JPS60231442A - 撥水処理硝子の製造方法 - Google Patents
撥水処理硝子の製造方法Info
- Publication number
- JPS60231442A JPS60231442A JP8711684A JP8711684A JPS60231442A JP S60231442 A JPS60231442 A JP S60231442A JP 8711684 A JP8711684 A JP 8711684A JP 8711684 A JP8711684 A JP 8711684A JP S60231442 A JPS60231442 A JP S60231442A
- Authority
- JP
- Japan
- Prior art keywords
- water
- repellent
- glass
- component
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims description 74
- 239000005871 repellent Substances 0.000 title claims description 65
- 238000004519 manufacturing process Methods 0.000 title description 6
- 229920000642 polymer Polymers 0.000 claims description 29
- 239000000853 adhesive Substances 0.000 claims description 20
- 230000001070 adhesive effect Effects 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 12
- 238000006116 polymerization reaction Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 230000002940 repellent Effects 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 4
- TUQLLQQWSNWKCF-UHFFFAOYSA-N trimethoxymethylsilane Chemical compound COC([SiH3])(OC)OC TUQLLQQWSNWKCF-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- -1 polydimethylsiloxane Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- BHWBMOFUXJUDJW-UHFFFAOYSA-N prop-1-ene hexahydrofluoride Chemical group CC=C.F.F.F.F.F.F BHWBMOFUXJUDJW-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8711684A JPS60231442A (ja) | 1984-04-28 | 1984-04-28 | 撥水処理硝子の製造方法 |
| US06/728,698 US4649071A (en) | 1984-04-28 | 1985-04-29 | Composite material and process for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8711684A JPS60231442A (ja) | 1984-04-28 | 1984-04-28 | 撥水処理硝子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60231442A true JPS60231442A (ja) | 1985-11-18 |
| JPH0545532B2 JPH0545532B2 (enrdf_load_stackoverflow) | 1993-07-09 |
Family
ID=13905980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8711684A Granted JPS60231442A (ja) | 1984-04-28 | 1984-04-28 | 撥水処理硝子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60231442A (enrdf_load_stackoverflow) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05279499A (ja) * | 1991-11-20 | 1993-10-26 | Asahi Glass Co Ltd | 表面処理された基材 |
| US5413865A (en) * | 1992-01-31 | 1995-05-09 | Central Glass Company, Limited | Water-repellent metal oxide film and method of forming same on glass substrate |
| WO1999021706A1 (en) * | 1997-10-24 | 1999-05-06 | Quester Technology, Inc. | Low dielectric constant materials prepared from photon or plasma assisted cvd |
| US6017609A (en) * | 1996-05-27 | 2000-01-25 | Central Glass Company, Limited | Water-repellent glass plate |
| US6020458A (en) * | 1997-10-24 | 2000-02-01 | Quester Technology, Inc. | Precursors for making low dielectric constant materials with improved thermal stability |
| US6086679A (en) * | 1997-10-24 | 2000-07-11 | Quester Technology, Inc. | Deposition systems and processes for transport polymerization and chemical vapor deposition |
| US6140456A (en) * | 1997-10-24 | 2000-10-31 | Quester Techology, Inc. | Chemicals and processes for making fluorinated poly(para-xylylenes) |
| US6358863B1 (en) | 1998-05-01 | 2002-03-19 | Quester Technology, Inc. | Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
| US6495208B1 (en) | 1999-09-09 | 2002-12-17 | Virginia Tech Intellectual Properties, Inc. | Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites |
| JP2006035806A (ja) * | 2004-07-30 | 2006-02-09 | Matsushita Electric Ind Co Ltd | 耐熱防汚基板およびこれを用いた加熱調理機器 |
| WO2010113477A1 (ja) * | 2009-03-31 | 2010-10-07 | シチズンファインテックミヨタ株式会社 | カバー付センサ及びその製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506618A (enrdf_load_stackoverflow) * | 1973-05-19 | 1975-01-23 | ||
| JPS506617A (enrdf_load_stackoverflow) * | 1973-05-19 | 1975-01-23 | ||
| JPS5356177A (en) * | 1976-11-02 | 1978-05-22 | Asahi Glass Co Ltd | Forming method for anti-foggig film on transparent body |
-
1984
- 1984-04-28 JP JP8711684A patent/JPS60231442A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506618A (enrdf_load_stackoverflow) * | 1973-05-19 | 1975-01-23 | ||
| JPS506617A (enrdf_load_stackoverflow) * | 1973-05-19 | 1975-01-23 | ||
| JPS5356177A (en) * | 1976-11-02 | 1978-05-22 | Asahi Glass Co Ltd | Forming method for anti-foggig film on transparent body |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05279499A (ja) * | 1991-11-20 | 1993-10-26 | Asahi Glass Co Ltd | 表面処理された基材 |
| US5413865A (en) * | 1992-01-31 | 1995-05-09 | Central Glass Company, Limited | Water-repellent metal oxide film and method of forming same on glass substrate |
| US6017609A (en) * | 1996-05-27 | 2000-01-25 | Central Glass Company, Limited | Water-repellent glass plate |
| US6258407B1 (en) | 1997-10-24 | 2001-07-10 | Quester Technology, Inc. | Precursors for making low dielectric constant materials with improved thermal stability |
| US6020458A (en) * | 1997-10-24 | 2000-02-01 | Quester Technology, Inc. | Precursors for making low dielectric constant materials with improved thermal stability |
| US6051321A (en) * | 1997-10-24 | 2000-04-18 | Quester Technology, Inc. | Low dielectric constant materials and method |
| US6086679A (en) * | 1997-10-24 | 2000-07-11 | Quester Technology, Inc. | Deposition systems and processes for transport polymerization and chemical vapor deposition |
| US6140456A (en) * | 1997-10-24 | 2000-10-31 | Quester Techology, Inc. | Chemicals and processes for making fluorinated poly(para-xylylenes) |
| WO1999021706A1 (en) * | 1997-10-24 | 1999-05-06 | Quester Technology, Inc. | Low dielectric constant materials prepared from photon or plasma assisted cvd |
| US6534616B2 (en) | 1997-10-24 | 2003-03-18 | Quester Technology, Inc. | Precursors for making low dielectric constant materials with improved thermal stability |
| US6663973B1 (en) | 1997-10-24 | 2003-12-16 | Canon, Usa, Inc. | Low dielectric constant materials prepared from photon or plasma assisted chemical vapor deposition and transport polymerization of selected compounds |
| US6358863B1 (en) | 1998-05-01 | 2002-03-19 | Quester Technology, Inc. | Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
| US6495208B1 (en) | 1999-09-09 | 2002-12-17 | Virginia Tech Intellectual Properties, Inc. | Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites |
| JP2006035806A (ja) * | 2004-07-30 | 2006-02-09 | Matsushita Electric Ind Co Ltd | 耐熱防汚基板およびこれを用いた加熱調理機器 |
| WO2010113477A1 (ja) * | 2009-03-31 | 2010-10-07 | シチズンファインテックミヨタ株式会社 | カバー付センサ及びその製造方法 |
| JP5597193B2 (ja) * | 2009-03-31 | 2014-10-01 | シチズンファインテックミヨタ株式会社 | カバー付センサ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0545532B2 (enrdf_load_stackoverflow) | 1993-07-09 |
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