JPS58145643A - Cleaning of indium-tin glass plate - Google Patents

Cleaning of indium-tin glass plate

Info

Publication number
JPS58145643A
JPS58145643A JP2954982A JP2954982A JPS58145643A JP S58145643 A JPS58145643 A JP S58145643A JP 2954982 A JP2954982 A JP 2954982A JP 2954982 A JP2954982 A JP 2954982A JP S58145643 A JPS58145643 A JP S58145643A
Authority
JP
Japan
Prior art keywords
glass plate
cleaning
film
metallic film
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2954982A
Other languages
Japanese (ja)
Other versions
JPH0147414B2 (en
Inventor
Hirokazu Kamei
宏和 亀井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2954982A priority Critical patent/JPS58145643A/en
Publication of JPS58145643A publication Critical patent/JPS58145643A/en
Publication of JPH0147414B2 publication Critical patent/JPH0147414B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:To carry out the cleaning of a transparent glass plate coated with an In-Sn metallic film by using ultraviolet ray, thereby preventing the clarification of the above black metallic film by the cleaning process, and facilitating the patterning of the electrodes. CONSTITUTION:A glass plate 1 having a deposited In-Sn (IT) metallic film is irradiated by the ultraviolet radiation apparatus furnished with a high pressure mercury lamp 4 during the transportation with the conveyor 2. The surface of the plate 1 can be cleaned rapidly by the activity of ultraviolet ray to remove the dust and moisture from the surface of the plate 1. The temperature of the plate 1 can be suppressed to about 130 deg.C throughout the cleaning process, and the clarification of the IT metallic film by the overheating during the cleaning process can be prevented.

Description

【発明の詳細な説明】 本発明は、In−5n系金属膜の酸化膜か透明電極とし
て形成されてなるガラス板の洗浄方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for cleaning a glass plate formed of an oxide film of an In-5n metal film or a transparent electrode.

液晶表示装置は2枚のガラス基板を利用して、これらガ
ラス基板の間隙に液晶組成物を充填して構成されている
。液晶組成物を挾持しているガラス基板面には、液晶組
成物に電界を印加するため電極が表示内容に対応した形
状で形成されている。
A liquid crystal display device is constructed by using two glass substrates and filling a gap between the glass substrates with a liquid crystal composition. Electrodes are formed on the surfaces of the glass substrates holding the liquid crystal composition in a shape corresponding to the display content in order to apply an electric field to the liquid crystal composition.

該電極は少なくとも表示を観察する側が透明電極で形成
され、通常はIn−5n系金属の酸化膜(以下ITO膜
と称す)が用いられる。
The electrode is formed of a transparent electrode at least on the side on which the display is viewed, and usually an In-5n metal oxide film (hereinafter referred to as an ITO film) is used.

」1記のようなITO膜はまずガラス板面にIn−5n
金属膜が蒸着され、この蒸着膜が焼成によって酸化され
透明導電膜にされる。
The ITO film as described in item 1 is first coated with In-5n on the glass plate surface.
A metal film is deposited, and the deposited film is oxidized by firing to form a transparent conductive film.

処で上記ITO膜を備えたガラス板を製造するにあたっ
て、ガラス板面は清浄な状態に保たれていなけれは、液
晶組成物を挟持した場合に液晶を変質させたり、表示に
欠損部分が生じる等の不都合を生じる惧れがある。従っ
て製造工程の適宜の段階でガラス板の洗浄が実行される
。ガラス基板の洗浄は従来から高温加熱する方法が広く
採用されている。このような高温加熱は水分や油分を除
去するのに効果がある。しかし上記のようにIn−5n
金属が蒸着されたガラス板を洗浄する場合、高温加熱の
雰囲気に晒すことによりIn−5n金属膜は酸化され、
金属状態で黒色を呈していた膜は酸化により透明膜に変
化する。透明膜の状態は、出来上った液晶表示装置のガ
ラス板としては同等支障を生じるものではないが、金属
膜を表示内容に対応した形状にパターニングする際、黒
色の金属膜に比べて作業を著しく困難にするという欠点
があった。
However, when manufacturing a glass plate equipped with the above-mentioned ITO film, the glass plate surface must be kept clean, otherwise when a liquid crystal composition is sandwiched, the liquid crystal may be deteriorated or defects may appear in the display. There is a risk of causing inconvenience. Therefore, cleaning of the glass plate is performed at an appropriate stage of the manufacturing process. Conventionally, high-temperature heating has been widely used for cleaning glass substrates. Such high-temperature heating is effective in removing moisture and oil. However, as mentioned above, In-5n
When cleaning a glass plate on which metal has been deposited, the In-5n metal film is oxidized by exposing it to a high temperature heating atmosphere.
The film, which was black in its metallic state, changes to a transparent film through oxidation. Although the condition of the transparent film does not cause any problems on the glass plate of the finished liquid crystal display device, it requires more work than a black metal film when patterning the metal film into a shape that corresponds to the display content. It had the disadvantage of making it extremely difficult.

本発明は上記従来のITO膜を備えたガラス板の製造方
法がもつ欠点に鑑みてなされたもので、洗浄によって黒
色IT金属膜が透明化されるのを抑制し、電極のパター
ニングが容易なITガラス板の洗浄方法を提供するもの
である。
The present invention has been made in view of the drawbacks of the conventional method of manufacturing a glass plate equipped with an ITO film. A method for cleaning a glass plate is provided.

即ち本発明はIT金属膜が蒸着されたガラス板を紫外線
光に晒して洗浄する。紫外線光はガラス板表面に付着し
たゴミや水分等を除去する作用がある。一方照射された
ガラス板面の温度上昇は約130℃程度に抑えることが
でき、洗浄中のIT金属膜の焼成による透明膜化は防く
ことができる。
That is, the present invention cleans a glass plate on which an IT metal film is deposited by exposing it to ultraviolet light. Ultraviolet light has the effect of removing dust, moisture, etc. adhering to the surface of the glass plate. On the other hand, the temperature rise of the irradiated glass plate surface can be suppressed to about 130° C., and it is possible to prevent the IT metal film from becoming a transparent film due to baking during cleaning.

また洗浄に要する時間も水銀灯の下で約60〜240s
ec程度の極めて短い洗浄で充分な効果を得ることがで
きる。
Also, the time required for cleaning is approximately 60 to 240 seconds under a mercury lamp.
Sufficient effects can be obtained with extremely short cleaning times such as EC.

第1図は、IT金属膜が蒸着されたガラス板1に紫外線
光を照射するための装置を示し、コンベア2で搬送され
てくるガラス板1面を被う集光型反射板3が設けられて
いる。該集光型反射板3で囲まれた空間内に高圧水銀灯
4が紫外線光源として設置されている。水銀灯4から放
射された紫外線は直接或いは反射板3に反射されてガラ
ス板1面に方向付けられ、IT金属膜を備えたガラス板
1而を速やかに洗浄する。ライン状に集光された紫外線
4により第3図に示す如く、コンベア2で運ばれるガラ
ス板1が一端から他端に向って洗浄される。
FIG. 1 shows an apparatus for irradiating ultraviolet light onto a glass plate 1 on which an IT metal film is vapor-deposited. ing. A high-pressure mercury lamp 4 is installed as an ultraviolet light source in a space surrounded by the condensing reflector 3. The ultraviolet rays emitted from the mercury lamp 4 are directed toward the glass plate 1 either directly or reflected by the reflection plate 3, and quickly clean the glass plate 1 provided with the IT metal film. As shown in FIG. 3, the glass plate 1 carried by the conveyor 2 is cleaned by the ultraviolet rays 4 focused in a line from one end to the other.

上記洗浄処理中、点灯した水銀灯4は同時に発熱するた
めこれを冷却することと、放射された紫外線によってオ
ゾンを発生するためこれを除去することを兼ねて、反射
板3で囲まれた空間を外部に通じさせるための排気孔5
が設けられ、次に説明する第2図(a) 、 (1))
に示す如く排気ファン6が取付けられている。
During the above cleaning process, the lit mercury lamp 4 generates heat at the same time, so the space surrounded by the reflector plate 3 is removed from the outside to cool the mercury lamp 4 and to remove ozone, which is generated by the emitted ultraviolet rays. Exhaust hole 5 for communicating with
2 (a), (1)), which will be explained next.
As shown in the figure, an exhaust fan 6 is installed.

第2図(a) 、 (+))は上記紫外線照射部を備え
た洗浄装置の全体の概観を示す側面図及び正面図で、外
側カバー7内に上記第1図に示した紫外線照射部が収納
されている。
FIGS. 2(a) and (+) are a side view and a front view showing the overall appearance of the cleaning device equipped with the ultraviolet irradiation section, in which the ultraviolet irradiation section shown in FIG. 1 is inside the outer cover 7. It is stored.

紫外線照射によって洗浄されたガラス板は、高温に晒さ
れていないためIT膜は金属膜のままに保存されており
、従って黒色を呈している。次に従来公知の工程により
電極パターンに対応する形状にパターニングされ、パタ
ーンエツチング後高温に焼成されて金属を酸化し、IT
Oの透明導電膜を作成する。上記ITO膜を備えたガラ
ス板は液晶表示装置だけではなく、ECD等の電極基板
としても利用することができる。
Since the glass plate cleaned by ultraviolet irradiation is not exposed to high temperatures, the IT film remains as a metal film, and therefore has a black color. Next, it is patterned into a shape corresponding to the electrode pattern by a conventionally known process, and after pattern etching, it is fired at a high temperature to oxidize the metal and become IT.
A transparent conductive film of O is created. The glass plate provided with the above-mentioned ITO film can be used not only for liquid crystal display devices but also as an electrode substrate for ECDs and the like.

以上本発明のように、IT膜が形成されたガラス板の洗
浄を紫外線光によって行うことにより、低い温度で洗浄
することができ、IT膜を金属膜の状態で維持させるこ
とができ、金属膜が黒色であるため観察が容易になりそ
の後に行われる電極パターニングの作業が著しく容易に
なる。
As described above, by cleaning the glass plate on which the IT film is formed using ultraviolet light, the glass plate on which the IT film is formed can be cleaned at a low temperature, the IT film can be maintained in the state of a metal film, and the metal film can be cleaned at a low temperature. Since it is black, it is easy to observe and the subsequent electrode patterning work is significantly facilitated.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明を実施するための洗浄装置の要部拡大図
、第2図(a) 、 (b)は同洗浄装置の側面図及び
平面図、第3図は紫外線照射状態を示す図である。 1:IT膜被着ガラス板、4:水銀灯。
FIG. 1 is an enlarged view of the main parts of a cleaning device for carrying out the present invention, FIGS. 2(a) and (b) are a side view and a plan view of the same cleaning device, and FIG. 3 is a diagram showing the state of ultraviolet irradiation. It is. 1: IT film coated glass plate, 4: Mercury lamp.

Claims (1)

【特許請求の範囲】[Claims] 1 透明ガラス板面にIn−5rJ4:尿膜を作成し、
該In−5n系金属膜が被着されたガラス板面を紫外線
光に晒して洗浄することを特徴とするITガラス板の洗
浄方法。
1 Create In-5rJ4: allantoic film on the surface of a transparent glass plate,
A method for cleaning an IT glass plate, characterized in that the glass plate surface coated with the In-5n metal film is cleaned by exposing it to ultraviolet light.
JP2954982A 1982-02-24 1982-02-24 Cleaning of indium-tin glass plate Granted JPS58145643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2954982A JPS58145643A (en) 1982-02-24 1982-02-24 Cleaning of indium-tin glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2954982A JPS58145643A (en) 1982-02-24 1982-02-24 Cleaning of indium-tin glass plate

Publications (2)

Publication Number Publication Date
JPS58145643A true JPS58145643A (en) 1983-08-30
JPH0147414B2 JPH0147414B2 (en) 1989-10-13

Family

ID=12279213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2954982A Granted JPS58145643A (en) 1982-02-24 1982-02-24 Cleaning of indium-tin glass plate

Country Status (1)

Country Link
JP (1) JPS58145643A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6361224A (en) * 1986-09-01 1988-03-17 Minolta Camera Co Ltd Color correction coating method for near parabolic optical transmission body array
JPS63237605A (en) * 1987-03-26 1988-10-04 Asahi Glass Co Ltd Surface processing method for glass medium for ultrasonic delay element
JP2007153679A (en) * 2005-12-06 2007-06-21 Fujikura Ltd Method of producing silica glass preform

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6361224A (en) * 1986-09-01 1988-03-17 Minolta Camera Co Ltd Color correction coating method for near parabolic optical transmission body array
JPS63237605A (en) * 1987-03-26 1988-10-04 Asahi Glass Co Ltd Surface processing method for glass medium for ultrasonic delay element
JP2007153679A (en) * 2005-12-06 2007-06-21 Fujikura Ltd Method of producing silica glass preform
JP4663501B2 (en) * 2005-12-06 2011-04-06 株式会社フジクラ Manufacturing method of quartz glass base material

Also Published As

Publication number Publication date
JPH0147414B2 (en) 1989-10-13

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