JPS6050917A - 分子線エピタキシャル装置のウエハ温度制御装置 - Google Patents
分子線エピタキシャル装置のウエハ温度制御装置Info
- Publication number
- JPS6050917A JPS6050917A JP16007383A JP16007383A JPS6050917A JP S6050917 A JPS6050917 A JP S6050917A JP 16007383 A JP16007383 A JP 16007383A JP 16007383 A JP16007383 A JP 16007383A JP S6050917 A JPS6050917 A JP S6050917A
- Authority
- JP
- Japan
- Prior art keywords
- cylinder
- temperature
- window
- wafer
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16007383A JPS6050917A (ja) | 1983-08-30 | 1983-08-30 | 分子線エピタキシャル装置のウエハ温度制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16007383A JPS6050917A (ja) | 1983-08-30 | 1983-08-30 | 分子線エピタキシャル装置のウエハ温度制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6050917A true JPS6050917A (ja) | 1985-03-22 |
| JPH0113214B2 JPH0113214B2 (enrdf_load_stackoverflow) | 1989-03-03 |
Family
ID=15707296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16007383A Granted JPS6050917A (ja) | 1983-08-30 | 1983-08-30 | 分子線エピタキシャル装置のウエハ温度制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6050917A (enrdf_load_stackoverflow) |
-
1983
- 1983-08-30 JP JP16007383A patent/JPS6050917A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0113214B2 (enrdf_load_stackoverflow) | 1989-03-03 |
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