JPS605237B2 - How to form printed circuits - Google Patents

How to form printed circuits

Info

Publication number
JPS605237B2
JPS605237B2 JP9317278A JP9317278A JPS605237B2 JP S605237 B2 JPS605237 B2 JP S605237B2 JP 9317278 A JP9317278 A JP 9317278A JP 9317278 A JP9317278 A JP 9317278A JP S605237 B2 JPS605237 B2 JP S605237B2
Authority
JP
Japan
Prior art keywords
adhesive
corona discharge
aluminum foil
adhesive layer
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9317278A
Other languages
Japanese (ja)
Other versions
JPS5521104A (en
Inventor
二朗 加納
等 冨井
邦弘 五十里
勉 高村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP9317278A priority Critical patent/JPS605237B2/en
Priority to GB8007439A priority patent/GB2040101B/en
Priority to PCT/JP1979/000171 priority patent/WO1980000294A1/en
Priority to DE2952961A priority patent/DE2952961C1/en
Publication of JPS5521104A publication Critical patent/JPS5521104A/en
Publication of JPS605237B2 publication Critical patent/JPS605237B2/en
Expired legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 本発明はプリント回路を形成する方法に関し、特に化学
めつき、もしくは化学めつきと亀気めつきを併用して導
電パターンを形成するプリント回路を形成する方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a printed circuit, and more particularly to a method for forming a printed circuit in which a conductive pattern is formed using chemical plating or a combination of chemical plating and flash plating.

近年、IC、BIの実用化が進むにともない、実装され
る機器の4・型化、高性能化、及び高信頼性化が進める
れている。
In recent years, as the practical use of ICs and BI has progressed, the devices to be mounted are becoming more 4-type, higher in performance, and higher in reliability.

これに対応してプリント回路板に対しても、高密度配線
化による小型化、高信頼性化および低コスト化が強く要
請されている。これらの要請に応えるものとして現在ス
ルーホールプリント回路板が実用化されており、その製
造方法は銅張り積層板を出発材料としてスルーホールの
ための穴あげの後、化学めつき、電気めつきを施し、然
る後に回路パターン部分とスルーホール部分をレジスト
で保護してから不必要部分の銅箔をエッチング除去する
もので、製造工程が複雑で且つ多大の材料費が必要で、
到底低コスト化への要請には応えられないという欠点を
有する。
Correspondingly, there is a strong demand for printed circuit boards to be smaller, more reliable, and lower in cost through higher density wiring. Through-hole printed circuit boards are currently being put into practical use to meet these demands, and their manufacturing method uses copper-clad laminates as the starting material, holes for through-holes, and then chemical plating and electroplating. After that, the circuit pattern part and through-hole part are protected with a resist, and unnecessary parts of the copper foil are removed by etching.The manufacturing process is complicated and requires a large amount of material cost.
The drawback is that it cannot meet the demand for lower costs.

ところで回路パターンを選択的に絶縁基板上に形成する
アディティブ法によれば簡単な製造工程でスルーホール
と回路パターンが同時に形成できるばかりでなく、材料
費が少なくて済む利点があり経済的に有利である。しか
し上記アディティブ法では絶縁基板上に、めつきによっ
て形成された回路層(金属層)と基板との密着力が銅張
り積層板に較べて劣るため、回路層の剥離を招きやすく
プリント回路としての信頼性に劣る欠点がある。
By the way, the additive method of selectively forming a circuit pattern on an insulating substrate not only allows through-holes and circuit patterns to be formed simultaneously in a simple manufacturing process, but also has the advantage of reducing material costs, making it economically advantageous. be. However, with the above additive method, the adhesion between the circuit layer (metal layer) formed by plating on the insulating substrate and the board is inferior to that of copper-clad laminates, so the circuit layer tends to peel off, making it difficult to use as a printed circuit. It has the disadvantage of being less reliable.

この回路層と絶縁基板との密着力改善策として、絶縁基
板の被めつき面に例えばニトトルゴムを主成分とする接
着剤層(下地層)を設けたのち、クロム硫酸溶液で親水
化処理し、化学めつきを施す方法が提案されているが、
この方法にても十分な性能が得られないほか、クロム硫
酸溶液を使用するための廃液処理設備を必要とし望まし
くない。本発明者らは上記欠点や不都合さを解消するた
め検討を重ねた結果、ジェン系合成ゴムを主成分とする
接着剤層を介して陽極酸化処理したアルミニウム箔面と
積層板とを一体成形したのち「アルミニウム箔および陽
極酸化層の一部又は全部をエッチング除去し、露出した
接着剤面にコロナ放電処理を施すと、得られる接着面は
、化学めつきを施す上で極めて優れた適性を有している
ことを見出した。
As a measure to improve the adhesion between the circuit layer and the insulating substrate, an adhesive layer (underlying layer) containing, for example, nitrile rubber as a main component is provided on the surface of the insulating substrate to be plated, and then a hydrophilic treatment is performed using a chromium sulfuric acid solution. A method of chemical plating has been proposed, but
This method also does not provide sufficient performance and is undesirable because it requires waste liquid treatment equipment for using a chromium sulfuric acid solution. As a result of repeated studies in order to eliminate the above-mentioned drawbacks and inconveniences, the inventors of the present invention have integrally molded an anodized aluminum foil surface and a laminate via an adhesive layer mainly composed of Gen-based synthetic rubber. Afterwards, ``If some or all of the aluminum foil and anodized layer are etched away and the exposed adhesive surface is subjected to corona discharge treatment, the resulting adhesive surface has excellent suitability for chemical plating.'' I found out what I was doing.

すなわち、化学めつき層が容易に得られ、特にプリント
回路板の製造に適用した場合、絶縁基板とめつき層が強
固に密着しており、プリント回路として要求される密着
強度と、はんだ耐熱性を備えていることを見出した。本
発明は上記知見に基づきクロム硫酸溶液による処理を要
せず化学めつきによって密着強度のすぐれた回路を容易
に形成しうるプリント回路の形成方法の提供を目的とす
るものである。
In other words, the chemically plated layer can be easily obtained, and especially when applied to the manufacture of printed circuit boards, the insulating substrate and the plated layer are tightly adhered, achieving the adhesion strength and soldering heat resistance required for printed circuits. I found out that I was prepared. Based on the above findings, the present invention aims to provide a method for forming a printed circuit which can easily form a circuit with excellent adhesion strength by chemical plating without requiring treatment with a chromium sulfuric acid solution.

以下本発明を詳細に説明すると、本発明は{1)陽極酸
化処理により凹凸を形成させたアルミニウム箔上にジェ
ン系合成ゴムを主成分とする接着剤層を塗布し、これを
半硬化状態とする工程、■上記接着剤塗布面と絶縁基板
又はプリプレグを積層し、加熱、加圧時に一体成形する
工程、‘3ーアルミニウム箔および陽極酸化層をエッチ
ング除去して凹凸のある接着剤面を露出させる工程、‘
4ー上記凹凸のある接着剤面をコロナ放電処理する工程
、および(5)コロナ放電処理した凹凸面に化学めつき
を施して導電パターンを形成する工程、を具備すること
を特徴とするプリント回路の形成方法である。
To explain the present invention in detail below, the present invention consists of {1) coating an adhesive layer mainly composed of Gen-based synthetic rubber on an aluminum foil that has been made uneven by anodizing treatment, and leaving this in a semi-cured state; Step of laminating the above adhesive coated surface and the insulating substrate or prepreg, and integrally forming it by heating and pressurizing; '3- Etching away the aluminum foil and anodized layer to expose the uneven adhesive surface The process of '
4-A printed circuit comprising the steps of: subjecting the uneven adhesive surface to a corona discharge treatment; and (5) chemically plating the corona discharge-treated uneven surface to form a conductive pattern. This is the formation method.

一般にアルミニウム表面の陽極酸化法としてはリン酸法
、硫酸法、シュウ酸法、クロム酸法などが知られている
が、本発明では特にリン酸法による陽極酸化処理が好ま
しく、密着力を向上させる。
In general, phosphoric acid method, sulfuric acid method, oxalic acid method, chromic acid method, etc. are known as anodizing methods for aluminum surfaces, but in the present invention, anodizing treatment using phosphoric acid method is particularly preferred, as it improves adhesion. .

次に本発明において用いられる絶系象基板としはプラス
チック板、ガラス板、セラミック板、積層板、金属板表
面を絶縁性樹脂で被覆して得られる絶縁基板などを挙げ
ることができる。
Examples of the absolute substrate used in the present invention include plastic plates, glass plates, ceramic plates, laminate plates, and insulating substrates obtained by coating the surface of a metal plate with an insulating resin.

又本発明に用いられるジェン系合成ゴムを主成分とする
接着剤であるが、ジェン系合成ゴムとしては例えば、ブ
タジエン重合体、ブタジェンスチレン共重合体、ブタジ
ェンアクリロニトリル共重合体、イソプレンゴム、或い
はクロロブレンゴムなどが挙げられる。
Furthermore, the adhesive used in the present invention is mainly composed of a DEN-based synthetic rubber, and the DEN-based synthetic rubber includes, for example, butadiene polymer, butadiene styrene copolymer, butadiene acrylonitrile copolymer, isoprene rubber, Alternatively, chloroprene rubber and the like may be mentioned.

これらの重合体もしくは共重合体はそのまま用いてもよ
いが、ェポキシ樹脂、フェノール樹脂などの熱硬化性樹
脂、補強剤としての役目を果すシリカゲル、ケイ酸ジル
コニウム、ケイ酸マグネシウムなどの充填剤を適宜添加
配合して使用してもよい。次に上記接着剤を陽極酸化処
理したアルミニウム箔面に設けるには、接着剤を溶剤に
熔解させその接着剤溶液を調整したのちワイヤーパーコ
ート、ロールコート、カーテンコート、浸債、印刷など
の方法により陽極酸化層表面に塗布し、加熱乾燥させ半
硬化状態とする。
These polymers or copolymers may be used as they are, but they may also be supplemented with thermosetting resins such as epoxy resins and phenolic resins, and fillers such as silica gel, zirconium silicate, and magnesium silicate, which serve as reinforcing agents. It may be used by adding and blending. Next, in order to apply the above adhesive to the anodized aluminum foil surface, the adhesive is dissolved in a solvent, the adhesive solution is prepared, and then wire percoating, roll coating, curtain coating, bonding, printing, or other methods are used. It is applied to the surface of the anodized layer by heating and dried to a semi-cured state.

半硬化状態に必要な加熱条件は接着剤溶液に使用する溶
剤の種類、使用する接着剤樹脂の硬化のし易さに依存す
るので一概に述べることができない。しかし、接着剤中
に残存する溶剤が十分に少なく、一体成形した際にアル
ミニウム箔と絶縁基板とが十分に密着する条件を実験的
に求める必要がある。一体成形時における加熱、加圧条
件は上言己接着剤層を設けたアルミニウム箔面とプリプ
レグを一体成形する際には、接着剤の硬化条件とプリプ
レグの硬化条件を一致させることが望ましい。プリプレ
グとして紙基材にフェノール樹脂を含浸させたもの、ガ
ラス基材にェポキシ樹脂を含浸させたものを使用する場
合には、140〜19000の温度、50〜150k9
/地の圧力が普通である。又接着剤層を設けたアルミニ
ウム箔面と絶縁基板を一体成形する際には、絶縁基板が
本来有する電気的、機械的および化学的性質を損わない
加熱、加圧条件が要求される。上記接着剤層を介して一
体成形されたアルミニウム箔付き絶縁基板(以下プリプ
レグの場合も含めて絶縁基板と呼ぶ)からアルミニウム
箔および陽極酸化層を除去して凹凸のある接着剤層を露
出させるには、アルミニウム箔および陽極酸化層をエッ
チング除去すればよい。
The heating conditions required for a semi-cured state cannot be stated in general terms because they depend on the type of solvent used in the adhesive solution and the ease of curing of the adhesive resin used. However, it is necessary to experimentally find conditions in which the amount of solvent remaining in the adhesive is sufficiently small and the aluminum foil and the insulating substrate are in close contact with each other when integrally formed. The heating and pressure conditions during integral molding are as follows: When integrally molding the prepreg and the aluminum foil surface provided with the adhesive layer, it is desirable to match the curing conditions of the adhesive and the prepreg. When using a paper base material impregnated with phenol resin or a glass base material impregnated with epoxy resin as prepreg, the temperature is 140 to 19,000 °C, and the temperature is 50 to 150 k9.
/Earth pressure is normal. Furthermore, when integrally molding the aluminum foil surface provided with the adhesive layer and the insulating substrate, heating and pressurizing conditions are required that do not impair the electrical, mechanical, and chemical properties inherent to the insulating substrate. To expose the uneven adhesive layer by removing the aluminum foil and anodized layer from the aluminum foil-attached insulating substrate (hereinafter referred to as the insulating substrate, including prepreg) that has been integrally formed with the adhesive layer interposed therebetween. The aluminum foil and anodized layer may be removed by etching.

エッチングには普通カセィソーダ、塩酸水溶液が利用さ
れる。次に本発明に使用するコロナ放電処理としては直
流コ。ナ、交流コロナのいずれも使用できるが、処理面
に対して均一なコロナが得られる高周波コロナが望まし
い。又高周波コロナについても回路上から真空管方式、
スパークギャップ方式、ソリッドステート方式などがあ
り、周波数、高周波形に差異があるが、これらいずれの
方式も使用可能である。本発明のコロナ放電処理による
絶縁基板とめつき金属層との密着力が向上する理由は、
アルミニウム箔および陽極酸化層の除去により接着剤表
面に形成される大きな凹凸の一つ一つに、コロナ放電処
理によりさらに4・さな凹凸が形成されると同時に本処
理により表面が親水化されるため、化学めつきが接着剤
層の十分深い部分から形成されるためと考えられる。実
際、上記接着剤層にコロナ放電処理を施すと表面張力は
約3桝飢e/肌から5がyne/肌以上に増加する。本
発明において上記コロナ放電処理後は従来と同様にして
、例えば化学鋼めつき俗や化学ニッケルめつき格を用い
、いわゆる無電解めつきを施して所要のプリント回路を
形成する。このプリント回路は上記無電解めつき処理の
みで導電パターンを形成する方法によってもよいし、無
電解めつきと竜気めつき処理を併用して導電パターンを
形成する方法によってもよい。上記のごとく本発明によ
ればクロム硫酸溶液による処理などを要せずにしかも金
属箔が強固に密着し、はんだ耐熱性などの点ですぐれた
回路基板が容易に得られる。
Caustic soda and hydrochloric acid aqueous solutions are commonly used for etching. Next, the corona discharge treatment used in the present invention is direct current. Although either a high-frequency corona or an AC corona can be used, a high-frequency corona is preferable because it can provide a uniform corona over the treated surface. Also, regarding the high frequency corona, a vacuum tube method is used from the circuit,
There are spark gap methods, solid state methods, etc., and although there are differences in frequency and high frequency waveform, any of these methods can be used. The reason why the adhesion between the insulating substrate and the plating metal layer is improved by the corona discharge treatment of the present invention is as follows.
For each large unevenness formed on the adhesive surface by removing the aluminum foil and anodized layer, small unevenness is further formed by corona discharge treatment, and at the same time, the surface is made hydrophilic by this treatment. This is thought to be because chemical plating is formed from a sufficiently deep part of the adhesive layer. In fact, when the adhesive layer is subjected to a corona discharge treatment, the surface tension increases from approximately 3 m2/skin to more than 5 m/skin. In the present invention, after the corona discharge treatment, so-called electroless plating is performed using, for example, chemical steel plating or chemical nickel plating in the same manner as in the prior art to form a desired printed circuit. This printed circuit may be formed by forming a conductive pattern using only the electroless plating process, or by using a combination of electroless plating and draught plating processes. As described above, according to the present invention, it is possible to easily obtain a circuit board in which the metal foil adheres firmly without requiring treatment with a chromium sulfuric acid solution, and which is excellent in terms of soldering heat resistance and the like.

以下に本発明の実施例を記載する。Examples of the present invention are described below.

実施例1〜5、比較例1〜5 下記の配合をホモジナィザ−で混合したのちに、三本ロ
ールにより十分均一に混銭した。
Examples 1 to 5, Comparative Examples 1 to 5 The following formulations were mixed using a homogenizer, and then mixed sufficiently uniformly using a triple roll.

そののちブチルセロソルプ溶液で25重量%の接着剤溶
液に希釈調整した。oニトリルゴム(日本ゼオン■製、
商品名;ハイカー1072)の2低重量%のメチルエチ
ルケトン溶液 …・・・・・
・25の重量部oフェノール樹脂(三菱ガス化学■製、
商品名;ニカノールPR−1440M)の5の重量%の
メタ/ール溶液 …・・・・・・
5の重量部oェポキシ樹脂(シェル石油化学■製、商品
名:ェピコート1001)の8の重量%のメチルエチル
ケトン溶液 ・・・・・・・・・31
重量部o酸無水物系樹脂硬化剤(日本化薬■製、商品名
:カヤハードCLA)の20重量%のブチルセロソルブ
溶液 ・・・・・・・・・1丸亀量部次
に厚さ50ムのアルミニウム箔(材質;AIA3岬‐1
8)を用い下記の条件で陽極酸化処理した。
Thereafter, the adhesive solution was diluted to 25% by weight with a butyl cellosol solution. o Nitrile rubber (manufactured by Nippon Zeon ■,
Product name: Hiker 1072) 2% by weight methyl ethyl ketone solution...
・25 parts by weight o phenolic resin (manufactured by Mitsubishi Gas Chemical ■,
5% by weight methanol solution of Nicanol PR-1440M (trade name: Nicanol PR-1440M)
Methyl ethyl ketone solution of 5 parts by weight of epoxy resin (manufactured by Shell Petrochemical ■, trade name: Epikot 1001) in 8 parts by weight of methyl ethyl ketone 31
Part by weight o 20% by weight solution of acid anhydride resin curing agent (manufactured by Nippon Kayaku ■, trade name: Kayahard CLA) in butyl cellosolve 1 part by Marugame Next 50 mm thick Aluminum foil (material: AIA3 Misaki-1
8) under the following conditions.

前処理液1:アルカリ・ソーク・クリーナ、格溢;9ぴ
0、時間:5分前処理液2:フッ化水素アンモニウム、
格温;室温、時間;3分電解液:1の雲量%の日3P0
4、電流密度;0.8A/d〆、格温:50qo、時間
;15分上記接着剤溶液を陽極酸化処理して表面を凹凸
にしたアルミニウム箔上にワイヤーバーにて塗布し、1
20qCのオーブン中で20分間乾燥して半硬化状態と
した。
Pretreatment liquid 1: Alkaline soak cleaner, Kakufuku; 9 pi 0, time: 5 minutes Pretreatment liquid 2: Ammonium hydrogen fluoride,
Temperature: room temperature, time: 3 minutes Electrolyte: 1 cloud cover% day 3P0
4. Current density: 0.8 A/d〆, temperature: 50 qo, time: 15 minutes The above adhesive solution was applied with a wire bar onto an aluminum foil whose surface had been roughened by anodizing treatment, and 1
It was dried in an oven at 20 qC for 20 minutes to a semi-cured state.

次に上記接着剤付きアルミニウム箔を厚さ1.6柳の紙
ヱポキシ系積層板の表裏両面に上記接着剤面を接して重
ね合せ、多段ヒートプレスに入れ20kg/鮒の圧力で
160oo、60分間の条件で一体成形した。
Next, the adhesive-coated aluminum foil was placed on both the front and back sides of a 1.6-thick willow paper epoxy laminate with the adhesive side in contact with the adhesive side, and placed in a multi-stage heat press at 160oo for 60 minutes at a pressure of 20kg/carp. It was integrally molded under the following conditions.

その結果硬化した紙ェポキシ樹脂基材にアルミニウム箔
が強固に密着した積層板が得られた。さらに50qoに
加溢された5重量%のカセイソーダと0.5重量%のグ
ルコン酸ソーダを含む水溶液からなるエッチング液を用
いて5分間浸潰しアルミニウム箔および陽極酸化層を除
去して凹凸のある接着剤面を露出させた。次にソリッド
ステート型コロナ放電機により、上記凹凸面のある接着
剤層をコロナ放電処理した。
As a result, a laminate was obtained in which the aluminum foil was firmly adhered to the cured paper epoxy resin base material. Furthermore, the aluminum foil and anodized layer were removed by immersion for 5 minutes using an etching solution consisting of an aqueous solution containing 5% by weight of caustic soda and 0.5% by weight of sodium gluconate, which was flooded with 50 qo, resulting in uneven bonding. The drug surface was exposed. Next, the adhesive layer with the uneven surface was subjected to corona discharge treatment using a solid-state corona discharge machine.

処理条件は下記の通りである。o装 置 ピラー社製
モデル 2.1KVAo印加電圧 8500Vo周波数
9.磯比 o接着剤付き基板送り速度 15m/mino入力電力
143.5V、1泌o電極間ギャップ 2.4肋 上記コロナ放電処理した接着剤付き基板を通常の方法で
めつき金属層の厚さが約4000Aに化学鋼めつきした
The processing conditions are as follows. o Device manufactured by Pillar Co., Ltd.
Model 2.1KVAo applied voltage 8500Vo frequency 9. Substrate with adhesive feeding speed: 15 m/min Input power: 143.5 V, gap between electrodes: 2.4 volts The above corona discharge treated substrate with adhesive was plated in the usual manner to reduce the thickness of the metal layer. Chemical steel plated to approximately 4000A.

めつき浴およびめつき前処理にはシップレ一社製32紅
プロセス(商品名)を使用した。さらに電気鋼めつきを
施し、鋼箔の厚さを約30仏に肉盛りした。化学鋼めつ
き後の外観およびJISC−6481に準拠して検討し
ためつき銅膜と積層板の密着力、はんだ耐熱値の結果は
第1表の通りであった。第1表 * かっこ内の数字は上記コロナ放電機に接着剤付き積
層板を連続的に通過させたときの通過回数第1表で実施
例1〜5は本発明の接着剤層があり、陽極酸化処理をし
、かつコロナ放電処理を施したもので、この結果はJB
C−6482に基づく規格値(紙ェポキシ系銅張積層板
の場合)、密着力;14k9′cM、はんだ耐熱値(2
60±8℃秒);1秒を越えており、実用的に十分な値
であるこてが分る。
For the plating bath and plating pretreatment, 32 Beni Process (trade name) manufactured by Shipley Co., Ltd. was used. Furthermore, electric steel plating was applied, and the thickness of the steel foil was increased to approximately 30 mm. Table 1 shows the appearance after chemical steel plating, the adhesion between the plated copper film and the laminate, and the solder heat resistance, which were examined in accordance with JISC-6481. Table 1 * The numbers in parentheses are the number of passes when the adhesive-coated laminate was continuously passed through the corona discharge machine in Table 1. Examples 1 to 5 had the adhesive layer of the present invention, and It has undergone oxidation treatment and corona discharge treatment, and this result is JB
Standard values based on C-6482 (for paper-epoxy copper clad laminates), adhesion strength: 14k9'cM, solder heat resistance value (2
60±8°C seconds); it exceeds 1 second, which is a practically sufficient value.

これに反し比較例1〜5は本発明の接着剤層とコロナ放
電処理のいずれか一方が欠ける場合、或は両者ともない
場合であり、いずれも密着力およびはんだ耐熱値で著し
く劣る。なおアルマイト層は密着力とはんだ耐熱値向上
のための補完的役割を果すものと考えられる。実施例
6〜10 実施例1〜5で用いた工程のなかで陽極酸化処理として
下記を用いる以外、実施例1〜5と同一の条件で化学め
つき、電気めつきまでを施し、銅箔の厚さを約30Aに
肉盛りした。
On the other hand, in Comparative Examples 1 to 5, either the adhesive layer of the present invention or the corona discharge treatment was missing, or both were missing, and both were significantly inferior in adhesion and soldering heat resistance. Note that the alumite layer is considered to play a complementary role in improving adhesion and soldering heat resistance. Example
6-10 Chemical plating and electroplating were performed under the same conditions as Examples 1-5, except that the following was used as anodizing treatment in the steps used in Examples 1-5, and the thickness of the copper foil was I filled it up to about 30A.

化学銅めつき後の外観およびJISC−6481に準拠
して検討しためつき銅膜と積層板の密着力、はんだ耐熱
値の結果は第2表の通りであった。前処理液;アルカリ
・ソーク・クリーナ、俗温;4000、時間;1び分電
解液;3の重量%の日3P04、電流密度;0.船/d
〆、俗温;30qo、時間:約1分第2表 かっこ内の数字はコロナ放電機に接着剤付き積層板を連
続的に通過させたときの通過回数第2表のごとく異なる
陽極酸化処理を施しても、本発明の接着剤層があり、か
つコロナ放電を行えば、JISC−6482に基づく規
格値を越えており、実施例1〜5同様に、実用的に十分
な値であることが分る。
Table 2 shows the appearance after chemical copper plating, the adhesion between the plated copper film and the laminate, and the solder heat resistance determined in accordance with JISC-6481. Pretreatment solution; alkaline soak cleaner, ambient temperature; 4000, time; 1 minute; electrolyte; 3% by weight day 3P04; current density; 0. ship/d
〆, ordinary temperature: 30qo, time: about 1 minute Table 2 The numbers in parentheses indicate the number of passes when the adhesive-coated laminate was passed through the corona discharge machine continuously. Even if the adhesive layer of the present invention is present and corona discharge is performed, the value exceeds the standard value based on JISC-6482, and as in Examples 1 to 5, it is confirmed that the value is sufficient for practical use. I understand.

実施例 11、12 実施例1〜5で用いたソリッドステート型コロナ放電機
の代りにスパークギャップ型コロナ放電機を用いる以外
は実施例1〜5と同様にして電気めつきを施した。
Examples 11 and 12 Electroplating was performed in the same manner as in Examples 1 to 5, except that a spark gap type corona discharge machine was used instead of the solid state type corona discharge machine used in Examples 1 to 5.

めつき外観は良好で密着力とはんだ耐熱値は第3表の通
りで実施例1〜5の結果と同等でJISC−6482に
基づく規格値を越えており、実用的に十分な値であるこ
とが分る。第3表 上記のごとく本発明に従った接着剤層、アルミニウム箔
層除去によるレブリカ、コロナ放電処理によるプリント
回路形成方法によればクロム酸などを使用することなく
密着力、はんだ耐熱性にすぐれたプリント回路基板が得
られる。
The plating appearance is good, and the adhesion and soldering heat resistance values are as shown in Table 3, which are equivalent to the results of Examples 1 to 5 and exceed the standard values based on JISC-6482, which are sufficient values for practical use. I understand. Table 3 As shown above, according to the printed circuit forming method using the adhesive layer, the replica by removing the aluminum foil layer, and the corona discharge treatment according to the present invention, excellent adhesion and soldering heat resistance can be achieved without using chromic acid or the like. A printed circuit board is obtained.

Claims (1)

【特許請求の範囲】[Claims] 1 陽極酸化処理により凹凸面を形成せしめたアルミニ
ウム箔上にジエン系合成ゴムを主成分とする接着剤を塗
布、乾燥して半硬化状態の接着剤層を形成する工程、上
記接着剤層と絶縁基板またはプリプレグを積層せしめ加
熱、加圧時に一体成形する工程、陽極酸化されたアルミ
ニウム箔をエツチング除去して凹凸面のある接着剤層を
露出させる工程、上記凹凸面をコロナ放電処理する工程
、および上記コロナ放電処理した凹凸面に化学めつきを
施して導電パターンを形成する工程、を具備することを
特徴とするプリント回路を形成する方法。
1. A step of applying an adhesive mainly composed of diene synthetic rubber onto an aluminum foil that has been made to have an uneven surface by anodizing treatment, and drying it to form a semi-cured adhesive layer, which is insulated from the adhesive layer. A step of laminating substrates or prepregs and integrally molding them when heated and pressurized, a step of etching away the anodized aluminum foil to expose an adhesive layer with an uneven surface, a step of subjecting the uneven surface to a corona discharge treatment, and A method for forming a printed circuit, comprising the step of chemically plating the corona discharge-treated uneven surface to form a conductive pattern.
JP9317278A 1978-07-13 1978-08-01 How to form printed circuits Expired JPS605237B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9317278A JPS605237B2 (en) 1978-08-01 1978-08-01 How to form printed circuits
GB8007439A GB2040101B (en) 1978-07-13 1979-06-30 Method of fabricating printed ciurcuits
PCT/JP1979/000171 WO1980000294A1 (en) 1978-07-13 1979-06-30 Method of fabricating printed circuits
DE2952961A DE2952961C1 (en) 1978-07-13 1979-06-30 Process for the production of a printed circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9317278A JPS605237B2 (en) 1978-08-01 1978-08-01 How to form printed circuits

Publications (2)

Publication Number Publication Date
JPS5521104A JPS5521104A (en) 1980-02-15
JPS605237B2 true JPS605237B2 (en) 1985-02-08

Family

ID=14075143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9317278A Expired JPS605237B2 (en) 1978-07-13 1978-08-01 How to form printed circuits

Country Status (1)

Country Link
JP (1) JPS605237B2 (en)

Also Published As

Publication number Publication date
JPS5521104A (en) 1980-02-15

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