JPS6026669A - Resist ink for electroless plating - Google Patents

Resist ink for electroless plating

Info

Publication number
JPS6026669A
JPS6026669A JP58135458A JP13545883A JPS6026669A JP S6026669 A JPS6026669 A JP S6026669A JP 58135458 A JP58135458 A JP 58135458A JP 13545883 A JP13545883 A JP 13545883A JP S6026669 A JPS6026669 A JP S6026669A
Authority
JP
Japan
Prior art keywords
electroless plating
resist
ink
copper
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58135458A
Other languages
Japanese (ja)
Other versions
JPS6352112B2 (en
Inventor
Nobuo Uozu
魚津 信夫
Satoshi Isoda
磯田 聰
Hiroyoshi Yokoyama
横山 博義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lincstech Circuit Co Ltd
Original Assignee
Hitachi Condenser Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Condenser Co Ltd filed Critical Hitachi Condenser Co Ltd
Priority to JP58135458A priority Critical patent/JPS6026669A/en
Publication of JPS6026669A publication Critical patent/JPS6026669A/en
Publication of JPS6352112B2 publication Critical patent/JPS6352112B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1605Process or apparatus coating on selected surface areas by masking
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Abstract

PURPOSE:To provide resist ink for electroless plating which prevent copper release and has high reliability by consisting the name of an epoxy resin compsn. contg. a filler mixed with aluminum silicate having a prescribed grain size or below, a solid soln. of titanium oxide, nickel oxide and antimony oxide and ultrafine grain silica. CONSTITUTION:This resist ink is constituted of an epoxy resin compn. contg. a filler mixed with aluminum silicate having <=15mu grain size, a solid soln. of the above-described oxides and fine grain silica. More specification, the manufacture of a printed wiring board is accomplished by coating an adhesive agent contg. a platng catalyst such as Pd on a base plate such as a paper-phenolic resin laminate contg. a plating catalyst such as Pd then printing the above- described ink for resist thereon. Since the ink for resist has extremely fine particles, the ruggedness on the printed surface is small. Therefore if the surface is thereafter subjected to an electroless plating treatment, copper is hardly stickable to the surface of the resist ink and particularly the solid soln. and the ultrafine grain silica have the effect of making difficult the growth of copper particles sticking to the surface. The generation of copper release and the short circuiting defect occurring therefrom are thus suppressed.

Description

【発明の詳細な説明】 本発明は無電解めっき用インクに関するものである。[Detailed description of the invention] The present invention relates to an ink for electroless plating.

印刷配線板は、それが組み込まれる装置が小型化するに
従って、高密痘実装可能なものが要求されるようになっ
てきており、ライン間の間隔の狭いものが必要となって
きた。
As the devices in which printed wiring boards are incorporated become smaller, there has been a need for printed wiring boards that can be mounted with high density, and there has been a need for narrower spacing between lines.

ところで、必要な回路部分のみに無電解めっき法により
金属めっきして回路を設けたフルアディティブ型の印刷
配線板は、例えば、めっき触媒入り基板にめっき触媒入
り接着剤を塗布し、めっきレジスト印刷、化学粗化、洗
浄、無電解めっき、半田レジスト印刷の各処理を順次行
ない製造されている。そして無電解めっき処理をした際
、従来のメツキレシストでは金属が付着し易く、その金
属が成長することがライン間を短絡する原因となってい
る。これは一般に銅ぶりと言われ、印刷配線板の高密度
化が進むに従ってこの銅ふりによる不良が増加する欠点
がある。そのために、無電解めっき処理後にパフ研摩等
による銅ふり除去処理を行なっているが、このような作
業によっても銅ふりを完全に無くすことが出来ず、作業
が困難である欠点があった。
By the way, a fully additive type printed wiring board in which a circuit is provided by metal plating only the necessary circuit parts by electroless plating is produced by, for example, applying a plating catalyst-containing adhesive to a plating catalyst-containing substrate, plating resist printing, It is manufactured by sequentially performing chemical roughening, cleaning, electroless plating, and solder resist printing. When electroless plating is performed, metal tends to adhere to conventional plating resists, and the growth of the metal causes short circuits between lines. This is generally referred to as copper tinting, and as the density of printed wiring boards becomes higher, the number of defects due to copper tinting increases. For this reason, after the electroless plating process, copper flakes are removed by puff polishing or the like, but even with such operations, the copper flakes cannot be completely removed and the work is difficult.

本発明は、以上の欠点を改良し、銅ぶりを防止して信頼
性の高い、かつ製造の容易な印刷配線板を製造しつる無
電解めっき用レジストインクの提供を目的とするもので
ある。
The object of the present invention is to provide a resist ink for electroless plating that can improve the above-mentioned drawbacks, prevent copper tinting, and produce printed wiring boards that are highly reliable and easy to manufacture.

本発明は、上記の目的を達成するために、粒径が15μ
以下の珪酸アルミニウム並びに酸化チタン、酸化ニッケ
ル及び酸化アンチモンの固溶体並びに超微粒子シリカを
混合した充填剤を含むエポキシ樹脂系組成物からなるこ
とを特徴とする無電解めっき用レジストインクを提供す
るものである。
In order to achieve the above object, the present invention has a particle size of 15 μm.
The present invention provides a resist ink for electroless plating characterized by comprising an epoxy resin composition containing the following filler mixed with aluminum silicate, a solid solution of titanium oxide, nickel oxide, and antimony oxide, and ultrafine silica. .

すなわち、印刷配線板を製造する場合、Pd等のめつき
触媒入りの紙フエノール樹脂積層板や紙エポキシ樹脂積
層板等の基板に、Pd等のめつき触媒入り接着剤を塗布
した後に本発明による無電解めっき用レジストインクを
印刷する。この無電解めっき用レジストインクは、エポ
キシ樹脂系組成物からなり、充填剤が粒径が25μ以下
の珪酸アルミニウムとこれよりも粒径の小さい固溶体や
超微粒子シリカであり、粒子が細かいので、印刷し1=
表面の凹凸が小さい。それ故、その後に無電解めっき処
理を行なった場合、銅がレジストインク表面に付着し難
く、特に固溶体と超微粒子シリカとは付着した銅粒子を
成長し難くする作用を有してa3す、銅ぶりの発生及び
それによる短絡不良を抑制しうるちのである。このよう
な効果は、特に、固溶体と超微粒子シリカの合計量がレ
ジン100重量部に対して3重量部以上の範囲において
顕箸である。ただし、合計間が15重量部より多くなる
と無電解銅めっき液に溶は易くなり、かつ該めっき液を
汚染するので好ましくない。
That is, when manufacturing a printed wiring board, after applying an adhesive containing a plating catalyst such as Pd to a substrate such as a paper phenolic resin laminate or a paper epoxy resin laminate containing a plating catalyst such as Pd, the adhesive according to the present invention is applied. Print resist ink for electroless plating. This resist ink for electroless plating is made of an epoxy resin composition, and the filler is aluminum silicate with a particle size of 25μ or less and a solid solution or ultrafine silica with a smaller particle size. 1=
Surface irregularities are small. Therefore, when electroless plating is performed afterwards, it is difficult for copper to adhere to the surface of the resist ink. In particular, the solid solution and ultrafine silica have the effect of making it difficult for the attached copper particles to grow. This suppresses the occurrence of blurring and the resulting short circuit defects. Such effects are particularly noticeable when the total amount of the solid solution and ultrafine silica is 3 parts by weight or more based on 100 parts by weight of the resin. However, if the total amount exceeds 15 parts by weight, it is undesirable because it becomes easy to dissolve in the electroless copper plating solution and contaminates the plating solution.

なお、エポキシ樹脂系組成物中の充填剤の含有量は10
〜30重量%が好ましく、10重量%未満あるいは30
重重聞より多いと印刷性が低くなり、所定の厚さが得ら
れなかったりあるいは所定の幅よりもはみ出し易い性質
がある。
In addition, the content of filler in the epoxy resin composition is 10
~30% by weight is preferred, less than 10% by weight or 30% by weight
If the number is more than 100%, the printability will be poor, and a predetermined thickness may not be obtained, or the ink may easily protrude beyond a predetermined width.

例えば、無電解めっき用レジストインクとして、エポキ
シ樹脂100重量部、流れ調整剤としてのモダフロー3
重量部、硬化剤としてのエビフオーム17重量部及びブ
チルカルピトール30重量部に対して、最大粒径15μ
以下の珪酸アルミニウム18!!1部、酸化チタン、酸
化ニッケル及び酸化ニッケルの固溶体8重量部、超微粒
子シリカ4重量部からなる充填剤を混合した本発明実施
例1と、上記組成において珪酸アルミニウムを23車m
部、固溶体を3重量部、超微粒子シリカを4重量部とし
た本発明実施例2と、珪酸アルミニウムを14車量部、
固溶体を8重量部、超微粒子シリカを6重量部とした本
発明実施例3と、最大粒径が15μより大きい珪酸アル
ミニウムを28重量部、固溶体をO重用部、超微粒子シ
リカを2重量部とした従来例を用い、基板に印刷し、そ
の後、化学粗化、無電解めっき処理を行ない銅めっきを
設けた印刷配線板について、印刷性や耐化学粗化液性、
銅めっきの成長性、銅15”lり量(20倍顕微鏡で見
える銅粒子数)を測定したところ表の通りの結果が得ら
れた。すなわち、本発明による方が従来例に比べて銅ふ
り量がはるかに少なくまた印刷性も優れていることが明
らかである。
For example, as a resist ink for electroless plating, 100 parts by weight of epoxy resin and Modaflow 3 as a flow control agent are used.
parts by weight, 17 parts by weight of Ebiform as a hardening agent and 30 parts by weight of butylcarpitol, maximum particle size 15μ
Aluminum silicate 18 below! ! 1 part by weight of titanium oxide, nickel oxide, 8 parts by weight of a solid solution of nickel oxide, and 4 parts by weight of ultrafine particle silica, and 23 m of aluminum silicate in the above composition.
Example 2 of the present invention, in which the solid solution was 3 parts by weight, the ultrafine silica was 4 parts by weight, and the aluminum silicate was 14 parts by weight,
Example 3 of the present invention using 8 parts by weight of solid solution and 6 parts by weight of ultrafine particle silica, 28 parts by weight of aluminum silicate with a maximum particle size of more than 15μ, O weight part of solid solution, and 2 parts by weight of ultrafine particle silica. Using the conventional example, printability, chemical roughening liquid resistance, printed wiring board with copper plating after printing on the board and then chemical roughening and electroless plating treatment were evaluated.
When the growth rate of copper plating and the amount of copper 15"l (the number of copper particles visible under a 20x microscope) were measured, the results shown in the table were obtained. In other words, the copper plating of the present invention was better than that of the conventional example. It is clear that the amount is much lower and the printability is also better.

表 以上の通り、本発明によれば、印刷配線板の製造時に発
生する銅ふり量を著しく軽減でき、印刷配線板の信頼性
を向上でき、かつその製造を容易にしつる無電解めっき
用レジストインクが得られる。
As shown in the table above, according to the present invention, the resist ink for electroless plating can significantly reduce the amount of copper dust generated during the manufacturing of printed wiring boards, improve the reliability of printed wiring boards, and facilitate the manufacturing thereof. is obtained.

特許出願人 日立コンデンサ株式会社Patent applicant: Hitachi Capacitor Co., Ltd.

Claims (1)

【特許請求の範囲】 (+) 無電解めっき用レジス1へインクにおいて、粒
径が15μ以下の珪酸アルミニウム並びに酸化チタン、
酸化ニッケル及び酸化アンチモンの固溶体並びに超微粒
子シリカを混合した充填剤を含むエポキシ樹脂系組成物
からなることを特徴とする無電解めっき用レジストイン
ク。 (2)酸化チタン、酸化ニッケル及び酸化アンチモンの
固溶体と超微粒子シリカの合計邑がレジン1“00!I
’!ffi部に対して3〜15重量部である特許請求の
範囲第1項記載の無電解めっき用レジストインク。 (3)充填剤の含有聞が10〜30重囚部である特許請
求の範囲第1項及び第2項記載の無電解めっき用レジス
トインク。
[Claims] (+) In the ink for the resist 1 for electroless plating, aluminum silicate and titanium oxide having a particle size of 15 μm or less,
A resist ink for electroless plating comprising an epoxy resin composition containing a filler mixed with a solid solution of nickel oxide and antimony oxide and ultrafine silica particles. (2) The total amount of solid solution of titanium oxide, nickel oxide, and antimony oxide and ultrafine silica is resin 1"00!I
'! The resist ink for electroless plating according to claim 1, wherein the amount is 3 to 15 parts by weight based on parts ffi. (3) The resist ink for electroless plating according to claims 1 and 2, wherein the filler content is 10 to 30 parts.
JP58135458A 1983-07-25 1983-07-25 Resist ink for electroless plating Granted JPS6026669A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58135458A JPS6026669A (en) 1983-07-25 1983-07-25 Resist ink for electroless plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58135458A JPS6026669A (en) 1983-07-25 1983-07-25 Resist ink for electroless plating

Publications (2)

Publication Number Publication Date
JPS6026669A true JPS6026669A (en) 1985-02-09
JPS6352112B2 JPS6352112B2 (en) 1988-10-18

Family

ID=15152179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58135458A Granted JPS6026669A (en) 1983-07-25 1983-07-25 Resist ink for electroless plating

Country Status (1)

Country Link
JP (1) JPS6026669A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE40947E1 (en) * 1997-10-14 2009-10-27 Ibiden Co., Ltd. Multilayer printed wiring board and its manufacturing method, and resin composition for filling through-hole

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5790072A (en) * 1980-11-25 1982-06-04 Hitachi Ltd Resist ink composition for chemical plating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5790072A (en) * 1980-11-25 1982-06-04 Hitachi Ltd Resist ink composition for chemical plating

Also Published As

Publication number Publication date
JPS6352112B2 (en) 1988-10-18

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