JP2602992B2 - Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board - Google Patents
Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring boardInfo
- Publication number
- JP2602992B2 JP2602992B2 JP2310040A JP31004090A JP2602992B2 JP 2602992 B2 JP2602992 B2 JP 2602992B2 JP 2310040 A JP2310040 A JP 2310040A JP 31004090 A JP31004090 A JP 31004090A JP 2602992 B2 JP2602992 B2 JP 2602992B2
- Authority
- JP
- Japan
- Prior art keywords
- chemical plating
- film
- adhesive
- adhesive composition
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 title claims description 57
- 239000000853 adhesive Substances 0.000 title claims description 44
- 230000001070 adhesive effect Effects 0.000 title claims description 44
- 239000000203 mixture Substances 0.000 title claims description 38
- 239000000126 substance Substances 0.000 title claims description 35
- 239000002313 adhesive film Substances 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000003822 epoxy resin Substances 0.000 claims description 15
- 229920000647 polyepoxide Polymers 0.000 claims description 15
- 239000005011 phenolic resin Substances 0.000 claims description 11
- 229920003051 synthetic elastomer Polymers 0.000 claims description 11
- 239000005061 synthetic rubber Substances 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 7
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 6
- 229920006267 polyester film Polymers 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 229910000510 noble metal Inorganic materials 0.000 claims description 5
- 229920001568 phenolic resin Polymers 0.000 claims description 5
- 150000001336 alkenes Chemical class 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 4
- 230000007261 regionalization Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 12
- 238000001723 curing Methods 0.000 description 11
- -1 triphenylphenacylphosphonium tetrafluoroborate Chemical compound 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 9
- 238000000576 coating method Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 7
- 238000009413 insulation Methods 0.000 description 6
- 238000007788 roughening Methods 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000007772 electroless plating Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229920000459 Nitrile rubber Polymers 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 229910052918 calcium silicate Inorganic materials 0.000 description 2
- 239000000378 calcium silicate Substances 0.000 description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000009824 pressure lamination Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004073 vulcanization Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 101100256737 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) hlm-1 gene Proteins 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- CFRNDJFRRKMHTL-UHFFFAOYSA-N [3-octanoyloxy-2,2-bis(octanoyloxymethyl)propyl] octanoate Chemical group CCCCCCCC(=O)OCC(COC(=O)CCCCCCC)(COC(=O)CCCCCCC)COC(=O)CCCCCCC CFRNDJFRRKMHTL-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000011134 resol-type phenolic resin Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 150000003284 rhodium compounds Chemical class 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 238000013040 rubber vulcanization Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Adhesive Tapes (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は,化学めつき用接着剤組成物,化学めつき用
接着剤フイルムおよび印刷配線板の製造法に関する。Description: TECHNICAL FIELD The present invention relates to an adhesive composition for chemical plating, an adhesive film for chemical plating, and a method for producing a printed wiring board.
(従来の技術) 従来より絶縁基板の表面に無電解めつきによつて回路
を形成するプリント配線板の製造方法において、予め絶
縁基板の表面に,無電解めつき用の下地接着剤を形成す
る方法が知られている。この接着剤としては,特公昭45
−9843号公報,特開昭58−57776号公報,特開昭59−626
83号公報,特開昭62−248291号公報等に記載されている
ように,主成分がエポキシ樹脂,合成ゴムおよびフエノ
ール樹脂からなつているものが知られている。また,特
公昭58−30760号公報,特公昭60−5079号公報,特開昭6
3−213676号公報,特開昭63−213677号公報等には,合
成ゴムとフエノール樹脂を主成分とする接着剤が記載さ
れている。これらにおいては、エポキシ樹脂の硬化剤に
イミダゾール類,アミン類,酸無水物,ノボラックフエ
ノール樹脂等公知の熱硬化触媒を使用し,合成ゴムの加
硫にレゾール形フエノール,イオウ化合物等を,加硫助
剤に酸化亜鉛,酸化マグネシウム等が用いられている。
一方,これら接着剤には,クロム硫酸混液での粗化効率
の向上や,めつき膜とのピール強度,半田耐熱性の向上
を目的に,炭酸カルシウム,ケイ酸カルシウム,酸化ケ
イ素,ジルコニウムシリケート,酸化チタン等の無機フ
イラーを用いている。(Prior Art) Conventionally, in a method of manufacturing a printed wiring board in which a circuit is formed by electroless plating on the surface of an insulating substrate, a base adhesive for electroless plating is previously formed on the surface of the insulating substrate. Methods are known. As this adhesive,
-9843, JP-A-58-57776, JP-A-59-626
No. 83, JP-A-62-248291, and the like, those whose main components consist of an epoxy resin, a synthetic rubber, and a phenol resin are known. Also, Japanese Patent Publication No. 58-30760, Japanese Patent Publication No. 60-5079,
JP-A-3-213676, JP-A-63-213677 and the like disclose an adhesive containing a synthetic rubber and a phenol resin as main components. In these, known thermosetting catalysts such as imidazoles, amines, acid anhydrides and novolak phenolic resins are used as curing agents for epoxy resins, and vulcanization of synthetic rubbers is carried out by vulcanization of resole phenols, sulfur compounds and the like. Zinc oxide, magnesium oxide, and the like are used as auxiliaries.
On the other hand, these adhesives include calcium carbonate, calcium silicate, silicon oxide, zirconium silicate, and the like for the purpose of improving the roughening efficiency in a chromic sulfuric acid mixed solution, the peel strength with the plating film, and the soldering heat resistance. An inorganic filler such as titanium oxide is used.
上記した接着剤成分は,溶剤に溶解してデイツプ法,
ロールコート法,カーテンコート法等で絶縁基板に塗布
・乾燥するか,または,あらかじめ支持体フイルム上に
塗布・乾燥して得られた接着剤フイルムを接着剤面に絶
縁基板側にしてラミネートし,その後,加熱硬化する方
法がとられている。上記に示される接着剤の硬化条件
は,前述の特開昭62−248291号公報にも記載のように,1
50〜200℃の温度で30〜120分とされている。しかし,150
℃・30分の条件では,熱硬化成分が十分に反応せず,こ
のため硬化した接着剤の絶縁抵抗が低く,また無電解め
つき時にめつきの析出応力の作用で接着剤皮膜がふくれ
を発生したり,めつき膜とのピール強度や半田耐熱性が
低下したりする問題がある。このため,一般的には前述
の特開昭62−248291号公報の実施例にも記載のように,1
60℃以上,60分以上の硬化条件が行われている。The above adhesive component is dissolved in a solvent and dipped,
The adhesive film obtained by coating and drying on an insulating substrate by a roll coating method, a curtain coating method, or the like, or by applying and drying the film on a support film in advance, and laminating the adhesive film on the insulating substrate side, Thereafter, a method of heat curing is used. As described in the above-mentioned Japanese Patent Application Laid-Open No. 62-248291, the curing conditions of the adhesive described above are as follows.
It is 30-120 minutes at a temperature of 50-200 ° C. But 150
Under conditions of 30 ° C for 30 minutes, the thermosetting components do not react sufficiently, so the cured adhesive has low insulation resistance and the adhesive film blisters due to the deposition stress during electroless plating. And the peel strength with the plating film and the solder heat resistance are reduced. For this reason, generally, as described in the above-mentioned embodiment of JP-A-62-248291, 1
Curing conditions of 60 ° C or more and 60 minutes or more are performed.
ところで近年,プリント配線板の板厚は,年々薄型化
し,用いる絶縁基材は紙フエノール板で0.8〜1.0mm厚,
ガラスエポキシ板では0.5〜1.0mm厚が使用されるように
なつてきている。In recent years, the thickness of printed wiring boards has become thinner year by year, and the insulating base material used is 0.8 to 1.0 mm thick paper phenol board.
For glass epoxy plates, 0.5-1.0 mm thickness has come to be used.
このように薄い絶縁基板上に上記した接着剤を形成し
て,160℃以上で60分以上の硬化を行うと,絶縁基板に反
り,ねじれが発生し,無電解めつきを行う前のメツキレ
ジスト形成工程で,レジストインクの印刷や,ドライフ
イルムを用いたメツキレジストの形成に不具合を生じる
ようになり,事実上,微細回路が形成できない問題が起
こる。If the above-mentioned adhesive is formed on a thin insulating substrate and cured at 160 ° C or more for 60 minutes or more, the insulating substrate will be warped and twisted. In the forming process, a problem occurs in printing of the resist ink and formation of the plating resist using the dry film, which causes a problem that a fine circuit cannot be formed.
(発明が解決しようとする問題点) 本発明は,前述した従来技術の問題,即ち,薄型化絶
縁基材を用いたときの反り,ねじれ及び紙フエノール板
の熱劣化を解決するために,低温,短時間の条件で硬化
する化学めつき用接着剤組成物,これを用いた化学めつ
き用接着剤フイルムおよび印刷配線板の製造法を提供す
るものである。(Problems to be Solved by the Invention) The present invention is intended to solve the above-mentioned problems of the prior art, that is, warping, twisting and thermal deterioration of a paper phenol board when a thin insulating base material is used. An adhesive composition for chemical plating that cures in a short time, an adhesive film for chemical plating using the same, and a method for producing a printed wiring board.
(問題点を解決するための手段) 本発明は,エポキシ樹脂,合成ゴム,フエノール樹
脂,化学めつきの触媒となる貴金属化合物および光感知
性芳香族オニウム塩を含有してなる化学めつき用接着剤
組成物,この接着剤組成物の層を透明な支持体フイルム
上に形成した化学めつき用接着剤フイルムならびにこの
接着剤組成物または接着剤フイルムを用いた印刷配線板
の製造法に関する。(Means for Solving the Problems) The present invention relates to an adhesive for chemical plating comprising an epoxy resin, a synthetic rubber, a phenol resin, a noble metal compound serving as a catalyst for chemical plating, and a photosensitive aromatic onium salt. The present invention relates to a composition, an adhesive film for chemical plating in which a layer of the adhesive composition is formed on a transparent support film, and a method for producing a printed wiring board using the adhesive composition or the adhesive film.
本発明は,積層板として厚さ0.6mm以下の薄型積層板
に適用することが好ましい。The present invention is preferably applied to a thin laminate having a thickness of 0.6 mm or less as a laminate.
本発明の化学めつき用接着剤組成物及び化学めつき用
接着剤フイルムについて以下に詳細に説明する。The adhesive composition for chemical plating and the adhesive film for chemical plating of the present invention will be described in detail below.
本発明に用いる光感知性芳香族オニウム塩としては,
特公昭52−14277号公報記載の第VII a族元素の芳香族オ
ニウム塩,特公昭52−14278号公報記載の第VI a族元素
の芳香族オニウム塩,特公昭52−14279号公報記載の第V
a族元素の芳香族オニウム塩等を使用できる。具体的に
は,テトラフルオロホウ酸トリフエニルフエナシルホス
ニウム,ヘキサフルオロアンチモン酸トリフエニルスル
ホニウム,テトラフルオロホウ酸ホウ酸ジフエニルヨー
ドニウム等が使用できる。これら光感知性芳香族オニウ
ム塩の配合量としては,エポキシ樹脂の硬化の点から組
成物中の固形分として0.2〜5重量%が好ましい。The photo-sensitive aromatic onium salt used in the present invention includes:
Aromatic onium salts of Group VIIa elements described in JP-B-52-14277, aromatic onium salts of Group VIa elements described in JP-B-52-14278, and OH-groups described in JP-B-52-14279. V
An aromatic onium salt of a group a element or the like can be used. Specifically, triphenylphenacylphosphonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, and the like can be used. The amount of the light-sensitive aromatic onium salt is preferably 0.2 to 5% by weight as a solid content in the composition from the viewpoint of curing of the epoxy resin.
この光感知性芳香族オニウム塩は,紫外線を照射する
と(365nmのセンサで0.5〜3.0J/cm2程度)分解し,エポ
キシ樹脂の硬化種であるルイス酸を放出し,その後また
は同時の加熱によりエポキシ樹脂を硬化するものであ
る。この作用により100〜150℃での低温硬化が可能とな
る。This light-sensitive aromatic onium salt decomposes when irradiated with ultraviolet light (approximately 0.5 to 3.0 J / cm 2 with a 365 nm sensor), releasing a Lewis acid, which is a hardening species of the epoxy resin, and subsequently or by simultaneous heating. It cures the epoxy resin. This effect allows low temperature curing at 100-150 ° C.
本発明に用いるエポキシ樹脂としては,ビスフエノー
ル型,ノボラック型,クレゾールノボラツク型脂環式等
のエポキシ樹脂が使用できる。エポキシ当量が450〜2,1
00g/eqのビスフエノールA型エポキシ樹脂が耐熱性,絶
縁特性の点でより好ましく,配合量としては,接着剤皮
膜の絶縁抵抗とピール強度の点から組成物中の固形分と
して15〜40重量%が好ましい。As the epoxy resin used in the present invention, an epoxy resin of a bisphenol type, a novolak type, a cresol novolak type alicyclic type or the like can be used. Epoxy equivalent is 450 ~ 2,1
A bisphenol A type epoxy resin of 00 g / eq is more preferable in terms of heat resistance and insulation properties. The compounding amount is 15 to 40% by weight as a solid content in the composition from the viewpoint of insulation resistance and peel strength of the adhesive film. % Is preferred.
本発明に用いる合成ゴムとしては,アクリロニトリル
ブタジエンゴム,イソプレン含有アクリロニトリルブタ
ジエンゴム,カルボキシル含有アクリロニトリルブタジ
エンゴム,スチレンブタジエンゴム等がある。配合量と
しては,めつき皮膜のピール強度と得られる印刷配線板
の絶縁抵抗の点から組成物の固形分として40〜60重量%
が好ましい。硬化した接着剤皮膜の絶縁抵抗が1012Ω以
下と低くなる傾向がある。Examples of the synthetic rubber used in the present invention include acrylonitrile butadiene rubber, isoprene-containing acrylonitrile butadiene rubber, carboxyl-containing acrylonitrile butadiene rubber, and styrene butadiene rubber. The compounding amount is 40 to 60% by weight as the solid content of the composition from the viewpoint of the peel strength of the plating film and the insulation resistance of the obtained printed wiring board.
Is preferred. The insulation resistance of the cured adhesive film tends to be as low as 10 12 Ω or less.
本発明に用いるフエノール樹脂としては,レゾール型
フエノール樹脂,純フエノール樹脂,アルキル変性フエ
ノール樹脂,カシユー変性フエノール樹脂等がある。フ
エノール樹脂の配合量としては,合成ゴムとの反応性お
よびめつき皮膜のピール強度の点から組成物の固形分と
して20〜40重量%が好ましい。Examples of the phenolic resin used in the present invention include a resol type phenolic resin, a pure phenolic resin, an alkyl-modified phenolic resin, and a cashew-modified phenolic resin. The compounding amount of the phenol resin is preferably 20 to 40% by weight as the solid content of the composition from the viewpoint of the reactivity with the synthetic rubber and the peel strength of the plating film.
本発明で用いる化学めつきの触媒となる貴金属化合物
としては,塩化パラジウム等のパラジウム化合物,塩化
ロジウム等のロジウム化合物などがあり,無機充填材に
吸着させた微粒子状のものや樹脂溶液に分散させた溶液
状のものとして使用できる。商品としては例えば,日立
化成工業株式会社製,PEC−8がある。配合量としては,
めつき膜の析出性と得られる印刷配線板の絶縁抵抗の点
から組成物の固形分中0.01〜2重量%が好ましい。エポ
キシ樹脂,合成ゴム,フエノール樹脂,化学めつきの触
媒となる貴金属化合物および光感知性芳香族オニウム塩
は必要に応じて2種以上を用いることもできる。Examples of the noble metal compound used as a catalyst for chemical plating used in the present invention include a palladium compound such as palladium chloride and a rhodium compound such as rhodium chloride, which are dispersed in a fine particle adsorbed on an inorganic filler or a resin solution. It can be used as a solution. As a product, for example, there is PEC-8 manufactured by Hitachi Chemical Co., Ltd. As the compounding amount,
From the viewpoint of the deposition property of the plating film and the insulation resistance of the obtained printed wiring board, it is preferably 0.01 to 2% by weight in the solid content of the composition. If necessary, two or more kinds of epoxy resin, synthetic rubber, phenol resin, noble metal compound serving as a catalyst for chemical plating, and light-sensitive aromatic onium salt can be used.
本発明ではさらに,公知の合成ゴムの加硫助剤の酸化
亜鉛,酸化マグネシウム,酸化コバルト等が使用でき,
塗工時の流出防止剤として表面積の大きい酸化けい素,
化学粗化時の粗化を容易にする効果のある炭酸カルシウ
ム,けい酸カルシウム,ジルコニウムシリケート等の微
粉末フイラーを用いることもできる。その他添加剤,着
色剤,熱硬化用触媒等を用いることもできる。In the present invention, known synthetic rubber vulcanization aids such as zinc oxide, magnesium oxide, and cobalt oxide can be used.
Silicon oxide with a large surface area as a run-off inhibitor during coating,
Fine powder fillers such as calcium carbonate, calcium silicate and zirconium silicate which have an effect of facilitating roughening during chemical roughening can also be used. Other additives, coloring agents, thermosetting catalysts and the like can also be used.
本発明の接着剤組成物の製法としては,公知の二本ロ
ール,ニーダ等の装置を用いて常法で行うことができ
る。無機材料は,これらの装置を用いて合成ゴム等と分
散し,有機材料は,ケトン類,セロソルブ類等の溶剤に
溶解することにより,本発明の接着剤組成物の溶液を得
ることができる。The adhesive composition of the present invention can be produced by a conventional method using a known apparatus such as a two-roller or a kneader. The inorganic material is dispersed in synthetic rubber or the like using these devices, and the organic material is dissolved in a solvent such as ketones or cellosolves to obtain a solution of the adhesive composition of the present invention.
接着剤組成物の溶液を積層板上に塗工する方法として
は,ロール印刷法,カーテンコート法,デイツプ法,ス
クリーン印刷法等,公知の方法が用いられる。この際,
塗布量は接着剤溶液濃度と塗布方法で調整することがで
きるが,乾燥後の接着剤組成物層の皮膜の厚さは,めつ
き皮膜のピール強度とエポキシ樹脂の硬化の点から20〜
70μm厚が好ましい。As a method of applying the solution of the adhesive composition on the laminate, a known method such as a roll printing method, a curtain coating method, a dipping method, and a screen printing method is used. On this occasion,
The coating amount can be adjusted by the adhesive solution concentration and the coating method, but the thickness of the adhesive composition layer after drying is 20 to 20 from the viewpoint of the peel strength of the plating film and the curing of the epoxy resin.
A thickness of 70 μm is preferred.
本発明の接着剤フイルムの製法は,常法により行うこ
とができる。例えば,前述の接着剤組成物の溶液をポリ
プロピレンフイルム,ポリエチレンフイルム,トリアセ
テートフイルム,フツ化ビニル系フイルム,シリコン離
型処理ポリエステルフイルム,オレフイン離型処理ポリ
エステルフイルム,未延伸のポリメチルペンテンフイル
ム等の支持体フイルム上にナイフコート法,ロールコー
ト法等で塗布し,乾燥して行われる。支持体フイルムと
しては,塗工時の耐熱性,離型性さらに離型剤の非転写
性等の点でオレフイン離型処理ポリエステルフィルムが
好ましい。The adhesive film of the present invention can be produced by a conventional method. For example, a solution of the adhesive composition described above is used to support a polypropylene film, a polyethylene film, a triacetate film, a vinyl fluoride film, a silicone release treated polyester film, an olefin release treated polyester film, an unstretched polymethylpentene film, or the like. The coating is performed on the body film by a knife coating method, a roll coating method or the like, followed by drying. As the support film, an olefin release-treated polyester film is preferable in terms of heat resistance during coating, release properties, and non-transfer properties of the release agent.
長尺の接着剤フイルムを製造する場合は,製造の最終
段階で該接着剤フイルムをロール状に巻き取る。この場
合,感圧性粘着テープ等の製造において公知の方法を用
い,露出した接着剤組成物層表面(支持体の反対面)上
に支持体フイルムよりも接着剤層との密着力が小さい保
護フイルムで被覆することが好ましい。保護フイルムで
接着剤組成物層を被覆することにより,ロール状に巻き
取つたときの接着剤組成物層の該支持体フイルム背面へ
の転着を防ぐことが可能であり,併せて塵の付着をも防
止することができる。保護フイルムとしては,例えば,
ポリエチレンフイルム,ポリプロピレンフイルム,テフ
ロンフイルム等がある。When manufacturing a long adhesive film, the adhesive film is wound into a roll at the final stage of the manufacturing. In this case, a protective film having a smaller adhesive strength with the adhesive layer than the support film is formed on the exposed surface of the adhesive composition layer (opposite the support) by a known method in the production of a pressure-sensitive adhesive tape or the like. It is preferred to coat with. By covering the adhesive composition layer with a protective film, it is possible to prevent the adhesive composition layer from being transferred to the back surface of the support film when wound up in a roll form, and also to prevent dust from adhering. Can also be prevented. As a protective film, for example,
There are polyethylene film, polypropylene film, Teflon film and the like.
本発明の接着剤フイルムの接着剤組成物層の厚さは,
特に制限するものではないが,前述どおり20〜70μmが
好ましい。The thickness of the adhesive composition layer of the adhesive film of the present invention is as follows.
Although not particularly limited, 20 to 70 μm is preferable as described above.
積層板上に,本発明の化学めつき用接着剤組成物の溶
液を塗工し,ついで接着剤組成物を硬化し配線パターン
形成部以外にめつきレジストを被覆し、ついで化学めつ
きで配線パターン形成部にめつきを析出して印刷配線板
が製造される。A solution of the adhesive composition for chemical plating of the present invention is applied on a laminate, and then the adhesive composition is cured, and a plating resist is coated on portions other than the wiring pattern forming portion. The printed wiring board is manufactured by depositing the plating on the pattern forming portion.
積層板上に,本発明の化学めつき用接着剤フイルム
を,接着剤組成物層を積層板側にして加熱加圧ラミネー
トし,ついで接着剤組成物を硬化し,配線パターン形成
部以外にめつきレジストを被覆し,ついで化学めつきで
配線パターン形成部にめつきを析出して印刷配線板が製
造される。The adhesive film for chemical plating according to the present invention is laminated on a laminate by heating and pressing with the adhesive composition layer facing the laminate, and then the adhesive composition is cured to be applied to portions other than the wiring pattern forming portion. A resist is coated, and then a plating is formed on the wiring pattern forming portion by chemical plating to produce a printed wiring board.
本発明の化学めつき用接着剤フイルムを積層板にラミ
ネートする方法について説明する。A method of laminating the adhesive film for chemical plating of the present invention on a laminate will be described.
これらの工程は,特開昭50−15876号公報,特開昭63
−277772号公報等に記載される公知の方法で行われる。
接着剤フイルムの積層板,例えば,紙基板フエノール樹
脂積層板等へのラミネートは容易である。すなわち,ポ
リエチレン等の保護フイルムが無い場合はそのまま,保
護フイルムのある場合は保護フイルムを剥離して又は剥
離しながら接着剤面を積層板側にして,積層板の両面ま
たは反面に加熱加圧ラミネートする。加熱加圧ラミネー
トは,印刷配線板製造業者では周知の常圧下のホツトロ
ールラミネータや特開昭52−52703号公報,特公昭55−1
3341号公報等に記載される減圧下又は真空下のラミネー
タを用いて行うことができる。These steps are described in JP-A-50-15876 and JP-A-63
This is performed by a known method described in, for example, Japanese Patent Application Laid-Open No.
It is easy to laminate the adhesive film on a laminate, such as a phenolic resin laminate on a paper substrate. In other words, if there is no protective film such as polyethylene, and if there is a protective film, peel off the protective film or, while peeling off, make the adhesive side the laminate side, and apply heat and pressure lamination on both sides or the other side of the laminate. I do. Heat and pressure lamination is performed by a hot-roll laminator under normal pressure, which is well known to a printed wiring board manufacturer, Japanese Patent Application Laid-Open No. 52-52703, and Japanese Patent Publication No. 55-1.
It can be performed using a laminator under reduced pressure or under vacuum described in JP-A-3341.
接着剤フイルムをラミネートした積層板は,次に必要
な場合には支持体フイルムを剥離して,またはこれを剥
離せずに接着剤組成物層を硬化する。接着剤組成物を基
板に塗工して得られる接着剤皮膜は,そのまま硬化す
る。硬化は,紫外線を照射する工程と同時または,その
後に100〜150℃で加熱することにより行われる。The laminate on which the adhesive film has been laminated is then cured with the adhesive composition layer by peeling the support film or without peeling it, if necessary. The adhesive film obtained by applying the adhesive composition to the substrate is cured as it is. Curing is performed at the same time as the step of irradiating with ultraviolet rays or thereafter by heating at 100 to 150 ° C.
次に常法により接着剤皮膜を形成した積層板の化学め
つきする部分以外へのめつきレジストの形成と,接着剤
の化学粗化,めつき核の析出及び活性化を行う。めつき
レジストの形成接着剤の粗面化,めつき核の析出及び活
性化とはいずれを先に行つてもよい。Next, a plating resist is formed on a portion other than the chemically plated portion of the laminate on which the adhesive film has been formed, and the adhesive is chemically roughened, and plating nuclei are precipitated and activated. Either the roughening of the adhesive for forming the plating resist, the deposition of the plating nucleus, or the activation may be performed first.
次に無電解めつきで化学めつきする部分に常法により
化学めつき膜を析出させる。Next, a chemical plating film is deposited on a portion to be chemically plated by electroless plating by a conventional method.
本発明の接着剤層を形成した積層板は,反り,ねじれ
が発生しないため,めつきレジストの印刷やドライフイ
ルムめつきレジストのラミネートが容易となり,微細回
路が安定して形成できる。Since the laminate having the adhesive layer of the present invention does not warp or twist, printing of plating resist or lamination of dry film plating resist is facilitated, and a fine circuit can be stably formed.
(実施例) 次に実施例により本発明を更に詳しく説明するが,本
発明はこれに限定されるものではない。なお,例中の
「部」は,特に断らない限り「重量部」を示す。(Examples) Next, the present invention will be described in more detail by way of examples, but the present invention is not limited thereto. In the examples, "parts" indicates "parts by weight" unless otherwise specified.
実施例1,2および比較例 ナイフコーターを用いて第1表に示したように,支持
体フイルムとしてオレフイン離型処理をしたポリエステ
ルフイルム,帝人(株)製,テトロンフイルムRO2(38
μm厚)の離型面に,第1表に示す組成の接着剤組成物
溶液を接着剤層の乾燥膜厚で30μmになるように塗布
し,引き続き乾燥(60〜110℃ 5分間)した後,保護
フイルム,ポリエチレンフイルム(30μm厚)でカバー
し,ロール状に巻き取つた化学めつき用接着剤フイルム
を得た。次いで,2本の接着剤フイルムのロール(幅500m
m,長さ100m)の接着剤組成物層を積層板中に化学めつき
用触媒を含む紙基材エポキシ樹脂積層板(日立化成工業
(株)製,商品名LE−144,0.8mm厚,500mm×500mm)の両
表面に,ポリエチレンフイルムを剥離しながらホツトロ
ールラミネータ(日立化成工業(株)製,商品名HLM−1
500型)でラミネートし(ホツトロール温度150℃,ホツ
トロール圧4kgf/cm2,ラミネートスピード1m/分)積層板
サイズに接着剤フイルムを切断した。次に紫外線と赤外
線が同時に放射される平行光照射型反射板を有する80W/
cmの高圧水銀灯2本を有する紫外線照射機(オーク製作
所(株)製,商品名HMW−514型)を用い,365nmセンサで
1.2J/cm2の紫外線を照射した。比較例1については,こ
の紫外線照射工程を行わなかつた。次に,ポリエステル
フイルムを剥離し,150℃の雰囲気温度を有する硬化炉内
で30分間加熱した。Examples 1 and 2 and Comparative Example As shown in Table 1 using a knife coater, a polyester film which was subjected to an olefin release treatment as a support film, Tetron Film RO2 (38) manufactured by Teijin Limited.
An adhesive composition solution having the composition shown in Table 1 was applied to the release surface having a thickness of 30 μm on the release surface having a thickness of 30 μm and then dried (60 to 110 ° C. for 5 minutes). , A protective film, a polyethylene film (30 μm thick), and an adhesive film for chemical plating that was wound into a roll. Next, roll two adhesive films (500m wide)
m, length of 100 m) paper-based epoxy resin laminate (Hitachi Chemical Industries, Ltd., trade name LE-144, 0.8 mm thickness, A hot roll laminator (HLM-1 manufactured by Hitachi Chemical Co., Ltd.) while peeling off the polyethylene film on both surfaces of 500 mm x 500 mm)
The adhesive film was cut to a laminate size (a hot roll temperature of 150 ° C., a hot roll pressure of 4 kgf / cm 2 , and a laminating speed of 1 m / min). Next, 80W /
Using a 365nm sensor using an ultraviolet irradiator with two cm high-pressure mercury lamps (Oak Seisakusho Co., Ltd., trade name: HMW-514)
Irradiation with ultraviolet rays of 1.2 J / cm 2 was performed. In Comparative Example 1, this ultraviolet irradiation step was not performed. Next, the polyester film was peeled off and heated for 30 minutes in a curing furnace having an ambient temperature of 150 ° C.
さらに比較例2としては,別の基板について紫外線照
射を行わず160℃の雰囲気温度を有する硬化炉内で60分
間加熱したものを作成した。Further, as Comparative Example 2, another substrate was heated for 60 minutes in a curing furnace having an ambient temperature of 160 ° C. without performing ultraviolet irradiation.
次に,この接着剤層の形成された基板の表面に,幅1c
m×長さ10cmのピール強度測定用パターンと幅2.5cm×長
さ2.5cmの260℃はんだ耐熱性測定用パターンを除いて,
紫外線硬化型めつきレジストインク(日本曹達(株)製
商品名RI−510)を印刷し,紫外線を1.5J/cm2で照射
してこのめつきレジストインクを硬化した。接着剤層の
露出している上記の両パターン部を無水クロム酸65g/
,濃硫酸250ml/とからなる化学粗化液で50℃で7分
間粗化し,水洗後,CuSO4・5H2O150g/,エチレンジア
ミン四酢酸30g/,37%HCHO水溶液10ml/,シアン化ナ
トリウム25mg/を含みNaOHでpH12.5に調整した無電解
銅めつき液に70℃で15時間浸漬し,各パターン形成部に
約30μm厚の銅めつき膜を形成した。次に水洗した後,1
50℃で30分間乾燥した。Next, on the surface of the substrate on which the adhesive layer was formed,
Except for the peel strength measurement pattern of mx 10cm in length and the 260 ° C solder heat resistance measurement pattern of 2.5cm in width x 2.5cm in length,
An ultraviolet-curable plating resist ink (trade name: RI-510, manufactured by Nippon Soda Co., Ltd.) was printed and irradiated with ultraviolet rays at 1.5 J / cm 2 to cure the plating resist ink. Both of the above pattern portions where the adhesive layer is exposed are coated with chromic anhydride 65 g /
, Roughening 7 minutes at 50 ° C. in a chemical roughening solution comprising concentrated sulfuric acid 250ml / and, after washing with water, CuSO 4 · 5H 2 O150g / , ethylenediaminetetraacetic acid 30 g /, 37% HCHO aqueous solution 10 ml /, sodium cyanide 25 mg / Was immersed in an electroless copper plating solution adjusted to pH 12.5 with NaOH at 70 ° C. for 15 hours to form a copper plating film having a thickness of about 30 μm on each pattern forming portion. Next, after washing with water,
Dry at 50 ° C. for 30 minutes.
得られた印刷配線板を用いJIS−C6481法に従い,パタ
ーン形成部の銅めつき膜のピール強度およびはんだ耐熱
性を測定した。結果を第2表にまとめて示した。Using the obtained printed wiring board, the peel strength and solder heat resistance of the copper-plated film at the pattern forming portion were measured according to the JIS-C6481 method. The results are summarized in Table 2.
ピール強度は,1cm幅のめつき皮膜を引張方向が積層板
に対し90゜で50mm/分の速さでレオメータを用いて引き
はがし,その強度によつて示した。The peel strength was indicated by the peel strength of a 1cm-wide coated film with a rheometer at a speed of 50mm / min at a tension of 90 ° to the laminate.
はんだ耐熱性は,260℃のフローはんだ浴に印刷配線板
の表面を接触させ,めつき膜のふくれ,はがれ等が発生
するまでの時間で示した。Solder heat resistance was expressed as the time until the surface of the printed wiring board was brought into contact with a flow solder bath at 260 ° C and blistering and peeling of the plating film occurred.
実施例1,2とも紫外線を利用した150℃の低温硬化が可
能になつたため,基板の反り,ねじれも1.0mm以下と少
なく印刷等に不具合もなく,めつき銅のピール強度,は
んだ耐熱性などが良好な印刷配線板が得られた。一方,
比較例の150℃での硬化では,エポキシ樹脂の硬化が不
充分であり,反り,ねじれは少ないものの,ピール強
度,はんだ耐熱性に問題があつた。また,160℃/60分の
加熱硬化したものは,ピール強度,はんだ耐熱性には,
ほぼ問題ないものの反りがひどく,レイシストインクの
印刷前に反りを矯正する必要があつた。In both Examples 1 and 2, curing at a low temperature of 150 ° C using ultraviolet light was possible, and the substrate warpage and twist were less than 1.0 mm, and there were no problems in printing, etc., peel strength of plated copper, solder heat resistance, etc. A good printed wiring board was obtained. on the other hand,
In the curing at 150 ° C. in the comparative example, the curing of the epoxy resin was insufficient, and the warpage and twist were small, but there were problems in peel strength and solder heat resistance. Heat cured at 160 ° C for 60 minutes has peel strength and solder heat resistance.
Although there was almost no problem, the warpage was severe, and it was necessary to correct the warpage before printing the racist ink.
(発明の効果) 本発明になる化学めつき用接着剤組成物および化学め
つき用接着剤フイルムによつて,基板の反り,ねじれが
少なく,めつき膜のピール強度およびはんだ耐熱性の高
い印刷配線板が得られる。 (Effect of the Invention) The adhesive composition for chemical plating and the adhesive film for chemical plating according to the present invention can reduce the warping and twisting of the substrate, and provide a printed film having high peel strength and solder heat resistance. A wiring board is obtained.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09J 121/00 JEB C09J 121/00 JEB C23C 18/20 C23C 18/20 H05K 3/18 6921−4E H05K 3/18 E (72)発明者 川本 峰雄 茨城県日立市久慈町4026番地 株式会社 日立製作所日立研究所内 (56)参考文献 特開 平2−167381(JP,A) 特開 昭60−226582(JP,A) 特開 昭60−199024(JP,A) 特開 昭60−124622(JP,A) 特開 昭57−118553(JP,A)──────────────────────────────────────────────────の Continuation of the front page (51) Int.Cl. 6 Identification number Agency reference number FI Technical indication location C09J 121/00 JEB C09J 121/00 JEB C23C 18/20 C23C 18/20 H05K 3/18 6921-4E H05K 3/18 E (72) Inventor Mineo Kawamoto 4026 Kuji-cho, Hitachi City, Ibaraki Prefecture Within Hitachi Research Laboratory, Hitachi, Ltd. (56) References JP-A-2-167381 (JP, A) JP-A-60-226582 ( JP, A) JP-A-60-199024 (JP, A) JP-A-60-124622 (JP, A) JP-A-57-118553 (JP, A)
Claims (6)
脂,化学めつきの触媒となる貴金属化合物および光感知
性芳香族オニウム塩を含有してなる化学めつき用接着剤
組成物。1. An adhesive composition for chemical plating comprising an epoxy resin, a synthetic rubber, a phenol resin, a noble metal compound serving as a catalyst for chemical plating, and a photosensitive aromatic onium salt.
〜40重量%,合成ゴムが40〜60重量%,フエノール樹脂
が20〜40重量%,化学めつきの触媒となる貴金属化合物
が0.01〜2重量%および光感知性芳香族オニウム塩が0.
2〜5重量%である請求項1記載の化学めつき用接着剤
組成物。2. An epoxy resin having a solid content of 15% in the composition.
-40% by weight, 40-60% by weight of synthetic rubber, 20-40% by weight of phenolic resin, 0.01-2% by weight of a noble metal compound serving as a catalyst for chemical plating, and 0.1% by weight of a photo-sensitive aromatic onium salt.
The adhesive composition for chemical plating according to claim 1, wherein the amount is 2 to 5% by weight.
剤組成物層の透明な支持体フイルム上に形成した化学め
つき用接着剤フイルム。3. An adhesive film for chemical plating formed on a transparent support film of the adhesive composition layer for chemical plating according to claim 1.
理をしたポリエステルフイルムである請求項3記載の化
学めつき用接着剤フイルム。4. The adhesive film for chemical plating according to claim 3, wherein the transparent support film is an olefin release-treated polyester film.
めつき用接着剤組成物の溶液を塗工し,ついで接着剤組
成物を硬化し配線パターン形成部以外にめつきレジスト
を被覆し,ついで化学めつきで配線パターン形成部にめ
つきを析出する印刷配線板の製造法。5. A solution of the adhesive composition for chemical plating according to claim 1 or 2 is coated on a laminate, and then the adhesive composition is cured to form a plating resist on portions other than the wiring pattern forming portion. A method of manufacturing a printed wiring board that coats and then deposits plating on the wiring pattern formation part by chemical plating.
めつき用接着剤フイルムを,接着剤組成物層を積層板側
にして加熱加圧ラミネートし,ついで接着剤組成物を硬
化し,配線パターン形成部以外にめつきレジストを被覆
し,ついで化学めつきで配線パターン形成部にめつきを
析出する印刷配線板の製造法。6. An adhesive film for chemical plating according to claim 3 or 4 is laminated on a laminate by heating and pressurizing with the adhesive composition layer facing the laminate, and then the adhesive composition is cured. A method of manufacturing a printed wiring board in which a plating resist is coated on portions other than a wiring pattern forming portion, and then plating is deposited on the wiring pattern forming portion by chemical plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2310040A JP2602992B2 (en) | 1990-11-15 | 1990-11-15 | Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2310040A JP2602992B2 (en) | 1990-11-15 | 1990-11-15 | Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04180984A JPH04180984A (en) | 1992-06-29 |
JP2602992B2 true JP2602992B2 (en) | 1997-04-23 |
Family
ID=18000439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2310040A Expired - Lifetime JP2602992B2 (en) | 1990-11-15 | 1990-11-15 | Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2602992B2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5532105A (en) * | 1992-08-07 | 1996-07-02 | Hitachi Chemical Company, Ltd. | Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board |
JPH1041633A (en) * | 1996-07-25 | 1998-02-13 | Hitachi Ltd | Multi layer wiring board and photosensitive resin compd. therefor |
EP1591097B1 (en) * | 2004-04-30 | 2012-06-20 | 3M Deutschland GmbH | Cationically curing two component materials containing a noble metal catalyst |
JP4492520B2 (en) | 2005-01-26 | 2010-06-30 | セイコーエプソン株式会社 | Droplet discharge head and droplet discharge device. |
JP5756444B2 (en) * | 2012-02-06 | 2015-07-29 | 富士フイルム株式会社 | LAMINATE, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION FOR FORMING UNDERLAYER LAYER |
CN104448752B (en) * | 2013-09-17 | 2017-01-18 | 比亚迪股份有限公司 | Polymer product, printing ink composition and surface selective metallization method |
CN112379649B (en) * | 2020-11-19 | 2021-09-17 | 重庆电子工程职业学院 | Intelligent household system |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4398014A (en) * | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
GB8329395D0 (en) * | 1983-11-03 | 1983-12-07 | Ciba Geigy Ag | Photopolymerisable compositions |
JPS60199024A (en) * | 1984-03-24 | 1985-10-08 | Nippon Soda Co Ltd | Curable resin composition |
JPS60226582A (en) * | 1984-04-24 | 1985-11-11 | Hitachi Chem Co Ltd | Filmy adhesive |
JP2605423B2 (en) * | 1988-09-20 | 1997-04-30 | 日立化成工業株式会社 | Adhesive for printed wiring boards |
-
1990
- 1990-11-15 JP JP2310040A patent/JP2602992B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH04180984A (en) | 1992-06-29 |
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