JPS60257053A - 荷電粒子ビ−ム装置 - Google Patents

荷電粒子ビ−ム装置

Info

Publication number
JPS60257053A
JPS60257053A JP59112469A JP11246984A JPS60257053A JP S60257053 A JPS60257053 A JP S60257053A JP 59112469 A JP59112469 A JP 59112469A JP 11246984 A JP11246984 A JP 11246984A JP S60257053 A JPS60257053 A JP S60257053A
Authority
JP
Japan
Prior art keywords
lens
charged particle
image
electron
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59112469A
Other languages
English (en)
Japanese (ja)
Other versions
JPH039581B2 (enrdf_load_stackoverflow
Inventor
Toyoki Kitayama
北山　豊樹
Shigeru Moriya
茂 守屋
Kazuhiko Komatsu
一彦 小松
Toshinori Goto
後藤　俊徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP59112469A priority Critical patent/JPS60257053A/ja
Publication of JPS60257053A publication Critical patent/JPS60257053A/ja
Publication of JPH039581B2 publication Critical patent/JPH039581B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP59112469A 1984-06-01 1984-06-01 荷電粒子ビ−ム装置 Granted JPS60257053A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59112469A JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59112469A JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Publications (2)

Publication Number Publication Date
JPS60257053A true JPS60257053A (ja) 1985-12-18
JPH039581B2 JPH039581B2 (enrdf_load_stackoverflow) 1991-02-08

Family

ID=14587417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59112469A Granted JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Country Status (1)

Country Link
JP (1) JPS60257053A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018011946A1 (ja) * 2016-07-14 2018-01-18 株式会社日立ハイテクノロジーズ イオンミリング装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835852A (ja) * 1981-08-28 1983-03-02 Agency Of Ind Science & Technol 荷電ビ−ム用レンズ

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835852A (ja) * 1981-08-28 1983-03-02 Agency Of Ind Science & Technol 荷電ビ−ム用レンズ

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018011946A1 (ja) * 2016-07-14 2018-01-18 株式会社日立ハイテクノロジーズ イオンミリング装置
KR20190002590A (ko) * 2016-07-14 2019-01-08 가부시키가이샤 히다치 하이테크놀로지즈 이온 밀링 장치
CN109314031A (zh) * 2016-07-14 2019-02-05 株式会社日立高新技术 离子铣削装置
JPWO2018011946A1 (ja) * 2016-07-14 2019-04-04 株式会社日立ハイテクノロジーズ イオンミリング装置
CN109314031B (zh) * 2016-07-14 2020-12-22 株式会社日立高新技术 离子铣削装置
US11257654B2 (en) 2016-07-14 2022-02-22 Hitachi High-Tech Corporation Ion milling apparatus

Also Published As

Publication number Publication date
JPH039581B2 (enrdf_load_stackoverflow) 1991-02-08

Similar Documents

Publication Publication Date Title
US5831270A (en) Magnetic deflectors and charged-particle-beam lithography systems incorporating same
US8502176B2 (en) Imaging system
JPH02718U (enrdf_load_stackoverflow)
JPS5871545A (ja) 可変成形ビ−ム電子光学系
JPH02295040A (ja) 集束イオンビーム装置
JPS6042825A (ja) 荷電ビ−ム露光装置
JPS5823155A (ja) 荷電粒子ビ−ムの整列制御装置
JPS6362321A (ja) 荷電粒子露光装置
WO2000075954A2 (en) Apparatus and method for forming a charged particle beam of arbitrary shape
JPS60257053A (ja) 荷電粒子ビ−ム装置
JPS62246240A (ja) 試料上に物体の像を投影するための電子ビ−ム装置
JPH0234426B2 (enrdf_load_stackoverflow)
JPH0234144B2 (enrdf_load_stackoverflow)
JP3086238B2 (ja) 荷電粒子ビーム露光装置
JP2594660B2 (ja) 荷電粒子ビーム露光方法
JP2907220B2 (ja) 電子ビーム露光装置
JPH03102813A (ja) 可変成形型荷電粒子線露光装置
JPH0748470B2 (ja) 荷電粒子ビーム装置
JP2695795B2 (ja) 荷電ビーム描画装置
JP2001093825A (ja) 荷電ビーム描画装置およびパターン描画方法並びに記録媒体
JPS63131450A (ja) 静電偏向装置
JPS5921164B2 (ja) 電子線露光装置
JP3040271B2 (ja) カラー受像管装置
JPS622454B2 (enrdf_load_stackoverflow)
JPS61125127A (ja) 電子ビ−ム露光装置