JPS60262972A - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS60262972A
JPS60262972A JP11794084A JP11794084A JPS60262972A JP S60262972 A JPS60262972 A JP S60262972A JP 11794084 A JP11794084 A JP 11794084A JP 11794084 A JP11794084 A JP 11794084A JP S60262972 A JPS60262972 A JP S60262972A
Authority
JP
Japan
Prior art keywords
substrate
electrodes
electrode
metal electrode
needle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11794084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0561350B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Okamoto
弘之 岡本
Hidekazu Oota
英一 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP11794084A priority Critical patent/JPS60262972A/ja
Publication of JPS60262972A publication Critical patent/JPS60262972A/ja
Publication of JPH0561350B2 publication Critical patent/JPH0561350B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP11794084A 1984-06-08 1984-06-08 プラズマｃｖｄ装置 Granted JPS60262972A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11794084A JPS60262972A (ja) 1984-06-08 1984-06-08 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11794084A JPS60262972A (ja) 1984-06-08 1984-06-08 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS60262972A true JPS60262972A (ja) 1985-12-26
JPH0561350B2 JPH0561350B2 (enrdf_load_stackoverflow) 1993-09-06

Family

ID=14723984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11794084A Granted JPS60262972A (ja) 1984-06-08 1984-06-08 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS60262972A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4915807A (en) * 1988-09-29 1990-04-10 Texas Instruments Incorporated Method and apparatus for processing a semiconductor wafer
JP2001098358A (ja) * 1999-09-28 2001-04-10 Ulvac Japan Ltd カーボン薄膜の成膜装置、及びカーボン薄膜製造方法
JP2005293854A (ja) * 2004-03-31 2005-10-20 Hiroshi Takigawa プラズマ生成用電源回路、プラズマ生成装置、プラズマ処理装置及び目的物
US20110000432A1 (en) * 2008-06-12 2011-01-06 Atomic Energy Council - Institute Of Nuclear Energy Research One atmospheric pressure non-thermal plasma reactor with dual discharging-electrode structure

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4915807A (en) * 1988-09-29 1990-04-10 Texas Instruments Incorporated Method and apparatus for processing a semiconductor wafer
JP2001098358A (ja) * 1999-09-28 2001-04-10 Ulvac Japan Ltd カーボン薄膜の成膜装置、及びカーボン薄膜製造方法
JP2005293854A (ja) * 2004-03-31 2005-10-20 Hiroshi Takigawa プラズマ生成用電源回路、プラズマ生成装置、プラズマ処理装置及び目的物
WO2005101927A1 (ja) * 2004-03-31 2005-10-27 Kurita Seisakusho Co., Ltd. プラズマ生成用電源回路、プラズマ生成装置、プラズマ処理装置及び目的物
US7719198B2 (en) 2004-03-31 2010-05-18 Hirofumi Takikawa Power supply circuit for plasma generation, plasma generating apparatus, plasma processing apparatus and plasma processed object
US20110000432A1 (en) * 2008-06-12 2011-01-06 Atomic Energy Council - Institute Of Nuclear Energy Research One atmospheric pressure non-thermal plasma reactor with dual discharging-electrode structure

Also Published As

Publication number Publication date
JPH0561350B2 (enrdf_load_stackoverflow) 1993-09-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term