JPS60235138A - 製版工程における製版材料と原稿との密着方法 - Google Patents

製版工程における製版材料と原稿との密着方法

Info

Publication number
JPS60235138A
JPS60235138A JP59092079A JP9207984A JPS60235138A JP S60235138 A JPS60235138 A JP S60235138A JP 59092079 A JP59092079 A JP 59092079A JP 9207984 A JP9207984 A JP 9207984A JP S60235138 A JPS60235138 A JP S60235138A
Authority
JP
Japan
Prior art keywords
original
plate
making material
printing
plate making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59092079A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0410064B2 (no
Inventor
Hisashi Nakane
中根　久
Junji Kutsuzawa
沓沢　潤司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUOTOPORI OUKA KK
Original Assignee
FUOTOPORI OUKA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUOTOPORI OUKA KK filed Critical FUOTOPORI OUKA KK
Priority to JP59092079A priority Critical patent/JPS60235138A/ja
Publication of JPS60235138A publication Critical patent/JPS60235138A/ja
Publication of JPH0410064B2 publication Critical patent/JPH0410064B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59092079A 1984-05-08 1984-05-08 製版工程における製版材料と原稿との密着方法 Granted JPS60235138A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59092079A JPS60235138A (ja) 1984-05-08 1984-05-08 製版工程における製版材料と原稿との密着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59092079A JPS60235138A (ja) 1984-05-08 1984-05-08 製版工程における製版材料と原稿との密着方法

Publications (2)

Publication Number Publication Date
JPS60235138A true JPS60235138A (ja) 1985-11-21
JPH0410064B2 JPH0410064B2 (no) 1992-02-24

Family

ID=14044438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59092079A Granted JPS60235138A (ja) 1984-05-08 1984-05-08 製版工程における製版材料と原稿との密着方法

Country Status (1)

Country Link
JP (1) JPS60235138A (no)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63132945U (no) * 1987-02-24 1988-08-31

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63132945U (no) * 1987-02-24 1988-08-31

Also Published As

Publication number Publication date
JPH0410064B2 (no) 1992-02-24

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