JPS6033366A - Dry etching apparatus - Google Patents

Abstract

PURPOSE:To provide the titled apparatus capable of performing the detection or irradiation of light in good reproducibility, constituted so as to prevent the adhesion of a reaction product to a light pervious plate by providing a plasma resistant mesh material to a viewing port having the light pervious plate provided to a vacuum container. CONSTITUTION:In a dry etching apparatus wherein a vacuum container 11 is evacuated to supply treating gas and plasma is generated between a pair of electrodes arranged in opposed relationship to etch a specimen supported by one electrode, plasma light is detected through the glass 3 provided to one end of the viewing port 12 attached to the vacuum container 11 to perform the monitoring of an etching process or light is irradiated to perform the adjustment of a plasma state. A mesh material 14 comprising a plasma resistant material is inserted into the glass 3 of the above mentioned viewing port 2 in the side of the vacuum container 11 to prevent such a phenomenon that the transmissivity of light is reduced and becomes unstable by the adhesion of a reaction product to the surface of the glass 13.

Description

[Detailed description of the invention] Industrial applications This invention relates to a dry etching device.

Structure of a conventional example and its problems In a conventional dry etching apparatus, as shown in FIG. An exhaust means is connected through an exhaust port 3, and inside the vacuum container 1, an upper electrode 4 and a lower electrode 6 which also serves as a support for the sample 5 are provided, and a reaction chamber 7 is formed between the two electrodes.
A high frequency power source 8 is connected to either one of the electrodes 4.6, and the plasma that is etching the sample 5 is passed through a glass 1° provided in the viewing boat 9.
Monitoring of the etching process by detecting plasma light and spectroscopic analysis. The etching characteristics were improved by changing the conditions.

However, in the above configuration, reaction products generated when etching the sample 5 adhere to and accumulate on the surface of the glass 10, making the light transmittance of the glass 1o unstable and decreasing. This method has the disadvantage that good reproducibility cannot be obtained when detecting the etching end point using spectroscopic analysis or when improving the etching mechanism by irradiating light.

Purpose of the Invention The purpose of the present invention is to prevent reaction products generated during etching from adhering to the transparent plate of the viewing port;
An object of the present invention is to provide a dry etching device capable of detecting light through a transparent plate and irradiating light with good reproducibility.

Structure of the Invention The dry etching apparatus of the present invention is characterized in that a mesh material made of a plasma-resistant material is inserted between the light-transmitting plate and the reaction chamber, so that reaction products adhere to the surface of the light-transmitting plate and prevent light. This has the effect of preventing the transmittance from decreasing and becoming unstable.

DESCRIPTION OF THE EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. 2 to 4. FIG. 2 is a perspective view of essential parts of the dry etching apparatus. Reference numeral 11 denotes a vacuum container, and a processing gas supply means and an exhaust means (not shown) are connected to the outside of the vacuum container 11. Also, an upper electrode and a lower electrode (not shown) are provided inside the vacuum container 11, and both By connecting a high frequency power source (not shown) to one of the electrodes, the space between the two electrodes becomes an etching reaction chamber for the sample placed on the lower electrode. 12 is a viewing boat provided in a part of the vacuum vessel 11, 13 is glass, and 14 is a mesh material having plasma resistance and made of stainless steel, for example. When etching is performed in the reaction chamber, reaction products and the like generated are adsorbed by the mesh material 14 provided midway through the viewing port 12, so that the inner surface of the glass 13 is not contaminated. Therefore, according to this embodiment, the glass 1
Since the light transmittance of No. 3 is kept constant, it is possible to stably perform light detection and irradiation with good reproducibility.

For example, when detecting the end point by spectroscopic analysis, in the conventional configuration, as shown in FIG. However, according to this example, as shown in FIG. 4, there is almost no deposit on the inner surface of the glass 13, and therefore the spectral intensity at the end point is continuous. It is kept constant against etching (see curve B), allowing for highly reproducible and reliable end point detection. However, the third
, 4, the M etching conditions are processing gas ccz, o gas flow rate 208CCΔ(, degree of vacuum 0.1
0 Torr, high frequency power supply bar'7-120W Torr. In Figure 3, T, 'T2 * T3 * T
4e T5 indicates the etching time for each sample.

In the above embodiment, the mesh material 14 was provided in the middle of the viewing boat 12, but when a vacuum holding gasket is used in the viewing boat 12, the mesh material 14 is provided at the center of the gasket with a mesh structure.
It is also possible to have this function.

Effects of the Invention According to the dry etching apparatus of the present invention, it is possible to obtain the effect that the reproducibility of light detection, light irradiation, etc. performed through a transparent plate can be improved.

[Brief explanation of the drawing]

Figure A1 is a schematic cross-sectional view of a conventional dry etching device, Figure 2 is a perspective view of the main part of a persimmon example of the present invention, Figure 3 is a spectrum intensity diagram for detecting the end point of etching in the conventional example, and Figure 4. is a spectral intensity diagram for detecting the end point of etching in this example.

Claims (1)

[Claims] A vacuum vessel, a processing gas supply means connected to the vacuum vessel, an exhaust means connected to the vacuum vessel, a pair of plasma generation electrodes disposed opposite to each other within the vacuum vessel, and a high frequency i ! a viewing boat provided in the vacuum vessel and having a transparent plate for extracting plasma light from the reaction chamber between the electrodes; and a viewing boat provided on the reaction chamber side of the transparent plate. A dry etching device comprising a plasma-resistant mesh material disposed to prevent reaction products from adhering to a transparent plate.