KR920007423B1 - Excluding method of dust of shadow mask - Google Patents
Excluding method of dust of shadow mask Download PDFInfo
- Publication number
- KR920007423B1 KR920007423B1 KR1019900003594A KR900003594A KR920007423B1 KR 920007423 B1 KR920007423 B1 KR 920007423B1 KR 1019900003594 A KR1019900003594 A KR 1019900003594A KR 900003594 A KR900003594 A KR 900003594A KR 920007423 B1 KR920007423 B1 KR 920007423B1
- Authority
- KR
- South Korea
- Prior art keywords
- shadow mask
- attached
- foreign
- dust
- combustion furnace
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/38—Exhausting, degassing, filling, or cleaning vessels
Abstract
Description
본 발명은 새도우마스크(shadow mask)의 이물질 제거방법에 관한 것으로서, 더 상세하게는 연소로를 사용하여 새도우마스크에 부착된 이물질을 제거하는 방법에 관한 것이다.The present invention relates to a method for removing foreign substances in a shadow mask, and more particularly, to a method for removing foreign substances attached to a shadow mask using a combustion furnace.
일반적으로 전자총에서 발산되어 주포커스렌즈에서 접속(Convergence)되는 R, G, B 전자빔을 각각 해당하는 형광점에 도달하도록 유도하는 것이 새도우마스크의 역할이다. 이와 같은 역할을 하는 새도우마스크를 제조하는 과정에서 주위에 있는 이물질들이 새도우마스크의 비임통과공에 부착됨으로써, 전자총에서 발산한 R, G, B 전자 비임이 이물질에 의해 굴절 및 산란하게 되거나 완전히 구멍이 막히게 되므로 해당 형광점에 도달되지 못하게 된다.In general, it is the role of the shadow mask to induce R, G, and B electron beams emitted from the electron gun to converge at the main focus lens to reach the corresponding fluorescent points. In the process of manufacturing the shadow mask which plays such a role, the surrounding foreign matters are attached to the non-passing holes of the shadow mask, so that the R, G, and B electron beams emitted from the electron gun are refracted and scattered by the foreign matter, or completely punctured As it becomes blocked, the fluorescence point cannot be reached.
따라서 종래에는 에어건(Airgun)을 사용하여 건조에어(dry air)를 새도우마스크 표면에 분사시켜 표면에 부착된 이물질을 제거하거나, 초음파를 이용한 제진장치를 사용하여 새도우마스크를 초음파고 진동시켜 새도우마스크의 표면에 부착된 이물질을 제거하여 왔으나, 이는 새도우마스크 표면에 제조과정에서 발생된 정전기로 인해 부착된 작은 입자의 이물질까지는 완전히 제거하지 못하는 한계를 가진다.Therefore, in the related art, a dry air is sprayed onto the shadow mask surface by using an airgun to remove foreign matters adhered to the surface, or the shadow mask is ultrasonically vibrated by using a vibration suppression device using ultrasonic waves. Although foreign substances adhered to the surface have been removed, this has a limitation that the foreign substances of small particles attached to the shadow mask surface due to the static electricity generated in the manufacturing process cannot be completely removed.
따라서 본 발명은 상술한 종래의 문제점을 감안하여 새도우마스크의 제조과정에서 새도우마스크의 내, 외면에 부착되는 이물질을 간단하게 제거할 수 있는 새도우마스크의 이물질 제거방법을 제공함에 그 목적이 있다.Accordingly, an object of the present invention is to provide a method for removing foreign substances from a shadow mask, which can easily remove foreign substances attached to inner and outer surfaces of a shadow mask in the manufacturing process of the shadow mask.
상기의 목적을 달성하기 위하여 본 발명은, 새도우마스크에 부착된 이물질의 제거방법에 있어서, 상기 새도우마스크를 연소로에 투입하여 상기 새도우마스크에 부착된 이물질을 연소시켜 제거하는 점에 그 특징이 있다.In order to achieve the above object, the present invention is characterized in that in the method of removing foreign matters attached to the shadow mask, the shadow mask is put into a combustion furnace to burn and remove the foreign matter attached to the shadow mask. .
이하에 본 발명에 따른 새도우마스크의 이물질 제거방법을 상세하게 설명한다.Hereinafter, a method for removing foreign substances in the shadow mask according to the present invention will be described in detail.
본 발명에 따른 새도우 마스크의 이물질 제거방법은 새도우마스크를 컨베이어등의 이송수단을 통하여 화염이 아닌 내부의 온도로 이물질을 가열하여 연소시키는 통상의 연소로의 내부로 이송시키면서 새도우마스크의 내, 외면에 부착된 이물질 예컨대, 먼지나 실장갑으로 부터 떨어진 부푸러기등을 연소로 내의 열로 연소시켜 제거하는 것이다. 여기에서 상기 연소로내의 온도는 새도우마스크의 내, 외면에 부착된 이물질을 연소시킬 수 있는 온도이면 충분하나 바람직하기로는 최고 약 300-500℃ 정도가 적당하다. 그리고 상기 새도우마스크는 약 30분에서 1시간에 걸쳐 연소로내의 통과하면서 가열되게 되며, 이때 연소로내의 온도분포를 입구와 출구에서 부터 내부로 갈수록 상온(20℃)에서 부터 서서히 약 약 1분에 20℃ 정도씩 점차적으로 높아지다가 중심부에서는 약 300-500℃를 유지하도록 하여 새도우마스크의 내, 외면에 부착된 이물질을 연소시켜 제거하게 된다. 여기에서 상기 연소로내의 온도분포가 입, 출구에서부터 내부로 갈수록 점차적으로 상승되도록 하는 이유는 새도우마스크의 열변형을 방지하기 위함이다.The foreign material removal method of the shadow mask according to the present invention transfers the shadow mask to the inside and outside of the shadow mask while transferring the inside of the normal combustion furnace for heating and burning the foreign matter to an internal temperature instead of a flame through a conveying means such as a conveyor. The foreign matter adhered to it, for example, the dust that has fallen from the glove or the like, is removed by burning it with heat in the combustion furnace. Here, the temperature in the furnace is sufficient to burn the foreign matter attached to the inner and outer surfaces of the shadow mask, but preferably at most about 300-500 ° C. The shadow mask is heated while passing through the furnace in about 30 minutes to 1 hour, and the temperature distribution in the furnace is gradually increased from room temperature (20 ° C.) to about 1 minute from the inlet and the outlet. It gradually increases by about 20 ℃ and maintains about 300-500 ℃ in the center to burn off foreign substances attached to the inner and outer surfaces of the shadow mask. The reason why the temperature distribution in the combustion furnace is gradually increased from the inlet and the outlet to the inside is to prevent thermal deformation of the shadow mask.
이와 같이 본 발명에 따른 새도우마스크의 이물질 제거방법은 본 출원인의 실험결과 종래의 새도우마스크의 이물질 제거방법에 있어서 구멍막힘등 그 불량률이 10%-14%이던 것이 본 발명 방법에 의하면 3%-4%℃로 현저하게 줄어 들었다.As described above, according to the method of the present invention, the foreign substance removal method of the shadow mask according to the present invention was 10% -14% according to the method of the present invention, in which the foreign substance removal method of the conventional shadow mask was 10% -14%. Significantly reduced to% ℃.
이와 같이 본발명 새도우 마스크의 이물질 제거방법은 새도우마스크에 부착된 이물질을 연소로를 통하여 연소시키는 간단한 방법으로 제거할 수 있도록 되어 있으며, 새도우마스크의 이물질로 인한 불량발생물을 종래에 비하여 현저하게 낮출 수 있어 생산성이 향상되게 되는 등의 이점이 있다.In this way, the foreign material removal method of the shadow mask of the present invention can remove the foreign matter attached to the shadow mask by a simple method of burning through the combustion furnace, and significantly lowers the defects caused by the foreign matter of the shadow mask as compared with the conventional method. There is an advantage such that the productivity can be improved.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019900003594A KR920007423B1 (en) | 1990-03-17 | 1990-03-17 | Excluding method of dust of shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019900003594A KR920007423B1 (en) | 1990-03-17 | 1990-03-17 | Excluding method of dust of shadow mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR910017491A KR910017491A (en) | 1991-11-05 |
| KR920007423B1 true KR920007423B1 (en) | 1992-08-31 |
Family
ID=19297075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900003594A KR920007423B1 (en) | 1990-03-17 | 1990-03-17 | Excluding method of dust of shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR920007423B1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110280534A (en) * | 2019-06-27 | 2019-09-27 | 云谷（固安）科技有限公司 | A kind of cleaning systems of mask plate and the clean method of mask plate |
-
1990
- 1990-03-17 KR KR1019900003594A patent/KR920007423B1/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110280534A (en) * | 2019-06-27 | 2019-09-27 | 云谷（固安）科技有限公司 | A kind of cleaning systems of mask plate and the clean method of mask plate |
Also Published As
| Publication number | Publication date |
|---|---|
| KR910017491A (en) | 1991-11-05 |
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