JPS6031081Y2 - バツクプレ−ト装置 - Google Patents
バツクプレ−ト装置Info
- Publication number
- JPS6031081Y2 JPS6031081Y2 JP12439978U JP12439978U JPS6031081Y2 JP S6031081 Y2 JPS6031081 Y2 JP S6031081Y2 JP 12439978 U JP12439978 U JP 12439978U JP 12439978 U JP12439978 U JP 12439978U JP S6031081 Y2 JPS6031081 Y2 JP S6031081Y2
- Authority
- JP
- Japan
- Prior art keywords
- front surface
- wafer
- back plate
- wafers
- support frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12439978U JPS6031081Y2 (ja) | 1978-09-12 | 1978-09-12 | バツクプレ−ト装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12439978U JPS6031081Y2 (ja) | 1978-09-12 | 1978-09-12 | バツクプレ−ト装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5542049U JPS5542049U (enExample) | 1980-03-18 |
| JPS6031081Y2 true JPS6031081Y2 (ja) | 1985-09-18 |
Family
ID=29084377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12439978U Expired JPS6031081Y2 (ja) | 1978-09-12 | 1978-09-12 | バツクプレ−ト装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6031081Y2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58185766A (ja) * | 1982-04-21 | 1983-10-29 | Jeol Ltd | 膜作成方法 |
-
1978
- 1978-09-12 JP JP12439978U patent/JPS6031081Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5542049U (enExample) | 1980-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4056879A (en) | Method of forming silicon solar energy cell having improved back contact | |
| DE59000869D1 (de) | Werkstuecktraeger fuer ein scheibenfoermiges werkstueck sowie vakuumprozesskammer. | |
| EP1383165A3 (en) | Peeling method | |
| JPS5575282A (en) | Manufacturing method of semiconductor laser device | |
| JPS64768A (en) | Manufacture of semiconductor element | |
| JPS6031081Y2 (ja) | バツクプレ−ト装置 | |
| Oura et al. | Thermally induced accumulation of silicon on palladium silicide surfaces as studied by Auger electron spectroscopy | |
| JPS5841722Y2 (ja) | イオン打込用のバックプレ−ト装置 | |
| RU2076390C1 (ru) | Способ охлаждения полупроводниковых пластин в вакууме | |
| JPS596617Y2 (ja) | バツクプレ−ト装置 | |
| JPS58137225A (ja) | 基板着脱機構 | |
| JPH0747865Y2 (ja) | ウエハ貼付装置 | |
| JPS62113347A (ja) | ウエハ−保持装置 | |
| JP2800464B2 (ja) | 化合物半導体基板用アニール処理炉 | |
| JPS57166025A (en) | Heat treatment method for compound semiconductor device | |
| JPS62105347A (ja) | 半導体製造装置 | |
| JPS5498570A (en) | Manufacture for semiconductor device | |
| JPH1064817A5 (enExample) | ||
| JPS59172736A (ja) | イオン注入用ウエハ−ス保持装置 | |
| JPS6041482Y2 (ja) | 熱交換装置 | |
| JPS5440583A (en) | Semiconductor device | |
| JPS56164537A (en) | Manufacture of semiconductor device | |
| JPH0418197Y2 (enExample) | ||
| JPH01164028A (ja) | オーム性電極の形成方法および装置 | |
| KR840001879A (ko) | 열회복성 판의 피복방법 및 장치 |