JPS6043825A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6043825A JPS6043825A JP15185883A JP15185883A JPS6043825A JP S6043825 A JPS6043825 A JP S6043825A JP 15185883 A JP15185883 A JP 15185883A JP 15185883 A JP15185883 A JP 15185883A JP S6043825 A JPS6043825 A JP S6043825A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- aluminum layer
- developed
- etching
- etching process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15185883A JPS6043825A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15185883A JPS6043825A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6043825A true JPS6043825A (ja) | 1985-03-08 |
| JPH0263292B2 JPH0263292B2 (cg-RX-API-DMAC7.html) | 1990-12-27 |
Family
ID=15527785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15185883A Granted JPS6043825A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6043825A (cg-RX-API-DMAC7.html) |
-
1983
- 1983-08-19 JP JP15185883A patent/JPS6043825A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0263292B2 (cg-RX-API-DMAC7.html) | 1990-12-27 |
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