JPH02224330A - Peep hole of automatic etching termination detector - Google Patents

Abstract

PURPOSE:To prevent the moisture collection on end point glasses from occurring thereby enabling the end point detection to be performed accurately for a long time by a method wherein a temperature controllable hot wire heater is inserted into the end point glasses previously put together. CONSTITUTION:The title detector is composed of a temperature controllable hot wire heater 4 inserted into end point glasses 1a, 1b previously put together. Accordingly, especially an AlCl3 base reaction product which is gasified by heat-controlling at around 130 deg.C will not adhere to the inside of the end point glasses 1a, 1b not to collect any moisture at all. Through these procedures, the final detection of etching process can be performed without fail.

Description

Detailed Description of the Invention (Industrial Application Field) The present invention relates to a viewing window (hereinafter referred to as an end point glass) of an automatic etching end point detection device of a dry etching apparatus.
It is related to the structure of

(Prior Art) Conventionally, as technologies in this field, there have been the following, for example.

FIG. 3 shows such a conventional dry etching apparatus.

As shown in this figure, plasma luminescence A separates the atmosphere in an etching chamber B to maintain a vacuum, and passes through an end point glass C that allows light to pass through, and then a band pass filter D that allows only specific wavelengths to pass through. and enters sensor E, which changes the light intensity with voltage. The end point of etching is automatically detected based on the change in the voltage output from the sensor E.

(Problem B that the invention seeks to solve) However, as the etching process continues, reaction products adhere to the chamber-side surface of the endpoint glass C, causing the glass to become cloudy and reducing the intensity of light passing through it. This may result in automatic end point detection not being able to be performed accurately.

Furthermore, if the inner surface of the end point glass C is frequently cleaned, the inside of the chamber B will be exposed to the atmosphere, resulting in the problem that particles are likely to be generated.

The present invention eliminates the above-mentioned problem of fogging of the endpoint glass due to reaction products adhering to the inner surface of the endpoint glass, and provides a viewing window for an etching automatic endpoint detection device that can prevent the endpoint glass from fogging. The purpose is to provide

(Means for Solving the Problems) In order to achieve the above object, the present invention provides an end point glass (
A hot wire heater (4) whose temperature can be adjusted is inserted between two glass panels la and lb) to adjust the temperature of the glass surface to a constant temperature.

(Function) According to the present invention, as described above, two end point glasses (1a, 1b) are put together, and a temperature-adjustable hot wire heater (4) is inserted between them to keep the glass surface at a constant temperature. In particular, AI C11s-based reaction products gasify when heated to about 130°C, so they do not adhere to the inner surface of the end point glass, no clouding occurs, and the end point of etching is controlled. Detection can be performed reliably.

(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

FIG. 1 is a block diagram of an automatic etching end point detection device showing an embodiment of the present invention, and FIG. 2 is a plan view of an end point glass of the automatic etching end point detection device.

As shown in this figure, two opposing end point glasses 1a and 1bfJ are placed at the opening of the etching chamber 2.
(Provided. The outer periphery of the surface of the two etching chambers of the end point glass la,
An O-ring 3 is disposed between the outer surfaces of the openings.
It is designed to maintain a vacuum.

Further, a hot wire heater 4 is placed between the end point glasses 1a and 1b, and the end thereof is connected to a temperature controller 7 by an electric wire.

The end point glasses la, lb are held at their outer peripheries by flanges 5, which are fixed to the outer surface of the etching chamber 2 with bolts 6.

Furthermore, the hot wire heater 4 located between the end point glasses 1a and 1b is also held in the same manner so that it does not fall off.

The use of two endpoint glasses 1a and 1b prevents workers from directly touching the hot wire heater 4 and causing burns, and preventing moisture from adhering to the hot wire heater 4 during maintenance, causing wire breakage and short circuits. This is to ensure that.

Further, the reason why the hot wire heater 4 is not embedded in the end point glass is to allow easy replacement of the heater.

With this configuration, it is possible to prevent reaction products from adhering to the inner surface of the endpoint glass and causing the inner surface to become cloudy.

The light that has passed through the endpoint glasses la and lb passes through a bandpass filter D that allows only specific wavelengths to pass, as in the prior art, and enters a sensor E that changes the light intensity with a voltage. Due to changes in the voltage output from this sensor E,
Automatic etching end point detection is performed. .

Note that the present invention is not limited to the above embodiments,
Various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

(Effects of the Invention) As described above in detail, according to the present invention, changes in light intensity can be stably detected by preventing fogging of the endpoint glass, so endpoint detection can be extended for a long time. It can be done over time and accurately.

Furthermore, since the cleaning cycle for the inner surface of the endpoint glass can be extended, particles are no longer generated due to exposure of the inside of the chamber to the atmosphere, and the yield of devices can be improved.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of an automatic etching end point detection device showing an embodiment of the present invention, FIG. 2 is a plan view of an end point glass of the automatic etching end point detection device, and FIG. 3 is a diagram of an automatic etching end point detection device of a conventional dry etching device. FIG. 2 is a configuration diagram of an end point detection device. la, lb... End point glass, 2... Etching chamber, 3... 0 ring, 4... Hot wire heater, 5... Flange, 6... Bolt, 7... Temperature controller. Patent applicant: Oki Electric Industry Co., Ltd. (1 other person) Agent: Patent attorney Mamoru Shimizu (1 other person)

Claims (1)

[Claims] (a) two opposing glasses for end point detection; (b) a hot wire heater disposed between the glasses; and (c) means for adjusting the temperature of the glass surface. A viewing window for an automatic etching end point detection device, comprising: