JPS60250685A - Electric circuit board - Google Patents

Electric circuit board

Info

Publication number
JPS60250685A
JPS60250685A JP10687284A JP10687284A JPS60250685A JP S60250685 A JPS60250685 A JP S60250685A JP 10687284 A JP10687284 A JP 10687284A JP 10687284 A JP10687284 A JP 10687284A JP S60250685 A JPS60250685 A JP S60250685A
Authority
JP
Japan
Prior art keywords
circuit board
adhesive
insulating layer
layer
aluminum plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10687284A
Other languages
Japanese (ja)
Inventor
高木 正己
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP10687284A priority Critical patent/JPS60250685A/en
Publication of JPS60250685A publication Critical patent/JPS60250685A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔技術分野〕 この発明は、電子部品を高密度に実装することのできる
電路基板に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an electrical circuit board on which electronic components can be mounted with high density.

〔背景技術〕[Background technology]

電子部品を高密度に実装すると電路基板の温度が上昇し
、電子部品の特性を劣化させたり、特性を変化させるな
どの問題があるので、高密度に実装する電路基板の場合
には熱伝導のすぐれたアルミ板のような導電金属板をは
りつけている。電路基板は耐熱性にすぐれたガラスエポ
キシ樹脂銅張積層板を使用している。この積層板は標準
的な板厚が1.6Mであり、熱放散がわるい。そこで板
厚のうすい(0,5IIiW〜1.01m)ものを使用
するが、それ#1ど向上しないにもかかわらず価格が大
巾に増える。
When electronic components are mounted in a high density, the temperature of the circuit board increases, causing problems such as degrading or changing the characteristics of the electronic components. A conductive metal plate like an aluminum plate is attached to it. The circuit board uses a glass epoxy resin copper-clad laminate with excellent heat resistance. This laminate has a standard thickness of 1.6M and has poor heat dissipation. Therefore, a thinner plate (0.5 IIiW ~ 1.01 m) is used, but although it does not improve #1, the price increases significantly.

さらにガラスエポキシ樹脂積層板とアルミ板の熱膨張係
数が異なりそりやひねりが生じアルミ板からはがれるお
それがある。
Furthermore, the thermal expansion coefficients of the glass epoxy resin laminate and the aluminum plate are different, and there is a risk that the laminate may warp or twist and come off from the aluminum plate.

〔発明の目的〕[Purpose of the invention]

本願発明は、上記する欠点を改善することを目的とし、
電子部品を高密度に実装しても熱放散がよく、電子部品
を劣化させることがない電路基板を提供するものである
The present invention aims to improve the above-mentioned drawbacks,
To provide an electrical circuit board that has good heat dissipation even when electronic components are mounted at high density and does not cause deterioration of the electronic components.

〔発明の開示〕[Disclosure of the invention]

以下本願発明を実施例にしたがい詳細に説明する。 The present invention will be described in detail below based on examples.

図において、6はアルミ板であり、その表面に絶縁層7
が形成されている。この絶#層7は陽仮酸化法により形
成することができる。陽極酸化法はアルミ板6をシュウ
酸やクロム酸や硫酸の水溶流のような電解質中で陽極と
して電流を通ずることにより、電解によって発生した酸
素がアルミニウムと化合して酸化被膜をつくり、美μ以
上にすることも可能である。8は接着剤層である。この
接着剤は熱に強いエポキシ系の接着剤が適当である。例
えばシリコン変性エポキシ樹脂とNBRとを主剤とし、
硬化剤と必要に応じて用いられる硬化促進剤とを配合し
て調整される接着剤を用いる。
In the figure, 6 is an aluminum plate with an insulating layer 7 on its surface.
is formed. This isolation layer 7 can be formed by a positive temporary oxidation method. In the anodic oxidation method, the aluminum plate 6 is used as an anode in an electrolyte such as an aqueous solution of oxalic acid, chromic acid, or sulfuric acid, and a current is passed through it as an anode.The oxygen generated by the electrolysis combines with aluminum to form an oxide film, resulting in a beautiful μ It is also possible to do more than that. 8 is an adhesive layer. A suitable adhesive for this adhesive is an epoxy adhesive that is resistant to heat. For example, silicone-modified epoxy resin and NBR are used as main ingredients,
An adhesive prepared by blending a curing agent and a curing accelerator used as necessary is used.

シリコン変性エポキシ樹脂は次の構造式の主鎖にポリシ
ロキサンを側鎖として付加せしめたものであり、エポキ
シ当量が700〜1700 、シリケート変性率が5重
量%以上のものが好まし一0R−0−8i −0−R 〈ヒ暑 R ここで上記構成中、n=2〜加(特に4〜7)、m=l
〜8(特に2〜4)のものが好ましく、Rは芳香族又は
脂肪族の次代水素で、Rとしては脂肪族のものが好まし
く特にエチル基であることが好ましい。
The silicon-modified epoxy resin has polysiloxane added as a side chain to the main chain of the following structural formula, and preferably has an epoxy equivalent of 700 to 1,700 and a silicate modification rate of 5% by weight or more. -8i -0-R <Hisatsu R Here, in the above configuration, n = 2 to + (especially 4 to 7), m = l
-8 (particularly 2-4) are preferred, R is aromatic or aliphatic hydrogen, and R is preferably aliphatic, particularly preferably an ethyl group.

なお前記絶縁層7が多孔質の絶縁層であるため、第3図
に示すごとく、接着剤が孔9に流入し、密着性が増す。
Note that since the insulating layer 7 is a porous insulating layer, as shown in FIG. 3, the adhesive flows into the holes 9, increasing the adhesion.

この接着剤は(資)μ〜1ωμ程度の厚さで塗布する。This adhesive is applied to a thickness of approximately 1 to 1 ω.

塗布したのち熱風乾燥や赤外炉などにいれてBステージ
の状態まで硬化させる。その条件は150°Q、30〜
120分程度が適当である。
After coating, it is dried in hot air or placed in an infrared oven to harden to B-stage. The conditions are 150°Q, 30~
Approximately 120 minutes is appropriate.

次いで接着剤層の表面を物理的手法で粗面化する。例え
ばサンドベーターなとで。
Next, the surface of the adhesive layer is roughened by a physical method. For example, Sandbator.

次いで粗面化された表面に無電解メッキ、電気メッキを
施すが、先ず接着剤の粗面に植付は活性化処理を施す。
Next, electroless plating and electroplating are applied to the roughened surface, but first, the rough surface of the adhesive is subjected to activation treatment.

植付は活性化処理は例えばシワプレイ化のキャタブリッ
プ404、キャタボジ、フト利、アクセレータ19をこ
の順に塗布することによって行うことができる。この活
性化処理を行った後無電解銅メッキ浴に浸漬して、ごく
薄い導電層を形成し、次いで電気銅メッキ浴にこれを浸
漬し、導電メッキ層により導電10を形成する。
Planting can be activated by, for example, applying wrinkle play catalyst lip 404, caterpillar, foot lever, and accelerator 19 in this order. After performing this activation treatment, it is immersed in an electroless copper plating bath to form a very thin conductive layer, and then immersed in an electrolytic copper plating bath to form a conductive layer 10 from the conductive plating layer.

しかる後に接着剤をBステージから完全に硬化させる。Thereafter, the adhesive is completely cured from the B stage.

前記導電メッキ810を工、・、チングなどして必要表
回路パターンを形成する。導’M、 Fm 10とアル
ミ板6との間にはアルミ板6の酸化絶縁層7(約田μ程
度)と、接着剤層8(約30〜100μ程度)が介在し
ており極めて薄い絶縁層が形成されている。
The conductive plating 810 is etched, etched, etc. to form a necessary front circuit pattern. Between the conductors M and Fm 10 and the aluminum plate 6, an oxide insulating layer 7 (approximately 10 μm) of the aluminum plate 6 and an adhesive layer 8 (approximately 30 to 100 μm thick) are interposed to form an extremely thin insulation layer. layers are formed.

この絶縁層はうすいので絶縁耐力は大きくけないけれど
もD C12VやDC6vなど低い電圧で一般的に使用
される電気回路であれば充分な絶縁が得られる。
Since this insulating layer is thin, its dielectric strength is not significantly compromised, but sufficient insulation can be obtained for electrical circuits commonly used at low voltages such as DC 12V or DC 6V.

而して、導電層10に回路を形成し、この回路に極めて
高密度に電子部品を実装して、導電層10の温度上昇が
大きくても、接着剤層8、絶縁層7のあつさが従来例に
比較して相当うすいので熱伝導度はよく、しかもアルミ
板6は熱の良導体であるから、アルミ板6を他の放熱の
よい金属板などに取付けられている場合には、どんどん
放熱する。
Therefore, even if a circuit is formed on the conductive layer 10 and electronic components are mounted on this circuit at an extremely high density, the temperature of the adhesive layer 8 and the insulating layer 7 will remain constant even if the temperature of the conductive layer 10 increases significantly. It is considerably thinner than the conventional example, so it has good thermal conductivity, and since the aluminum plate 6 is a good conductor of heat, if the aluminum plate 6 is attached to another metal plate with good heat dissipation, it will dissipate heat rapidly. do.

〔発明の効果〕〔Effect of the invention〕

上記するごとく本願発明によれば、表面に酸化処理によ
り絶縁層7が形成された導電性金属板6と、この金属板
6の前記絶縁層7の表面に塗布された接着剤層8と、こ
の接着剤層8の表面に形成された電路10とを備えた電
路基板としたので、電子部品を高密度に実装して、温度
上昇が高くても。
As described above, according to the present invention, the conductive metal plate 6 has an insulating layer 7 formed on its surface by oxidation treatment, the adhesive layer 8 coated on the surface of the insulating layer 7 of this metal plate 6, and Since the circuit board is provided with the circuit board 10 formed on the surface of the adhesive layer 8, it is possible to mount electronic components at high density even when the temperature rise is high.

絶縁層、接着剤層が薄いので、アルミ板6の方向に放熱
がよい。したがって電子部品の劣化や特性の変化もない
Since the insulating layer and adhesive layer are thin, heat radiation is good in the direction of the aluminum plate 6. Therefore, there is no deterioration of electronic components or change in characteristics.

しかも従来例の、ごとくガラスエポキシ積層板に比較し
、コストは極めて安価となる。
Furthermore, the cost is extremely low compared to conventional glass epoxy laminates.

【図面の簡単な説明】[Brief explanation of the drawing]

図において、第1図は従来例を示す部分断面図、第2図
乃至第3図は本願考案の寮施例を示す部分断面図である
。 6:アルミ板、7:酸化絶縁層、8:接着剤層、lO;
導電板。
In the drawings, FIG. 1 is a partial sectional view showing a conventional example, and FIGS. 2 and 3 are partial sectional views showing a dormitory embodiment of the present invention. 6: Aluminum plate, 7: Oxidized insulating layer, 8: Adhesive layer, IO;
conductive plate.

Claims (1)

【特許請求の範囲】[Claims] (1)表面に酸化処理により絶縁層が形成された導電性
金属板と、この金属板の前記絶縁層の表面に塗布された
接着剤層と、この接着剤層の表面に形成された電路とを
備えた電路基板。
(1) A conductive metal plate with an insulating layer formed on the surface by oxidation treatment, an adhesive layer applied to the surface of the insulating layer of this metal plate, and an electric path formed on the surface of this adhesive layer. Electrical circuit board with.
JP10687284A 1984-05-25 1984-05-25 Electric circuit board Pending JPS60250685A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10687284A JPS60250685A (en) 1984-05-25 1984-05-25 Electric circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10687284A JPS60250685A (en) 1984-05-25 1984-05-25 Electric circuit board

Publications (1)

Publication Number Publication Date
JPS60250685A true JPS60250685A (en) 1985-12-11

Family

ID=14444623

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10687284A Pending JPS60250685A (en) 1984-05-25 1984-05-25 Electric circuit board

Country Status (1)

Country Link
JP (1) JPS60250685A (en)

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