JPS6041243A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6041243A JPS6041243A JP14941283A JP14941283A JPS6041243A JP S6041243 A JPS6041243 A JP S6041243A JP 14941283 A JP14941283 A JP 14941283A JP 14941283 A JP14941283 A JP 14941283A JP S6041243 A JPS6041243 A JP S6041243A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- film
- oxide film
- layer
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 50
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 230000000903 blocking effect Effects 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 5
- 230000002265 prevention Effects 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 abstract description 7
- 239000001301 oxygen Substances 0.000 abstract description 7
- 230000003449 preventive effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 27
- 238000002347 injection Methods 0.000 description 12
- 239000007924 injection Substances 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 238000005468 ion implantation Methods 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- 238000002513 implantation Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14941283A JPS6041243A (ja) | 1983-08-16 | 1983-08-16 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14941283A JPS6041243A (ja) | 1983-08-16 | 1983-08-16 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6041243A true JPS6041243A (ja) | 1985-03-04 |
| JPH0152900B2 JPH0152900B2 (enrdf_load_stackoverflow) | 1989-11-10 |
Family
ID=15474551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14941283A Granted JPS6041243A (ja) | 1983-08-16 | 1983-08-16 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6041243A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63170046U (enrdf_load_stackoverflow) * | 1987-04-18 | 1988-11-04 | ||
| JPH01259538A (ja) * | 1988-04-11 | 1989-10-17 | Agency Of Ind Science & Technol | 酸化膜の形成方法 |
-
1983
- 1983-08-16 JP JP14941283A patent/JPS6041243A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63170046U (enrdf_load_stackoverflow) * | 1987-04-18 | 1988-11-04 | ||
| JPH01259538A (ja) * | 1988-04-11 | 1989-10-17 | Agency Of Ind Science & Technol | 酸化膜の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0152900B2 (enrdf_load_stackoverflow) | 1989-11-10 |
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