JPS60241214A - アモルフアスシリコン膜の生成法 - Google Patents

アモルフアスシリコン膜の生成法

Info

Publication number
JPS60241214A
JPS60241214A JP59096652A JP9665284A JPS60241214A JP S60241214 A JPS60241214 A JP S60241214A JP 59096652 A JP59096652 A JP 59096652A JP 9665284 A JP9665284 A JP 9665284A JP S60241214 A JPS60241214 A JP S60241214A
Authority
JP
Japan
Prior art keywords
silicon
substrate
film
gas
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59096652A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0210567B2 (enExample
Inventor
Ko Yasui
安井　甲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP59096652A priority Critical patent/JPS60241214A/ja
Publication of JPS60241214A publication Critical patent/JPS60241214A/ja
Publication of JPH0210567B2 publication Critical patent/JPH0210567B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photovoltaic Devices (AREA)
  • Recrystallisation Techniques (AREA)
JP59096652A 1984-05-16 1984-05-16 アモルフアスシリコン膜の生成法 Granted JPS60241214A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59096652A JPS60241214A (ja) 1984-05-16 1984-05-16 アモルフアスシリコン膜の生成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59096652A JPS60241214A (ja) 1984-05-16 1984-05-16 アモルフアスシリコン膜の生成法

Publications (2)

Publication Number Publication Date
JPS60241214A true JPS60241214A (ja) 1985-11-30
JPH0210567B2 JPH0210567B2 (enExample) 1990-03-08

Family

ID=14170759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59096652A Granted JPS60241214A (ja) 1984-05-16 1984-05-16 アモルフアスシリコン膜の生成法

Country Status (1)

Country Link
JP (1) JPS60241214A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005093798A1 (ja) * 2004-03-26 2005-10-06 Nissin Electric Co., Ltd. シリコンドット形成方法及びシリコンドット形成装置
JP2007080999A (ja) * 2005-09-13 2007-03-29 Nissin Electric Co Ltd シリコンドットの形成方法及び装置
JP2007088311A (ja) * 2005-09-26 2007-04-05 Nissin Electric Co Ltd シリコンドット形成方法及びシリコンドット形成装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0610969U (ja) * 1992-07-17 1994-02-10 益弘 光山 表示装置
JPH0615081U (ja) * 1992-07-21 1994-02-25 益弘 光山 表示装置
JPH0654075U (ja) * 1992-12-18 1994-07-22 益弘 光山 展示装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005093798A1 (ja) * 2004-03-26 2005-10-06 Nissin Electric Co., Ltd. シリコンドット形成方法及びシリコンドット形成装置
US7988835B2 (en) 2004-03-26 2011-08-02 Nissin Electric Co., Ltd. Silicon dot forming method and silicon dot forming apparatus
JP2007080999A (ja) * 2005-09-13 2007-03-29 Nissin Electric Co Ltd シリコンドットの形成方法及び装置
JP2007088311A (ja) * 2005-09-26 2007-04-05 Nissin Electric Co Ltd シリコンドット形成方法及びシリコンドット形成装置

Also Published As

Publication number Publication date
JPH0210567B2 (enExample) 1990-03-08

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