JPS604127B2 - 四弗化珪素ガスの精製法 - Google Patents
四弗化珪素ガスの精製法Info
- Publication number
- JPS604127B2 JPS604127B2 JP56122457A JP12245781A JPS604127B2 JP S604127 B2 JPS604127 B2 JP S604127B2 JP 56122457 A JP56122457 A JP 56122457A JP 12245781 A JP12245781 A JP 12245781A JP S604127 B2 JPS604127 B2 JP S604127B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- sif4
- acid
- oxygen
- absorption peak
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 title claims description 46
- 238000000034 method Methods 0.000 title claims description 5
- 238000000746 purification Methods 0.000 title description 6
- 239000007789 gas Substances 0.000 claims description 43
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 5
- 229910004014 SiF4 Inorganic materials 0.000 description 30
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 20
- 238000010521 absorption reaction Methods 0.000 description 17
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000000862 absorption spectrum Methods 0.000 description 13
- 239000002253 acid Substances 0.000 description 9
- 101100537937 Caenorhabditis elegans arc-1 gene Proteins 0.000 description 7
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 229910008284 Si—F Inorganic materials 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 101100334001 Caenorhabditis elegans rib-1 gene Proteins 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 101150098638 RNASE1 gene Proteins 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical class [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- IOYKOBPSEGXAHU-UHFFFAOYSA-N trifluoro(hydroxy)silane Chemical compound O[Si](F)(F)F IOYKOBPSEGXAHU-UHFFFAOYSA-N 0.000 description 1
- ARBIYISMVFAYHV-UHFFFAOYSA-N trifluoro(trifluorosilyloxy)silane Chemical compound F[Si](F)(F)O[Si](F)(F)F ARBIYISMVFAYHV-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Treating Waste Gases (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56122457A JPS604127B2 (ja) | 1981-08-06 | 1981-08-06 | 四弗化珪素ガスの精製法 |
| GB08219951A GB2103198B (en) | 1981-08-06 | 1982-07-09 | Refining silicon tetrafluoride gas |
| IT22534/82A IT1156313B (it) | 1981-08-06 | 1982-07-22 | Procedimento di raffinazione del tetrafluoruro di silicio gassoso |
| DE3228535A DE3228535C2 (de) | 1981-08-06 | 1982-07-30 | Verfahren zur Reinigung von Siliciumtetrafluoridgas |
| FR8213412A FR2510982A1 (fr) | 1981-08-06 | 1982-07-30 | Procede de raffinage de tetrafluorure de silicium gazeux |
| US06/405,384 US4457901A (en) | 1981-08-06 | 1982-08-05 | Method of refining silicon tetrafluoride gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56122457A JPS604127B2 (ja) | 1981-08-06 | 1981-08-06 | 四弗化珪素ガスの精製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5826022A JPS5826022A (ja) | 1983-02-16 |
| JPS604127B2 true JPS604127B2 (ja) | 1985-02-01 |
Family
ID=14836321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56122457A Expired JPS604127B2 (ja) | 1981-08-06 | 1981-08-06 | 四弗化珪素ガスの精製法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4457901A (OSRAM) |
| JP (1) | JPS604127B2 (OSRAM) |
| DE (1) | DE3228535C2 (OSRAM) |
| FR (1) | FR2510982A1 (OSRAM) |
| GB (1) | GB2103198B (OSRAM) |
| IT (1) | IT1156313B (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62137938U (OSRAM) * | 1986-02-24 | 1987-08-31 | ||
| US11467452B2 (en) | 2017-07-27 | 2022-10-11 | Lg Chem, Ltd. | Substrate |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1196983B (it) * | 1986-07-23 | 1988-11-25 | Enichem Agricoltura Spa | Procedimento per la produzione di tetrafluoruro di silicio |
| EP0599278B1 (en) * | 1992-11-27 | 1996-01-31 | MITSUI TOATSU CHEMICALS, Inc. | Process for the preparation of partially-substituted fluorosilane |
| CA2327658A1 (en) | 1998-04-09 | 1999-10-21 | Uhp Materials, Inc. | Preparation and purification of diborane |
| US6790419B1 (en) | 1999-06-11 | 2004-09-14 | Honeywell Intellectual Properties Inc. | Purification of gaseous inorganic halide |
| JP3909385B2 (ja) * | 2001-07-12 | 2007-04-25 | 昭和電工株式会社 | テトラフルオロシランの製造方法およびその用途 |
| US7666379B2 (en) * | 2001-07-16 | 2010-02-23 | Voltaix, Inc. | Process and apparatus for removing Bronsted acid impurities in binary halides |
| TW200512159A (en) * | 2003-09-25 | 2005-04-01 | Showa Denko Kk | Method for producing tetrafluorosilane |
| JP4576312B2 (ja) * | 2005-10-03 | 2010-11-04 | 東北電力株式会社 | 四フッ化ケイ素の製造方法、及びそれに用いる製造装置 |
| CN102962903B (zh) * | 2012-11-21 | 2015-02-25 | 罗振华 | 硅锭线锯切割工艺中硅颗粒的回收方法 |
| US11891344B2 (en) | 2022-04-20 | 2024-02-06 | Chtem Limited | Methods for graded utilization of fluorine and silicon resources in phosphate ores |
| CN114988920B (zh) * | 2022-04-20 | 2023-01-13 | 贵州新东浩化工材料科技有限公司 | 一种分级利用磷矿石中氟、硅资源的方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2844441A (en) * | 1954-11-26 | 1958-07-22 | Du Pont | Process of purifying liquid silicon halide |
| GB779804A (en) * | 1955-03-30 | 1957-07-24 | Columbian Carbon | Improvements in method for generating silicon tetrafluoride |
| FR1136051A (fr) * | 1955-03-30 | 1957-05-07 | Columbian Carbon | Procédé de production du tétrafluorure de silicium |
| US2999736A (en) * | 1959-01-07 | 1961-09-12 | Houdry Process Corp | High purity silicon |
| GB2079262B (en) * | 1980-07-02 | 1984-03-28 | Central Glass Co Ltd | Process of preparing silicon tetrafluoride by using hydrogen fluoride gas |
-
1981
- 1981-08-06 JP JP56122457A patent/JPS604127B2/ja not_active Expired
-
1982
- 1982-07-09 GB GB08219951A patent/GB2103198B/en not_active Expired
- 1982-07-22 IT IT22534/82A patent/IT1156313B/it active
- 1982-07-30 DE DE3228535A patent/DE3228535C2/de not_active Expired
- 1982-07-30 FR FR8213412A patent/FR2510982A1/fr active Granted
- 1982-08-05 US US06/405,384 patent/US4457901A/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62137938U (OSRAM) * | 1986-02-24 | 1987-08-31 | ||
| US11467452B2 (en) | 2017-07-27 | 2022-10-11 | Lg Chem, Ltd. | Substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5826022A (ja) | 1983-02-16 |
| IT8222534A0 (it) | 1982-07-22 |
| GB2103198A (en) | 1983-02-16 |
| IT1156313B (it) | 1987-02-04 |
| DE3228535C2 (de) | 1986-02-06 |
| US4457901A (en) | 1984-07-03 |
| GB2103198B (en) | 1985-07-24 |
| FR2510982A1 (fr) | 1983-02-11 |
| DE3228535A1 (de) | 1983-02-24 |
| FR2510982B1 (OSRAM) | 1984-01-13 |
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