におけるポリエチレングリコールの濃度を10
重重量上すること以外は実施例1と同様な操作を行って
乾燥ゲルを得た。得られた乾燥ゲルはクラックや割れは
全くなかった。Example 2 The concentration of polyethylene glycol in Example 1 was changed to 10
A dry gel was obtained in the same manner as in Example 1 except that the weight was increased. The dried gel obtained had no cracks or breaks.
実施例3
とした以外は実施例1と同様な操作を行って乾燥ゲルを
得た。得られた乾燥ゲルはクラックや割れは全くなかっ
た。Example 3 A dry gel was obtained by performing the same operation as in Example 1 except for the following. The dried gel obtained had no cracks or breaks.
実施例4
有機バインダーとして実施例3と同じポリビニルアルコ
ールを用いその濃度を10重量憾とした以外は実施例1
と同様な操作を行って乾燥ゲルを得た。得られた乾燥ゲ
ルはクラックや割れは全くなかった。Example 4 Example 1 except that the same polyvinyl alcohol as in Example 3 was used as the organic binder and the concentration was 10% by weight.
A dry gel was obtained in the same manner as above. The dried gel obtained had no cracks or breaks.
ル法により容易に製造可能となる。その大きさは基本的
には制約がなく、形状も板状、棒状、管状等のいずれで
も製造できる。It can be easily manufactured by the method. There are basically no restrictions on its size, and it can be manufactured in any shape such as a plate, rod, or tube.
又、不発明によりシリカガラスは従来より安価に製造で
きるため、従来から使用されてきたIC製造用フォトマ
スク基材等の分野はもちろん、液晶表示用基材等にも応
用を拡大できる。 −\」・Further, due to the invention, silica glass can be manufactured at a lower cost than before, so its application can be expanded not only to fields such as photomask substrates for IC manufacturing, which have been conventionally used, but also to substrates for liquid crystal displays, etc. −\”・
Claims (1)
す)で示されるシリコンアルコキシド及び/又はその重
縮合物を加水分解してシリカゾルとし、次いでゲル化し
乾燥及び焼結するシリカガラスの製造法において、前記
加水分解時にアルコール溶性の有機質バインダーを添加
することを特徴とするシリカガラスの製造法。1. Production of silica glass by hydrolyzing silicon alkoxide and/or its polycondensate represented by the general formula Si(OR)_4 (where R represents an alkyl group) to obtain silica sol, then gelling, drying and sintering A method for producing silica glass, characterized in that an alcohol-soluble organic binder is added during the hydrolysis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61110143A JP2635313B2 (en) | 1986-05-14 | 1986-05-14 | Method for producing silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61110143A JP2635313B2 (en) | 1986-05-14 | 1986-05-14 | Method for producing silica glass |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62265130A true JPS62265130A (en) | 1987-11-18 |
JP2635313B2 JP2635313B2 (en) | 1997-07-30 |
Family
ID=14528126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61110143A Expired - Lifetime JP2635313B2 (en) | 1986-05-14 | 1986-05-14 | Method for producing silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2635313B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4943542A (en) * | 1987-10-31 | 1990-07-24 | Hitachi Chemical Company, Ltd. | Process for producing silica glass |
JPH0333031A (en) * | 1989-06-29 | 1991-02-13 | Sumitomo Electric Ind Ltd | Production of functional organic molecule-doped amorphous silica |
EP0583943A3 (en) * | 1992-08-14 | 1994-08-17 | At & T Corp | Manufacture of a vitreous silica product by a sol-gel process |
US5871558A (en) * | 1994-08-04 | 1999-02-16 | Hitachi Chemical Company, Ltd. | Process for producing silica glass |
FR2767808A1 (en) * | 1997-08-29 | 1999-03-05 | Samsung Electronics Co Ltd | PROCESS FOR PRODUCING SILICA GLASS |
US6410631B1 (en) | 1999-01-29 | 2002-06-25 | Samsung Electronics Co., Ltd. | Composition for production of silica glass using sol-gel process |
JP2008284626A (en) * | 2007-05-16 | 2008-11-27 | Miraial Kk | Micro-flow channel device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5719045A (en) * | 1980-07-09 | 1982-02-01 | Sumitomo Heavy Ind Ltd | Electric dust collection |
JPS57190645A (en) * | 1981-05-20 | 1982-11-24 | Toyobo Co Ltd | Preparation of porous gel product |
JPS60108325A (en) * | 1983-11-17 | 1985-06-13 | Nippon Telegr & Teleph Corp <Ntt> | Production of glass |
-
1986
- 1986-05-14 JP JP61110143A patent/JP2635313B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5719045A (en) * | 1980-07-09 | 1982-02-01 | Sumitomo Heavy Ind Ltd | Electric dust collection |
JPS57190645A (en) * | 1981-05-20 | 1982-11-24 | Toyobo Co Ltd | Preparation of porous gel product |
JPS60108325A (en) * | 1983-11-17 | 1985-06-13 | Nippon Telegr & Teleph Corp <Ntt> | Production of glass |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4943542A (en) * | 1987-10-31 | 1990-07-24 | Hitachi Chemical Company, Ltd. | Process for producing silica glass |
JPH0333031A (en) * | 1989-06-29 | 1991-02-13 | Sumitomo Electric Ind Ltd | Production of functional organic molecule-doped amorphous silica |
EP0583943A3 (en) * | 1992-08-14 | 1994-08-17 | At & T Corp | Manufacture of a vitreous silica product by a sol-gel process |
US5871558A (en) * | 1994-08-04 | 1999-02-16 | Hitachi Chemical Company, Ltd. | Process for producing silica glass |
FR2767808A1 (en) * | 1997-08-29 | 1999-03-05 | Samsung Electronics Co Ltd | PROCESS FOR PRODUCING SILICA GLASS |
US6410631B1 (en) | 1999-01-29 | 2002-06-25 | Samsung Electronics Co., Ltd. | Composition for production of silica glass using sol-gel process |
US6519976B2 (en) | 1999-01-29 | 2003-02-18 | Samsung Electronics Co., Ltd. | Method for production of silica glass using sol-gel process |
JP2008284626A (en) * | 2007-05-16 | 2008-11-27 | Miraial Kk | Micro-flow channel device |
Also Published As
Publication number | Publication date |
---|---|
JP2635313B2 (en) | 1997-07-30 |
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