JPS60225491A - Method of producing printed board - Google Patents

Method of producing printed board

Info

Publication number
JPS60225491A
JPS60225491A JP8231084A JP8231084A JPS60225491A JP S60225491 A JPS60225491 A JP S60225491A JP 8231084 A JP8231084 A JP 8231084A JP 8231084 A JP8231084 A JP 8231084A JP S60225491 A JPS60225491 A JP S60225491A
Authority
JP
Japan
Prior art keywords
plating
layer
chemical
catalyst
printed board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8231084A
Other languages
Japanese (ja)
Inventor
直洋 両角
中尾 紀代史
宏 高橋
伸 高根沢
昭士 中祖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP8231084A priority Critical patent/JPS60225491A/en
Publication of JPS60225491A publication Critical patent/JPS60225491A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明に化学めっきによVm体回路τ形成丁ゐプリント
基板c/)M造法に関し、荷に化学めっきの除、レジス
ト上へのめっきの析出の抑制の可能なプリント基板の製
造法に関す心。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to the method of manufacturing printed circuit boards (c/) for forming Vm body circuits by chemical plating, and includes the removal of chemical plating on loads and the plating on resists. Regarding the manufacturing method of printed circuit boards that can suppress the precipitation of

(従来技術) 従来より化学めっきによりプリント基板で裏道する方法
の一つとして、杷縁基叡上にめっき触媒τ含有丁ゐ甘酸
ゴムτ主成分と丁/8接7#を剤層τ設けて、tgI絽
形成部以外【めっきレジストによりマスクして、化学的
に粗面化しyt挾水洗工程τ鮭て、−tc/)まま化学
めっきτ行う方法がある0本方法ね化学めっき法として
の触媒の付与させ力Vc71rrI11丁れは他の方法
であるところり粗面化した表口に楽敵処理によ!7触媒
虐τ形成さぜゐ方法に較べて朋媒τ単純に接7!I+剤
中に混合するたけですむこと、触媒が按膚創虐甲に安定
に分散されることなど0丁ぐnた長消かあゐ〇しかし本
力法に他法Vc較べてめっきに除し1以下の欠点g:M
する◎丁lvち、他法が触媒層によ−り接盾剤表[II
Oか強化さnレジスト上に按漕剤が転移丁ゐことげ少な
いが不法C/、)接漕剤の粗面化された凸部の−tf1
5が接麿剤増から脱離しフジスト上に付層し易い欠点か
ある。この場曾、惚めて小片であっても、そり中に触媒
τ確実にせ有丁ゐため、めっきか析出し酸量することに
避けられない。こり欠点0最近回路の間隔かa2in以
下と狭り、1gl路としてS@度化されるにつれて重大
な欠点となって@た口 (発明の目的) 板の製造法τ提供するものであゐ◎ (発明の構成) 本発明rrIe3縁基板表向に、化学めっき触媒τ含有
する接ft剤層τ形成し、接層剤層τ粗面処理し、水洗
τ行い、次いで化学めっきにより回路τ形成するプリン
ト基板の製造法に於て、化学めっきり前に乾練工程τ行
うことτ物像とす−on> c = o 、なとの水と
R沌性V強い基が無数に生成しこりため水洗工程τ経て
、そのまま。
(Prior art) Conventionally, as one of the methods of back-cutting printed circuit boards by chemical plating, a layer of agent τ of a plating catalyst τ containing a plating catalyst τ containing a hard acid rubber τ as a main component and a T/8 contact 7# is provided. , There is a method of performing chemical plating τ while other than the tgI silk forming area [masked with plating resist, chemically roughened, yt water washing process τ, -tc/)] There are 0 methods. Catalyst as chemical plating method The applied force Vc71rrI11 can be easily applied to the roughened surface of the surface using other methods! 7 Compared to the method of forming a catalyst, the catalyst is simply connected! However, compared to other methods, this method has a significant effect on plating because it only needs to be mixed into the I+ agent, and the catalyst is stably dispersed in the skin wound layer. 1 or less defects g: M
◎ However, another method uses a catalyst layer to form a shielding agent [II
The coating agent transfers onto the reinforced resist.
There is a drawback that 5 tends to separate from the adhesive and form a layer on the fujist. In this case, even if it is a small piece, it is inevitable that it will be plated or precipitated due to the presence of catalyst τ in the warping. Recently, as the spacing between circuits has become narrower to less than a2 inch, and the S@ degree has been increased to 1 Gl circuit, this has become a serious drawback. (Structure of the invention) An adhesive layer τ containing a chemical plating catalyst τ is formed on the surface of the rrIe3 edge substrate of the present invention, the surface of the adhesive layer τ is roughened, water is washed τ, and a circuit τ is formed by chemical plating. In the manufacturing method of printed circuit boards, a dry kneading step τ is performed before chemical processing. After τ, leave it as is.

めっ@τ行うとめっき液が相当に深部までに拡散可能と
lv、こcvM米としてめっきaにより表向層が可塑化
された様な状態にlり凝集力が低下丁ゐことが明らρ工
にZまた0指で峨(俸丁った程度で無数の小片が取り去
られる状態であり、こり状態でにめっき時の敵流によっ
て容易に脱離丁ゐものと予想されるところでこり凝集力
の強化のために、化学@面化児了俊、化学めっきに先立
って接層剤層の乾燥工程を設けたところ接盾剤の凝集力
0強化し、めっき欲に撹漬しても凝集力に低下せず接膚
剤小片か脱離することl(めりきて完了することか出来
た0そり機mに明ら〃)ではないか、粗面化によって接
膚刑層中に生地した極性基a水と会曾状恕にあるが乾燥
VC,よりその相手で失い、極性基同志の会合に笈化す
るとともに縦梁カフDs高(lりめつき敵中に浸漬して
もめり!+aCL)反入τ仰側丁ゐ様l構造変化が起っ
たものと思われる。乾燥に事突土乾燥状態にある程度行
う。その条件に基板によって変わるか標準的には常みに
放置するならば一日以上、50℃に711]熱すゐなら
ば60分以上、100℃ならば5分以上である。この時
It is clear that when plating @τ is performed, the plating solution can diffuse to a considerable depth, and as a result of plating (a), the surface layer becomes plasticized and the cohesive force decreases. It is a state in which countless small pieces are removed by applying a Z or zero finger to the plating process, and the particles agglomerate in places where it is expected that they will easily be detached by the enemy flow during plating in a stiff state. In order to strengthen the force, chemistry@Ryotoshi Menkaji, by setting up a drying process for the adhesive layer prior to chemical plating, the cohesive force of the adhesive was strengthened to 0, and even if the plating was stirred, it would not cohere. It is possible that small pieces of the skin contactant may come off without decreasing the force (as evidenced by the 0-shaving machine that was able to complete the process) due to the roughening of the surface. The polar group A is in contact with water, but it is dry VC, and it is lost in the opponent, and the polar group is turned into a meeting of comrades, and the vertical beam cuff Ds high (l glares even if it is immersed in the enemy! +aCL) It seems that a structural change has occurred.The drying process is carried out to a certain extent in a soil dry state.The conditions may vary depending on the substrate, or if the standard is to leave it as is. If it is heated to 50℃ for more than a day, it will be for more than 60 minutes, and if it is heated to 100℃, it will be for more than 5 minutes.At this time.

粗面化され′I′c接看剤に付層している水分子2.乾
燥に除去可能な水分のうち、80%以上、好ましくは9
0%以上、史に好ましく695%以上か除去される。
Water molecules layered on the roughened 'I'c adhesion agent2. 80% or more of the water that can be removed by drying, preferably 9%
It is removed by 0% or more, preferably 695% or more.

絶縁基板は通常の2エノール系、あるいはエポキシ系積
層8j1無機糸あるいに有機態asia台系からなる板
材か用いられる・接看剤に、化学めっき法で一般に用い
られる台数ゴムτ主成とし、#I硬化性樹脂で補強した
ものが用いられる。
The insulating substrate is a plate material made of ordinary 2 enol-based or epoxy-based laminated 8j1 inorganic yarn or organic asia series.The adhesive is mainly composed of rubber τ, which is commonly used in chemical plating methods. A material reinforced with #I curable resin is used.

マスクc/)ためのめっきレジストとしてに粗向化赦に
侵され難いエポキシ系τ用いる。めっきレジストas化
学めっきに先立ついずfLカの段階例えは接膚剤粗化処
理前、乾諌俊等の段階に形態する@粗面化に用いる敵ね
一般のクロム鈑−硫FIL Jlクロム赦−憶版lどが
通用9籠であゐ◎化学めっき法としては−Mり銅τめり
き膜として形成小米/bもQ)τ用いる◎ 実施例1 接ffi仰jとしては、アクリロニトリルブタジェンゴ
ム(アクリロニトリル41%)、658B、t−フfk
2X/−ルag111.35部、シリル。
As a plating resist for the mask c/), an epoxy system τ, which is resistant to roughening, is used. Plating resist as a stage prior to chemical plating For example, before skin contact roughening treatment, at the stage of drying and so on. ◎ As for the chemical plating method, - Formed as a chromium copper τ plating film, Q) τ is also used. Rubber (acrylonitrile 41%), 658B, t-fk
111.35 parts of 2X/-ru ag, silyl.

20都、塩化パラジウム0.1部からなるめっき触媒含
有のpP−硬化型接宥剤τ用いた0こり接虐剤τsoo
mm角の厭フェノール積層&(日立化取工東■#曲品名
LP−141)の両面に浸漬塗布し160℃で60分、
vl]熱硬化させ30次に必12m[1部Mに穴t−明
は大半の部分の回路のM幅および線間か0.2ffll
lllCなるようなエポキシ系レジストτ印刷し150
℃で60分硬化させた0次いでクロム離島a(Cr0m
55 g−11HFft’M 21g+slτ水で希釈
し全体t11とする。ンに40℃で15分間浸漬しτ水
洗した0次に0120℃−5分、■50℃−60分、■
帛■で48時間、■全く乾燥しないものの4mについて
20, zero stiffness soothing agent τsoo using pP-curing type soothing agent τ containing a plating catalyst consisting of 0.1 part of palladium chloride
Dip coating on both sides of a mm square piece of phenol laminate & (Hitachi Katori Koto ■#Koku product name LP-141) at 160℃ for 60 minutes.
vl] Heat cure for 30 minutes, then 12m [holes in M of 1 part - Light are most part of circuit M width and line spacing or 0.2ffll]
Print 150 epoxy resists such as 150
0 then chromium isolated island a (Cr0m
55 g-11HFft'M 21g+slτ Dilute with water to make total t11. 0120°C - 5 minutes, ■ 50°C - 60 minutes, ■
■For 48 hours with cloth ■About 4m of cloth that does not dry at all.

化学めっきτ67℃で60時間行った◎化学めっき敵と
しては なる組gで用いた。侍らnたプリント仮の餉の厚さに5
5μmであり、レジスト上り銅の析出状J!1lrI以
下の1うであつた〇 ■・・・・・・・・・析tB、21゜ ■・・・・・・・・・析出なし ■・・・・・・・・・析出なし ■・・・・・・・・・0.2fflll11gl路間τ
ブリッジする析出か9ケ均にあった〇 実施例2 接71RjlJとしてにアクリロニトリルブタジェンゴ
ム(アクリロニトリル41%)、60s% を−フチル
フェノール街脂% 30tlビスフエノール型エポキシ
樹脂8s、イミダゾール糸吠化剤2部、チタン白18部
、塩化パラジウムu、08部からなるめりき7!1m含
有り熱咬化型接膚剤τ用いたoccL)接膚剤τsoo
ma角り紙エポキシ積層板(日立化戚工栗■製曲品名L
E−144)の両面に&債塗布し実施例1と同様に乾燥
しへ明はレジスト印刷、化学粗面化τ行った0久に■1
20℃−5分■50℃−45分■呈瀝で30時間ω全(
乾燥しないものについて英M例1と1lffJ様な化学
めりきτ行り7eo侍られたプリント叡の銅の厚さ03
5μmでありレジスト上の銅の析出状M4に以下のよう
であった0■・・・・・・・・・析出なし ■・・・・・・・・・析出なし ■・・・・・・・・・析出なし ■・・・・・・・・・0.2m1IIC/)回路間τブ
リッジする町田が5ヶMにあった◎ (発明の効未) 以上説明したように、不発8Aの方法に於てに。
Chemical plating τ Conducted at 67°C for 60 hours ◎ Used in group g, which is not suitable for chemical plating. The thickness of the samurai print is 5
5 μm, and the shape of the copper deposit on the resist J! 1 lrI or less 〇■・・・・・・Analysis tB, 21゜■・・・・・・No precipitation■・・・・・・・・・No precipitation■・・・・・・・・・・0.2ffllll11gl roadma τ
〇Example 2 71RjlJ was mixed with acrylonitrile butadiene rubber (acrylonitrile 41%), 60s% - phthylphenol street fat% 30tl bisphenol type epoxy resin 8s, imidazole compound occL) Skin contact agent τsoo using heat-biting type skin contact agent τ containing Meliki 7!1m consisting of 2 parts of titanium white, 18 parts of titanium white, and 0.8 parts of palladium chloride.
ma square paper epoxy laminate (Hitachi Chemical Co., Ltd. Product name: L
E-144) was coated on both sides, dried in the same manner as in Example 1, resist printed on the light side, and chemically roughened with τ.
20℃ - 5 minutes ■ 50℃ - 45 minutes ■ 30 hours ω total (
For those that do not dry, the thickness of the copper of the printed 叡 that was served by the English M example 1 and 1lffJ-like chemical cutting τ going 7eo 03
5 μm, and the shape of copper precipitation on the resist M4 was as follows: 0■・・・・・・No precipitation■・・・・・・No precipitation■・・・・・・・・・No precipitation ■・・・・・・・・・0.2m1IIC/) Machida for τ bridging between circuits was 5M◎ (Efficacy of invention) As explained above, the method of misfire 8A In.

めっきレジストに不菅のめっきか発生子ゐことかない。There is no plating or particles on the plating resist.

第1頁の続き @発明者 中祖 昭士 下館市久 所内Continuation of page 1 @Inventor Chuso Akira Ichihisa Shimodate Inside the office

Claims (1)

【特許請求の範囲】 1、 1[Q#基叛表面に、化学めりき触媒で含有する
接層剤層τ形既し、接層剤層τ粗面化処理し、水洗τ行
い、次いで化学めっきにより回路τ形&丁ゐプリント基
板の製造法に於て。 化学めっきり前に乾燥工程7行つことτ%鱗とするプリ
ント基板V)製造法〇
[Claims] 1, 1 [On the surface of the Q# base, a layer of a chemical plated catalyst containing a layer τ is formed, the surface of the layer τ is roughened, washed with water τ, and then chemically plated. In the manufacturing method of circuit τ type &D type printed circuit board by plating. Printed circuit board with 7 drying steps before chemical cleaning V) Manufacturing method
JP8231084A 1984-04-24 1984-04-24 Method of producing printed board Pending JPS60225491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8231084A JPS60225491A (en) 1984-04-24 1984-04-24 Method of producing printed board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8231084A JPS60225491A (en) 1984-04-24 1984-04-24 Method of producing printed board

Publications (1)

Publication Number Publication Date
JPS60225491A true JPS60225491A (en) 1985-11-09

Family

ID=13770983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8231084A Pending JPS60225491A (en) 1984-04-24 1984-04-24 Method of producing printed board

Country Status (1)

Country Link
JP (1) JPS60225491A (en)

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