JPS6045919A - Substrate for thin film magnetic head and forming method of magnetic pole - Google Patents
Substrate for thin film magnetic head and forming method of magnetic poleInfo
- Publication number
- JPS6045919A JPS6045919A JP15363883A JP15363883A JPS6045919A JP S6045919 A JPS6045919 A JP S6045919A JP 15363883 A JP15363883 A JP 15363883A JP 15363883 A JP15363883 A JP 15363883A JP S6045919 A JPS6045919 A JP S6045919A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- magnetic pole
- thin film
- magnetic
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3113—Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
＋１１ 発明の技術分野
本発明は、薄膜磁気ヘッドに用いる基板に係り、特に基
板表面の加工に関する。DETAILED DESCRIPTION OF THE INVENTION +11 Technical Field of the Invention The present invention relates to a substrate used in a thin film magnetic head, and particularly to processing of the surface of the substrate.
（２） 従来技術と問題点
従来の薄膜磁気ヘッド用基板としてはガラス系或はアル
ミナ系のセラミックを加工し、表面をｌＯＯλ以下の
さに エしている。この加工粗さを得るには、加工Ｕを
伴い、基板価格の上昇を招いている。またその上面に形
成する薄膜層の密着不良によるハクリなどの欠陥が生ず
る場合があった。また通常の鏡面加工を施した基板を使
用した薄膜磁気ヘッドに於て、その磁極へ異方性付与が
困難となり、この特性の変動が大きいのどの欠点があっ
た。(2) Conventional technology and problems Conventional thin-film magnetic head substrates are made of glass or alumina ceramic, and the surface is
I'm having a hard time. Obtaining this processed roughness requires processing U, which causes an increase in the substrate price. In addition, defects such as peeling may occur due to poor adhesion of the thin film layer formed on the top surface. Further, in a thin film magnetic head using a substrate subjected to ordinary mirror finishing, it is difficult to impart anisotropy to the magnetic pole, and this characteristic has a drawback of large fluctuations.
なお第１図は従来の表面を１００Å以下の粗さに加工し
た薄膜磁気ヘッド用基板１上に磁極２を形成する図であ
る。図で（ａ）は平面図、（ｂ）はｘｘ’軸断面図を示
す。FIG. 1 is a diagram showing the formation of a magnetic pole 2 on a conventional thin film magnetic head substrate 1 whose surface is processed to a roughness of 100 Å or less. In the figures, (a) shows a plan view, and (b) shows a xx'-axis cross-sectional view.
（３）発明の目的
本発明の目的は、基板表面を粗くすることによリ、基板
への磁性層の密着性の向上を計り、さらにその 工 ■
を−口に えることにより薄膜磁極に異方性を付与しよ
うとするものである。(3) Purpose of the Invention The purpose of the present invention is to improve the adhesion of the magnetic layer to the substrate by roughening the surface of the substrate, and to further improve the process.
The idea is to impart anisotropy to the thin film magnetic pole by adding .
（４）発明の構成
＋１１薄膜磁気ヘツドを形成する基板に於て、その表面
の粗さを該基板上に形成する薄膜磁極厚のｌ／１０から
１／１００とすることを特徴とした薄膜磁気ヘッド用基
板
（２）基板に表面加工を施す際に、基板上へ形成する薄
膜磁極のコア幅と平行な方向へ加工傷を残すことを特徴
とする特許請求の範囲第１項記載の薄膜磁気ヘッド用基
板
（３）基板上に、薄膜磁極を設ける薄膜磁気ヘッドの製
法において、薄膜磁気ヘッドの磁極形成時に、磁極幅と
平行方向にストライプを形成後、所定の膜厚を有する磁
性膜を成膜する磁極形成法（４）上記ストライプが加工
溝もしくは、非磁性膜凸形パターンであることを特徴と
する第３項記載の磁極形成法
により達成される。(4) Structure of the Invention +11 A thin film magnetic head, characterized in that the surface roughness of the substrate forming the thin film magnetic head is 1/10 to 1/100 of the thickness of the thin film magnetic pole formed on the substrate. Substrate for Head (2) Thin film magnetic material according to claim 1, characterized in that when the substrate is subjected to surface processing, processing scratches are left in a direction parallel to the core width of the thin film magnetic pole formed on the substrate. Head Substrate (3) In the manufacturing method of a thin film magnetic head in which a thin film magnetic pole is provided on a substrate, when forming the magnetic pole of the thin film magnetic head, a stripe is formed in a direction parallel to the magnetic pole width, and then a magnetic film having a predetermined thickness is formed. Method for forming a magnetic pole using a film (4) This is achieved by the method for forming a magnetic pole according to item 3, wherein the stripe is a processed groove or a convex pattern of a nonmagnetic film.
本発明は、基板表面仕上げの際に鏡面加工（〜１００人
）まで加工を行わず、その表面上に形成する薄膜磁極の
膜厚（通常〜２μｍ）の１／１０ないし１／１００の表
面粗さまでの加工で終了する。またその加工方向は、薄
膜磁気ヘッドを形成する際のコア 向とする。このよう
に表面加工された基板上に薄膜磁極を形成する場合、磁
性薄膜形成初期の結晶核がこのキズに沿って形成され、
その方向に一軸異方性が得られる。本発明はこの効果を
積極的に利用したものである。The present invention does not perform mirror finishing (~100 people) when finishing the surface of the substrate, and the surface roughness is 1/10 to 1/100 of the thickness (usually ~2 μm) of the thin film magnetic pole formed on the surface. Finished with the same processing. The processing direction is the direction of the core when forming the thin film magnetic head. When forming a thin film magnetic pole on a substrate whose surface has been processed in this way, crystal nuclei at the initial stage of magnetic thin film formation are formed along these scratches.
Uniaxial anisotropy is obtained in that direction. The present invention actively utilizes this effect.
（５）発明の実施例 以下本発明について実施例を上げて説明する。(5) Examples of the invention The present invention will be described below with reference to Examples.
第２図に本発明の一実施例を示す。第２図でｆａ）は基
板１上に主磁極薄膜層２を形成した平面図で、（ｂ）は
ｌａｌのｘｘ’線断面図を示す。主磁極の磁極は図の矢
印Ａ方向に異方性をイ］与する場合を示し、１１は基板
表面の加工傷である。FIG. 2 shows an embodiment of the present invention. In FIG. 2, fa) is a plan view of the main magnetic pole thin film layer 2 formed on the substrate 1, and FIG. 2B is a cross-sectional view taken along the line xx' of la1. The magnetic pole of the main pole provides anisotropy in the direction of arrow A in the figure, and numeral 11 indicates processing scratches on the substrate surface.
表面に基板の傷あとが反映され、好ましい磁気特′性が
得られない。また−ニーより小であるとその（００
効果は発生しない。このような基板を使用することによ
り磁極の磁性膜２はＡ方向の傷により異方性が形成され
つつ所定の膜厚に成膜される。この発明により磁麺の磁
化方向をＡ方向へ揃えることが出来、良好な特性を持つ
薄膜磁気ヘッドの形成が容易となる。Scratches on the substrate are reflected on the surface, making it impossible to obtain desirable magnetic properties. Also, if it is smaller than the knee, the (00 effect will not occur.) By using such a substrate, the magnetic film 2 of the magnetic pole can be formed to a predetermined thickness while forming anisotropy due to scratches in the A direction. According to the present invention, the magnetization direction of the magnetic noodles can be aligned in the A direction, making it easy to form a thin film magnetic head with good characteristics.
第３図に第２の実施例を示す。この実施例では、基板ｌ
上に意識的に溝加工を行うものである。加工溝１２の深
さｄｌを磁極厚さｔの １ 、、ＬとＬＯ１υり
ｌ１幅ｄ２を磁極厚さｔの１二ｉｉとする。又加工溝１
２の間隔りは磁極厚さｔのｉｌ１ＩＬ程度とする。この
ようなストライプ状の加工溝を形成することにより、第
１の実施例と同様の効果を得た。FIG. 3 shows a second embodiment. In this example, the substrate l
Grooves are intentionally machined on the top. Let the depth dl of the processed groove 12 be 1, L of the magnetic pole thickness t, and the width d2 of LO1υl1 be 12ii of the magnetic pole thickness t. Also, processing groove 1
The interval between the two is approximately il1IL of the magnetic pole thickness t. By forming such striped grooves, the same effects as in the first embodiment were obtained.
第４図に本発明の効果を応用した他の実施例を示す。基
板としては鏡面加工したものを使用し、その上面にまず
、加工傷１１もしくは加工溝１２に相当するようなスト
ライプ形状の磁性膜１３を形成する。即ち、基板１上に
所定膜厚ｄ１程度の磁性膜を形成した後、ホトエツチン
グにより、所定幅ｄ２程度で間隔がＤ程度のストライプ
形状にパターニングする。FIG. 4 shows another embodiment to which the effects of the present invention are applied. A mirror-finished substrate is used as the substrate, and a striped magnetic film 13 corresponding to the processing scratches 11 or the processing grooves 12 is first formed on its upper surface. That is, after forming a magnetic film with a predetermined thickness of about d1 on the substrate 1, it is patterned into a stripe shape having a predetermined width of about d2 and an interval of about D by photoetching.
しかる後基板上に本来の磁極形状に磁性膜２を第４図（
Ｃ１もしくは（ｄｌのように形成することにより、第１
．第２の実施例と同様な効果を得た。第４図（ａｌ、
（Ｃ１は平面図、 （ｂｌ、 Ｔｄ）はそれぞれ（ａｌ
、 （Ｃ）のｘｘ′線断面図を示す。After that, the magnetic film 2 is placed on the substrate in the original magnetic pole shape as shown in FIG.
C1 or (dl), the first
．． Similar effects to those of the second embodiment were obtained. Figure 4 (al,
(C1 is a plan view, (bl, Td) are (al
, shows a cross-sectional view taken along line xx' of (C).
（６）発明の効果
本発明によれば、磁性層の基板への密着を向上すること
ができるとともに、磁性層に良好な異方性を付与するこ
とができる。その結果、製造の歩留り向上とともに高性
能な薄膜磁気ヘットを容易に製造することができる。(6) Effects of the Invention According to the present invention, it is possible to improve the adhesion of the magnetic layer to the substrate and to impart good anisotropy to the magnetic layer. As a result, it is possible to easily manufacture a high-performance thin film magnetic head with improved manufacturing yield.
第１図は従来の薄膜磁気ヘッドを説明する図。
第２図〜第４図は本発明の薄膜磁気ヘッドの製法を説明
する平面図（ａｌと断面図ｆｂｌである。
ｔｌ 目
豫３ 目FIG. 1 is a diagram illustrating a conventional thin film magnetic head. FIGS. 2 to 4 are a plan view (al) and a cross-sectional view fbl for explaining the manufacturing method of the thin film magnetic head of the present invention.
Claims (1)
面の粗さを該基板上に形成する薄膜磁極厚の１／１０か
ら１／１００とすることを特徴とした薄ｌＩ＊磁気ヘッ
ド用基板 （２）基板に表面加工を施す際に、基板上へ形成する薄
膜磁極のコア幅と平行な方向へ加工傷を残すことを特徴
とする特許請求の範囲第１項記載の薄膜磁気ヘッド用基
板 （３）基板上に、薄膜磁極を設ける薄膜磁気ヘッドの製
法において、薄膜磁気ヘッドの磁極形成時に、磁極幅と
平行方向にストライプを形成後、所定の膜厚を有する磁
性膜を成膜する磁極形成法（４）上記ストライプが加工
溝もしくは非磁性膜の凸形パターンであることを特徴と
する特許請求の範囲第３項記載の磁極形成法[Claims] +11 A thin lI substrate for forming a thin film magnetic head, characterized in that the surface roughness is 1/10 to 1/100 of the thickness of the thin film magnetic pole formed on the substrate. *Substrate for magnetic head (2) When surface-processing the substrate, processing scratches are left in a direction parallel to the core width of the thin-film magnetic pole formed on the substrate, according to claim 1. Substrate for Thin Film Magnetic Head (3) In the manufacturing method of a thin film magnetic head in which a thin film magnetic pole is provided on a substrate, when forming the magnetic pole of the thin film magnetic head, after forming stripes in a direction parallel to the magnetic pole width, a magnetic film having a predetermined film thickness is formed. (4) A method for forming a magnetic pole according to claim 3, wherein the stripe is a processed groove or a convex pattern of a nonmagnetic film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153638A JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153638A JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6045919A true JPS6045919A (en) | 1985-03-12 |
| JPH0630129B2 JPH0630129B2 (en) | 1994-04-20 |
Family
ID=15566887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58153638A Expired - Lifetime JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630129B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018174214A (en) * | 2017-03-31 | 2018-11-08 | Tdk株式会社 | Permanent magnet thin film |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4828339A (en) * | 1971-08-20 | 1973-04-14 | ||
| JPS56169309A (en) * | 1980-05-30 | 1981-12-26 | Canon Inc | Magnetic thin film material |
| JPS5848218A (en) * | 1981-09-17 | 1983-03-22 | Nippon Electric Glass Co Ltd | Material for use in magnetic head |
-
1983
- 1983-08-23 JP JP58153638A patent/JPH0630129B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4828339A (en) * | 1971-08-20 | 1973-04-14 | ||
| JPS56169309A (en) * | 1980-05-30 | 1981-12-26 | Canon Inc | Magnetic thin film material |
| JPS5848218A (en) * | 1981-09-17 | 1983-03-22 | Nippon Electric Glass Co Ltd | Material for use in magnetic head |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018174214A (en) * | 2017-03-31 | 2018-11-08 | Tdk株式会社 | Permanent magnet thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0630129B2 (en) | 1994-04-20 |
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