JPS59231719A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS59231719A
JPS59231719A JP10412183A JP10412183A JPS59231719A JP S59231719 A JPS59231719 A JP S59231719A JP 10412183 A JP10412183 A JP 10412183A JP 10412183 A JP10412183 A JP 10412183A JP S59231719 A JPS59231719 A JP S59231719A
Authority
JP
Japan
Prior art keywords
magnetic layer
magnetic
thin film
layer
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10412183A
Other languages
Japanese (ja)
Inventor
Masaharu Kawase
川瀬 政春
Katsuyuki Tanaka
克之 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10412183A priority Critical patent/JPS59231719A/en
Publication of JPS59231719A publication Critical patent/JPS59231719A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obtain satisfactory coercive force with the machined surface itself of a base plate forming a magnetic layer by forming the 1st magnetic layer in the form of a thin amorphous alloy film on the base plate then forming successively an insulating layer to serve as a magnetic gap, a conductor layer to serve as a coil and the 2nd magnetic layer thereon. CONSTITUTION:A ferrite block is cut to a desired thickness by an inside or outside circumferential slicer, by which a base plate 2 having <=0.6S surface roughness is obtd. The resulted plate 2 is washed and dried then a Co-base amorphous alloy such as a Co-Nb alloy or the like is deposited by a sputtering method, etc. to form the 1st thin magnetic film 9. A magnetic gap 5 is then formed by Al2O3, etc. and a conductor 6 to serve as a coil, an insulator 7 and the 2nd magnetic layer 8 are successively formed to manufacture a thin film magnetic head. Al2O3 or polyimide or the like is used for the insulator 7 and the 2nd magnetic layer is the same as the 1st magnetic layer 9 or an Fe-Si-Al alloy, etc. may be used for the same. The need for finishing the surface of the plate 1 to a specular surface is thus eliminated and the thin film magnetic head having <=0.5 Oe coercive force is obtd. at a low cost.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜磁気ヘッドに係り、特に基板の磁性層形成
面を機械加工面のままとしても要求される特性を得るの
に好適な構成の薄膜磁気ヘッドに関するものである。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a thin film magnetic head, and particularly to a thin film having a structure suitable for obtaining required characteristics even if the magnetic layer forming surface of the substrate remains a machined surface. This relates to magnetic heads.

〔発明の背景〕[Background of the invention]

第1図は従来の薄膜磁気ヘッドの製造工程説明図である
。従来の薄膜磁気ヘッドは、第1図(a)に示すフェラ
イトブロック1を作成し、同図(b)に示すように、こ
のブロック1を機械加工によって磁性層を形成させる面
が所定の粗さの基板2とし、次に、同図(c)ItC示
すように、その表面を研摩加工し″′C鏡面仕上げを行
って膜形成基板6とし、その後、同図(d)に示すよう
に、基板3の鏡面仕上げした上にpe−8i−A1合金
系またはFe −Ni合金系の第1の磁性層4をスパッ
タリング法で形成し、第1の磁性層4を形成後、第1図
(e)に示すように、第1の磁性層4の上に5iotま
たはAl tOnからなる磁気ギャップ5、コイルを形
成する導電体6.5ift 、 Alt Onあるいは
ポリイミド樹脂よりなる絶縁体7および第1の磁性層4
と磁気回路を作る第2の磁性層8をそれぞれ所定の薄膜
パターンに順次積層して製造するようにしていた。
FIG. 1 is an explanatory diagram of the manufacturing process of a conventional thin film magnetic head. In the conventional thin film magnetic head, a ferrite block 1 shown in FIG. 1(a) is prepared, and as shown in FIG. 1(b), the surface on which the magnetic layer is formed is machined to a predetermined roughness. Next, as shown in FIG. 5(c) ItC, the surface thereof was polished to a mirror finish to obtain a film forming substrate 6, and then, as shown in FIG. 2(d), A first magnetic layer 4 made of a pe-8i-A1 alloy or a Fe-Ni alloy is formed on the mirror-finished substrate 3 by a sputtering method. After forming the first magnetic layer 4, as shown in FIG. ), on the first magnetic layer 4 there is a magnetic gap 5 made of 5iot or AltOn, a conductor 6.5ift forming a coil, an insulator 7 made of AltOn or polyimide resin, and a first magnetic layer. layer 4
and a second magnetic layer 8 forming a magnetic circuit were manufactured by sequentially laminating them in a predetermined thin film pattern.

このような薄膜磁気ヘッドの製造方法によれば、同一基
板上に多数の磁気ヘッドを並設した構造のマルチトラッ
ク磁気ヘッドを作ることができる。
According to such a method of manufacturing a thin film magnetic head, a multi-track magnetic head having a structure in which a large number of magnetic heads are arranged side by side on the same substrate can be manufactured.

しかし、第1の磁性層4を形成する基板面を第1図(C
)に示すように機械加工後ダイヤモンド塗粒等を用いて
表面粗さ0.03S以下にしないと、薄膜磁気ヘッドの
磁性層として要求される保磁力0.50e以下の磁性層
を形成できない。ところで、基板の表面を0.05S以
下に鏡面仕上げするには、ダイヤモンド塗粒を使りて研
摩しなければならず、研摩加工に多くの時間を要し、基
板価格の半分が研摩費用となり、このため、高価な薄膜
磁気ヘッドになってしまうという欠点があった。
However, the substrate surface on which the first magnetic layer 4 is formed is shown in FIG.
), a magnetic layer with a coercive force of 0.50e or less, which is required for a magnetic layer of a thin-film magnetic head, cannot be formed unless the surface roughness is reduced to 0.03S or less using diamond coating or the like after machining. By the way, in order to give the surface of the board a mirror finish of 0.05S or less, it is necessary to polish it using diamond coating particles, which requires a lot of time and half of the board price is the polishing cost. For this reason, there is a drawback that the thin film magnetic head becomes expensive.

〔発明の目的〕[Purpose of the invention]

本発明は上記に鑑みてなされたもので、その目的とする
ところは、基板の磁性層形成面を機械加工面のままとし
ても薄膜磁気ヘッドに要求される保磁力を有するように
できる薄膜磁気ヘッドを提供することにある。
The present invention has been made in view of the above, and an object of the present invention is to provide a thin film magnetic head that can have a coercive force required for a thin film magnetic head even if the magnetic layer forming surface of the substrate remains a machined surface. Our goal is to provide the following.

〔発明の概要〕[Summary of the invention]

本発明は、第2図に示すように、CO基非晶質合金を第
1の磁性層に使用すると、基板面粗さを0.6S以下と
すれば、薄膜磁気ヘッドに要求される0、50e以下の
保持力とすることができることが明らかになり、また、
0.68の面粗さは、機械加工のみによって実現できる
ことに着目してなされたもので、基板上に形成する第1
の磁性層を非晶質合金よりなる薄膜としたことを特徴と
している。
As shown in FIG. 2, the present invention has the advantage that when a CO-based amorphous alloy is used for the first magnetic layer, if the substrate surface roughness is 0.6S or less, the 0, It became clear that it is possible to have a holding force of 50e or less, and
The surface roughness of 0.68 was achieved by focusing on the fact that it could be achieved only by machining.
The magnetic layer is a thin film made of an amorphous alloy.

〔発明の実施例〕[Embodiments of the invention]

以下本発明を第3図に示す実施例を用いて詳細に説明す
る。
The present invention will be explained in detail below using an embodiment shown in FIG.

第6図の本発明の薄膜磁気ヘッドの一実施例を示す縦断
面図である。第6図において、2は磁性層を形成する面
を機械加工のみによって面粗さ0.6S以下としである
フェライトよりなる基板、9は基板2上に形成したCo
−Nb合金の薄膜からなる第1の磁性層、5.6.7.
8は第1の磁性層上に従来と同様それぞれ一定の薄膜パ
ターンに □順次積層したS鴎からなる磁気ギャップ、
コイルを形成する導電体、5in2からなる絶縁体、F
e−Ni合金薄膜からなる第2の磁性層である。
FIG. 7 is a longitudinal sectional view showing an embodiment of the thin film magnetic head of the present invention shown in FIG. 6; In FIG. 6, 2 is a substrate made of ferrite whose surface on which the magnetic layer is to be formed has a surface roughness of 0.6S or less by only machining, and 9 is a Co
- first magnetic layer made of a thin film of Nb alloy, 5.6.7.
8 is a magnetic gap made up of S gulls sequentially laminated in a certain thin film pattern on the first magnetic layer, as in the conventional case;
Conductor forming the coil, insulator consisting of 5in2, F
This is a second magnetic layer made of an e-Ni alloy thin film.

次に、第3図に示す薄膜磁気ヘッドの製造方法について
簡単に説明する。まず、フェライトブロックを熱プレス
等によって作成し、このフェライトブロックを内周また
は外周スライサによりて所望の厚さに切断して基板2と
する。このとき面粗さは0.68以下となっている。そ
の後、基板2を洗滌、乾燥し、スパッタリング法により
Co −Nb合金薄膜を残留ガス圧4 x 10’ T
orr、Arガス圧2x10−3Torrとして基板2
上に形成し、第1の磁性層9とする。その後、第1の磁
性層9上に従来と同様の方法により磁気ギャップ5、導
電体6、絶縁層7、第2の磁性層8を順次積層する。な
お、残留ガス圧、Arガス圧を上記のように規定したの
は、これ以上では薄膜磁気ヘッドに要求さる保持力0.
5Qe以下を実現できないためである。
Next, a method for manufacturing the thin film magnetic head shown in FIG. 3 will be briefly described. First, a ferrite block is created by hot pressing or the like, and this ferrite block is cut into a desired thickness using an inner or outer slicer to form the substrate 2. At this time, the surface roughness was 0.68 or less. Thereafter, the substrate 2 is washed and dried, and a Co-Nb alloy thin film is formed by sputtering at a residual gas pressure of 4 x 10'T.
orr, Ar gas pressure 2x10-3Torr, substrate 2
The first magnetic layer 9 is formed on top of the magnetic layer 9. Thereafter, a magnetic gap 5, a conductor 6, an insulating layer 7, and a second magnetic layer 8 are sequentially laminated on the first magnetic layer 9 by a method similar to the conventional method. The reason why the residual gas pressure and the Ar gas pressure are defined as above is because if the residual gas pressure and Ar gas pressure are exceeded, the holding force required for the thin film magnetic head is 0.
This is because it is not possible to achieve 5Qe or less.

上記した本発明の実施例によれば、基板2の磁性層形成
面を機械加工面のままとしても薄膜磁気ヘッドに要求さ
れる0、5Qe以下の保持力を有するようにできる。し
たがって、鏡面研摩作業が不要になる。
According to the embodiment of the present invention described above, even if the magnetic layer forming surface of the substrate 2 is left as a machined surface, it can have a coercive force of 0.5 Qe or less required for a thin film magnetic head. Therefore, mirror polishing work becomes unnecessary.

な?、基板2としては、フェライトのほか感光性ガラス
を用いることができる。また、磁気ギャップ5は、Al
 20.であってもよい。また、絶縁体7は、Al2O
,またはポリイミド系樹脂であってもよい。さらに、第
1の磁性層9は、Co−Nb合金のみでなく、Co −
Nb −Zk等のCo基非晶質合合金であればよく、第
2の磁性層8はFe −Si −A1合金であってもよ
く、第1の磁性層9と同じCo基非晶質合金であっても
よい。
What? As the substrate 2, photosensitive glass can be used in addition to ferrite. Moreover, the magnetic gap 5 is made of Al
20. It may be. Further, the insulator 7 is Al2O
, or polyimide resin. Furthermore, the first magnetic layer 9 is made of not only Co-Nb alloy but also Co-
The second magnetic layer 8 may be a Co-based amorphous alloy such as Nb-Zk, and the second magnetic layer 8 may be a Fe-Si-A1 alloy, or the same Co-based amorphous alloy as the first magnetic layer 9. It may be.

また、フェライトブロックの加工は、0.6s以下の面
粗さに加工できるものであればよく、内周、外周スライ
サによる加工に限定されるものではない。
Further, the processing of the ferrite block may be any method as long as it can be processed to a surface roughness of 0.6 seconds or less, and is not limited to processing using an inner circumference or outer circumference slicer.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、基板の磁性層形
成面を機械加工のままとしても薄膜磁気ヘッドに要求さ
れる保持力を有するようにでき、基板の磁性層形成面の
研摩加工をする必要がなくなるという効果がある。
As explained above, according to the present invention, the holding force required for a thin film magnetic head can be obtained even if the magnetic layer forming surface of the substrate is left machined, and the magnetic layer forming surface of the substrate can be polished. This has the effect of eliminating the need to do so.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の薄膜磁気ヘッドの製造工程説明図、第2
図はCo基非晶質合金を第1の磁性層として用いた場合
の基板の磁性層形成面粗さと保持力との関係の実験結果
を示す線図、第3図は本発明の薄膜磁気ヘッドの一実施
例を示す縦断面図である。 2・・・基板、      5・・・磁気ギャップ、6
・・・導電体、     7・・・絶縁体、8・・・第
2の磁性層、  9・・・第1の磁性層。 $l圀 (ct) (b) (C) 第 l 図 (e) 4、、−+ 第2図 第3図
Figure 1 is an explanatory diagram of the manufacturing process of a conventional thin-film magnetic head;
The figure is a diagram showing the experimental results of the relationship between the roughness of the magnetic layer forming surface of the substrate and the coercive force when a Co-based amorphous alloy is used as the first magnetic layer. FIG. 2 is a vertical cross-sectional view showing one embodiment of the invention. 2... Substrate, 5... Magnetic gap, 6
... Conductor, 7... Insulator, 8... Second magnetic layer, 9... First magnetic layer. $l 圀(ct) (b) (C) Figure l (e) 4,, -+ Figure 2 Figure 3

Claims (1)

【特許請求の範囲】 1、 基板上に第1の磁性層、磁気ギャップとなる“絶
縁層、コイルとなる導電体および前記第1の磁性層と磁
気回路を作る第2の磁性層とをそれぞれ所定の形状に順
次積層してなる薄膜磁気ヘッドにおいて、前記第1の磁
性層を非晶質合金よりなる薄膜としたことを特徴とする
薄膜磁気ヘッド。 2、 前記基板上の前記第1の磁性層を形成する面の粗
さは0,68以下としである特許請求の範囲第1項記載
の薄膜磁気ヘッド。 6、 前記非晶質合金はCo基非晶質合金である特許請
求の範囲第1項または第2項記載の薄膜磁気ヘッド。
[Claims] 1. A first magnetic layer, an insulating layer forming a magnetic gap, a conductor forming a coil, and a second magnetic layer forming a magnetic circuit with the first magnetic layer are provided on a substrate, respectively. A thin film magnetic head formed by sequentially laminating layers in a predetermined shape, characterized in that the first magnetic layer is a thin film made of an amorphous alloy. 2. The first magnetic layer on the substrate. The thin film magnetic head according to claim 1, wherein the surface on which the layer is formed has a roughness of 0.68 or less. 6. The thin film magnetic head according to claim 1, wherein the amorphous alloy is a Co-based amorphous alloy. The thin film magnetic head according to item 1 or 2.
JP10412183A 1983-06-13 1983-06-13 Thin film magnetic head Pending JPS59231719A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10412183A JPS59231719A (en) 1983-06-13 1983-06-13 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10412183A JPS59231719A (en) 1983-06-13 1983-06-13 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS59231719A true JPS59231719A (en) 1984-12-26

Family

ID=14372287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10412183A Pending JPS59231719A (en) 1983-06-13 1983-06-13 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS59231719A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6356419B1 (en) 1999-07-23 2002-03-12 International Business Machines Corporation Antiparallel pinned read sensor with improved magnetresistance
CN115449760A (en) * 2022-08-01 2022-12-09 香港城市大学深圳福田研究院 Polymer composite material and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6356419B1 (en) 1999-07-23 2002-03-12 International Business Machines Corporation Antiparallel pinned read sensor with improved magnetresistance
CN115449760A (en) * 2022-08-01 2022-12-09 香港城市大学深圳福田研究院 Polymer composite material and preparation method thereof
CN115449760B (en) * 2022-08-01 2024-04-02 香港城市大学深圳福田研究院 Polymer composite material and preparation method thereof

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