JPS6039807A - 絶縁膜を有する薄膜磁気ヘツド用基板材料 - Google Patents
絶縁膜を有する薄膜磁気ヘツド用基板材料Info
- Publication number
- JPS6039807A JPS6039807A JP14896183A JP14896183A JPS6039807A JP S6039807 A JPS6039807 A JP S6039807A JP 14896183 A JP14896183 A JP 14896183A JP 14896183 A JP14896183 A JP 14896183A JP S6039807 A JPS6039807 A JP S6039807A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- al2o3
- insulating
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 59
- 239000010409 thin film Substances 0.000 title claims abstract description 54
- 239000010408 film Substances 0.000 title claims abstract description 21
- 239000000463 material Substances 0.000 title claims description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 15
- 229910052593 corundum Inorganic materials 0.000 abstract description 15
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 15
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000013078 crystal Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 230000003746 surface roughness Effects 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract description 2
- 230000009897 systematic effect Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 16
- 239000010410 layer Substances 0.000 description 14
- 238000005336 cracking Methods 0.000 description 3
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- -1 11fO Chemical compound 0.000 description 1
- 101150063042 NR0B1 gene Proteins 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14896183A JPS6039807A (ja) | 1983-08-15 | 1983-08-15 | 絶縁膜を有する薄膜磁気ヘツド用基板材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14896183A JPS6039807A (ja) | 1983-08-15 | 1983-08-15 | 絶縁膜を有する薄膜磁気ヘツド用基板材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6039807A true JPS6039807A (ja) | 1985-03-01 |
| JPH0259604B2 JPH0259604B2 (enrdf_load_stackoverflow) | 1990-12-13 |
Family
ID=15464527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14896183A Granted JPS6039807A (ja) | 1983-08-15 | 1983-08-15 | 絶縁膜を有する薄膜磁気ヘツド用基板材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6039807A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63222317A (ja) * | 1987-03-11 | 1988-09-16 | Tokin Corp | 薄膜磁気ヘツド用基板材料 |
| US6277506B1 (en) | 1999-03-11 | 2001-08-21 | Sumitomo Special Metals Co., Ltd. | Thin film magnetic head thin film magnetic head substrate and method for fabricating such substrate |
-
1983
- 1983-08-15 JP JP14896183A patent/JPS6039807A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63222317A (ja) * | 1987-03-11 | 1988-09-16 | Tokin Corp | 薄膜磁気ヘツド用基板材料 |
| US6277506B1 (en) | 1999-03-11 | 2001-08-21 | Sumitomo Special Metals Co., Ltd. | Thin film magnetic head thin film magnetic head substrate and method for fabricating such substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0259604B2 (enrdf_load_stackoverflow) | 1990-12-13 |
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